| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/05/2004 | US20040021840 Lithographic apparatus, device manufacturing method, performance measuring method, calibration method and computer program |
| 02/05/2004 | US20040021803 Method of determining local structures in optical crystals |
| 02/05/2004 | US20040021801 Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
| 02/05/2004 | US20040021254 Alignment methods for imprint lithography |
| 02/05/2004 | US20040021221 Method of forming a pattern of a semiconductor device and photomask therefor |
| 02/05/2004 | US20040021095 Electron beam writing equipment |
| 02/05/2004 | US20040021061 Photodiode, charged-coupled device and method for the production |
| 02/05/2004 | US20040020689 Base pattern forming material for electrode and wiring material absorption, electrode and wiring forming method, and method of manufacturing image forming apparatus |
| 02/05/2004 | US20040020388 Method and substrate for the preparation of a printing plate |
| 02/05/2004 | DE19851810B4 Härtbares Harz und Harzmasse Curable resin and resin composition |
| 02/05/2004 | DE10234527A1 Polymerizable composition containing halogen, amine, silicon, or germanium compounds and cleavable organic protective groups useful in electron beam lithography |
| 02/05/2004 | DE10233491A1 Kompakte Einrichtung zur Bebilderung einer Druckform Compact device for imaging a printing forme |
| 02/05/2004 | DE10233209A1 Irradiating resist during the production of integrated switching arrangement comprises forming radiation-sensitive resist layer arrangement after producing layer to be structured and irradiating the resist layer arrangement |
| 02/05/2004 | DE10232984A1 Düsenanordnung zum Aufbringen einer Flüssigkeit auf ein Substrat Nozzle arrangement for applying a liquid to a substrate |
| 02/05/2004 | DE10232689A1 Mit Strahlen geladener Teilchen arbeitende Anwendungen With charged particle beams working applications |
| 02/05/2004 | DE10229988A1 Verfahren und Anordnung zur Handhabung von Retikeln Method and apparatus for handling reticles |
| 02/05/2004 | DE10228546A1 Verfahren zur Strukturierung einer Lithographiemaske Method for structuring a lithography mask |
| 02/05/2004 | CA2495531A1 Backlighting system for displays |
| 02/05/2004 | CA2493926A1 Fluorinated polymers, photoresists and processes for microlithography |
| 02/04/2004 | EP1387389A2 Multi-electron beam exposure method and apparatus |
| 02/04/2004 | EP1387384A1 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same |
| 02/04/2004 | EP1387220A2 Adjustment method and apparatus of optical system, and exposure apparatus |
| 02/04/2004 | EP1387219A2 Test photomask, flare evaluation method, and flare compensation method |
| 02/04/2004 | EP1387218A1 Laser beam expansion without unchanged spatial coherence |
| 02/04/2004 | EP1387217A2 Lithography exposure apparatus having an evacuable reticle library coupled to a vacuum chamber |
| 02/04/2004 | EP1387216A2 Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern |
| 02/04/2004 | EP1387215A1 Optical element resistant to pressure-induced defects |
| 02/04/2004 | EP1387054A2 Cooling apparatus and method, and exposure apparatus comprising said cooling apparatus |
| 02/04/2004 | EP1386904A1 Acenaphthylene derivative, polymer, and antireflection film-forming composition |
| 02/04/2004 | EP1386729A1 Method for the preparation of a printing plate |
| 02/04/2004 | EP1386728A1 Method and substrate for the preparation of a printing plate |
| 02/04/2004 | EP1386525A1 High flux, high energy photon source |
| 02/04/2004 | EP1386378A1 Improved fan for gas discharge laser |
| 02/04/2004 | EP1386377A1 Gas discharge laser with improved beam path |
| 02/04/2004 | EP1386376A1 Laser spectral engineering for lithographic process |
| 02/04/2004 | EP1386351A1 Method of wet etching a silicon and nitrogen containing material |
| 02/04/2004 | EP1386350A1 Method of wet etching an inorganic antireflection layer |
| 02/04/2004 | EP1385705A1 High resolution laserable assemblages for laser-induced thermal image transfer |
| 02/04/2004 | EP0900150B9 Application to fabric of heat-activated transfers |
| 02/04/2004 | CN2602402Y Eliminating bubble device for the printed circuit board developing machine |
| 02/04/2004 | CN1473352A Amorphous carbon layer for improved adhesion of photoresist |
| 02/04/2004 | CN1473351A Semiconductor manufacturing apparatus control system |
| 02/04/2004 | CN1473129A Reticle protection and transport |
| 02/04/2004 | CN1473104A Seamless master and method of making same |
| 02/04/2004 | CN1472789A Optical mask testing, optical spot evaluating method and optical spot compensation |
| 02/04/2004 | CN1472777A Laser source controlling method and device, exposuring method and device and manufacture of components |
| 02/04/2004 | CN1472776A Optical masks, manufacture thereof and manufacture of electronic elements |
| 02/04/2004 | CN1472775A Method for calibrating shrinkage effect on terminal of linear film |
| 02/04/2004 | CN1472604A Optical approaching correcting method |
| 02/04/2004 | CN1472603A Scanning exposuring device and method, manufacture of scanning exposuring device |
| 02/04/2004 | CN1472602A Etching device and manufacture of components |
| 02/04/2004 | CN1472601A Optical projecting processor, manufacture and products, thereby, cleaning apparatus and method for pollutant therefrom |
| 02/04/2004 | CN1472600A Method for adjusting focus position |
| 02/04/2004 | CN1472599A Photoetching process with multilayer photoresist layer application |
| 02/04/2004 | CN1472597A Laminating body for IR burning |
| 02/04/2004 | CN1472253A Optical solidifying-thermo solidifying resin composition and its solidified products |
| 02/04/2004 | CN1472231A Light sensitive polymer containing adamantane alkyl vinyl ether and optical retardent composition containing same |
| 02/04/2004 | CN1472083A Design producing technology for metal etching maps |
| 02/04/2004 | CN1472014A Liquid spraying method and device, producing method for electrooptical device and basilar plate |
| 02/04/2004 | CN1137176C Isolation of novolak resin without high temp distillation and photoresist composition therfrom |
| 02/04/2004 | CN1137004C Liquid coating method and producing method for electronic device by using said method |
| 02/03/2004 | US6687885 Correction of layout pattern data during semiconductor patterning process |
| 02/03/2004 | US6687562 Process monitoring system for lithography lasers |
| 02/03/2004 | US6687041 Pattern generator using EUV |
| 02/03/2004 | US6687013 Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus |
| 02/03/2004 | US6686991 Wafer stage assembly, servo control system, and method for operating the same |
| 02/03/2004 | US6686990 Scanning exposure method with reduced time between scans |
| 02/03/2004 | US6686989 Exposure apparatus |
| 02/03/2004 | US6686948 Laser imaging apparatus |
| 02/03/2004 | US6686429 Copolymer of an ethenically unsaturated nitrile-containing monomer and a nonaromatic cyclic unit such as tert-butyl norborenecarboxylate; sensitive in deep ultraviolet region; microlithography |
| 02/03/2004 | US6686322 Cleaning agent and cleaning process using the same |
| 02/03/2004 | US6686290 Method of forming a fine pattern |
| 02/03/2004 | US6686132 Method and apparatus for enhancing resist sensitivity and resolution by application of an alternating electric field during post-exposure bake |
| 02/03/2004 | US6686131 Method of producing biocompatible structures and biocompatible microchip |
| 02/03/2004 | US6686130 Radiation with light during development of photoresist; calibration |
| 02/03/2004 | US6686129 Partial photoresist etching |
| 02/03/2004 | US6686127 Plate-making method for producing waterless lithographic printing plate |
| 02/03/2004 | US6686126 Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate |
| 02/03/2004 | US6686124 Self-crosslinkable p-hydroxystyrene polymer partially derivatized with 9-anthracenemethanol; antireflective coating, planarizing layer or etch resistant hard mask |
| 02/03/2004 | US6686123 Photoresist monomer, polymer thereof and photoresist composition containing the same |
| 02/03/2004 | US6686122 Production of photoresist coatings |
| 02/03/2004 | US6686121 Without purifying resist materials formed by reaction, by reacting an alkali-soluble polymer having phenolic hydroxyl groups or carboxyl group with a vinyl ether and/or dialkyl carbonate in catalyst, aprotic solvent, adding acid generator |
| 02/03/2004 | US6686120 Thermal acid generator and a method of forming a pattern using the same. the photoresist composition includes about 100 parts by weight of an alkali-soluble acryl copolymer, about 5-100 parts by weight of 1,2-quinonediazide compound, about |
| 02/03/2004 | US6686108 Improve resolution of patterns; reduce size difference of patterns in the coarse region and fine region; improve size accuracy of patterns existing at the boundary of the coarse region and fine region. |
| 02/03/2004 | US6686107 Method for producing a semiconductor device |
| 02/03/2004 | US6686106 Photosensitive resin compositions, insulating films, and processes for formation of the films |
| 02/03/2004 | US6686105 Color filter, color filter forming material and process for producing color filter |
| 02/03/2004 | US6686104 Ink jet printing a pattern in resin layer comprised of polyacrylamide with hydroxy or ether functionality and halogenated triazine, diphenyliodonium or triphenylsulfonium derivative |
| 02/03/2004 | US6686102 Miniaturization; photolithography patterns; phase shifting; applying photosensitive material to semiconductor; exposure to electromagnetic waves |
| 02/03/2004 | US6686100 Optical proximity correction method |
| 02/03/2004 | US6686098 Lithography method and lithography mask |
| 02/03/2004 | US6685869 Resin composition and three-dimensional object |
| 02/03/2004 | US6684925 Laminator and laminating method for lamination to substrate |
| 02/03/2004 | US6684785 Lithographic imaging with printing members having multiphase laser-responsive layers |
| 02/03/2004 | US6684782 Flexopgraphic printing plate and raw plate therefor |
| 02/02/2004 | CA2428400A1 Apparatus for producing a printing form |
| 01/29/2004 | WO2004010483A1 Illuminating optical system, exposure system and exposure method |
| 01/29/2004 | WO2004010228A2 Maskless lithography using an array of diffractive focusing elements |
| 01/29/2004 | WO2004010227A2 Recording an image with multiple intensity levels |
| 01/29/2004 | WO2004010226A2 Machine for exposing printed circuit boards |