| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/10/2004 | USRE38421 Exposure apparatus having catadioptric projection optical system |
| 02/10/2004 | US6691052 Apparatus and methods for generating an inspection reference pattern |
| 02/10/2004 | US6690993 Reticle storage system |
| 02/10/2004 | US6690764 X-ray sources that maintain production of rotationally symmetrical x-ray flux during use |
| 02/10/2004 | US6690706 High rep-rate laser with improved electrodes |
| 02/10/2004 | US6690704 Control system for a two chamber gas discharge laser |
| 02/10/2004 | US6690455 Illuminance measurement apparatus and exposure apparatus |
| 02/10/2004 | US6690450 Exposure method, exposure apparatus, method for producing exposure apparatus, and method for producing device |
| 02/10/2004 | US6690021 Method of aligning a wafer in a photolithography process |
| 02/10/2004 | US6689899 Diamine and acid anhydride |
| 02/10/2004 | US6689550 Ambient condition sensor for a photosensitive media cartridge |
| 02/10/2004 | US6689541 Process for forming a photoresist mask |
| 02/10/2004 | US6689540 Polymeric backbone having grafted thereon at least one element selected from the group consisting of silicon, germanium, tin and mixtures thereof; and a protecting group. |
| 02/10/2004 | US6689539 A fluororesin having a fluoro aliphatic group of 3 to 20 carbon atoms in which atleast two of three terminal hydrogen atoms are substituted for fluorine atoms, and an ethylene based unsaturated group; and a negative photosensitive |
| 02/10/2004 | US6689537 Laser printing; direct drawing from digital signals of computers |
| 02/10/2004 | US6689536 Transmittance of a chemically amplified resist against light of a wavelength shorter than a 180 nm band is improved when polymer includes a polyhydroxystyrene derivative having hexafluoroisopropyl alcohol on its side chain |
| 02/10/2004 | US6689535 A novalak resin crosslinking agent having hydroxyalkyl and/or alkoxyalkyl groups and an acidic compound; undercoatings; a rectangular cross-sectional profile without causing footing, undercutting, etc. at the bottom |
| 02/10/2004 | US6689534 Using infrared laser |
| 02/10/2004 | US6689531 Resist composition |
| 02/10/2004 | US6689530 Ultraviolet lithography microfabrication with improved resolution and pattern profile after development |
| 02/10/2004 | US6689529 Method for measuring diffusion of photogenerated catalyst in chemically amplified resists |
| 02/10/2004 | US6689521 Preventing plasma induced electrical charge damage |
| 02/10/2004 | US6689520 Exposure method for correcting dimension variation in electron beam lithography |
| 02/10/2004 | US6689519 Methods and systems for lithography process control |
| 02/10/2004 | US6689419 Method for manufacturing semiconductor device |
| 02/10/2004 | US6689215 Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface |
| 02/10/2004 | US6688228 Planographic printing plate precursor having a support with pits |
| 02/10/2004 | US6688020 Substrate processing apparatus |
| 02/05/2004 | WO2004012245A1 Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method |
| 02/05/2004 | WO2004012244A1 Light conducting device |
| 02/05/2004 | WO2004012239A2 Photosensitive bottom anti-reflective coatings |
| 02/05/2004 | WO2004012235A2 Atmospheric pressure plasma processing reactor |
| 02/05/2004 | WO2004012234A2 Superlattice nanopatterning of wires and complex patterns |
| 02/05/2004 | WO2004012232A2 Forming bilayer resist patterns |
| 02/05/2004 | WO2004012207A2 Optical device for high energy radiation |
| 02/05/2004 | WO2004012014A2 Diagnosing system for an x-ray source assembly |
| 02/05/2004 | WO2004012013A2 Optical imaging using a pupil filter and coordinated illumination polarisation |
| 02/05/2004 | WO2004012012A1 Method for producing electronic device |
| 02/05/2004 | WO2004011984A2 Retainer, exposure apparatus, and semiconductor device fabrication method |
| 02/05/2004 | WO2004011968A1 Diffractive optics, dioptric element, illuminating optical system, exposure system and exposure method |
| 02/05/2004 | WO2004011967A1 Diffractive optics, illumiinating optical system, exposure system and exposure method |
| 02/05/2004 | WO2004011885A1 Backlighting system for displays |
| 02/05/2004 | WO2004011522A1 Composition for holography, method of curing the same, and cured article |
| 02/05/2004 | WO2004011509A1 Fluorinated polymers, photoresists and processes for microlithography |
| 02/05/2004 | WO2004011258A2 Method of forming and repairing a lithographic template having a gap defect |
| 02/05/2004 | WO2004011161A2 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks |
| 02/05/2004 | WO2003087233A3 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 02/05/2004 | WO2003086959A3 Transfer method for the production of microstructured substrates |
| 02/05/2004 | WO2003082937A3 Polymerisable composition |
| 02/05/2004 | WO2003081337A3 Device for manipulation of the angular position of an object relative to a fixed structure |
| 02/05/2004 | WO2003075328A9 Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method |
| 02/05/2004 | WO2003052511A3 Imaging device in a projection exposure facility |
| 02/05/2004 | WO2003050614A3 System and method for reducing photoresist photo-oxidative degradation in 193 nm photolithography |
| 02/05/2004 | US20040025140 Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography |
| 02/05/2004 | US20040025139 Mask pattern and method for forming resist pattern using mask pattern thereof |
| 02/05/2004 | US20040025138 Light intensity simulation method, program product, and designing method of photomask |
| 02/05/2004 | US20040024113 Polymerizable compositions based on epoxides |
| 02/05/2004 | US20040023414 Self-assembling peptide surfaces for cell patterning and interactions |
| 02/05/2004 | US20040023368 Apparatus for light controlled parallel synthesis of molecular sequence arrays on solid surfaces |
| 02/05/2004 | US20040023176 Fluorinated polymer |
| 02/05/2004 | US20040023163 Acrylic ester copolymer; onium (especially sulfonium or iodonium) salt of fluoroalkylsulfonic acid as an acid generator; oxo acid of phosphorus; and a sec. or tert. amine to provide a quenching effect. |
| 02/05/2004 | US20040023162 Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern |
| 02/05/2004 | US20040023161 Using a photomask having both a minute aperture where the main component of a transmitted light is an evanescent light and an aperture where the main component is a propagating light; controlling distance between substrate and photomask |
| 02/05/2004 | US20040023159 Polymerization initiator comprises a compound having only one naphthalimide structure; radial generator comprises a compound having two or more naphthalimide structures, which also functions as a crosslinking agent |
| 02/05/2004 | US20040023158 Solid imaging compositions for preparing polyethylene-like articles |
| 02/05/2004 | US20040023157 Protecting groups in polymers, photoresists and processes for microlithography |
| 02/05/2004 | US20040023156 Antireflective coatings |
| 02/05/2004 | US20040023153 Resist compostion and patterning process |
| 02/05/2004 | US20040023152 Photoresists, polymers and processes for microlithography |
| 02/05/2004 | US20040023151 Negative resist material and pattern formation method using the same |
| 02/05/2004 | US20040023150 Photoresists, polymers and processes for microlithography |
| 02/05/2004 | US20040023148 Hand application to fabric of heat transfers imaged with color copiers/printers |
| 02/05/2004 | US20040023147 Alkali-soluble resin, photosensitive diazoquinone compound, and a filler; can form patterns with high resolution and high film thickness retention |
| 02/05/2004 | US20040023145 Liquid, radiation-curable compositions containing epoxy interpenetrating polymer networks result in cured three-dimensional shaped articles having very high impact resistance |
| 02/05/2004 | US20040023137 Apparatus and methods for photolithographic processing |
| 02/05/2004 | US20040023136 Infrared-sensitive composition containing a metallocene derivative |
| 02/05/2004 | US20040023133 Photoresist pattern and forming method thereof |
| 02/05/2004 | US20040023130 Test photomask, flare evaluation method, and flare compensation method |
| 02/05/2004 | US20040023126 Lithographic template having a repaired gap defect method of repair and use |
| 02/05/2004 | US20040023122 Optical element resistant to pressure-induced defects |
| 02/05/2004 | US20040023120 Prepolymer having a carboxyl group in combination with at least two unsaturated bonds in its molecule, a polymerization initiator, a diluent, a di- or polyoxetane compound, and a curing promoter |
| 02/05/2004 | US20040022964 Polymer having a photo-reactive ethenyl group on a main chain; improved alignment stability against external shocks, light, and heat. |
| 02/05/2004 | US20040022963 Polymer having a photo-reactive ethenyl group on a main chain; improved alignment stability against external shocks, light, and heat. |
| 02/05/2004 | US20040022694 Processing apparatus, measuring apparatus, and device manufacturing method |
| 02/05/2004 | US20040022353 Illumination system particularly for microlithography |
| 02/05/2004 | US20040022295 High-peak-power laser device and application to the generation of light in the extreme ultraviolet |
| 02/05/2004 | US20040022293 Automatic gas control system for a gas discharge laser |
| 02/05/2004 | US20040022292 High rep-rate laser with improved electrodes |
| 02/05/2004 | US20040022291 Lithography laser with beam delivery and beam pointing control |
| 02/05/2004 | US20040022068 Illumination optical system, exposure method and apparatus using the same |
| 02/05/2004 | US20040021948 Method and device for producing an optically antireflective surface |
| 02/05/2004 | US20040021943 Method and system for correction of intrinsic birefringence in UV microlithography |
| 02/05/2004 | US20040021866 Scatterometry alignment for imprint lithography |
| 02/05/2004 | US20040021854 Flare measuring method and flare measuring device, exposure method and exposure system, method of adjusting exposure system |
| 02/05/2004 | US20040021847 Method for manufacturing screen plate and screen plate |
| 02/05/2004 | US20040021845 Illumination optical system, exposure method and apparatus using the same |
| 02/05/2004 | US20040021844 Projection optical system and exposure apparatus having the projection optical system |
| 02/05/2004 | US20040021843 Quartz substrate is joined to a support body on at least one side; subsequently, from the quartz substrate material is removed to a desired value with a thickness |
| 02/05/2004 | US20040021842 System and method for laser beam expansion without expanding spatial coherence |
| 02/05/2004 | US20040021841 Exposure method and apparatus |