| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/11/2004 | DE10237508A1 Verfahren zum Bilden einer Maskierschicht auf einem Substrat A method of forming a masking layer on a substrate |
| 03/11/2004 | CA2495978A1 Decal transfer microfabrication |
| 03/10/2004 | EP1396873A1 Electron beam writing equipment |
| 03/10/2004 | EP1396761A2 An alignment tool, a lithographic apparatus, an alignment method and a device manufacturing method |
| 03/10/2004 | EP1396760A2 Differential pumping system and exposure apparatus |
| 03/10/2004 | EP1396759A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 03/10/2004 | EP1396758A2 Differential pumping system and exposure apparatus |
| 03/10/2004 | EP1396757A2 Reticle focus measurement system and method using multiple interferometric beams |
| 03/10/2004 | EP1396756A2 Planographic printing plate precursor |
| 03/10/2004 | EP1396349A2 Method for production of support for lithographic printing plate precursor and support for lithographic printing plate precursor |
| 03/10/2004 | EP1396338A1 Heat-sensitive lithographic printing plate precursor |
| 03/10/2004 | EP1395878A1 Photoresists processable under biocompatible conditions for multi-biomolecule patterning |
| 03/10/2004 | EP1395877A2 Lithographic method of manufacturing a device |
| 03/10/2004 | EP1395857A2 Method for controlled modification of the reflective qualities of a multi-layer |
| 03/10/2004 | EP1395615A1 Oxime ester photoinitiators having a combined structure |
| 03/10/2004 | EP1395428A1 Chemical imaging of a lithographic printing plate |
| 03/10/2004 | EP1002242A4 Stepper or scanner having two energy monitors for a laser |
| 03/10/2004 | EP0954384B1 Method for coating a plurality of fluid layers onto a substrate |
| 03/10/2004 | EP0883892B1 Vacuum compatible linear motion device |
| 03/10/2004 | CN1481519A Process for removal of photoresis after post ion implantation |
| 03/10/2004 | CN1481392A Surface-active photoinitiators |
| 03/10/2004 | CN1480996A Method for etching photoresistive layer deposited on substrat of semiconductor |
| 03/10/2004 | CN1480994A Substrate processing system and its processing method |
| 03/10/2004 | CN1480986A Bearing appts. its mfg. method, bearing table appts, and exposure appts. |
| 03/10/2004 | CN1480985A Method of peripheral auxiliary graphics for determining algnment mark of wafer and photoresist mask utilized |
| 03/10/2004 | CN1480788A Analyzing system of exposuring device, analyzing method, and program, and semiconductor element mfg. method |
| 03/10/2004 | CN1480787A Damping device, flat table device and exposuring device |
| 03/10/2004 | CN1480749A Method of producing polymer light pipe |
| 03/10/2004 | CN1480746A Diffusion reflector, its mfg. method and proximity exposure method |
| 03/10/2004 | CN1480491A Light sensitivity resin precursor compsn. |
| 03/10/2004 | CN1141733C Array type optical probe scanning IC photoetching method |
| 03/10/2004 | CN1141732C Method of improving outline of photoresist pattern |
| 03/10/2004 | CN1141622C Aqueous developing solutions for reduced developer residue |
| 03/10/2004 | CN1141621C Aliali aqueous developing solutions and method for preparing photoresist pattrn with pattern |
| 03/10/2004 | CN1141620C Scanner with array light source for IC photo etching system |
| 03/10/2004 | CN1141619C Chemically amplitied resist composition |
| 03/10/2004 | CN1141618C Photosensitive composition and method of pattern formation |
| 03/09/2004 | US6704920 Process control for micro-lithography |
| 03/09/2004 | US6704661 Real time analysis of periodic structures on semiconductors |
| 03/09/2004 | US6704340 Lithography laser system with in-place alignment tool |
| 03/09/2004 | US6704339 Lithography laser with beam delivery and beam pointing control |
| 03/09/2004 | US6704096 Exposure apparatus and exposure method |
| 03/09/2004 | US6704095 Control of a distribution of illumination in an exit pupil of an EUV illumination system |
| 03/09/2004 | US6704094 Correction of leveling tilt induced by asymmetrical semiconductor patterns |
| 03/09/2004 | US6704093 Scanning exposure apparatus, scanning exposure method, and device manufacturing method |
| 03/09/2004 | US6704092 Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane |
| 03/09/2004 | US6704091 Exposure apparatus and exposure method |
| 03/09/2004 | US6704090 Exposure method and exposure apparatus |
| 03/09/2004 | US6704089 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby |
| 03/09/2004 | US6704088 Environmental-control method and apparatus for an exposure system |
| 03/09/2004 | US6704075 Color filter substrate, method of fabricating color filter substrate, liquid crystal device, method of fabricating liquid crystal device, and electronic apparatus |
| 03/09/2004 | US6703630 Exposure method, electron beam exposure apparatus and fabrication method of electronic device |
| 03/09/2004 | US6703629 Charged beam exposure apparatus having blanking aperture and basic figure aperture |
| 03/09/2004 | US6703625 Methods and apparatus for off-axis lithographic illumination |
| 03/09/2004 | US6703623 Electron beam proximity exposure apparatus |
| 03/09/2004 | US6703328 Semiconductor device manufacturing method |
| 03/09/2004 | US6703323 Method of inhibiting pattern collapse using a relacs material |
| 03/09/2004 | US6703190 Method for producing resist structures |
| 03/09/2004 | US6703188 Method of fabricating optical waveguide structure |
| 03/09/2004 | US6703187 Method of forming a self-aligned twin well structure with a single mask |
| 03/09/2004 | US6703185 Aggregating a hydrophobizing precursor mingled in a fountain solution or adding a coagulant to the solution and removing the precursor by filtration |
| 03/09/2004 | US6703184 Organic light-emitting diode devices |
| 03/09/2004 | US6703183 (meth)acrylic acid adamantane or norbornane ester derivatives |
| 03/09/2004 | US6703182 Unsaturated oxime derivatives and the use thereof as latent acids |
| 03/09/2004 | US6703181 Comprising at least one of: imidazole compound, an alanine compound, an adenine compound, an adenosine compound, and a quaternary ammonium salt compound, and which increases miscibility in a resist film |
| 03/09/2004 | US6703178 Comprises a polymer containing a novel lactone alicyclic unit; well-balanced outcome of etching resistance and substrate adhesion |
| 03/09/2004 | US6703171 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method |
| 03/09/2004 | US6703169 Applying an organic antireflection coating over a metal-containing layer; applying a chemically-amplified positive tone or negative tone deep ultraviolet photoresist; baking; exposure to radiation; baking |
| 03/09/2004 | US6703167 Calibration using scattering bars; lithography tools |
| 03/09/2004 | US6701972 Vacuum load lock, system including vacuum load lock, and associated methods |
| 03/09/2004 | US6701843 Gentle cleaning using a water emulsion of an alcohol and cyclic hydrocarbon having at least one double bond with phosphoric acid, a phosphate salt, or a polyvinylphosphonic acid |
| 03/04/2004 | WO2004019667A1 Method for forming bump on electrode pad with use of double-layered film |
| 03/04/2004 | WO2004019389A1 Mark position detection device, mark position detection method, superimposing measurement device, and superimposing measurement method |
| 03/04/2004 | WO2004019134A1 Removing solution |
| 03/04/2004 | WO2004019133A2 Method for forming a masking layer on a substrate |
| 03/04/2004 | WO2004019132A1 Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric |
| 03/04/2004 | WO2004019131A1 Composition sensitive to visible light |
| 03/04/2004 | WO2004019130A1 Process for producing a patterned oxide film on a substrate |
| 03/04/2004 | WO2004019128A2 Projection optical system and method for photolithography and exposure apparatus and method using same |
| 03/04/2004 | WO2004019105A1 Catadioptric reduction lens having a polarization beamsplitter |
| 03/04/2004 | WO2004019104A1 Device for receiving an optical module in an imaging unit |
| 03/04/2004 | WO2004019079A2 Continuous direct-write optical lithography |
| 03/04/2004 | WO2004019077A2 Structures and methods for reducing retardance |
| 03/04/2004 | WO2004018908A2 Mems-based fluid valve device |
| 03/04/2004 | WO2004018622A2 Selective and alignment-free molecular patterning of surfaces |
| 03/04/2004 | WO2003104897A3 Objective, especially a projection objective for microlithography |
| 03/04/2004 | WO2003096122A3 Method for producing a unit comprising three-dimensional surface structuring and use of said method |
| 03/04/2004 | WO2003087943A3 Method for producing a mask adapted to a lighting device |
| 03/04/2004 | WO2003087939A3 On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments |
| 03/04/2004 | WO2003081712A3 Grating element for filtering wavelengths ≤ 100nm |
| 03/04/2004 | WO2003021728A3 Very narrow band, two chamber, high rep rate gas discharge laser system |
| 03/04/2004 | WO2003001633A3 Method and device utilizing driving force to deliver deposition compound |
| 03/04/2004 | US20040044982 Reticles and methods of forming and using the same |
| 03/04/2004 | US20040044981 Reticle fabrication method |
| 03/04/2004 | US20040044435 Method and system for handling substrates in a production line including a cluster tool and a metrology tool |
| 03/04/2004 | US20040044102 Mixture of addition polymer and epoxy resin |
| 03/04/2004 | US20040043337 Stripping photoresists using water which decomposes into hydrogen, oxygen free radicals |
| 03/04/2004 | US20040043336 Method of manufacturing print belts |
| 03/04/2004 | US20040043335 Applying layer of polymerizable initiator to bearings; then polymer |
| 03/04/2004 | US20040043334 Method of manufacturing for conductive pattern substrate |