| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/04/2004 | US20040043333 Controlling wavelength for etching photomask; antireflectivity; stabilization a photoresist pattern over layer to be etched |
| 03/04/2004 | US20040043332 Method of manufacturing semiconductor device, and method of forming resist pattern |
| 03/04/2004 | US20040043331 Lithographic apparatus and device manufacturing method |
| 03/04/2004 | US20040043330 Applying amplified photoresists to substrate in solvent; film forming polymer; acid generator; reducing channel width |
| 03/04/2004 | US20040043329 Dimensional stability; dispensing, partial development, rotation cycles |
| 03/04/2004 | US20040043328 Overcoating substrate with photoresists; exposure to patterned image; one step removal, development |
| 03/04/2004 | US20040043327 Mixture of epoxy and phenolic resins, latent curing agents and photosensitive acid generator |
| 03/04/2004 | US20040043325 Polymerizable composition and negative-working planographic printing plate precursor using the same |
| 03/04/2004 | US20040043324 Photoresist for forming semiconductor; polymer containing (meth)acrylated adamamtane compound |
| 03/04/2004 | US20040043323 High energy beams lithography; mixture of water insoluble phenolic resin and acid generator |
| 03/04/2004 | US20040043322 Photosensitive resin composition |
| 03/04/2004 | US20040043321 Copolymer conatining vinylsilfonic compound and hydroxystyrene compound with acid generators |
| 03/04/2004 | US20040043311 Use of multiple reticles in lithographic printing tools |
| 03/04/2004 | US20040043310 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 03/04/2004 | US20040043309 Apparatus and method for mounting a hard pellicle |
| 03/04/2004 | US20040043307 Miniaturization integrated circuits, semiconductors; phase shifting masking |
| 03/04/2004 | US20040043305 Alternating phase shifting masking; generating destructive interference |
| 03/04/2004 | US20040043198 Method and apparatus to easily measure reticle blind positioning with an exposure apparatus |
| 03/04/2004 | US20040042937 Photopolymers; exposure to light; three-dimensional pattern |
| 03/04/2004 | US20040042790 Substrate processing method and substrate processing apparatus |
| 03/04/2004 | US20040042213 Light modulating device and exposure apparatus using the same |
| 03/04/2004 | US20040042094 Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice |
| 03/04/2004 | US20040041994 Balanced positioning system for use in lithographic apparatus |
| 03/04/2004 | US20040041993 Mask having pattern areas whose transmission factors are different from each other |
| 03/04/2004 | US20040041990 System and method for using flexographic media in an imaging system |
| 03/04/2004 | US20040041272 Method for etching anti-reflectant coating layers |
| 03/04/2004 | US20040041129 Solvent solubility; adhesive; heat resistance; dielectric film pattern |
| 03/04/2004 | US20040041104 Lithographic apparatus and device manufacturing method |
| 03/04/2004 | US20040041103 Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method |
| 03/04/2004 | US20040041102 Method and configuration for compensating for unevenness in the surface of a substrate |
| 03/04/2004 | US20040041101 Exposure apparatus |
| 03/04/2004 | US20040041078 System and method for calibrating an imaging system during imaging |
| 03/04/2004 | US20040040934 Method of etching a photoresist layer disposed on a semiconductor substrate |
| 03/04/2004 | US20040040653 Forming pattern on surface of silicone elastomer; oxidation; bonding to substrate |
| 03/04/2004 | US20040040584 Substrate processing apparatus and substrate processing method drying substrate |
| 03/04/2004 | US20040040456 System and method for registering media in an imaging system |
| 03/04/2004 | DE19512776B4 Verfahren zum Bilden eines feinen Musters A method of forming a fine pattern |
| 03/04/2004 | DE10329867A1 Lithographieverfahren zum Verhindern einer Lithographischen Belichtung des Randgebiets eines Halbleiterwafers Lithography method for preventing a lithographic exposure of the peripheral area of a semiconductor wafer |
| 03/04/2004 | DE10328610A1 Mikromuster erzeugendes Material, Verfahren zum Erzeugen von Mikromustern und Verfahren zum Herstellen einer Halbleitervorrichtung Micropattern-generating material, method for producing micro-patterns, and method of manufacturing a semiconductor device |
| 03/04/2004 | DE10313548A1 Binary blazed diffracting optical element and objective containing this has diffracting structures of varied and controlled distances with respect to the radiation wavelength |
| 03/04/2004 | DE10310597A1 Beschichtungsverfahren für ein Farbfilter sowie Ausrichtungs-Zusammenbauverfahren unter Verwendung desselben Of the same coating method for a color filter, and alignment assembly method using |
| 03/04/2004 | DE10238559A1 Immobilising polymeric hydrogel on polymer surfaces, e.g. in dialysers, tubes or catheters, involves coating with hydrogel-forming polymer containing a flavine, flavone or flavonoid initiator and irradiating with UV-VIS light |
| 03/04/2004 | DE10238420A1 Printing plate exposure method with compensation of exposure beam intensity variations dependent on alignment of reflection surface of optical deflection device |
| 03/04/2004 | DE10237880A1 Production of a scattering plate used in a projection exposure unit, especially in an exposure system for microlithography of semiconductor components, comprises irradiating a surface of a substrate with particles |
| 03/04/2004 | DE10144876B4 Belichtungsmaskeneinrichtung und Verfahren zur Ausrichtung einer Vielzahl von Substraten auf eine Belichtungsmaske Exposure mask device and method for aligning a plurality of substrates on an exposure mask |
| 03/04/2004 | DE10005192B4 Antriebssystem für ein Abtast- oder Aufzeichnungsorgan eines Reproduktionsgerätes Drive system for a scanning or recording Organ reproduction apparatus |
| 03/04/2004 | CA2495332A1 Selective and alignment-free molecular patterning of surfaces |
| 03/03/2004 | EP1395037A2 System and method for calibrating an imaging system during imaging. |
| 03/03/2004 | EP1394616A1 An alignment tool, a lithographic apparatus, an alignment method and a device manufacturing method |
| 03/03/2004 | EP1394615A2 Lithographic apparatus and device manufacturing method |
| 03/03/2004 | EP1394614A1 System and method for registering media in an imaging system. |
| 03/03/2004 | EP1394612A2 Lithographic projection apparatus and reflector assembly for use in said apparatus |
| 03/03/2004 | EP1394611A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 03/03/2004 | EP1394610A2 Microlithography reticles including high-contrast reticle-identification codes, and apparatus and methods for identifying reticles based on such codes |
| 03/03/2004 | EP1394590A1 Method for growing a calcium fluoride crystal |
| 03/03/2004 | EP1394128A2 Optical apparatus |
| 03/03/2004 | EP1394127A1 Quartz glass member and projection aligner |
| 03/03/2004 | EP1393546A1 A tdi detecting device, a feed-through equipment and electron beam apparatus using these devices |
| 03/03/2004 | EP1393389A2 Laser patterning of devices |
| 03/03/2004 | EP1393138A2 Enhanced fieldbus device alerts in a process control system |
| 03/03/2004 | EP1393134A2 Lighting system with a plurality of individual grids |
| 03/03/2004 | EP1393133A2 Projection system for euv lithography |
| 03/03/2004 | EP1393132A2 Exposure control for phase shifting photolithographic masks |
| 03/03/2004 | EP1393131A1 Thick film photoresists and methods for use thereof |
| 03/03/2004 | EP1393130A2 Design and layout of phase shifting photolithographic masks |
| 03/03/2004 | EP1393129A2 Phase conflict resolution for photolithographic masks |
| 03/03/2004 | EP1393128A1 Lithography system and method for device manufacture |
| 03/03/2004 | EP1393127A1 Backside alignment system and method |
| 03/03/2004 | EP1393115A1 Systems and methods for scanning a beam of light across a specimen |
| 03/03/2004 | EP1393114A2 Correction of birefringence in cubic crystalline projection lenses and optical systems |
| 03/03/2004 | EP1392786A2 Marking substrates |
| 03/03/2004 | EP1392745A1 Polymer suitable for photoresist compositions |
| 03/03/2004 | EP1392675A1 Substituted oxime derivatives and the use thereof as latent acids |
| 03/03/2004 | EP1392519A1 Method for thermally transferring oriented materials for organic electronic displays and devices |
| 03/03/2004 | EP1392508A1 Anti-reflective coating composition with improved spin bowl compatibility |
| 03/03/2004 | EP1024963B1 Pattern formation |
| 03/03/2004 | EP0938413B1 Radiation-sensitive compositions and printing plates |
| 03/03/2004 | CN1479940A Observation device and its manufacturing method, exposure device and method for manufacturing micro-device |
| 03/03/2004 | CN1479880A Dynamically stabilizer contact lenses |
| 03/03/2004 | CN1479769A Radiation-sensitive composition changing in refractive index and method of changing refractive index |
| 03/03/2004 | CN1479337A Method for manufacturing component figure, distributing structure, electronic source and image display device |
| 03/03/2004 | CN1479174A Photoetching device and method for manufacturing device |
| 03/03/2004 | CN1479173A Radiation sensitive resin composite, method for forming insulating film having pattern, active matrix plate and panel display equipped with the film and method for producing panel display device |
| 03/03/2004 | CN1479172A Pattern forming method and substrate treatment device |
| 03/03/2004 | CN1479073A Distortion measurement method and exposure equipment |
| 03/03/2004 | CN1478800A Photoetch resist copolymer |
| 03/02/2004 | US6701512 Focus monitoring method, exposure apparatus, and exposure mask |
| 03/02/2004 | US6700950 Methods and systems for controlling critical dimension (CD) error |
| 03/02/2004 | US6700916 E-diagnostic, laser simulator, automated testing and deconvolution of spectra for lithographic exposure radiation generating systems such as excimer or molecular fluorine laser or EUV source systems |
| 03/02/2004 | US6700915 Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections |
| 03/02/2004 | US6700715 Oscillation damping system |
| 03/02/2004 | US6700700 Reflective spectral filtering of high power extreme ultra-violet radiation |
| 03/02/2004 | US6700667 Exposure apparatus and method |
| 03/02/2004 | US6700665 Interferometric apparatus for measuring the topography of mirrors in situ and providing error correction signals therefor |
| 03/02/2004 | US6700650 Holder for holding a printed circuit for exposure to light |
| 03/02/2004 | US6700649 Method for improved resolution of patterning using binary masks with pupil filters |
| 03/02/2004 | US6700648 Method for controlling a processing apparatus |
| 03/02/2004 | US6700647 Exposure system of semiconductor wafer and method for operating the same |
| 03/02/2004 | US6700646 Lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
| 03/02/2004 | US6700645 Projection optical system and exposure apparatus and method |