| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/26/2004 | US20040035605 Electrically active patterns are applied using colloidal suspension of nanoparticles that exhibit a desired electrical characteristic; nanoparticles are surrounded by insulative shells that may be removed by application of energy |
| 02/26/2004 | US20040035570 Cooling apparatus and method, and exposure apparatus having the cooling apparatus |
| 02/26/2004 | US20040035442 Method for removal of photoresist using sparger |
| 02/26/2004 | US20040035021 Drying resist with a solvent bath and supercritical CO2 |
| 02/26/2004 | DE20316241U1 Illumination implement for circuit structure manufacture on circuit board, using photomask exposing circuit structure image on circuit board, in which illumination member is formed by number of punctiform light sources on support plate |
| 02/26/2004 | DE10332651A1 Holographic lithography in three-dimensional photo lacquer body, employs multi-faced optical entry element, having planar- or curved surfaces |
| 02/26/2004 | DE10329360A1 Doppelbrechungsmessgerät, Spannungsentfernungseinrichtung, Polarimeter und Belichtungsgerät Birefringence meter, tension remover, polarimeter and exposure apparatus |
| 02/26/2004 | DE10316589A1 System to hold a group of lenses, in a katadioptric lens at a light projector for microlithography, has structured uncoupling units for suspension in the carrier with the required stiffness |
| 02/26/2004 | DE10236422A1 Verfahren zur Charakterisierung einer Beleuchtungsquelle in einem Belichtungsgerät A method of characterizing an illumination source in an exposure apparatus |
| 02/26/2004 | DE10236239A1 Koordinaten-Messtisch Coordinate measuring table |
| 02/26/2004 | DE10236027B3 Checking method for lithography mask used for IC manufacture using comparison of checked mask structure with reference structure after transfer of both structures to a semiconductor material |
| 02/26/2004 | DE10114861B4 Verfahren und Vorrichtung zum Entlacken eines Bereiches auf einem Maskensubstrat Method and apparatus for stripping paint an area on a mask substrate |
| 02/26/2004 | DE10061248B4 Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes Method and apparatus for in situ decontamination of an EUV lithography device |
| 02/25/2004 | EP1391920A2 Method of fabricating an active matrix, optoelectronic visualisation devices and mask for such devices |
| 02/25/2004 | EP1391886A1 Optical recording material |
| 02/25/2004 | EP1391786A1 Chuck, lithographic apparatus and device manufacturing method |
| 02/25/2004 | EP1391785A1 Particle barrier for use in a lithographic projection apparatus |
| 02/25/2004 | EP1391784A2 Polymerizable composition and negative-working planographic printing plate precursor using the same |
| 02/25/2004 | EP1391479A1 Improved colored articles and compositions and methods for their fabrication |
| 02/25/2004 | EP1391476A1 Photoreactive composition |
| 02/25/2004 | EP1391473A1 Water-soluble or water-dispersible polyepoxy compounds containing sulfonate or thiosulfate moieties |
| 02/25/2004 | EP1391470A1 Process for preparing polymer compound for resist |
| 02/25/2004 | EP1391316A1 Laser thermal transfer recording method |
| 02/25/2004 | EP1391297A2 Coating film layer moisture adjusting device and planographic printing plate producing method |
| 02/25/2004 | EP1391296A1 Presensitized lithographic plate comprising microcapsules |
| 02/25/2004 | EP1391017A1 FOUR KHz GAS DISCHARGE LASER SYSTEM |
| 02/25/2004 | EP1390975A2 Flexure based translation stage |
| 02/25/2004 | EP1390974A2 Arrangement and method for detecting defects on a substrate in a processing tool |
| 02/25/2004 | EP1390813A2 Microlithograpic projection illumination system, optical system, method for the production of a microlithographic projection lens system and microlithographic structuring method |
| 02/25/2004 | EP1390812A1 Organic bottom antireflective coating for high performance mask making optical imaging |
| 02/25/2004 | EP1390783A2 Lens system consisting of fluoride crystal lenses |
| 02/25/2004 | EP1390692A1 Periodic patterns and technique to control misalignment |
| 02/25/2004 | EP1390690A2 Cyclic error reduction in average interferometric position measurements |
| 02/25/2004 | EP1390664A1 Materials, methods, and uses for photochemical generation of acids and/or radical species |
| 02/25/2004 | EP1390309A1 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass |
| 02/25/2004 | EP1141780B1 An exposure device |
| 02/25/2004 | EP1103017B1 Colour changing composition and colouring polymeric articles made therefrom |
| 02/25/2004 | EP1056757B1 Substituted benzoylferrocene anionic photoinitiators |
| 02/25/2004 | CN1478220A Chemically amplifying positive radiation sensitive resin composition |
| 02/25/2004 | CN1478219A Photocurable and thermosetting resin composition |
| 02/25/2004 | CN1478218A Radiation curable compositions |
| 02/25/2004 | CN1477451A Corrosion-proof agent stripper |
| 02/25/2004 | CN1477450A Transfer basic board platform for exposure equipment |
| 02/25/2004 | CN1477449A Method for mfg. photoetching device and component |
| 02/25/2004 | CN1477447A Photoresist pattern thickness-increasing material, photoresist pattern containing it and its use |
| 02/25/2004 | CN1477446A Photosensitive lithographic plate printing |
| 02/25/2004 | CN1476977A Method for making microstructure body, method for making liquid spray nozzle and liquid spray nozzle |
| 02/25/2004 | CN1139970C Stripping agent against photoresist residues |
| 02/25/2004 | CN1139846C Apparatus for fabricating silk-screen |
| 02/25/2004 | CN1139845C Alignment method for array type optical probe scanning IC photoetching system |
| 02/25/2004 | CN1139535C Method for making nano line structure using probe transferred particle |
| 02/25/2004 | CN1139483C Super-thin thermosensitive computer direct plate and its making process and developer |
| 02/24/2004 | USRE38438 Catadioptric reduction projection optical system and exposure apparatus having the same |
| 02/24/2004 | US6697698 Overlay inspection apparatus for semiconductor substrate and method thereof |
| 02/24/2004 | US6697695 Laser device management system |
| 02/24/2004 | US6697199 Objective with lenses made of a crystalline material |
| 02/24/2004 | US6697145 Substrate processing apparatus for coating photoresist on a substrate and forming a predetermined pattern on a substrate by exposure |
| 02/24/2004 | US6697096 Laser beam pattern generator having rotating scanner compensator and method |
| 02/24/2004 | US6696529 Photosensitive resin composition, porous resin, circuit board, and wireless suspension board |
| 02/24/2004 | US6696506 Cationic photocatalyst composition and photocurable composition |
| 02/24/2004 | US6696228 Use of ethylene carbonate and/or propylene carbonate treatment using ozone, for the stripping and removal of resist films |
| 02/24/2004 | US6696227 Using masking to form pattern; photoresists |
| 02/24/2004 | US6696225 Substrate and manufacturing method thereof |
| 02/24/2004 | US6696224 Forming layer to be etched over semiconductor substrate, forming imaging layer over layer to be etched, removing selected regions of imaging layer to leave pattern of openings extending partially into imaging layer, etching |
| 02/24/2004 | US6696223 Method for performing photolithography |
| 02/24/2004 | US6696221 Radiating and curing without mask to form relief image |
| 02/24/2004 | US6696220 Template for room temperature, low pressure micro-and nano-imprint lithography |
| 02/24/2004 | US6696219 Positive resist laminate |
| 02/24/2004 | US6696218 Resin which has a polymerization unit derived from p-hydroxystyrene and a polymerization unit having a group unstable against acid, and a dialkanesulfonate of isopropylidenedicyclohexanol |
| 02/24/2004 | US6696217 Acrylated ester polymer |
| 02/24/2004 | US6696216 Thiophene-containing photo acid generators for photolithography |
| 02/24/2004 | US6696208 Semiconductor lithography structures; forming latent images; applying photoresist to semiconductor; calibration |
| 02/24/2004 | US6696206 Lithography mask configuration |
| 02/24/2004 | US6696112 Display device having a polyimide insulating layer |
| 02/24/2004 | US6696008 Maskless laser beam patterning ablation of multilayered structures with continuous monitoring of ablation |
| 02/24/2004 | US6695947 Device for manufacturing semiconductor device and method of manufacturing the same |
| 02/24/2004 | US6695922 Film forming unit |
| 02/19/2004 | WO2004015497A1 Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method therefor |
| 02/19/2004 | WO2004015477A1 Optical component comprising a material having zero longitudinal thermal expansion |
| 02/19/2004 | WO2004014964A2 PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY |
| 02/19/2004 | WO2004014960A2 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |
| 02/19/2004 | WO2004014652A1 High speed negative-working thermal printing plates |
| 02/19/2004 | WO2003104900A3 Microelectronic cleaning compositions containing oxidizers and organic solvents |
| 02/19/2004 | WO2003075098A3 Prevention of contamination of optical elements and cleaning said elements |
| 02/19/2004 | WO2003058665A3 Air-cooled lamp, and article treatment system and method utilizing an air-cooled lamp |
| 02/19/2004 | WO2003038858A8 A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor |
| 02/19/2004 | WO2003026363A8 Discharge source with gas curtain for protecting optics from particles |
| 02/19/2004 | WO2002084401A9 Photoresist compositions comprising solvents for short wavelength imaging |
| 02/19/2004 | WO2002079876A3 Lithographic template |
| 02/19/2004 | WO2002069053A3 Method and apparatus for registration control in production by imaging |
| 02/19/2004 | WO2002069048A3 Method and apparatus for printing patterns on substrates |
| 02/19/2004 | US20040034160 Mixtures of addition copolymers, acid generators and solvents, used as photosensitive coatings in lithography; relief images |
| 02/19/2004 | US20040034155 Acenaphthylene derivative, polymer, and antireflection film-forming composition |
| 02/19/2004 | US20040034115 Surface-active photoinitiators |
| 02/19/2004 | US20040033699 Method of making an integrated circuit using an EUV mask formed by atomic layer deposition |
| 02/19/2004 | US20040033515 Preparing a fluidic device for detection of restriction fragment length polymorphism; high throughput macromolecular analysis using diffraction gradient lithography gradient interfaces |
| 02/19/2004 | US20040033448 Misalignment is automatically detected and corrected, eliminating the need for reworking |
| 02/19/2004 | US20040033445 Method of forming a photoresist pattern and method for patterning a layer using a photoresist |
| 02/19/2004 | US20040033444 Method of manufacturing semiconductor device and method of forming pattern |
| 02/19/2004 | US20040033441 Negative resist composition |