| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/15/2004 | US20040009429 Acid generating sulfonium compound, a resin having specific repeating units, which is decomposed by the action of an acid to increase it's solubility in an alkaline developing solution |
| 01/15/2004 | US20040009428 Resist curable resin composition and cured article thereof |
| 01/15/2004 | US20040009427 A sulfonium compound which generates an acid upon exposure to radiation, and a resin component (acrylic monomer containing a lactone group which becomes insoluble in alkali under the action of an acid generated from sulfonium compound) |
| 01/15/2004 | US20040009426 Infrared photosensitive composition and image recording material for infrared exposure |
| 01/15/2004 | US20040009425 Radiation durable organic compounds with high transparency at 157 nm, and method for preparing |
| 01/15/2004 | US20040009424 Protecting groups for lithographic resist compositions |
| 01/15/2004 | US20040009417 Method for making fine prints from oscillations in fresnel diffraction patterns in ultra high resolution lithography |
| 01/15/2004 | US20040009416 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
| 01/15/2004 | US20040009415 Optical apparatus comprising lenses and light sources positioned such that image distortion is suppressed, used to form lelctronics such as semiconductors or liquid crystal displays |
| 01/15/2004 | US20040009414 Dye-containing curable composition, color filter and method of manufacturing the same |
| 01/15/2004 | US20040009413 Substrate and masking multilayers having apertures for transmission of radiation to form patterns, and for generation of optics by printing onto photoresist layers and transferring the prints to radiation transparent layers |
| 01/15/2004 | US20040009410 Integrated cooling substrate for extreme ultraviolet reticle |
| 01/15/2004 | US20040009406 Optical recording medium comprising photoactive polymers used for holography and data processing; recording |
| 01/15/2004 | US20040009295 Spin-coating method, determination method for spin-coating condition and mask blank |
| 01/15/2004 | US20040008811 Compositions and methods involving direct write optical lithography |
| 01/15/2004 | US20040008433 Wavefront aberration correction system |
| 01/15/2004 | US20040008427 Optical system with compensated spatial dispersion |
| 01/15/2004 | US20040008424 Adjustment of the partial coherence of the light energy in an imaging system |
| 01/15/2004 | US20040008419 Variable focus lens by small changes of the equatorial lens diameter |
| 01/15/2004 | US20040008408 Relay lens used in an illumination system of a lithography system |
| 01/15/2004 | US20040008383 Method and apparatus for eliminating seams in screened image data for repetitive printing |
| 01/15/2004 | US20040008353 CD metrology analysis using a finite difference method |
| 01/15/2004 | US20040008348 Birefringence measurement apparatus, strain remover, polarimeter and exposure apparatus |
| 01/15/2004 | US20040008334 Step and repeat imprint lithography systems |
| 01/15/2004 | US20040008332 Exposure device |
| 01/15/2004 | US20040008331 Lithographic apparatus and device manufacturing method |
| 01/15/2004 | US20040008329 Exposure condition determination system |
| 01/15/2004 | US20040008328 Optical device, method of cleaning the same, projection aligner, and method of producing the same |
| 01/15/2004 | US20040008298 Preparing photo-patterned mono- or polychromatic, polarizing films; polarizer can be placed on the interior substrate surface of the Liquid Crystal Display (LCD) cell |
| 01/15/2004 | US20040007990 Light generation apparatus, exposure apparatus, and device manufacturing method |
| 01/15/2004 | US20040007920 Methods and apparatus for initializing a planar motor |
| 01/15/2004 | US20040007680 Electron beam lithography apparatus using a patterned emitter |
| 01/15/2004 | US20040007382 A photolithographic process for forming a semiconductor, heating carried out simultaneously with photo-radiation to deactivate substrate protection agents and the dissolution inhibitors |
| 01/15/2004 | US20040007246 In-situ cleaning of light source collector optics |
| 01/15/2004 | DE10329384A1 Phasenverschiebungsmaske für optische Lithographie Phase shift mask for optical lithography |
| 01/15/2004 | DE10327257A1 Verfahren zur Bildung von Metallkolloidmustern A method of forming metal colloid patterns |
| 01/15/2004 | DE10229818A1 Verfahren zur Fokusdetektion und Abbildungssystem mit Fokusdetektionssystem Method of focus detection and imaging system with focus detection system |
| 01/15/2004 | DE10229614A1 Katadioptrisches Reduktionsobjektiv A catadioptric reduction objective |
| 01/15/2004 | DE10227345A1 Verfahren zur Bestimmung lokaler Strukturen in optischen Kristallen Method for the determination of local structures in optical crystals |
| 01/15/2004 | DE10227190A1 Verfahren zur Filterung von Strahlung A method for filtering radiation |
| 01/14/2004 | EP1380899A2 Lithographic apparatus and device manufacturing method |
| 01/14/2004 | EP1380898A1 Substrate holder and device manufacturing method |
| 01/14/2004 | EP1380897A1 Lithographic apparatus and device manufacturing method |
| 01/14/2004 | EP1380896A1 Optical system with compensated spatial dispersion |
| 01/14/2004 | EP1380895A1 Chemically amplified resist material and patterning method using the same |
| 01/14/2004 | EP1380871A2 Relay lens used in an illumination system of a lithography system |
| 01/14/2004 | EP1380439A1 Heat-sensitive composition, negative working lithographic printin plate precursor coated with the said composition and method for forming a negative image on the said plate |
| 01/14/2004 | EP1380425A1 Method of producing microstructure, method of producing liquid discharge head, and liquid discharge head produced thereby |
| 01/14/2004 | EP1380422A1 Method of manufacturing microstructure, method of manufacturing liquid discharge head, and liquid discharge head |
| 01/14/2004 | EP1380000A2 Method and device for vibration control |
| 01/14/2004 | EP1379923A2 Substrate alignment |
| 01/14/2004 | EP1379922A2 Grating test patterns and methods for overlay metrology |
| 01/14/2004 | EP1379921A1 Process for producing acid sensitive liquid composition containing a carbonate |
| 01/14/2004 | EP1379920A2 Photoresist compositions comprising bases and surfactants for microlithography |
| 01/14/2004 | EP1379918A1 Imageable element comprising graft polymer |
| 01/14/2004 | EP1379331A2 Process for producing film forming resins for photoresist compositions |
| 01/14/2004 | CN1468406A Digital photolithography system for making smooth diagonal components |
| 01/14/2004 | CN1468391A 正感光性聚酰亚胺树脂组合物 Positive photosensitive polyimide resin composition |
| 01/14/2004 | CN1468390A Photoinitiated reactions |
| 01/14/2004 | CN1468050A Method of manufacturing printed wiring board and printed wiring board obtained by the manufacturing method |
| 01/14/2004 | CN1467840A Semiconductor device and method of manufacturing the same |
| 01/14/2004 | CN1467794A Pattern formation method |
| 01/14/2004 | CN1467793A Treating solution applying method |
| 01/14/2004 | CN1467792A 曝光条件确定系统 Exposure conditions determine the system |
| 01/14/2004 | CN1467791A Litho process applying to mask ROM coding layout |
| 01/14/2004 | CN1467790A Method for forming open-top pattern and application thereof |
| 01/14/2004 | CN1467570A Pattern writing apparatus, pattern writing method and substrate |
| 01/14/2004 | CN1467569A Projection exposure equipment |
| 01/14/2004 | CN1467568A Method and apparatus for exposure |
| 01/14/2004 | CN1467567A Planographic printing plate precursor |
| 01/14/2004 | CN1467532A Exposure head and exposure apparatus |
| 01/14/2004 | CN1467517A Fabrication method of optical wiring circuit and optical wiring baseboard having the same optical wiring circuit |
| 01/14/2004 | CN1134826C Method for producing semiconductor device |
| 01/14/2004 | CN1134706C Process for producing screen printing form and screen printing fabric of coated screen web |
| 01/14/2004 | CN1134705C Smart photolithography |
| 01/14/2004 | CN1134511C Water soluble resin composition |
| 01/14/2004 | CN1134505C Photosensitive mixture and recording material produced therefrom |
| 01/14/2004 | CN1134457C New alpha-aminoacetophenone photoinitiators |
| 01/14/2004 | CN1134352C Method for decoratively shaping painted substrate surface |
| 01/14/2004 | CN1134310C Method and device for treating substrates |
| 01/14/2004 | CA2490975A1 A device having a light-absorbing mask and a method for fabricating same |
| 01/13/2004 | US6678348 Integral lens for high energy particle flow, method for producing such lenses use thereof in analysis devices and devices for radiation therapy and lithography |
| 01/13/2004 | US6678240 Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements |
| 01/13/2004 | US6678099 Reflective color filter |
| 01/13/2004 | US6678038 Apparatus and methods for detecting tool-induced shift in microlithography apparatus |
| 01/13/2004 | US6678037 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/13/2004 | US6677600 EUV radiation source |
| 01/13/2004 | US6677390 Photocurable composition containing iodonium salt compound |
| 01/13/2004 | US6677242 Integrated shallow trench isolation approach |
| 01/13/2004 | US6677166 Method for confirming alignment of a substrate support mechanism in a semiconductor processing system |
| 01/13/2004 | US6677108 Exposure of photoresists to radiation; patterning |
| 01/13/2004 | US6677107 Resist film is made to function as a light screening film, wherein the information detecting ability of the photo mask can be enhanced |
| 01/13/2004 | US6677106 Widens the window of operation of standard used patterning compositions used in making thermally sensitive printing plates using a flood exposure method |
| 01/13/2004 | US6677103 Positive-working photoresist composition |
| 01/13/2004 | US6677102 Chemical amplifying type positive resist composition |
| 01/13/2004 | US6677101 Reactivity, rigidity and adhesion to the substrate, and undergoes a low degree of swelling during development; resolution |
| 01/13/2004 | US6677100 Copolymer of an acrylate or methacrylate monomer having a silyl (si), silanol, silanediol, silanetriol, germanyl (ge), or stannous (sn) group, and maleic anhydride; for excimer laser lithography |
| 01/13/2004 | US6677099 Positive type photosensitive polyimide resin composition |
| 01/13/2004 | US6677089 Charged particle beam exposure method with performing proximity effect correction by adjusting widths of patterns included in block pattern formed on a mask |
| 01/13/2004 | US6677088 Photomask producing method and apparatus and device manufacturing method |