| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/13/2004 | US6676757 Capable of increasing yields of a coating solution and forming an uniform coating film |
| 01/13/2004 | US6676317 Rotor balancing structure, sheet material processing device, and image forming device |
| 01/13/2004 | US6676289 Temperature measuring method in pattern drawing apparatus |
| 01/13/2004 | US6675863 Seamless master and method of making same |
| 01/13/2004 | US6675711 Apparatus for feeding and ejecting a printing plate onto a surface plate |
| 01/10/2004 | CA2432859A1 Heat-sensitive composition in which removal of the unexposed regions is unnecessary, negative lithographic plate coated with the said composition and method for forming a negativeimage on the said plate |
| 01/08/2004 | WO2004004025A2 Method for the economical structuring of conducting polymers by means of defining hydrophilic and hydrophobic regions |
| 01/08/2004 | WO2004003982A1 Reflection mirror apparatus, exposure apparatus and device manufacturing method |
| 01/08/2004 | WO2004003666A1 Coating forming agent for reducing pattern dimension and method of forming fine pattern therewith |
| 01/08/2004 | WO2004003665A1 Recording material formulations for holographic media |
| 01/08/2004 | WO2004003611A1 Writing of photo-induced structures |
| 01/08/2004 | WO2004003469A1 Pattern detector and its using method, measuring method and apparatus, position measuring method, exposing method and device, and method for fabricating device |
| 01/08/2004 | WO2004003035A1 Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation |
| 01/08/2004 | WO2004002955A2 Photosensitive compositions |
| 01/08/2004 | WO2003044078A9 Anti-reflective coatings for photolithography and methods of preparation thereof |
| 01/08/2004 | WO2003012529A3 Objective, particularly a projection objective for use in semiconductor lithography |
| 01/08/2004 | WO2002073688A3 Lithography method for forming semiconductor devices on a wafer and apparatus |
| 01/08/2004 | WO2002042845A3 Photoacid generators and photoresists comprising same |
| 01/08/2004 | US20040006757 Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique |
| 01/08/2004 | US20040006485 Manufacturing integrated circuits |
| 01/08/2004 | US20040006443 Position measuring device and method for determining a position |
| 01/08/2004 | US20040006191 Silicon-containing polymer, resist composition and patterning process |
| 01/08/2004 | US20040006189 For use in fine patterning of semiconductors |
| 01/08/2004 | US20040006161 Ultraviolet curable resin composition and photo solder resist ink including the same |
| 01/08/2004 | US20040005518 Method for forming a planarized layer of a semiconductor device |
| 01/08/2004 | US20040005517 Forming a conductive trace on a substrate. The conductive trace is patterned with a photoresist mask and etched, thereby forming a polymer layer on a top surface and sidewalls of the photoresist mask and on sidewalls of the conductive trace and |
| 01/08/2004 | US20040005516 Lithography method for preventing lithographic exposure of peripheral region of semiconductor wafer |
| 01/08/2004 | US20040005515 Light sensitive planographic printing plate precursor and its processing method |
| 01/08/2004 | US20040005514 Thermally imageable elements and methods for their preparation and use are disclosed. The elements contain, in order, a substrate; an underlayer; and an ink-repellent layer. The underlayer contains a crosslinked allyl functional |
| 01/08/2004 | US20040005513 Resist composition |
| 01/08/2004 | US20040005512 Positive-working resist composition |
| 01/08/2004 | US20040005507 Controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the |
| 01/08/2004 | US20040005506 Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern |
| 01/08/2004 | US20040005444 Substrate for and a process in connection with the product of structures |
| 01/08/2004 | US20040005412 Organometallic precursor mixture for forming metal alloy pattern and method of forming metal alloy pattern using the same |
| 01/08/2004 | US20040005374 Creating objects through X and Z movement of print heads |
| 01/08/2004 | US20040005266 Optical member, process for producing the same, and projection aligner |
| 01/08/2004 | US20040005209 Reticle pod |
| 01/08/2004 | US20040005149 Substrate treating apparatus and method |
| 01/08/2004 | US20040004771 Projection optical system, exposure system provided with the projection optical system, and exposure method using the projection optical system |
| 01/08/2004 | US20040004757 Very-high aperture projection objective |
| 01/08/2004 | US20040004726 Overlay targets with isolated, critical-dimension features and apparatus to measure overplay |
| 01/08/2004 | US20040004722 Athermal zero-shear interferometer |
| 01/08/2004 | US20040004704 Reticle carrier |
| 01/08/2004 | US20040004703 Method and apparatus for reducing rotary stiffness in a support mechanism |
| 01/08/2004 | US20040004702 Reversed, double-helical bellows seal |
| 01/08/2004 | US20040004701 Radiation generating apparatus, radiation generating method, exposure apparatus, and exposure method |
| 01/08/2004 | US20040004700 Exposure apparatus and exposure method for use in forming a pattern of a semiconductor device |
| 01/08/2004 | US20040004699 Increasing a scan rate in a photolithography system by increasing a unit travel length while maintaining a minimum resolution |
| 01/08/2004 | US20040004297 Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method |
| 01/08/2004 | US20040003737 Printing press, layered formation and making method thereof, and printing plate and making method thereof |
| 01/08/2004 | DE19815978B4 Verfahren zur Herstellung von Klein- und Mikroteilen aus Keramik Process for the production of small and micro parts made of ceramic |
| 01/08/2004 | DE10260689A1 Verfahren zur optimalen Fokusbestimmung Method for determination of optimum focus |
| 01/08/2004 | DE10227867A1 Zusammensetzung zum Entfernen von Sidewall-Residues Composition for removing Sidewall Residues |
| 01/08/2004 | DE10227189A1 Verfahren zur Herstellung von Flexdruckformen mittels Laser-Direktgravur A process for the production of printing forms Flex means of direct laser engraving |
| 01/08/2004 | DE10226655A1 Vorrichtung zur Positionierung eines optischen Elements in einer Struktur A device for positioning an optical element in a structure |
| 01/08/2004 | DE10128481B4 Verfahren zur Ätzung eines Substrats A method for etching a substrate |
| 01/08/2004 | CA2530777A1 Writing of photo-induced structures |
| 01/07/2004 | EP1378936A2 Electrostatic chuck |
| 01/07/2004 | EP1378798A1 Process for making a printing belt |
| 01/07/2004 | EP1378797A2 Wavefront aberration correction system |
| 01/07/2004 | EP1378796A1 Composition for forming antireflection film for lithography |
| 01/07/2004 | EP1378795A1 Resist composition and patterning process |
| 01/07/2004 | EP1378794A1 Light sensitive composition and light sensitive planographic printing plate precursor |
| 01/07/2004 | EP1378793A2 Light sensitive planographic printing plate precursor |
| 01/07/2004 | EP1378782A2 Deformable mirror with passive and active actuators |
| 01/07/2004 | EP1378780A2 Projection optical system, exposure apparatus, and device production method |
| 01/07/2004 | EP1378038A1 Injection seeded f2 laser with wavelength control |
| 01/07/2004 | EP1378037A1 Injection seeded f2 laser with line selection and discrimination |
| 01/07/2004 | EP1378036A1 Injection seeded laser with precise timing control |
| 01/07/2004 | EP1378035A1 Injection seeded f 2? laser with pre-injected filter |
| 01/07/2004 | EP1377881A2 Scanning probe based lithographic alignment |
| 01/07/2004 | EP1377880A1 Lithograph with one-dimensional trigger mask and method for production of digital holograms in a storage medium |
| 01/07/2004 | EP1377879A2 Photoresist compositions comprising solvents for short wavelength imaging |
| 01/07/2004 | EP1377878A2 Preparation of photomasks |
| 01/07/2004 | EP1377876A1 High resolution resists for next generation lithographies |
| 01/07/2004 | EP1377853A1 Microlens for projection lithography and method of preparation thereof |
| 01/07/2004 | EP1377451A2 Epoxy-functional polymeric microbeads |
| 01/07/2004 | CN2598023Y 图形发生器 Graphics Generator |
| 01/07/2004 | CN1466860A Method and apparatus for generating X-ray or EUV radiation |
| 01/07/2004 | CN1466708A Photoresist stripper/cleaner compositions containing aromatic acid inhibitors |
| 01/07/2004 | CN1466707A Pinhole defect repair by resist blow |
| 01/07/2004 | CN1466706A Photosensitive resin composition |
| 01/07/2004 | CN1466171A Method for shortening analytic period of mfg. process |
| 01/07/2004 | CN1466017A Etching method for making film transistor LCD |
| 01/07/2004 | CN1466016A Pendulum type digital exposure method |
| 01/07/2004 | CN1466012A Method for preventing corrosion water washing in metal layer etching process |
| 01/07/2004 | CN1466011A Method for making LCD device |
| 01/07/2004 | CN1465687A Semiconductor process residue removal composition and process |
| 01/07/2004 | CN1134043C Discharge lamp source appts and method |
| 01/07/2004 | CN1133902C Method and appts for development of resist |
| 01/07/2004 | CN1133901C Alkysulfonyloximes for high-resolution I-line hpotoresists of high sensitivity |
| 01/07/2004 | CN1133866C Differential interferometer system and lithographic step-and-scan apts. provided with such a system |
| 01/07/2004 | CN1133631C Epoxy acrylate, preparing process and use thereof |
| 01/06/2004 | US6675369 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 01/06/2004 | US6675368 Apparatus for and method of preparing pattern data of electronic part |
| 01/06/2004 | US6675053 Layout for measurement of overlay error |
| 01/06/2004 | US6674890 Defect inspection method and apparatus therefor |
| 01/06/2004 | US6674516 Method of photolithographic exposure dose control as a function of resist sensitivity |
| 01/06/2004 | US6674514 Illumination optical system in exposure apparatus |