| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/29/2004 | WO2004010225A2 Machine for exposing printed circuit boards |
| 01/29/2004 | WO2004010224A2 Projection objective for a projection exposure apparatus |
| 01/29/2004 | WO2004010223A1 Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric |
| 01/29/2004 | WO2004010222A2 Method for the production of photoresist structures |
| 01/29/2004 | WO2004010220A1 Nozzle assembly for applying a liquid to a substrate |
| 01/29/2004 | WO2004010200A1 Catadioptric multi-mirror systems for protection lithography |
| 01/29/2004 | WO2004010167A2 Holographic surface mask etching and optical structures |
| 01/29/2004 | WO2004010164A2 Catadioptric projection objective |
| 01/29/2004 | WO2004009730A1 Composition and process for wet stripping removal of sacrificial anti-reflective material |
| 01/29/2004 | WO2004009710A1 Polymerisable diketopyrrolopyrroles, use of such compounds in colour filters and polymers prepared from these compounds |
| 01/29/2004 | WO2004009651A1 New difunctional photoinitiators |
| 01/29/2004 | WO2004009489A2 Fabrication of 3d photopolymeric devices |
| 01/29/2004 | WO2004009318A1 Addressable semiconductor array light source for localized radiation delivery |
| 01/29/2004 | WO2003096387A3 High efficiency solid-state light source and methods of use and manufacture |
| 01/29/2004 | WO2003075342A3 Methodology for repeatable post etch cd in a production tool |
| 01/29/2004 | WO2003069016A3 In-line deposition processes for circuit fabrication |
| 01/29/2004 | WO2003044602A3 Laser beam pattern generator with compensation of rotational scan errors |
| 01/29/2004 | WO2003038479A3 Structures and methods for reducing aberration in optical systems |
| 01/29/2004 | US20040019408 Lithography tool having a vacuum reticle library coupled to a vacuum chamber |
| 01/29/2004 | US20040019173 Water-compatible epoxy compounds containing sulfonate or thiosulfate moieties |
| 01/29/2004 | US20040019152 Alcoholic hydroxyl group-, aromatic ring- and protolytically leaving group-containing copolymer |
| 01/29/2004 | US20040018949 Semiconductor process residue removal composition and process |
| 01/29/2004 | US20040018742 Forming bilayer resist patterns |
| 01/29/2004 | US20040018724 Plating method |
| 01/29/2004 | US20040018656 Method for improving contact hole patterning |
| 01/29/2004 | US20040018646 Resist pattern formation method |
| 01/29/2004 | US20040018453 Reduce photoresist residues; mixture of diphenyl oxide and antifoam agents |
| 01/29/2004 | US20040018452 Prepassivation before cleaning |
| 01/29/2004 | US20040018451 Controlling thickness of antireflective layer; soluble in developer; heat crosslinkabel polymer |
| 01/29/2004 | US20040018450 Forming multilayer photoresist on substrate; hardening; prevent defects |
| 01/29/2004 | US20040018449 Method of manufacturing member pattern, method of manufacturing wiring structure, method of manufacturing electron source, and method of manufacturing image display device |
| 01/29/2004 | US20040018448 Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARC |
| 01/29/2004 | US20040018447 Method for the preparation of a printing plate |
| 01/29/2004 | US20040018446 Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board |
| 01/29/2004 | US20040018445 Chemical amplification type positive resist composition |
| 01/29/2004 | US20040018444 Image recording; lithography printing plates |
| 01/29/2004 | US20040018443 Multilayer; support with hydrophilic layer; exposure to scanning laser |
| 01/29/2004 | US20040018442 Resist composition comprising photosensitive polymer having lactone in its backbone |
| 01/29/2004 | US20040018438 Method and system of processing stamps |
| 01/29/2004 | US20040018372 Etching substrate material, etching process and article obtained by etching |
| 01/29/2004 | US20040018346 Uniformity of photoresist patterns; crosslinked polysiloxane |
| 01/29/2004 | US20040017989 Fabricating sub-resolution structures in planar lightwave devices |
| 01/29/2004 | US20040017885 Illumination system particularly for microlithography |
| 01/29/2004 | US20040017623 Deformable mirror with high-bandwidth servo for rigid body control |
| 01/29/2004 | US20040017556 Exposure apparatus, and device manufacturing method |
| 01/29/2004 | US20040017555 Method for improving image quality and for increasing writing speed during exposure of light-sensitive layers |
| 01/29/2004 | US20040017554 Projection exposure system |
| 01/29/2004 | US20040017553 Light condenser |
| 01/29/2004 | US20040017551 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method using the apparatus, and semiconductor manufacturing factory |
| 01/29/2004 | US20040017525 Substrate for electro-optical panel and fabrication method of the same, electro-optical panel and electronic device |
| 01/29/2004 | US20040017167 Vibration control device, stage device and exposure apparatus |
| 01/29/2004 | US20040016904 Composition and process for wet stripping removal of sacrificial anti-reflective material |
| 01/29/2004 | US20040016894 Plasma generation |
| 01/29/2004 | US20040016891 Lithographic apparatus and device manufacturing method |
| 01/29/2004 | US20040016719 Solutions and processes for removal of sidewall residue after dry etching |
| 01/29/2004 | US20040016718 Micro-optic elements and method for making the same |
| 01/29/2004 | DE19622639B4 Wafer-Stepper mit einer Schnittstelle Wafer stepper with an interface |
| 01/29/2004 | DE10303511A1 Organische antireflektierende Beschichtungszusammensetzung und Verfahren zum Bilden von Fotolackmustern unter Verwendung derselben Organic anti-reflective coating composition and method for forming photoresist patterns by using the same |
| 01/29/2004 | DE10232860A1 Verfahren sowie Vorrichtung zur Reinigung von Aussenflächen an Lithographieobjektiven mikrolithographischer Projektionsbelichtungsanlagen Method and apparatus for cleaning exterior surfaces of lithography lenses of microlithographic projection exposure apparatus |
| 01/29/2004 | DE10230652A1 Optische Vorrichtung mit einer Beleuchtungslichtquelle An optical device comprising an illumination light source |
| 01/29/2004 | DE10230387A1 Verfahren zur Projektion einer ersten und wenigstens einer zweiten Maske eines Maskenansatzes auf ein Substrat A method for projecting a first and at least a second mask of a batch to a substrate |
| 01/29/2004 | DE10229118A1 Verfahren zur kostengünstigen Strukturierung von leitfähigen Polymeren mittels Definition von hydrophilen und hydrophoben Bereichen The method for cost-structuring of conductive polymers by means of definition of hydrophilic and hydrophobic regions |
| 01/29/2004 | DE10228338A1 Herstellung von transparenten fluorhaltigen Resistpolymeren in Fotoresists mit Reaktionsankern für eine chemische Nachverstärkung von Resiststrukturen durch radikalische Terpolymerisation mit Acrylaten, Methacrylaten und Butenolderivaten Production of transparent fluorine-containing polymer resist in photoresists with response anchors for chemical amplification resist patterns by radical Terpolymerization with acrylates, methacrylates and Butenolderivaten |
| 01/29/2004 | CA2492514A1 Machine for exposing printed circuit boards |
| 01/29/2004 | CA2486784A1 New difunctional photoinitiators |
| 01/28/2004 | EP1385195A2 Substrate treating system |
| 01/28/2004 | EP1385192A2 Device working with beams of charged particles |
| 01/28/2004 | EP1385059A1 Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same |
| 01/28/2004 | EP1385058A1 Lithographic apparatus and device manufacturing method |
| 01/28/2004 | EP1385057A2 Compact device for exposing a printing form |
| 01/28/2004 | EP1385056A2 Method and apparatus for reducing thermal stress in a wafer |
| 01/28/2004 | EP1385055A1 Stereolithographic resins with high temperature and high impact resistance |
| 01/28/2004 | EP1385054A1 Color wheel fabrication method |
| 01/28/2004 | EP1385053A2 Automatical optical proximity correction (OPC) rule generation |
| 01/28/2004 | EP1385052A2 Orientation dependent shielding for use with dipole illumination techniques |
| 01/28/2004 | EP1385051A1 EUV lithographic projection apparatus comprising an optical element with a self-assembled monolayer, optical element with a self-assembled monolayer, method of applying a self-assembled monolayer and device manufacturing method |
| 01/28/2004 | EP1385034A1 Adaptive lithography mirror with actuators |
| 01/28/2004 | EP1385027A1 Process of producing polymer optical waveguide |
| 01/28/2004 | EP1384737A2 Cycloaliphatic epoxy compounds containing styrenic, cinnamyl, or maleimide functionality |
| 01/28/2004 | EP1384394A1 Method and device for the generation of far ultraviolet or soft x-ray radiation |
| 01/28/2004 | EP1384234A1 Euvl multilayer structures |
| 01/28/2004 | EP1384118A1 Method and apparatus for the hardening of photopolymer plates |
| 01/28/2004 | EP1384117A2 Exposure method and apparatus |
| 01/28/2004 | EP1383812A1 Polycyclic fluorine-containing polymers and photoresists for microlithography |
| 01/28/2004 | EP1135977B1 Method of manufacturing an interlayer via and a laminate precursor useful therefor |
| 01/28/2004 | EP1023622B1 Device for the wavelength-selective mixture and/or distribution of polychromatic light |
| 01/28/2004 | EP0883835B9 Protective overcoat useful for enhancing the resistance of a printing plate precursor to ambient humidity |
| 01/28/2004 | CN1471659A Positive photosensitive resin precursor and process for producing the same |
| 01/28/2004 | CN1471650A Optical element holding device |
| 01/28/2004 | CN1471132A Method for forming pattern of semiconductor device and semiconductor device |
| 01/28/2004 | CN1471131A Method for forming photoresist layer on semconductor substrate |
| 01/28/2004 | CN1470947A Proximity effect correction method of electronic beam exposure and use thereof |
| 01/28/2004 | CN1470946A Chemical-enlarging etchant material and patterning method using same |
| 01/28/2004 | CN1470945A Exposure device and article-loading table device and method for making device |
| 01/28/2004 | CN1470944A Photoetching apparatus and device manufacturing method |
| 01/28/2004 | CN1470943A Light cover combination and exposure method for forming threadlet pattern therewith |
| 01/28/2004 | CN1470942A Vortex phase-shift mask in photoetching technique |
| 01/28/2004 | CN1470941A Light exposure monitoring method and method for making semiconductor device |
| 01/28/2004 | CN1470940A Close-connected exposure device |
| 01/28/2004 | CN1470900A Compact device for printing-plate imaging |