| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/18/2004 | WO2004014964A3 PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY |
| 03/18/2004 | WO2003104901A3 Cleaning compositions for microelectronic substrates |
| 03/18/2004 | WO2003100923A3 Production of integrated optical waveguides with solvent extraction |
| 03/18/2004 | WO2003077038A3 Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae |
| 03/18/2004 | WO2003075099A3 Method and system for overlay measurement |
| 03/18/2004 | WO2003030252B1 Process for producing interconnects |
| 03/18/2004 | WO2003003123A3 Critical dimension monitoring from latent image |
| 03/18/2004 | US20040054981 Method of manufacturing electronic device |
| 03/18/2004 | US20040054025 Compositions comprising a benzophenone photoinitiator |
| 03/18/2004 | US20040053800 Process solutions containing surfactants |
| 03/18/2004 | US20040053511 Line edge roughness reduction |
| 03/18/2004 | US20040053504 In-situ plasma etch for TERA hard mask materials |
| 03/18/2004 | US20040053172 Increasing the wetting between the developer and photoresist, by applying a solutions comprising 2,5,8,11-tetramethyl-6-dodecyne-5,8-diol surfactant |
| 03/18/2004 | US20040053171 Increasing the photosensitivity and high resolution, by including a catalysts of acid generator and amide compound; excimer laser lithography for micro-semiconductors |
| 03/18/2004 | US20040053170 Method for forming pattern and treating agent for use therein |
| 03/18/2004 | US20040053169 Process and apparatus for minimizing thermal gradients across an advanced lithographic mask |
| 03/18/2004 | US20040053167 Electrochemical forming an aluminum oxide layer with porosity, on an aluminum supports, providing heat insulation, heat diffusion for thermography |
| 03/18/2004 | US20040053163 Light- sensitive layer includes a fluoro-aliphatic group-containing copolymer |
| 03/18/2004 | US20040053162 Intermediate layer material composition for multilayer resist process and pattern formation process using the same |
| 03/18/2004 | US20040053161 Chemical amplification type resist composition |
| 03/18/2004 | US20040053160 A resist formualtion containing 1. a onium ion compound capable of generating an active seed upon irradiation, 2.a compound capable of reacting with active seed generated from compound 1., 3. a compound performing electron transfer |
| 03/18/2004 | US20040053158 Onium salts and the use therof as latent acids |
| 03/18/2004 | US20040053157 An image receiving sheet containing an image receiving layer and at least five heat transfer sheets different in color, each with a substrate, a light-heat conversion layer and an image forming layer |
| 03/18/2004 | US20040053156 Photosensitive resin precursor composition |
| 03/18/2004 | US20040053148 Exposure method and apparatus |
| 03/18/2004 | US20040053147 Controlling to set an exhaust amount from the first peripheral region outside the cup, an exhaust amount from second peripheral region inside the cup in performing rinsing with the substrate held in vacuum adsorption |
| 03/18/2004 | US20040053146 Method of varying template dimensions to achieve alignment during imprint lithography |
| 03/18/2004 | US20040053144 Phase shift mask, and exposure method and device manufacturing method using the same |
| 03/18/2004 | US20040053143 Tilting a first set of micromirrors on one side of the boundary to produce a high reflected output; tilting second set on other side of boundary past a tilt producing minimum reflected output intensity to a tilt; improved contrast |
| 03/18/2004 | US20040053141 First feature of phase shifter is large so the effectiveness of phase shifting is degraded in defining space, degradation of phase shifting and tightness of space cause the space not to print reliabily when exposed alone by phase-shifting mask |
| 03/18/2004 | US20040053026 Attenuated embedded phase shift photomask blanks |
| 03/18/2004 | US20040052973 Positioning wafers in combustion chambers and heating; combustion |
| 03/18/2004 | US20040052967 Actinic ray curable composition, actinic ray curable ink, image forming method, and ink jet recording apparatus |
| 03/18/2004 | US20040052956 Method and apparatus for coating a wafer |
| 03/18/2004 | US20040052031 Substrate holder and device manufacturing method |
| 03/18/2004 | US20040051984 Devices and methods for cooling optical elements in optical systems, including optical systems used in vacuum environments |
| 03/18/2004 | US20040051954 Etched silicon diffraction gratings for use as euv spectral purity filters |
| 03/18/2004 | US20040051953 Illumination apparatus with light shielding near an exit plane of an optical pipe and projection exposure apparatus using same |
| 03/18/2004 | US20040051928 Apparatus and method for selectively exposing photosensitive materials using a reflective light modulator |
| 03/18/2004 | US20040051881 Position measuring device |
| 03/18/2004 | US20040051858 Lithography apparatus |
| 03/18/2004 | US20040051857 Projection system for EUV lithography |
| 03/18/2004 | US20040051856 Lithographic apparatus and device manufacturing method |
| 03/18/2004 | US20040051855 Programmable photolithographic mask system and method |
| 03/18/2004 | US20040051854 System and method for resetting a reaction mass assembly of a stage assembly |
| 03/18/2004 | US20040051852 Projection optical system, exposure device using said projection optical system, and exposure method using said exposure device |
| 03/18/2004 | US20040051806 Integrated-circuit technology photosensitive sensor |
| 03/18/2004 | US20040051402 Actuator to correct for off center-of-gravity line of force |
| 03/18/2004 | US20040051057 Method of determining movement sequence and apparatus for realizing it |
| 03/18/2004 | US20040051055 Adjustment in a MAPPER system |
| 03/18/2004 | US20040050406 One step stripping of substrates by exposing to nontoxic solvent mixtures comprising carbonates, oxidizers and promoters |
| 03/18/2004 | DE10337509A1 Semiconductor manufacturing apparatus using network, provides communication between storage device and drawing unit storing drawing information, using storage area network |
| 03/18/2004 | DE10241851A1 Production of flexographic printing plates, comprises heating exposed flexographic printing element, and removal of softened, unpolymerized parts of relief-forming layer |
| 03/18/2004 | CA2494618A1 Method for making ophthalmic devices |
| 03/17/2004 | EP1398672A2 Optimisation of a parameter in an exposure apparatus |
| 03/17/2004 | EP1398671A1 Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device |
| 03/17/2004 | EP1398670A2 A method of aligning a substrate, a computer program and a device manufacturing method |
| 03/17/2004 | EP1398669A1 Lithographic apparatus and device manufacturing method |
| 03/17/2004 | EP1398668A2 Reticle manipulators and related methods for conveying thin, circular reticles as used in charged-particle-beam microlithography |
| 03/17/2004 | EP1398667A1 Photosensitive resin composition comprising a halogen-free colorant |
| 03/17/2004 | EP1398656A1 Surface-plasmon-generated light source and its use |
| 03/17/2004 | EP1398651A1 Optical path converting optical element ,optical path converter, and optical projector, and image display apparatus using said optical element |
| 03/17/2004 | EP1398339A1 Polysiloxane, process for production thereof and radiation-sensitive resin composition |
| 03/17/2004 | EP1398309A1 Novel adamantane derivative |
| 03/17/2004 | EP1398172A1 Support for lithographic printing plate, method of preparing the support and presensitized plate |
| 03/17/2004 | EP1398170A2 Pattern formation |
| 03/17/2004 | EP1398163A2 Print control for flexographic printing |
| 03/17/2004 | EP1398109A2 Stage apparatus and its driving method, exposure apparatus and device manufacturing method |
| 03/17/2004 | EP1397945A1 Star pinch x-ray and extreme ultraviolet photon source |
| 03/17/2004 | EP1397813A2 Hybrid optical component for x ray applications and method associated therewith |
| 03/17/2004 | EP1397725A1 Radiation-curable resin composition and rapid prototyping process using the same |
| 03/17/2004 | EP1397651A1 Birefringence measurement at deep-ultraviolet wavelengths |
| 03/17/2004 | EP1397393A1 Photo-initiator compositions |
| 03/17/2004 | EP1397260A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 03/17/2004 | EP1319198B1 Machine for the treatment of printing plates |
| 03/17/2004 | EP1290498B1 Method for creating an integrated circuit stage wherein fine and large patterns coexist |
| 03/17/2004 | EP1257879A4 Radiation sensitive copolymers, photoresist compositions thereof and deep uv bilayer systems thereof |
| 03/17/2004 | EP1224717A4 High pulse rate pulse power system with fast rise time and low leakage current |
| 03/17/2004 | EP1170755A4 Integral lens for high energy particle flow, method for producing such lenses and use thereof in analysis devices and devices for radiation therapy and lithography |
| 03/17/2004 | EP1169357A4 Hydroxy-epoxide thermally cured undercoat for 193 nm lithography |
| 03/17/2004 | EP0917002B1 Composition for antireflection or light absorption film and compounds for use in the same |
| 03/17/2004 | CN1483158A Projection lithography using a phase shifting aperture |
| 03/17/2004 | CN1483093A Semiconductor stripping composition containing 1,3-dicarbonyl compounds |
| 03/17/2004 | CN1482663A Method for monitoring overlaying alignment on wafer |
| 03/17/2004 | CN1482192A Coating compositions for use with an overcoated photoresist |
| 03/17/2004 | CN1482191A Coating compositions for use with an overcoated photoresist |
| 03/17/2004 | CN1142579C 电子束曝光方法 Electron beam exposure method |
| 03/17/2004 | CN1142463C Fractionated novolak resin copolymer and photoresist composition therefrom |
| 03/17/2004 | CN1142462C Fine electrospark process of forming electrode |
| 03/17/2004 | CN1142136C Process for controlling particle size of 1,,2- diazo naphthoquinone 4- or 5- sulfonic acid esters |
| 03/17/2004 | CA2441044A1 Automobile gauge faces made of stainless steel and other metals |
| 03/16/2004 | USRE38465 Exposure apparatus |
| 03/16/2004 | US6708323 Method and apparatus for verifying mask pattern data according to given rules |
| 03/16/2004 | US6707616 Projection exposure apparatus, projection exposure method and catadioptric optical system |
| 03/16/2004 | US6707602 Reflective spectral filtering of high power extreme ultra-violet radiation |
| 03/16/2004 | US6707601 Exposure apparatus and method |
| 03/16/2004 | US6707562 Method of using scatterometry measurements to control photoresist etch process |
| 03/16/2004 | US6707560 Dual-domain lateral shearing interferometer |
| 03/16/2004 | US6707538 Near-field exposure system selectively applying linearly polarized exposure light to exposure mask |
| 03/16/2004 | US6707537 Projection exposure system |