| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/19/2004 | US20040033440 Capable of generating 2,4,6-benzenesulfonic acid, e.g., (5-(2,4,6-triisopropylbenzenesulfonyloxy)imino- (thiophen-2-ylidene)-2-methylphenyl) or (cyclohexa-2,5-dienylidenephenyl)acetonitrile |
| 02/19/2004 | US20040033439 Acid generator and a fluoropolymer formed by cyclopolymerizing a fluorinated diene monomer having blocked acidic groups |
| 02/19/2004 | US20040033438 Alkali-insoluble or slightly soluble resin protected with an acid-labile protecting group, carboxylic acid generating compound, and sulfonic acid generating compound |
| 02/19/2004 | US20040033437 Radiation-sensitive composition |
| 02/19/2004 | US20040033436 Copolymers containing units derived from hydroxyfluoroalkyl group-containing norbornenes |
| 02/19/2004 | US20040033435 Underlayer of a water-insoluble and alkali-soluble resin; image-recording layer of the resin plus an infrared absorbent; for making a multilayer infrared laser positive-working printing plate |
| 02/19/2004 | US20040033434 Sulfonium salt compound |
| 02/19/2004 | US20040033432 Improved resolution, improved focus latitude, and minimized line width variation or shape degradation even on long-term PED. |
| 02/19/2004 | US20040033424 Forming semiconductor devices, microelectronic devices, microelectromechanical devices, microfluidic devices, and photonic devices |
| 02/19/2004 | US20040033423 Comprised of polymerizable acrylic monomers and light absorbing phenanthrenequinone or cyclopenta(def)phenanthrene-quinone dyes; when polymerized dye reacts with acrylic to form thermally stable, light sensitive, hard, inert product |
| 02/19/2004 | US20040033317 Surface-active photoinitators |
| 02/19/2004 | US20040033309 Photo-patternable mono-phase fluorinated organometallic sol-gels for integrated optics and methods of fabrication |
| 02/19/2004 | US20040033037 Optical fiber bundle, light source device using the optical fiber bundle, and method for manufacturing the light source device |
| 02/19/2004 | US20040032931 X-ray alignment system for fabricaing electronic chips |
| 02/19/2004 | US20040032579 Method for determining wavefront aberrations |
| 02/19/2004 | US20040032577 Semiconductor manufacturing apparatus and method |
| 02/19/2004 | US20040032576 Exposure method and apparatus |
| 02/19/2004 | US20040032575 Exposure apparatus and an exposure method |
| 02/19/2004 | US20040032574 Lithographic projection apparatus, device manufacturing method, and device manufacturing thereby |
| 02/19/2004 | US20040032169 Motor system for positioning a load |
| 02/19/2004 | US20040031932 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/19/2004 | US20040031409 Method for preparing master plate useful for making lithograpic printing plate without need of dampening water |
| 02/19/2004 | US20040031408 Presensitized lithographic plate comprising microcapsules |
| 02/19/2004 | US20040031135 Semiconductor manufacturing apparatus control system |
| 02/19/2004 | DE19956354B4 Verfahren zum Ausgleich von nicht rotationssymmetrischen Abbildungsfehlern in einem optischen System A method for compensating for non-rotationally symmetric aberrations in an optical system |
| 02/19/2004 | DE10236404A1 Production of substrate for ink-jet printing conductive or light-emitting polymer solution for full-color display uses photoresists, first given high surface energy before masking with second and reducing surface energy in unmasked areas |
| 02/19/2004 | DE10235255A1 Reflektierender Spiegel zur lithographischen Belichtung und Herstellungsverfahren Reflective mirror for lithographic exposure and production methods |
| 02/19/2004 | DE10233849A1 Polymerizable composition for the production of a resist for the production of semiconductor components, contains at least one unsaturated polymerizable monomer having a silicon atom and a carbonyl group |
| 02/19/2004 | DE10233631A1 A radiation sensitive element including a pretreated carrier, two radiation sensitive layers and a top layer, a diazo resin as negative useful for lithographic printing plates |
| 02/19/2004 | DE10206687B4 Vorrichtung und Verfahren zur lichtinduzierten chemischen Behandlung eines Werkstücks Apparatus and method for light-induced chemical treatment of a workpiece |
| 02/18/2004 | EP1389747A2 Lithographic projection apparatus and reflector asembly for use in said apparatus |
| 02/18/2004 | EP1389746A2 Process solutions containing surfactants |
| 02/18/2004 | EP1389745A1 Acetylenic diol surfactant solutions and methods of using same |
| 02/18/2004 | EP1389615A1 Process for producing epoxy compound, epoxy resin composition and use thereof, ultraviolet-curable can coating composition, and process for producing coated metal can |
| 02/18/2004 | EP1389521A2 Thermosensitive/photosensitive resin composition |
| 02/18/2004 | EP1389177A2 Solid mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene oligomers and their use |
| 02/18/2004 | EP1189760B1 Thermal transfer of a black matrix containing carbon black |
| 02/18/2004 | EP1100630B1 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 02/18/2004 | EP0900398B1 Fabrication of small-scale coils and bands as photomasks on optical fibers for generation of in-fiber gratings, electromagnets as micro-nmr coils, microtransformers, and intra-vascular stents |
| 02/18/2004 | CN1476629A Aligner, aligning method and method for fabricating device |
| 02/18/2004 | CN1476628A Bright field image reversal for contact hole patterning |
| 02/18/2004 | CN1476551A High-resolution overlay alignment methods and systems for imprint lithography |
| 02/18/2004 | CN1476449A 卤代光学聚合物组合物 Optical halogenated polymer compositions |
| 02/18/2004 | CN1476054A Method for mfg. semiconductor apparatus and method for forming pattern |
| 02/18/2004 | CN1476053A Material and method for forming pattern |
| 02/18/2004 | CN1475864A Manufacturing method of photoetching apparatus and device |
| 02/18/2004 | CN1475863A Manufacturing method of photo etching apparatus and device |
| 02/18/2004 | CN1475862A Exposure device and exposure method |
| 02/18/2004 | CN1475861A Polymerizable composition, inhibitor and electron beam plate printing method |
| 02/18/2004 | CN1475350A Micro-structural body making method, liqiuid spraying head making method and liquid spraying head |
| 02/18/2004 | CN1475344A Heat sensitive composition not necessory to remove unexposed region, female pattern flat-plate printing plate coated with said composition and method for forming negative picture on said plate |
| 02/18/2004 | CN1138830C Photo-curable polymer composition and flexographic printing plates containing same |
| 02/18/2004 | CN1138777C Photoactivatable nitrogen-containing bases based on alpha-amino ketones |
| 02/17/2004 | US6694503 Processing device and method of processing material with ultraviolet light or light of shorter wavelength than ultraviolet light |
| 02/17/2004 | US6694498 Feed-forward lithographic overlay offset method and system |
| 02/17/2004 | US6694284 Methods and systems for determining at least four properties of a specimen |
| 02/17/2004 | US6693939 Laser lithography light source with beam delivery |
| 02/17/2004 | US6693834 Device and method for detecting alignment of bit lines and bit line contacts in DRAM devices |
| 02/17/2004 | US6693704 Wave surface aberration measurement device, wave surface aberration measurement method, and projection lens fabricated by the device and the method |
| 02/17/2004 | US6693701 Method and apparatus for diffractive transfer of a mask grating |
| 02/17/2004 | US6693700 Scanning projection exposure apparatus |
| 02/17/2004 | US6693402 Electromagnetic alignment and scanning apparatus |
| 02/17/2004 | US6693345 Semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
| 02/17/2004 | US6693284 Stage apparatus providing multiple degrees of freedom of movement while exhibiting reduced magnetic disturbance of a charged particle beam |
| 02/17/2004 | US6693049 Filling with an oxyalkylated melamine, benzoguanamine, acetoguanamine, glycol uryl, urea, thiourea, guanidine, alkyleneurea or succinylamide and heating at 150-250 c, whereby no bubble is generated when the fine hole is filled. |
| 02/17/2004 | US6693043 Method for removing photoresist from low-k films in a downstream plasma system |
| 02/17/2004 | US6692951 Protein particle for use as genetic engineering tool in expression of heterologous proteins in bacillus |
| 02/17/2004 | US6692903 Substrate cleaning apparatus and method |
| 02/17/2004 | US6692902 Photoresist is formed on substrate, photo mask comprising plurality of halftone exposure units, each unit comprising plurality of parallel transmitting strips is used to perform out of focus exposure and developing process to form slants |
| 02/17/2004 | US6692901 Method for fabricating a resist pattern, a method for patterning a thin film and a method for manufacturing a micro device |
| 02/17/2004 | US6692897 Positive resist composition |
| 02/17/2004 | US6692894 Composite film for near field light generation having nonlinear optical material such as antimony sandwiched between two dielectric layers; rapid formation; reuse |
| 02/17/2004 | US6692893 Onium salts, photoacid generators, resist compositions, and patterning process |
| 02/17/2004 | US6692892 Composition for antireflection coating |
| 02/17/2004 | US6692891 Semiconductor |
| 02/17/2004 | US6692890 For lithographic printing plates comprising hydrophilic anodized aluminum base; adhesion; porosity |
| 02/17/2004 | US6692889 Photoresist polymeric compound and photoresist resin composition |
| 02/17/2004 | US6692888 Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| 02/17/2004 | US6692887 Copolymer of such as maleic anhydride and norbornene acid cleavable derivative; transparency; dry etching resistance; photoresist pattern with high adhesion, sensitivity, resolution and developability |
| 02/17/2004 | US6692884 Sulfonium, n-hydroxyimidesulfonate or a disulfonyldiazomethane acid generator; and a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developing solution |
| 02/17/2004 | US6692883 Generating acid; adjustment solubility in alklaine developer |
| 02/17/2004 | US6692879 Thermal transfer recording material |
| 02/17/2004 | US6692877 Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same |
| 02/17/2004 | US6692793 Photo-cured film, and photosensitive element, printed wiring board and semiconductor package using such film |
| 02/17/2004 | US6692165 Substrate processing apparatus |
| 02/17/2004 | US6692164 Immersion substrate in developer solution; rinsing; applying ultrasonic vibration |
| 02/17/2004 | US6691618 Chemical imaging of a lithographic printing plate |
| 02/17/2004 | US6691615 Drum for fixing sheet-type member |
| 02/17/2004 | CA2292472C Lithographic imaging with reduced power requirements |
| 02/12/2004 | WO2004013904A1 Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method |
| 02/12/2004 | WO2004013900A2 System and method for manufacturing embedded conformal electronics |
| 02/12/2004 | WO2004013700A1 Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film |
| 02/12/2004 | WO2004013699A2 Infrared-sensitive composition containing a metallocene derivative |
| 02/12/2004 | WO2004013697A2 Micro-contact printing method |
| 02/12/2004 | WO2004013695A1 Photomask |
| 02/12/2004 | WO2004013694A1 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device |
| 02/12/2004 | WO2004013693A2 Scatterometry alignment for imprint lithography |
| 02/12/2004 | WO2004013692A2 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 02/12/2004 | WO2004013674A1 Method and system for correction of intrinsic birefringence in uv microlithography |
| 02/12/2004 | WO2004013202A1 Polycarboxylic acid resin, polycarboxylic acid resin composition, and cured article obtained therefrom |