| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/22/2004 | US20040011231 Method and apparatus for accurate, micro-contact printing |
| 01/22/2004 | DE10325308A1 Abbildungsverfahren Imaging methods |
| 01/22/2004 | DE10240356A1 Electrostatic holding element used in the lithographic structuring of semiconductor elements or substrates has a dielectric part with a specified thickness and having a structured surface |
| 01/22/2004 | DE10235482B3 Vorrichtung zum Fixieren dünner und flexibler Substrate A device for fixing a thin and flexible substrates |
| 01/22/2004 | DE10227807A1 Silylalkylester von Anthracen- und Phenanthrencarbonsäuren Silyl alkyl esters of anthracene and Phenanthrencarbonsäuren |
| 01/22/2004 | CA2491678A1 Heat stable photocurable resin composition for dry film resist |
| 01/21/2004 | EP1383157A2 Electron beam exposure apparatus and semiconductor device manufacturing method |
| 01/21/2004 | EP1383007A1 Lithographic apparatus, and device manufacturing method |
| 01/21/2004 | EP1383006A1 Negative photosensitive resin composition and display device using the same |
| 01/21/2004 | EP1382644A1 Photosensitive polyimide resin precursor composition, optical waveguide using the polyimide and process for producing the optical waveguide |
| 01/21/2004 | EP1382446A1 Laminate for IR ablation |
| 01/21/2004 | EP1382230A1 Method and device for generating extreme ultraviolet radiation in particular for lithography |
| 01/21/2004 | EP1382095A1 Laser wavelength control unit with piezoelectric driver |
| 01/21/2004 | EP1381919A1 Euv-transparent interface structure |
| 01/21/2004 | EP1381656A1 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 01/21/2004 | EP1112307B1 Screen coating composition and method for applying same |
| 01/21/2004 | EP0792530B1 Low cost, high average power, high brightness solid state laser |
| 01/21/2004 | CN1470010A Dissolution inhibitors in photoresist compositions for microlithography |
| 01/21/2004 | CN1469953A Fibrous structure having increased surface area and process for making same |
| 01/21/2004 | CN1469918A Stabilized alkaline compositions for cleaning microelectronic substrates |
| 01/21/2004 | CN1469887A Fractionation of resins using a static mixer and a liquid-liquid centrifuge |
| 01/21/2004 | CN1469845A Process for recovering onium hydroxides from solutions containing onium compounds |
| 01/21/2004 | CN1469452A Method for constituting graph on intermetallic dielectric layer |
| 01/21/2004 | CN1469432A Method for forming fine pattern |
| 01/21/2004 | CN1469430A Coating film forming agent for pattern minuteness and method for forming minute pattern with the same forming agent |
| 01/21/2004 | CN1469429A Method for producing thin film semiconductor and method for forming resist pattern thereof |
| 01/21/2004 | CN1469426A Making process of double-layered photoresist for semiconductor manufacture |
| 01/21/2004 | CN1469200A Electronic photoetching equipment with pattern emitter |
| 01/21/2004 | CN1469199A Positive photoresist composition and method for forming etch resistant pattern |
| 01/21/2004 | CN1469198A Positve photosensitive painting composition, method for producing positive photosensitive resin and forming method of pattern |
| 01/21/2004 | CN1469197A Positive photoresist composition and method for forming resist pattern |
| 01/21/2004 | CN1469196A Organis antireflective coating composition and method for forming photoresist pattern with the same composition |
| 01/21/2004 | CN1469195A Photosensitive lithographic printing plate forebody and its processing method |
| 01/21/2004 | CN1469194A Method for producing lithographic printing plate |
| 01/21/2004 | CN1469193A Objective table apparatus and exposure apparatus |
| 01/21/2004 | CN1469135A Micro lens and producing method, micro-lens array plate, electrooptical apparatus and electronic instrument |
| 01/21/2004 | CN1468907A Photosensitive polyimide resin precursor composition, optical polyimide, light wave guide tube and process for producing the same light wave guide tube |
| 01/21/2004 | CN1135603C Charged particle beam photoetching device and photoetching process of charged particle beam |
| 01/21/2004 | CN1135438C Three-dimensional etching process |
| 01/21/2004 | CN1135437C Thermal treatment method of positive photoetching gel composition |
| 01/20/2004 | US6681379 Phase shifting design and layout for static random access memory |
| 01/20/2004 | US6680803 Partial objective in an illuminating systems |
| 01/20/2004 | US6680798 Optical reduction system with control of illumination polarization |
| 01/20/2004 | US6680794 Polarization beam splitter for photolithography |
| 01/20/2004 | US6680775 Substrate treating device and method, and exposure device and method |
| 01/20/2004 | US6680774 Method and apparatus for mechanically masking a workpiece |
| 01/20/2004 | US6680763 Photosensitive resin composition and liquid crystal display color filter |
| 01/20/2004 | US6680481 Mark-detection methods and charged-particle-beam microlithography methods and apparatus comprising same |
| 01/20/2004 | US6680440 Using permanent plating resist, which is not degraded by conventional baths, to protect substrate areas, including metallized features on substrate, from deposition of metal during plating |
| 01/20/2004 | US6680347 Self-dispersible epoxide/surfactant coating compositions |
| 01/20/2004 | US6680263 Method for applying a photoresist layer to a substrate having a preexisting topology |
| 01/20/2004 | US6680214 Artificial band gap |
| 01/20/2004 | US6680164 Using hydrogen and water plasma mixture. |
| 01/20/2004 | US6680163 Method of forming opening in wafer layer |
| 01/20/2004 | US6680162 VLSI-based system for durable high-density information storage |
| 01/20/2004 | US6680161 Lithographic printing plate precursor |
| 01/20/2004 | US6680160 Halogenated anti-reflective coatings |
| 01/20/2004 | US6680159 Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same |
| 01/20/2004 | US6680158 Radiation-sensitive resin composition for spacer |
| 01/20/2004 | US6680157 Mixing with aromatic compound |
| 01/20/2004 | US6680156 Photosensitive transfer material |
| 01/20/2004 | US6680155 Positive photoresist composition |
| 01/20/2004 | US6680152 Photosensitive resin composition |
| 01/20/2004 | US6680078 For example, controlling a flow of a liquid photoresist onto a semiconductor wafer. |
| 01/20/2004 | US6679307 Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board |
| 01/16/2004 | CA2435162A1 Laminate for ir ablation |
| 01/15/2004 | WO2004006310A1 Exposure system |
| 01/15/2004 | WO2004006309A1 Method of exposure and aligner |
| 01/15/2004 | WO2004006308A1 Illuminating method, exposing method, and device for therefor |
| 01/15/2004 | WO2004006307A1 Electron beam exposure method and system therefor |
| 01/15/2004 | WO2004006291A2 Patterning method |
| 01/15/2004 | WO2004006120A1 System and method for dispensing liquids |
| 01/15/2004 | WO2004006023A1 Composition for antireflection coating and method for forming pattern |
| 01/15/2004 | WO2004006022A1 System and method for optical metrology of semiconductor wafers |
| 01/15/2004 | WO2004006021A2 Optical device comprising an light source |
| 01/15/2004 | WO2004006020A1 Photosensitive compositions based on polycyclic polymers |
| 01/15/2004 | WO2004006019A1 A method and a stamp for transferring a pattern to a substrate |
| 01/15/2004 | WO2004006012A2 A carried for a reticle used in photolithographic semiconductor |
| 01/15/2004 | WO2004006011A2 Method and arrangement for the manipulation of reticles |
| 01/15/2004 | WO2004006003A1 A device having a light-absorbing mask a method for fabricating same |
| 01/15/2004 | WO2004005847A1 Cyclic error compensation in interferometry systems |
| 01/15/2004 | WO2004005846A1 Shearing interferometer calibrating method, production method for projection optical system, projection opticalsystem, and projection exposure system |
| 01/15/2004 | WO2004005042A1 Digital waterless lithographic printing plate having high resistance to water-washable inks |
| 01/15/2004 | WO2003054630A8 Device and method for modifying the surface of a workpiece using photonic radiation |
| 01/15/2004 | WO2003052462A3 Catadioptric reduction lens |
| 01/15/2004 | US20040010770 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 01/15/2004 | US20040010768 Performance of integrated circuit components via a multiple exposure technique |
| 01/15/2004 | US20040010385 Inspection method and a photomask |
| 01/15/2004 | US20040010341 System and method for dispensing liquids |
| 01/15/2004 | US20040010159 Blends of quinone alkide and nitroxyl compounds and polymerization inhibitors |
| 01/15/2004 | US20040009883 Comprising 0.001 to 0.5% by weight of a fluorine compound, a mixed solvent of an amide solvent and an ether solvent and water |
| 01/15/2004 | US20040009673 Method and system for imprint lithography using an electric field |
| 01/15/2004 | US20040009437 Forming a photoresist adjacent a substrate; imagewise exposing the photoresist and developing; implanting ions into the photoresist to thereby increase it's stability |
| 01/15/2004 | US20040009436 Methods for forming resist pattern and fabricating semiconductor device using Si-containing water-soluble polymer |
| 01/15/2004 | US20040009435 Method for forming semiconductor device |
| 01/15/2004 | US20040009434 Sandwich photoresist structure in phtotlithographic process |
| 01/15/2004 | US20040009433 Pattern formation method |
| 01/15/2004 | US20040009432 Substrate oscillating system oscillates substrate in one-dimensional direction paralleled with a main surface of substrate by means of oscillating whole of substrate rotating system in one dimensional direaction; uniform pattern |
| 01/15/2004 | US20040009431 Method of exposing semiconductor device |
| 01/15/2004 | US20040009430 Photosensitive resin composition |