| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/02/2004 | US6700644 Condenser for photolithography system |
| 03/02/2004 | US6700643 Device for exposure of a peripheral area of a film circuit board |
| 03/02/2004 | US6700642 Laser exposure apparatus |
| 03/02/2004 | US6700641 Temperature control method and exposure apparatus thereby |
| 03/02/2004 | US6700600 Beam positioning in microlithography writing |
| 03/02/2004 | US6700095 Pattern generation system using a spatial light modulator |
| 03/02/2004 | US6699951 Monomer and polymer for photoresist, photoresist composition, and phosphor layer composition for color cathode ray tube |
| 03/02/2004 | US6699800 Pattern design method for lithography C/H process |
| 03/02/2004 | US6699798 Promoting adhesion of fluoropolymer films to semiconductor substrates |
| 03/02/2004 | US6699729 Method of forming planar color filters in an image sensor |
| 03/02/2004 | US6699646 Handled under bright sodium safelight for inspection of coatings |
| 03/02/2004 | US6699645 Using chemically amplified resist which comprises alkali insoluble base polymer and acid generator in which patternwise exposed film of resist is developed with organic alkaline developer in presence of surfactant; peel, crack resistance |
| 03/02/2004 | US6699644 Process for forming a photoresist pattern comprising alkaline treatment |
| 03/02/2004 | US6699643 Stamper manufacturing method |
| 03/02/2004 | US6699641 Photosensitive bottom anti-reflective coating |
| 03/02/2004 | US6699640 Applying ink; exposure to radiation; removal wastes;continuous cycles |
| 03/02/2004 | US6699639 Projection-exposure methods and apparatus exhibiting increased throughput |
| 03/02/2004 | US6699638 On a thermal crosslinking layer a water soluble overcoat layer, and at least one of these layers contains a compound capable of converting light into heat; easy to handle and causes no defects even when touched with fingers |
| 03/02/2004 | US6699635 Positive photosensitive composition |
| 03/02/2004 | US6699630 Method and apparatus for exposure, and device manufacturing method |
| 03/02/2004 | US6699628 Synchronize movable stage, calibration plate, detectable label |
| 03/02/2004 | US6699627 Semiconductor pattern overlay. |
| 03/02/2004 | US6699626 Mask set for use in phase shift photolithography technique which is suitable to form random patterns |
| 03/02/2004 | US6699624 Precision optical measurement of the two process layers on a semiconductor wafer, set of diffraction grating test patterns that are used in combination with rigorous diffraction grating analysis |
| 03/02/2004 | US6699425 Device and method for transferring microstructures |
| 03/02/2004 | US6699408 Method of making a fluoride crystalline optical lithography lens element blank |
| 03/02/2004 | US6698944 Exposure apparatus, substrate processing unit and lithographic system, and device manufacturing method |
| 03/02/2004 | US6698354 Method and device for producing a printing block |
| 02/26/2004 | WO2004017421A1 Micro t-shaped electrode fabricating method |
| 02/26/2004 | WO2004017390A1 Method and compositions for hardening photoresist in etching processes |
| 02/26/2004 | WO2004017388A2 Lithographic template and method of formation |
| 02/26/2004 | WO2004017366A2 Reticle manipulating device |
| 02/26/2004 | WO2004017143A2 Method for irradiating a resist |
| 02/26/2004 | WO2004017142A1 Polymerizable composition, polymer, resist, and lithography methods |
| 02/26/2004 | WO2004017141A1 Optical image recording material, hologram base body, method of optical image recording and process for producing optical image recording material and hologram base body |
| 02/26/2004 | WO2004017139A2 Negative-working photosensitive composition and negative-working photosensitive planographic printing plate |
| 02/26/2004 | WO2004016827A1 Remover solution |
| 02/26/2004 | WO2004016689A1 Optical material containing photocurable fluoropolymer and photocurable fluororesin composition |
| 02/26/2004 | WO2004016664A1 Fluorinated polymers useful as photoresists, and processes for microlithography |
| 02/26/2004 | WO2004016406A1 Imprint lithography processes and systems |
| 02/26/2004 | WO2003100525A3 Method for determining wavefront aberrations |
| 02/26/2004 | WO2003100487A8 Polymer micro-ring resonator device and fabrication method |
| 02/26/2004 | WO2003099782A3 Acetal protected polymers and photoresists compositions thereof |
| 02/26/2004 | WO2003087934A3 Interferometry system error compensation in twin stage lithography tools |
| 02/26/2004 | WO2003085456A3 Method and device for imaging a mask onto a substrate |
| 02/26/2004 | WO2003042728A8 Achromatic fresnel optics for ultraviolet and x-ray radiation |
| 02/26/2004 | WO2003040828A3 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography |
| 02/26/2004 | WO2003036339A3 Transfer of optical element patterns on a same side of a substrate already having feature thereon |
| 02/26/2004 | WO2003030597A3 Machine and installation for tracing on a support |
| 02/26/2004 | US20040040003 Use of overlay diagnostics for enhanced automatic process control |
| 02/26/2004 | US20040039153 Photosensitive compositions based on polycyclic polymers |
| 02/26/2004 | US20040039150 Triazine ring based polymers for photoinduced liquid crystal alignment, liquid crystal alignment layer containing the same, liquid crystal element using the alignment layer and method of manufacturing the same |
| 02/26/2004 | US20040039100 Photoresist; partial esterification product of a styrene maleic anhydride copolymer with (meth)acrylate and hydroxyl containing side chains and an amide containing (meth)acrylate |
| 02/26/2004 | US20040038840 Useful for stripping photoresists and cleaning organic and inorganic compounds from a semiconductor substrate |
| 02/26/2004 | US20040038552 Method for fabricating bulbous-shaped vias |
| 02/26/2004 | US20040038549 Semiconductor apparatus fabrication method |
| 02/26/2004 | US20040038532 Method for drying microstructure member |
| 02/26/2004 | US20040038531 Method of manufacturing semiconductor apparatus |
| 02/26/2004 | US20040038460 Methods of forming transistor gates; and methods of forming programmable read-only memory constructions |
| 02/26/2004 | US20040038455 Use of overlay diagnostics for enhanced automatic process control |
| 02/26/2004 | US20040038268 Support bound probes and methods of analysis using the same |
| 02/26/2004 | US20040038155 Topcoat process to prevent image collapse |
| 02/26/2004 | US20040038154 Separation-material composition for photo-resist and manufacturing method of semiconductor device |
| 02/26/2004 | US20040038151 Multilayer elements containing photoresist compositions and their use in microlithography |
| 02/26/2004 | US20040038150 Novel resins and photoresist compositions comprising same |
| 02/26/2004 | US20040038149 For laser scanning exposure; irradiation polymerizaion with high pressure mercury lamp |
| 02/26/2004 | US20040038148 Positive type radiation-sensitive resin composition for producing product formed by plating and process for producing product formed by plating |
| 02/26/2004 | US20040038146 Optical recording material |
| 02/26/2004 | US20040038139 Method and system for realtime CD microloading control |
| 02/26/2004 | US20040038138 Comprises ink films colored by ink drops inside openings enclosed by banks demarcated and formed on a substrate; photoresists; photolithography; electrooptics; liquid crystal displays |
| 02/26/2004 | US20040038137 Coating method for a color filter and aligning-assembling method by using the same |
| 02/26/2004 | US20040038135 Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus |
| 02/26/2004 | US20040038134 Radiation-patterning tools, and methods of printing structures |
| 02/26/2004 | US20040038010 Transcription plate for forming orientation layer |
| 02/26/2004 | US20040037999 Fabrication method |
| 02/26/2004 | US20040037959 Nanolithography, forming a pattern on a substrate by using a coated tip pen, coated with a compound, atomic force microscope imaging, drawing |
| 02/26/2004 | US20040037487 Optical wiring substrate fabrication process and optical wiring substrate device |
| 02/26/2004 | US20040037388 Illumination system particularly for microlithography |
| 02/26/2004 | US20040037387 Illumination system particularly for microlithography |
| 02/26/2004 | US20040037339 Laser discharge chamber passivation by plasma |
| 02/26/2004 | US20040037338 High rep-rate laser with improved electrodes |
| 02/26/2004 | US20040036991 Ultra-high resolution imaging devices |
| 02/26/2004 | US20040036985 Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
| 02/26/2004 | US20040036977 Optical illumination device, exposure device and exposure method |
| 02/26/2004 | US20040036971 Methods for reducing polarization aberration in optical systems |
| 02/26/2004 | US20040036961 Structures and methods for reducing polarization aberration in optical systems |
| 02/26/2004 | US20040036940 Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system |
| 02/26/2004 | US20040036932 Phase volume hologram and method for producing the phase volume hologram |
| 02/26/2004 | US20040036883 Projection exposure apparatus |
| 02/26/2004 | US20040036850 Substrate attracting and holding system for use in exposure apparatus |
| 02/26/2004 | US20040036849 Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method |
| 02/26/2004 | US20040036848 Lithographic apparatus and device manufacturing method |
| 02/26/2004 | US20040036846 Mask producing method |
| 02/26/2004 | US20040036201 Methods and apparatus of field-induced pressure imprint lithography |
| 02/26/2004 | US20040036076 Semiconductor device and method of manufacturing same |
| 02/26/2004 | US20040036040 Writing methodology to reduce write time, and system for performing same |
| 02/26/2004 | US20040036037 Illumination system with a plurality of light sources |
| 02/26/2004 | US20040036035 Positioning system for use in lithographic apparatus |
| 02/26/2004 | US20040035820 Fabrication of MEMS devices with spin-on glass |
| 02/26/2004 | US20040035690 For parallel synthesis and assay of biopolymers using light-directed generation of photo-generated reagents on microarray biochips |