| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/12/2004 | WO2004012854A2 Method for preparing photosensitive barrier rib paste composition for fabricating plasma display pannel |
| 02/12/2004 | WO2004001841A3 Method and system for realtime critical dimention microloading control |
| 02/12/2004 | WO2004001797A9 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing |
| 02/12/2004 | WO2003096234A3 Optimization of die placement on wafers |
| 02/12/2004 | WO2003050615A3 Photomask and method for qualifying the same with a prototype specification |
| 02/12/2004 | WO2002099533A3 Alternating phase-shift mask inspection method and apparatus |
| 02/12/2004 | US20040030814 Reflective mirror for lithographic exposure and production method |
| 02/12/2004 | US20040030079 Radiation transparent; bonding strength; lithography |
| 02/12/2004 | US20040029989 Water soluble; binder is acrylated resin; photoinitiator; easy cleaning; excellent wipeability; counterfeit protection |
| 02/12/2004 | US20040029753 Resist stripping liquid containing fluorine compound |
| 02/12/2004 | US20040029396 Process solutions containing surfactants |
| 02/12/2004 | US20040029395 Process solutions containing acetylenic diol surfactants |
| 02/12/2004 | US20040029394 Method and structure for preventing wafer edge defocus |
| 02/12/2004 | US20040029386 Method of patterning inter-metal dielectric layers |
| 02/12/2004 | US20040029369 Fabrication method of semiconductor integrated circuit device |
| 02/12/2004 | US20040029115 Labeling a terminal monomer and scanning to determine the position; can analyze hundreds of macromolecules simultaneously |
| 02/12/2004 | US20040029052 Method of forming fine patterns using silicon oxide layer |
| 02/12/2004 | US20040029051 Stripping agent composition and method of stripping |
| 02/12/2004 | US20040029050 Computer control; coating semiconductor substrate with photoresist; circuit pattern; doping with phosphorus |
| 02/12/2004 | US20040029047 Micropattern forming material, micropattern forming method and method for manufacturing semiconductor device |
| 02/12/2004 | US20040029046 Process control; forming semiconductor; generating backscattering electrons; scanning; controlling deflection |
| 02/12/2004 | US20040029045 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment |
| 02/12/2004 | US20040029042 Photoresist systems |
| 02/12/2004 | US20040029041 Lithography; curable thermoplastic resin; transferring patterns |
| 02/12/2004 | US20040029037 Amplification type positive resist composition |
| 02/12/2004 | US20040029036 Solvents and photoresist compositions for 193 nm imaging |
| 02/12/2004 | US20040029035 Pattern-forming material and method of forming pattern |
| 02/12/2004 | US20040029034 Multilayer photoresist; variations in spectra absorption |
| 02/12/2004 | US20040029032 Positive photoresist composition |
| 02/12/2004 | US20040029029 Error reduction in semiconductor processes |
| 02/12/2004 | US20040029028 Window between pattern layout; projecting laser beams; determination, calibration reflection |
| 02/12/2004 | US20040029027 Adjustment, varying focusing, dosage; projecting pattern; coating with poassivation layer; uniform etching, development, oxidation, cleaning |
| 02/12/2004 | US20040029026 Supplying gas to substrate; conveying substrate; development photoresist |
| 02/12/2004 | US20040029025 Method for exposing at least one or at least two semiconductor wafers |
| 02/12/2004 | US20040029024 Reflective masking; dividing pattern forming using light wavelength; photolithography; miniatruizing circuit |
| 02/12/2004 | US20040029023 Photomask, productyion method of the same, pattern forming method using the photomask |
| 02/12/2004 | US20040029022 Compact design; rotating adjustment of optics; forming image; calibration |
| 02/12/2004 | US20040029021 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device |
| 02/12/2004 | US20040028814 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 02/12/2004 | US20040028327 Monolithic three-dimensional structures |
| 02/12/2004 | US20040028269 Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device |
| 02/12/2004 | US20040028175 Illumination system particularly for microlithography |
| 02/12/2004 | US20040027681 Exposure head and exposure apparatus |
| 02/12/2004 | US20040027680 Method of manufacturing microlens, microlens, microlens array plate, electrooptic device and electronic equipment |
| 02/12/2004 | US20040027675 Microlens for projection lithography and method of preparation thereof |
| 02/12/2004 | US20040027653 Microlithographic reduction projection catadioptric objective |
| 02/12/2004 | US20040027636 Device having a light-absorbing mask and a method for fabricating same |
| 02/12/2004 | US20040027632 Deformable mirror with passive and active actuators |
| 02/12/2004 | US20040027572 Fast wafer positioning method for optical metrology |
| 02/12/2004 | US20040027555 Reduced striae extreme ultraviolet elements |
| 02/12/2004 | US20040027553 Method for the characterization of an illumination source in an exposure apparatus |
| 02/12/2004 | US20040027552 Reticle manipulators and related methods for conveying thin, circular reticles as used in charged-particle-beam microlithography |
| 02/12/2004 | US20040027551 Mask clamping device |
| 02/12/2004 | US20040027550 Distributed projection system |
| 02/12/2004 | US20040027549 Observation apparatus and method of manufacturing the same, exposure apparatus, and method of manufacturing microdevice |
| 02/12/2004 | US20040027413 Tractor feed imaging system and method for platesetter |
| 02/12/2004 | US20040027008 Coordinate measuring stage |
| 02/12/2004 | US20040026634 Electron beam proximity exposure apparatus |
| 02/12/2004 | US20040026629 Emission source having carbon nanotube, electron microscope using this emission source, and electron beam drawing device |
| 02/12/2004 | US20040026627 Electron beam monitoring sensor and electron beam monitoring method |
| 02/12/2004 | US20040026360 Mask and method of manufacturing the same, electroluminescent device and method of manufacturing the same, and electronic instrument |
| 02/12/2004 | US20040026359 Method and apparatus for etching-manufacture of cylindrical elements |
| 02/12/2004 | US20040026258 Method for forming high reflective micropattern |
| 02/12/2004 | US20040026229 Diode as light source; biosynthsis of biopolymers |
| 02/12/2004 | US20040026007 Method and apparatus for direct fabrication of nanostructures |
| 02/12/2004 | US20040025733 EUV lithographic projection apparatus comprising an optical element with a self-assembled monolayer, optical element with a self-assembled monolayer, method of applying a self-assembled monolayer, device manufacturing method and device manufactured thereby |
| 02/12/2004 | US20040025731 Method and system for simultaneous loading and unloading of substrates in platesetter |
| 02/12/2004 | US20040025322 Waffle wafer chuck apparatus and method |
| 02/12/2004 | DE19728201B4 Vorrichtung und Verfahren zum Erzeugen eines Lichtstrahls in einer Abbildungsvorrichtung Apparatus and method for generating a light beam in an imaging device |
| 02/12/2004 | DE10331033A1 Cleaning composition, used for removing resist or residues of resist or from dry etching in semiconductor device production, contains fluoride of non-metal base, water-soluble organic solvent, acid and water |
| 02/12/2004 | DE10320272A1 Printing form production apparatus, has six-point mounting portions lying at corners of triangular laser module, in which V- shaped prisms with spheres, are mounted |
| 02/12/2004 | DE10304822A1 Microlithography installation investigation device for determination of the effect of a microlithography UV light projecting installation on the polarization direction of UV radiation incident on it |
| 02/12/2004 | DE10300765A1 Semiconductor device pattern formation comprises performing etching process of formed antireflective films to form micro-bends, and coating photoresist above anti-reflective films with micro-bends, and exposing coated films to light source |
| 02/12/2004 | DE10233828A1 Optical component used in an illuminating system for microlithography comprises a material having a temperature-dependent thermal longitudinal expansion coefficient |
| 02/12/2004 | CA2495308A1 Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film |
| 02/11/2004 | EP1388884A2 Electron beam proximity exposure apparatus |
| 02/11/2004 | EP1388760A1 Method of processing light sensitive planographic printing plate precursor |
| 02/11/2004 | EP1388759A1 Positive photoresist composition |
| 02/11/2004 | EP1388758A1 Photosensitive heat resistant resin precursor composition |
| 02/11/2004 | EP1388757A1 Base pattern forming material for forming electrodes and wiring , electrode and wiring forming method and method of manufacturing image forming apparatus |
| 02/11/2004 | EP1388538A1 Polymerisation Initiator |
| 02/11/2004 | EP1388416A2 Method and system for simultaneous loading and unloading of substrates in platesetter |
| 02/11/2004 | EP1388027A1 Photoresist composition for deep ultraviolet lithography |
| 02/11/2004 | EP1388026A1 Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet |
| 02/11/2004 | EP1388025A2 Photosensitive coloring compositon, color filter using the compositon and method of producing the same |
| 02/11/2004 | EP1082224B1 Printing mould and method for modifying its wetting characteristics |
| 02/11/2004 | EP0786071B1 On-axis mask and wafer alignment system |
| 02/11/2004 | CN1475028A Optical device, exposure device and device manufacturing method |
| 02/11/2004 | CN1474962A Method for forming pattern and treating agent for use therein |
| 02/11/2004 | CN1474961A Positive type photosensitive epoxy resin composition and printed circuit board using same |
| 02/11/2004 | CN1474960A Lithographic method of manufacturing device |
| 02/11/2004 | CN1474954A Light modulation device and system |
| 02/11/2004 | CN1474752A Polymer anti-reflective coatings deposited by plasma enhanced chemical vapor deposition |
| 02/11/2004 | CN1474236A Cross mark keeping method, cross mark keeping device and exposure device |
| 02/11/2004 | CN1474235A Advanced lighting system for micro light carving method |
| 02/11/2004 | CN1474234A Light carving projection device and method for producing device with it and produced device |
| 02/11/2004 | CN1474233A Method for transfering mask or chip in storage box and used device and its producing method |
| 02/11/2004 | CN1473748A Cross mark transport method, cross mark transport device and exposure device |
| 02/11/2004 | CN1138181C Photosenstiive composition and use thereof |
| 02/11/2004 | CN1138166C Device for generating several laser beams |