| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/06/2004 | US6674513 Projection exposure methods and apparatus, and projection optical systems |
| 01/06/2004 | US6674512 Uses the known relative movement between interferometer support blocks and a reference member |
| 01/06/2004 | US6674511 Evaluation mask, focus measuring method and aberration measuring method |
| 01/06/2004 | US6674510 Off-axis levelling in lithographic projection apparatus |
| 01/06/2004 | US6674509 Scanning exposure apparatus and method |
| 01/06/2004 | US6674085 Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems |
| 01/06/2004 | US6673889 Radiation curable coating containing polyfuorooxetane |
| 01/06/2004 | US6673850 Odorless photoinitiator compounds having chain transfer groups |
| 01/06/2004 | US6673714 Method of fabricating a sub-lithographic sized via |
| 01/06/2004 | US6673706 Using developer solution |
| 01/06/2004 | US6673638 Method and apparatus for the production of process sensitive lithographic features |
| 01/06/2004 | US6673637 Methods and systems for determining a presence of macro defects and overlay of a specimen |
| 01/06/2004 | US6673526 Illumination from light sources to phase shifting masks through lenses and optical filters onto substrates; photolithography |
| 01/06/2004 | US6673525 Coating photoresist layers on substrates, then baking, hydrosilylating and etching with oxygen to form miniature integrated circuit patterns |
| 01/06/2004 | US6673523 Pattern formation method |
| 01/06/2004 | US6673521 Use of a supercritical or liquified co2 is used in conjunction with an organometallic reagent enhances, without swelling, the diffusion of the reagent into the film and provides unexpectedly higher resolution top surface imaging. |
| 01/06/2004 | US6673519 Suitable for imaging by digitally controlled laser radiation |
| 01/06/2004 | US6673518 Polymer, resist composition and patterning process |
| 01/06/2004 | US6673517 Polymer comprising units derived from 7-oxabicyclo(2.2.1)hept-2-ene derivatives; sensitive to high-energy radiation, resolution, etching resistance, and minimized swell; micropatterning with electron beams |
| 01/06/2004 | US6673516 Coating composition for chemically amplified positive resist and method of patterning resist using the same |
| 01/06/2004 | US6673515 Polymer, resist composition and patterning process |
| 01/06/2004 | US6673513 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same |
| 01/06/2004 | US6673512 Photoresists comprising homo(co)polycarbons, acid generators, curing agents and bases, used to form miniaturized patterns on semiconductors using x-rays or radiation beams; high sensitivity and resolution |
| 01/06/2004 | US6673511 Resist composition |
| 01/06/2004 | US6673509 Photopolymerizable recording element and process for preparing flexographic printing forms |
| 01/06/2004 | US6673508 Comprises photosensitive silver halide particles, silver salt, reducing agent, vinyl polymer and/or hydrazine derivative; photothermography; for thermal development process without producing liquid waste |
| 01/06/2004 | US6673287 Vapor phase surface modification of composite substrates to form a molecularly thin release layer |
| 01/06/2004 | US6672210 Lithographic printing plate precursor with a graft polymerized hydrophilic layer |
| 01/06/2004 | US6672193 Controlled cutting |
| 01/06/2004 | US6672109 Silica glass member, method for producing the same, and projection aligners using the same |
| 01/06/2004 | CA2245542C Composition exhibiting improved fluorescent response |
| 01/06/2004 | CA2234110C Photosensitive resin composition |
| 01/02/2004 | EP1376663A2 Method and system for forming a semiconductor device |
| 01/02/2004 | EP1376268A1 Composition for hologram-recording material, hologram-recording medium, and process for producing the same |
| 01/02/2004 | EP1376242A1 Over-coating agent for forming fine patterns and a method of forming fine patterns using it |
| 01/02/2004 | EP1376241A1 Method for preparing lithographic printing plate |
| 01/02/2004 | EP1376240A2 Laser beam control for an exposure apparatus |
| 01/02/2004 | EP1376239A2 Cooling device for an optical element |
| 01/02/2004 | EP1376238A2 A system for correcting aberration and distortion in EUV litography |
| 01/02/2004 | EP1376237A2 Off-axis metrology of adaptive optical system |
| 01/02/2004 | EP1376235A2 Full-contact type exposure device |
| 01/02/2004 | EP1376234A1 Method for forming metal pattern |
| 01/02/2004 | EP1376233A2 Method of producing a resin for a radiation-sensitive material |
| 01/02/2004 | EP1376232A1 Photosensitive resin composition |
| 01/02/2004 | EP1376231A1 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment |
| 01/02/2004 | EP1376230A1 Fine pattern forming method |
| 01/02/2004 | EP1376229A1 Structure for pattern formation, method for pattern formation, and application thereof |
| 01/02/2004 | EP1376228A1 Structure for pattern formation, method for pattern formation, and application thereof |
| 01/02/2004 | EP1376227A1 Structure for pattern formation, method for pattern formation, and application thereof |
| 01/02/2004 | EP1376226A1 Structure for pattern formation, method for pattern formation, and application thereof |
| 01/02/2004 | EP1376225A1 Structure for pattern formation, method for pattern formation, and application thereof |
| 01/02/2004 | EP1376224A1 Structure for pattern formation, method for pattern formation, and application thereof |
| 01/02/2004 | EP1376192A2 Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system |
| 01/02/2004 | EP1376191A1 Deformable mirror actuation system |
| 01/02/2004 | EP1376185A2 Minimizing thermal distortion effects on EUV mirror |
| 01/02/2004 | EP1376183A2 Optical-element mountings exhibiting reduced deformation of optical elements held thereby |
| 01/02/2004 | EP1376103A2 Method for determining local structures in optical crystals |
| 01/02/2004 | EP1376092A2 Method and device for controlling thermal distortion in elements of a lithography system |
| 01/02/2004 | EP1376052A2 System and method for automated focus measuring of a lithography tool |
| 01/02/2004 | EP1375699A1 Method for forming metal pattern |
| 01/02/2004 | EP1375597A1 Radiation-sensitive composition changing in refractive index and utilization thereof |
| 01/02/2004 | EP1375540A1 Ethylenic fluoromonomer containing hydroxyl or fluoroalkylcarbonyl group and fluoropolymer obtained by polymerizing the same |
| 01/02/2004 | EP1375463A1 Optically active compound and photosensitive resin composition |
| 01/02/2004 | EP1375136A1 Reusable printing plate |
| 01/02/2004 | EP1374650A1 Method and device for producing extreme ultraviolet radiation and soft x-radiation |
| 01/02/2004 | EP1374310A2 Nanofabrication |
| 01/02/2004 | EP1374287A2 Process for forming sub-lithographic photoresist features |
| 01/02/2004 | EP1374269A1 Method of producing a screen for a color display tube |
| 01/02/2004 | EP1373985A1 Lithography system with beam guidance and method for producing digital holograms in a storage medium |
| 01/02/2004 | EP1373983A1 Lithograph with a trigger mask and method of production of digital holograms in a storage medium |
| 01/02/2004 | EP1373982A2 Method for adjusting the overlay of two masking planes in a photolithographic process for the production of an integrated circuit |
| 01/02/2004 | EP1373981A2 Lithographer comprising a mobile lens and method for producing digital holograms in a storage medium |
| 01/02/2004 | EP1373980A1 High performance, photoimageable resin compositions and printing plates prepared therefrom |
| 01/02/2004 | EP1373979A1 Substrate improvements for thermally imageable composition and methods of preparation |
| 01/02/2004 | EP1373943A2 Method and device for producing an optically antireflective surface |
| 01/02/2004 | EP1373877A1 Base stabilization system |
| 01/02/2004 | EP1373426A1 Structural bonding tapes and articles containing the same |
| 01/02/2004 | EP1373331A2 Thermally cured underlayer for lithographic application |
| 01/02/2004 | EP1373151A1 Oxygen doping of silicon oxyfluoride glass |
| 01/02/2004 | EP0956518B1 Interferometer system and lithographic apparatus comprising such a system |
| 01/02/2004 | EP0775940B2 Use of a photosensitive paste, method of producing a plasma display and plasma display obtainable thereby |
| 01/01/2004 | US20040003368 Method and apparatus for performing rule-based gate shrink utilizing dipole illumination |
| 01/01/2004 | US20040002773 Photoresist system |
| 01/01/2004 | US20040002575 Photoresists; mixture with solvent and photoacid generator |
| 01/01/2004 | US20040002224 Substrate processing system and substrate processing method |
| 01/01/2004 | US20040002216 Method and system for forming a semiconductor device |
| 01/01/2004 | US20040002020 Photoresist residue remover composition |
| 01/01/2004 | US20040002019 Method for Preparing Lithographic Printing Plate |
| 01/01/2004 | US20040002017 Polymers with mixed photoacid-labile groups and photoresists comprising same |
| 01/01/2004 | US20040002011 Photolithography; measuring adjustment mask; forming grid pattern; calibration |
| 01/01/2004 | US20040002010 Variation in light intensity; high density images; photolithography |
| 01/01/2004 | US20040002008 Recording material formulations for holographic media |
| 01/01/2004 | US20040002007 Oxime derivatives and the use thereof as latent acids |
| 01/01/2004 | US20040001964 Method of manufacturing a structure having pores |
| 01/01/2004 | US20040001961 Dry films; reducing dielectric interface |
| 01/01/2004 | US20040001918 Uniform thickness; storage containers, discharging nozzle |
| 01/01/2004 | US20040001244 Semiconductor device and method for forming the same using cubic crystalline optical system with reduced birefringence |
| 01/01/2004 | US20040001192 System and method for automated focus measuring of a lithography tool |
| 01/01/2004 | US20040001191 Scanning exposure apparatus and method |
| 01/01/2004 | US20040001190 Projection exposure apparatus and device manufacturing method |