Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2014
01/01/2014CN102569169B Interconnection method based on press printing technology
01/01/2014CN102540710B Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device
01/01/2014CN102414625B Method for formation of resist pattern, and developing solution
01/01/2014CN102037407B 聚合物笔平版印刷术 Polymer Pen Lithography
01/01/2014CN101980086B Immersion exposure apparatus and method
01/01/2014CN101960382B Positive photosensitive polyimide composition
01/01/2014CN101663740B Method of low-k dielectric film repair
12/2013
12/31/2013US8619361 Direct derivative feedforward vibration compensation system
12/31/2013US8619234 Utilities transfer system in a lithography system
12/31/2013US8619231 Cleaning method, exposure method, and device manufacturing method
12/31/2013US8618515 Lithography apparatus and device manufacturing method
12/31/2013US8618217 Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same
12/31/2013US8618040 Solvent compositions containing chlorofluoroolefins or fluoroolefins
12/31/2013US8617800 Patterning process
12/31/2013US8617799 Post arrays and methods of making the same
12/31/2013US8617798 Customized lithographic particles
12/31/2013US8617797 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns
12/31/2013US8617796 Photosensitive resin composition for color filter and color filter using the same
12/31/2013US8617795 Photosensitive resin composition and pattern forming method using the same
12/31/2013US8617794 Method of forming patterns
12/31/2013US8617793 Waterless planographic printing plate precursor
12/31/2013US8617792 Aromatic ring-containing polymer for resist underlayer, resist underlayer composition including the same, and method of patterning device using the same
12/31/2013US8617791 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
12/31/2013US8617790 Photoresist composition and method for producing photoresist pattern
12/31/2013US8617789 Photoacid generator, method for producing the same, and resist composition comprising the same
12/31/2013US8617788 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
12/31/2013US8617787 Sulfonium salt, photo-acid generator, and photosensitive resin composition
12/31/2013US8617786 Poly-oxycarbosilane compositions for use in imprint lithography
12/31/2013US8617785 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
12/31/2013US8617784 Increasing photoresist processing throughput
12/31/2013US8617775 Optimized mask design for fabricating periodic and quasi-periodic patterns
12/31/2013US8617435 Photochromic composite material
12/27/2013WO2013191863A1 Aperture control of thermal processing radiation
12/27/2013WO2013191744A1 Oversized interposer
12/27/2013WO2013191341A1 Method of manufacturing stamp for plasmonic nanolithography apparatus and plasmonic nanolithography apparatus
12/27/2013WO2013191255A1 Illumination apparatus, processing apparatus, and method for manufacturing device
12/27/2013WO2013191203A1 Silicon-containing resist underlayer film-forming composition having sulfone structure and amine structure
12/27/2013WO2013191155A1 Photosensitive resin composition, method for manufacturing cured film, cured film, organic el display device, and liquid crystal display device
12/27/2013WO2013191062A1 Transfer film, method for producing capacitive input device, capacitive input device, and image display device provided with same
12/27/2013WO2013190944A1 Extreme ultraviolet light generation system
12/27/2013WO2013190812A1 Method for production of semiconductor device, semiconductor device, and production system for semiconductor device
12/27/2013WO2013190406A1 Organic solvent developable photoresist composition
12/27/2013WO2013189827A2 Radiation source and lithographic apparatus.
12/27/2013WO2013189724A2 Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method
12/27/2013WO2013189203A1 Method for manufacturing large-version light guide sheet using mask plate
12/27/2013WO2013148299A3 Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor
12/27/2013WO2013139878A3 Arrangement and method for transporting radicals
12/27/2013WO2013120839A3 Device for the magnetic-field-compensated positioning of a component
12/27/2013WO2013117518A3 Support and lithographic apparatus comprising a support
12/27/2013WO2013113632A3 A stage system and a lithographic apparatus
12/26/2013US20130345106 Photoresist striping compositions for manufacturing lcd
12/26/2013US20130344445 Apparatus and method for printing a periodic pattern with a large depth of focus
12/26/2013US20130344444 Process for making lithographic printing plate
12/26/2013US20130344442 Polymer, positive resist composition and patterning process
12/26/2013US20130344441 Organic solvent developable photoresist composition
12/26/2013US20130344440 Lithographic printing plate precursors and processes for preparing lithographic printing plates
12/26/2013US20130344439 Photoresists comprising amide component
12/26/2013US20130344438 Photoacid generator, photoresist, coated substrate, and method of forming an electronic device
12/26/2013US20130344437 Photosensitive resin composition
12/26/2013US20130344436 Resist composition and method of forming resist pattern
12/26/2013US20130344435 Resist compposition and method of forming resist pattern
12/26/2013US20130342821 Imaging optical system
12/26/2013US20130342820 Light-exposure device
12/26/2013US20130342819 Exposure apparatus, exposure method, and method of manufacturing article
12/26/2013US20130341304 Resist underlayer film-forming composition, pattern-forming method and resist underlayer film
12/26/2013US20130340929 Method of manufacturing stamp for plasmonic nanolithography apparatus and plasmonic nanolithography apparatus
12/26/2013US20130340636 A kind of tinplate cylindrical can screen process printing technology
12/25/2013EP2677365A1 Printing plate developing solution composition, developing solution, and method of manufacturing printing plate precursor
12/25/2013EP2677364A1 Photosensitive coloring composition
12/25/2013EP2676800A1 Member with concave portion and method for manufacturing same
12/25/2013EP2676169A1 Photosensitive resin laminate and thermal processing of the same
12/25/2013EP2676168A2 System for magnetic shielding
12/25/2013EP2676162A1 Mirror device
12/25/2013EP2497083B1 Photopolymer formulation with various comonomers
12/25/2013EP2413190B1 Curable coloring composition, color filter and method for producing same, and quinophthalone dye
12/25/2013EP2082286B1 Solvent-assisted embossing of flexographic printing plates
12/25/2013CN203367237U Decompression drying unit
12/25/2013CN203365922U Precise developer
12/25/2013CN203365921U Anti-welding development device for PCB (Printed Circuit Board)
12/25/2013CN203365920U PCB (printed circuit board) solder-masking developing trough
12/25/2013CN203365919U PCB (printed circuit board) solder-masking developing filtering device
12/25/2013CN203365918U Self-alignment exposure orientation equipment
12/25/2013CN203365917U Exposure device
12/25/2013CN203365916U Air guide device for an exposure machine
12/25/2013CN203365915U Six-DOF (degree of freedom) micropositioner with lifting vacuum claws
12/25/2013CN203365914U Six-DOF (degree of freedom) micropositioner with automatic grabbing and lifting mechanism
12/25/2013CN203365913U Six-DOF (degree of freedom) micropositioner with vacuum grabbing and lifting mechanism
12/25/2013CN203365912U Wave aberration measurement system
12/25/2013CN203365911U Film structure used on semi-automatic exposing machine
12/25/2013CN103477286A Substrate processing device
12/25/2013CN103477285A System for magnetic shielding
12/25/2013CN103477284A Chemically amplified positive photosensitive composition for an organic insulation film, and method for forming an organic insulation film using same
12/25/2013CN103477283A Photosensitive resin composition and laminate thereof
12/25/2013CN103477282A Photocurable resin composition, dry film, cured product, and printed wiring board
12/25/2013CN103477281A Photosensitive resin laminate and thermal processing method of the same
12/25/2013CN103477222A Device for high throughput investigations of cellular interactions
12/25/2013CN103476873A Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid-state imaging element, and novel dipyrromethene-type metal complex compound or tautomer thereof
12/25/2013CN103476808A Polymer compound comprising dye and curable resin composition comprising same
12/25/2013CN103476734A Method for producing a ceramic component composed of a plurality of preforms
12/25/2013CN103474396A Manufacturing method of thin film transistor liquid crystal display (TFT-LCD) array substrate
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