| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/16/2004 | US6707536 Projection exposure apparatus |
| 03/16/2004 | US6707535 Device for exposure of a peripheral area |
| 03/16/2004 | US6707534 Maskless conformable lithography |
| 03/16/2004 | US6707533 Detection apparatus and exposure apparatus using the same |
| 03/16/2004 | US6707532 Projection exposure apparatus |
| 03/16/2004 | US6707530 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 03/16/2004 | US6707529 Exposure method and apparatus |
| 03/16/2004 | US6707528 Exposure apparatus having independent chambers and methods of making the same |
| 03/16/2004 | US6707107 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 03/16/2004 | US6706826 Copolymer, process for producing the same, and resist composition |
| 03/16/2004 | US6706609 Method of forming an alignment feature in or on a multi-layered semiconductor structure |
| 03/16/2004 | US6706533 Determining concentration of solution using mathematical formula which relates concentration to electroconductivity at a given temperature |
| 03/16/2004 | US6706466 Heat treating without removal of moisture |
| 03/16/2004 | US6706464 Prevent short circuiting; solvent-free dielectric films; exposure to actinic radiation |
| 03/16/2004 | US6706463 Heat sensitve element overcoating substrate; applying laser beams; development by rubbing |
| 03/16/2004 | US6706462 Contains a colored layer containing filter dye besides an oxygen cutoff layer; solves safelight fog problem; use as computer-to-plate lithographic printing plate precursor |
| 03/16/2004 | US6706461 Dyed photoresists and methods and articles of manufacture comprising same |
| 03/16/2004 | US6706456 Method of determining exposure conditions, exposure method, device manufacturing method, and storage medium |
| 03/16/2004 | US6706454 Method for the production of a printing plate using particle growing acceleration by an additive polymer |
| 03/16/2004 | US6706453 Photolithographic formation of microscopic patterns in semiconductor; integrated circuits; resolution |
| 03/16/2004 | US6706452 Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device |
| 03/16/2004 | US6706321 Developing treatment method and developing treatment unit |
| 03/16/2004 | US6705228 Uv light from a light source that is modified by a projection unit with respect to direction and/or intensity, trigger signals are evaluated by a receiver formed as the higher-level unit. |
| 03/11/2004 | WO2004021450A1 Gate electrode and its fabricating method |
| 03/11/2004 | WO2004021419A1 Projection optical system and exposure device |
| 03/11/2004 | WO2004021418A1 Temperature control method and device, and exposure method and apparatus |
| 03/11/2004 | WO2004021417A1 Maintenance system, substrate processing device, remote operation device, and communication method |
| 03/11/2004 | WO2004021088A2 Lithographic method for small line printing |
| 03/11/2004 | WO2004021086A1 Grating based spectral filter for eliminating out of band radiation in an extreme ultra-violet lithography system |
| 03/11/2004 | WO2004021085A1 Optical subsystem, particularly for a projection exposure system comprising at least one optical element that can be brought into at least two positions |
| 03/11/2004 | WO2004021084A2 Decal transfer microfabrication |
| 03/11/2004 | WO2004021083A1 Device for transferring a pattern to an object |
| 03/11/2004 | WO2004021080A1 Stereoflexography |
| 03/11/2004 | WO2004020704A1 Apparatus and method for deposition of an electrophoretic emulsion |
| 03/11/2004 | WO2004006011A3 Method and arrangement for the manipulation of reticles |
| 03/11/2004 | WO2003093902A3 Lighting system, particularly for use in extreme ultraviolet (euv) lithography |
| 03/11/2004 | WO2003087937A3 Waterborne printed circuit board coating compositions |
| 03/11/2004 | WO2003068784A3 Acyl- and bisacylphosphine derivatives |
| 03/11/2004 | WO2003058349A3 Method for the production of a flexographic plate and flexographic plate obtained according to said method |
| 03/11/2004 | WO2003021360A3 Phase-shift-moire focus monitor |
| 03/11/2004 | WO2002079882A3 Lithography method |
| 03/11/2004 | US20040049762 Method for monitoring matched machine overlay |
| 03/11/2004 | US20040049761 Hybrid optical proximity correction for alternating aperture phase shifting designs |
| 03/11/2004 | US20040048978 Photosensitive resin composition, solder resist comprising the same, cover lay film, and printed circuit board |
| 03/11/2004 | US20040048943 Accelerators for cationic polymerization catalyzed by iron-based catalyst |
| 03/11/2004 | US20040048761 Cleaning composition |
| 03/11/2004 | US20040048730 To be used in the near ultraviolet region |
| 03/11/2004 | US20040048412 Method of fabricating a semiconductor |
| 03/11/2004 | US20040048400 Reticle focus measurement method using multiple interferometric beams |
| 03/11/2004 | US20040048204 For use in lithography to fabricate semiconductor devices; performance |
| 03/11/2004 | US20040048201 Resist application method and device |
| 03/11/2004 | US20040048200 Method for forming fine pattern on substrate by using resist pattern, and resist surface treatment agent |
| 03/11/2004 | US20040048199 Imagewise exposure of the photopolymerizable relief-forming layer by means of actinic radiation, heating; removal of the softened, unpolymerized parts of the relief-forming layer with formation of a printing relief |
| 03/11/2004 | US20040048198 Producing multilayer composite; allowing the thermally decomposing polymerization initiators to diffuse out of the depot layer; removal of depot layer; thermal crosslinking of the precursor layer to produce relief-forming layer |
| 03/11/2004 | US20040048197 Photosensitive black matrix |
| 03/11/2004 | US20040048196 Anti-reflective coating composition with improved spin bowl compatibility |
| 03/11/2004 | US20040048194 Mehod for forming a tunable deep-ultraviolet dielectric antireflection layer for image transfer processing |
| 03/11/2004 | US20040048192 Radiation-sensitive resin composition |
| 03/11/2004 | US20040048190 For producing semiconductor integrated- circuit elements, masks for integrated circuit production, printed wiring boards, liquid-crystal panels |
| 03/11/2004 | US20040048189 Light sensitive composition and light sensitive planographic printing plate precursor |
| 03/11/2004 | US20040048188 Positive photosensitive polyimide resin composition |
| 03/11/2004 | US20040048187 High resolution |
| 03/11/2004 | US20040048175 Receiver element for adjusting the focus of an imaging laser |
| 03/11/2004 | US20040048174 Reticle focus measurement system using multiple interferometric beams |
| 03/11/2004 | US20040048171 Applying photoresist to base layer; photoresist layer is subjected to masked exposure which is matched to a predetermined final surface patterning; developing; coating by sputtering to destabilize the sacrificial layer regions |
| 03/11/2004 | US20040048169 For use in irradiating a wafer with an electron beam for cell projection |
| 03/11/2004 | US20040048167 Method of illuminating a photomask using chevron illumination |
| 03/11/2004 | US20040048166 Contact printing as second exposure of double exposure attenuated phase shift mask process |
| 03/11/2004 | US20040048132 Fuel cell and electronic device using fuel cell |
| 03/11/2004 | US20040047386 High repetition rate gas discharge laser with precise pulse timing control |
| 03/11/2004 | US20040047385 Very narrow band, two chamber, high reprate gas discharge laser system |
| 03/11/2004 | US20040047384 Gas laser apparatus for lithography |
| 03/11/2004 | US20040047109 Method for forming a photoresist pattern, method for forming a capacitor using the same and capacitor |
| 03/11/2004 | US20040047057 Substrate for material to be exposed |
| 03/11/2004 | US20040047029 Optical member and projection optical system for photolithography using the same |
| 03/11/2004 | US20040047027 Interferometer with reduced shear |
| 03/11/2004 | US20040047023 Defective pixel compensation method |
| 03/11/2004 | US20040047014 In-line holographic mask for micromachining |
| 03/11/2004 | US20040046965 Interferometric stage metrology system |
| 03/11/2004 | US20040046961 Reticle overlay correction |
| 03/11/2004 | US20040046952 Supporting system in exposure apparatus |
| 03/11/2004 | US20040046951 Printing by active tiling |
| 03/11/2004 | US20040046950 Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics |
| 03/11/2004 | US20040046949 Differential pumping system and exposure apparatus |
| 03/11/2004 | US20040046948 Exposure apparatus and method of conveying mask and work |
| 03/11/2004 | US20040046947 Image adjustor including damping assembly |
| 03/11/2004 | US20040046503 Microcavity discharge device |
| 03/11/2004 | US20040046287 Method for making opthalmic devices |
| 03/11/2004 | US20040046271 Functional patterning material for imprint lithography processes |
| 03/11/2004 | US20040045929 Mask and its manufacturing method, and method for manufacturing semiconductor device |
| 03/11/2004 | US20040045866 Packaged radiation sensitive coated workpiece process for making and method of storing same |
| 03/11/2004 | US20040045465 Four color digital printing process and color image element using color-sensitive photopolymers |
| 03/11/2004 | DE10339717A1 Production of a microstructure, e.g. in the manufacture of semiconductor devices, comprises crosslinking a film with acid released by a resist structure |
| 03/11/2004 | DE10304116A1 Optimierverfahren für ein Objektiv mit Fluorid-Kristall-Linsen sowie Objektiv mit Fluorid-Kristall-Linsen Optimization method for a lens with fluoride crystal lenses and lens with fluoride crystal lenses |
| 03/11/2004 | DE10253353A1 Objective with doubly refracting lenses especially a projection objective for microphotolithography and compensation process has two different sets of doubly refracting lenses |
| 03/11/2004 | DE10240115A1 Verfahren und System zum Handhaben von Substraten in einer Produktionslinie mit einer Cluster-Anlage und einer Messanlage Method and system for handling substrates in a production line with a cluster system and a measuring system |
| 03/11/2004 | DE10240002A1 Optisches Teilsystem insbesondere für eine Projektionsbelichtungsanlage mit mindestens einem in mindestens zwei Stellungen verbringbaren optischen Element Optical subsystem particular for a projection exposure apparatus having at least one verbringbaren at least two positions optical element |
| 03/11/2004 | DE10239956A1 Catadioptric microscopic objective for UV light in semiconductor production and testing has massive lens body in refractive section and off axis reflection |
| 03/11/2004 | DE10239858A1 Verfahren und Anordnung zur Kompensation von Unebenheiten in der Oberfläche eines Substrates Method and apparatus for compensating for irregularities in the surface of a substrate |
| 03/11/2004 | DE10239344A1 Device for sealing an optical projection unit flows noble gas or nitrogen around intermediate spaces to give contactless sealing |