| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/25/2013 | CN103474336A Method for manufacturing high-evenness grid electrode lines |
| 12/25/2013 | CN103472944A Touch panel and manufacturing method thereof |
| 12/25/2013 | CN103472703A Volume hologram laminate |
| 12/25/2013 | CN103472694A Photoresist removal method, exposure device and display array substrate manufacturing method |
| 12/25/2013 | CN103472693A Process spray nozzle for chip developing process |
| 12/25/2013 | CN103472692A Developing tank |
| 12/25/2013 | CN103472691A Exposure machine and method for controlling same |
| 12/25/2013 | CN103472690A Axial adjusting device for optical element in projection objective system |
| 12/25/2013 | CN103472689A Photoetching image device and method for realizing super-resolution imaging through enhancing illumination numerical aperture |
| 12/25/2013 | CN103472688A Illumination device of deep ultraviolet projection mask aligner and application method |
| 12/25/2013 | CN103472687A Photoetching annular-illumination-mode generating device |
| 12/25/2013 | CN103472686A Method for simulating three-dimensional light intensity distribution in thick resist ultraviolet (UV) shifting mask lithography |
| 12/25/2013 | CN103472685A Synchronizer, scanning type laser imaging system and synchronizing method |
| 12/25/2013 | CN103472684A Substrate processing apparatus and device manufacturing method |
| 12/25/2013 | CN103472683A Manufacturing device of digital photoetching microscopic carvings as well as carving method thereof |
| 12/25/2013 | CN103472682A Method for preparing diffraction micro-optical elements based on mask lithography technique and injection molding |
| 12/25/2013 | CN103472681A Lithography movement table reacting force neutralization apparatus and lithography applying the same |
| 12/25/2013 | CN103472680A Silicon wafer pre-alignment apparatus |
| 12/25/2013 | CN103472679A Double-workpiece table long travel measurement apparatus and use method thereof |
| 12/25/2013 | CN103472678A Lithography and workpiece table system applied in lithography |
| 12/25/2013 | CN103472677A Substrate vertical direction photoelectricity detection apparatus and method thereof |
| 12/25/2013 | CN103472676A Wave aberration surveying marker and wave aberration measuring method |
| 12/25/2013 | CN103472675A Processing technology for curved film |
| 12/25/2013 | CN103472674A Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound |
| 12/25/2013 | CN103472612A Array substrate preparation method, array substrate and liquid crystal display device |
| 12/25/2013 | CN103472610A Substrate drying device and substrate cleaning system |
| 12/25/2013 | CN103472586A Projection optical system |
| 12/25/2013 | CN103472574A Photoetching projection objective with variable conjugate distance and photoetching method |
| 12/25/2013 | CN103472559A Axial macro-micro adjusting device for optical element in photoetching projection objective lens system |
| 12/25/2013 | CN103472555A Dual-motor optical element axial adjustment device |
| 12/25/2013 | CN103472004A Photolithography process parameter measurement apparatus and method thereof |
| 12/25/2013 | CN103467646A Alkali-soluble resin and preparation method thereof |
| 12/25/2013 | CN103465015A Multi-degree-of-freedom adjusting mechanism |
| 12/25/2013 | CN102880001B Laser thermal lithography organic photoresist and preparation method of photoresist |
| 12/25/2013 | CN102707565B Manufacturing method of black matrix, color filter and display device |
| 12/25/2013 | CN102645853B Diffractive annular illumination generator and method for manufacturing same |
| 12/25/2013 | CN102633984B Polyurethane-acrylate oligomer, and synthesis method and application thereof |
| 12/25/2013 | CN102540717B Photosensitive resin composition and light blocking layer using same |
| 12/25/2013 | CN102495534B Galvanometer type laser direct writing photoetching machine |
| 12/25/2013 | CN102460308B Preparing lithographc printing plates with enhanced contrast |
| 12/25/2013 | CN102262361B Exposure apparatus and exposure process |
| 12/25/2013 | CN102131958B Method of forming microstructure |
| 12/25/2013 | CN102072742B Lithographic apparatus and device manufacturing method |
| 12/25/2013 | CN101661873B Substrate processing system, carrying device and coating device |
| 12/25/2013 | CN101622580B Resist underlayer film forming composition for electron beam lithography |
| 12/24/2013 | US8614785 Microlithography projection system with an accessible diaphragm or aperture stop |
| 12/24/2013 | US8614283 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer |
| 12/24/2013 | US8614053 Processess and compositions for removing substances from substrates |
| 12/24/2013 | US8614051 Photosensitive resin composition and circuit formation substrate using the same |
| 12/24/2013 | US8614050 Polymers, photoresist compositions and methods of forming photolithographic patterns |
| 12/24/2013 | US8614049 Resist composition and method of forming resist pattern |
| 12/24/2013 | US8614048 Resin, resist composition and method for producing resist pattern |
| 12/24/2013 | US8614047 Photodecomposable bases and photoresist compositions |
| 12/24/2013 | US8614046 Salt and photoresist composition containing the same |
| 12/24/2013 | US8614037 Dye-containing negative working curable composition, color filter and method of producing thereof |
| 12/24/2013 | US8613999 Laser-engraveable compositions and flexographic printing precursors comprising organic porous particles |
| 12/24/2013 | DE102013206981A1 Facet mirror for e.g. extreme UV (EUV) projection exposure system used in lighting system, has mirror facet unit that varies radius of curvature of mirror facet from specific radius of curvature to another radius of curvature |
| 12/24/2013 | DE102012224359A1 Verfahren zur Herstellung von Stempeln für Vorrichtungen für die plasmonische Nanolithographie und Vorrichtung für die plasmonische Nanolithographie A process for the production of stamps for devices for the plasmonic nanolithography and apparatus for the plasmonic nanolithography |
| 12/19/2013 | WO2013188547A1 Linear stage and metrology architecture for reflective electron beam lithography |
| 12/19/2013 | WO2013187577A1 Photocurable composition, barrier layer including same, and encapsulated device including same |
| 12/19/2013 | WO2013187530A1 Pattern forming method, composition used therein, method for manufacturing electronic device, and electronic device |
| 12/19/2013 | WO2013187520A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film used therefor, and electronic device manufacturing method and electronic device using the same |
| 12/19/2013 | WO2013187493A1 Colored photosensitive resin composition |
| 12/19/2013 | WO2013187313A1 Liquid composition for cleaning, method for cleaning semiconductor element, and method for manufacturing semiconductor element |
| 12/19/2013 | WO2013187300A1 Light irradiating device, and exposure device |
| 12/19/2013 | WO2013187299A1 Light irradiating device, and exposure device |
| 12/19/2013 | WO2013187209A1 Photosensitive composition |
| 12/19/2013 | WO2013186929A1 Mask protection device, exposure apparatus, and method for manufacturing device |
| 12/19/2013 | WO2013186307A1 Positioning system, lithographic apparatus and device manufacturing method |
| 12/19/2013 | WO2013186136A2 Lithographic apparatus and device manufacturing method |
| 12/19/2013 | WO2013185990A1 Negative-working thick film photoresist |
| 12/19/2013 | WO2013185989A1 Positive photosensitive material |
| 12/19/2013 | WO2013185919A1 Projection exposure apparatus and method for controlling a projection exposure apparatus |
| 12/19/2013 | WO2013185822A1 Maskless lithographic apparatus and method for generating an exposure pattern |
| 12/19/2013 | WO2013185422A1 Method for producing motherboard alignment film, transfer plate, and alignment liquid |
| 12/19/2013 | WO2013185401A1 Mask and correction method thereof |
| 12/19/2013 | WO2013139483A3 Measuring system for measuring an imaging quality of an euv lens |
| 12/19/2013 | WO2013124052A3 Lithography device with eddy-current brake |
| 12/19/2013 | WO2013100205A3 Exposure apparatus and exposure method |
| 12/19/2013 | WO2013064890A8 Nanocomposite negative photosensitive composition and use thereof |
| 12/19/2013 | US20130337649 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process |
| 12/19/2013 | US20130337387 Resist composition and method of forming resist pattern |
| 12/19/2013 | US20130337386 Processing apparatus for processing a flexographic plate, a method and a computer program product |
| 12/19/2013 | US20130337385 Negative pattern-forming method and photoresist composition |
| 12/19/2013 | US20130337384 Positive resist composition for immersion exposure and pattern forming method |
| 12/19/2013 | US20130337383 Patterning process and resist composition |
| 12/19/2013 | US20130337382 Compound, resist composition and method of forming resist pattern |
| 12/19/2013 | US20130337381 Negative-working thick film photoresist |
| 12/19/2013 | US20130337380 Positive photosensitive material |
| 12/19/2013 | US20130337379 Antireflective compositions and methods of using same |
| 12/19/2013 | US20130337378 Sulfonium salt, polymer, resist composition, and patterning process |
| 12/19/2013 | US20130337372 Method and System for Design of a Reticle to be Manufactured Using Variable Shaped Beam Lithography |
| 12/19/2013 | US20130337370 Photomask and method for forming the same |
| 12/19/2013 | US20130337231 Substrate having etching mask and method for producing same |
| 12/19/2013 | US20130337168 Method for forming silicon-containing resist underlayer film |
| 12/19/2013 | US20130335723 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
| 12/19/2013 | US20130335722 Lithographic apparatus and device manufacturing method |
| 12/19/2013 | US20130335721 Measurement of the position of a radiation beam spot in lithography |
| 12/19/2013 | US20130335720 Reflecting optical member, optical system, exposure apparatus, and device manufacturing method |
| 12/19/2013 | US20130335719 Exposure method, exposure apparatus, and photomask |