| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/25/2004 | DE10241620A1 Lithographic structurization of substrate with electron beam, used for making photo-mask, e.g. of chrome-on-glass type, uses system of electroconductive, water-insoluble lower resist layer and upper layer of electron beam resist |
| 03/25/2004 | DE10241165A1 Stabilisierte infrarotempfindliche Elemente Stabilized infrared-sensitive elements |
| 03/25/2004 | DE10240598A1 Catadioptric reflective/reduction lens for mapping an image pattern transfers a picture of the pattern in an object plane into an image plane |
| 03/24/2004 | EP1401248A2 Radiation source, lithographic apparatus, and device manufacturing method |
| 03/24/2004 | EP1401023A2 Manufacturing methods of semiconductor device and solid state image pickup device |
| 03/24/2004 | EP1400860A2 Lithographic marker structure, lithographic projection apparatus comprising such a lithographic marker structure and method for substrate alignment using such a lithographic marker structure |
| 03/24/2004 | EP1400859A2 Alignment system and methods for lithographic systems using at least two wavelengths |
| 03/24/2004 | EP1400858A1 Photoresist stripper composition |
| 03/24/2004 | EP1400857A1 A process for making a flexographic printing plate by thermal development |
| 03/24/2004 | EP1400856A2 Method of making lithographic printing plate |
| 03/24/2004 | EP1400855A2 Device inspection |
| 03/24/2004 | EP1400854A2 Alignment systems and methods for lithographic systems |
| 03/24/2004 | EP1400853A1 Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device |
| 03/24/2004 | EP1400852A2 Photopolymerizable presensitized plate and method for making lithographic printing plate |
| 03/24/2004 | EP1400851A2 Polymerizable composition and planographic printing plate precursor using the same |
| 03/24/2004 | EP1400850A1 Method of forming thick resist pattern |
| 03/24/2004 | EP1400849A1 Positive photosensitive resin compositions and semiconductor device |
| 03/24/2004 | EP1400760A1 Substrate treating system and substrate treating method |
| 03/24/2004 | EP1400545A2 Halo resistant photoimagable coverlay compositions |
| 03/24/2004 | EP1400544A1 A method of graft polymerization and variety of materials utilizing the same as well as producing method thereof |
| 03/24/2004 | EP1400488A2 Fabrication of MEMS devices with spin-on glass |
| 03/24/2004 | EP1400369A2 Pattern formation |
| 03/24/2004 | EP1400352A2 Printing plate precursor and printing method |
| 03/24/2004 | EP1399921A2 Method for the production of an optical disk matrix |
| 03/24/2004 | EP1399783A1 Method of processing lithographic printing plate precursors |
| 03/24/2004 | EP1399782A2 Method of measuring critical dimension and overlay in single step |
| 03/24/2004 | EP1399766A2 Optical element and manufacturing method therefor |
| 03/24/2004 | EP1154868A4 Non-corrosive cleaning composition and method for removing plasma etching residues |
| 03/24/2004 | EP1076667B1 Preparation of co-and terpolymers of p-hydroxystyrene and alkyl acrylates |
| 03/24/2004 | EP0996870B1 Improved dissolution inhibition resists for microlithography |
| 03/24/2004 | CN1484869A Fuel cell electric equipment electronic board manufacturing method of electric board connector for fuel cell wiring member and mounting method of fuel cell |
| 03/24/2004 | CN1484863A Integrated-circuit technology photosensitive sensor |
| 03/24/2004 | CN1484850A Stage system exposure device and method of manufacturing device |
| 03/24/2004 | CN1484757A Imaging characteristics measuring method, imaging characteristics adjusting method, exposure method and equipment, program and recording medium, and device producing method |
| 03/24/2004 | CN1484659A Compositions for microlithography |
| 03/24/2004 | CN1484281A Using second exposure to assit a PSM exposure in printing tight space adjacent to large feature |
| 03/24/2004 | CN1484099A System and method for automated focus measnring of lithography tool |
| 03/24/2004 | CN1484098A Electvonic beam based pattern scanning method and scanning device |
| 03/24/2004 | CN1484097A Photographic corrosion mfg method for mixing type photo mask |
| 03/24/2004 | CN1484095A Positive photoresist composition and method for forming slushing pattern |
| 03/24/2004 | CN1484094A Photoresist developer-soluble organic bottom antireflective composition and photo lothography and etching process using same |
| 03/24/2004 | CN1483748A Synthetic resin for PS plate and photoresit and preparation method thereof |
| 03/24/2004 | CN1483574A Method for mfg of screen plate and screen plate |
| 03/24/2004 | CN1142988C Citric trialkyl amide surfactant |
| 03/24/2004 | CN1142944C Photoinitiator formulations |
| 03/23/2004 | US6711732 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era |
| 03/23/2004 | US6711452 Semiconductor exposure apparatus and parameter check method |
| 03/23/2004 | US6711202 Discharge laser with porous insulating layer covering anode discharge surface |
| 03/23/2004 | US6710930 Illumination optical system and method of making exposure apparatus |
| 03/23/2004 | US6710917 8-mirror microlithography projection objective |
| 03/23/2004 | US6710884 Apparatus and method for measuring mirrors in situ |
| 03/23/2004 | US6710876 Metrology system using optical phase |
| 03/23/2004 | US6710857 Substrate holding apparatus and exposure apparatus including substrate holding apparatus |
| 03/23/2004 | US6710856 Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby |
| 03/23/2004 | US6710855 Projection exposure apparatus and method |
| 03/23/2004 | US6710854 Projection exposure apparatus |
| 03/23/2004 | US6710853 Phase grating focus monitor using overlay technique |
| 03/23/2004 | US6710852 Method and apparatus of wafer exposure with correction feedback |
| 03/23/2004 | US6710851 Multi pattern reticle |
| 03/23/2004 | US6710850 Exposure apparatus and exposure method |
| 03/23/2004 | US6710849 Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method |
| 03/23/2004 | US6710848 Projection exposure apparatus and method |
| 03/23/2004 | US6710847 Exposure method and exposure apparatus |
| 03/23/2004 | US6710846 Environmental control apparatus for exposure apparatus |
| 03/23/2004 | US6710845 Purging gas from a photolithography enclosure between a mask protective device and a patterned mask |
| 03/23/2004 | US6710353 Actuator and transducer |
| 03/23/2004 | US6710188 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer |
| 03/23/2004 | US6710150 Solubility in alkaline aqueous solution in the presence of a proton; for use in photolithography |
| 03/23/2004 | US6710148 Polymers, resist compositions and patterning process |
| 03/23/2004 | US6709988 Production process of electronic component using wet etching, electronic component, and suspension for hard disk |
| 03/23/2004 | US6709986 Method for manufacturing semiconductor memory device by using photoresist pattern exposed with ArF laser beam |
| 03/23/2004 | US6709880 Semiconductor device and a manufacturing method of the same |
| 03/23/2004 | US6709876 Method for detecting removal of organic material from a semiconductor device in a manufacturing process |
| 03/23/2004 | US6709808 Subbed or unsubbed support with image forming layers or transparent electroconductive, non-charging layers both made of colloidal polymers |
| 03/23/2004 | US6709807 Process for reducing edge roughness in patterned photoresist |
| 03/23/2004 | US6709806 Electroconductive zones on dielectric |
| 03/23/2004 | US6709805 Inkjet printhead nozzle plate |
| 03/23/2004 | US6709804 Printed wiring board and semiconductor device and processes to prepare the same |
| 03/23/2004 | US6709800 Substrate provided thereon with a light- sensitive layer containing a fluoro-aliphatic group-containing copolymer prepared by copolymerizing at least (a) an addition polymerizable monomer having, on a side chain, a |
| 03/23/2004 | US6709799 Resist compositions |
| 03/23/2004 | US6709797 Precision patterning |
| 03/23/2004 | US6709795 Stereolithographically packaged, in-process semiconductor die |
| 03/23/2004 | US6709794 Exposure method based on multiple exposure process |
| 03/23/2004 | US6709792 Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask |
| 03/23/2004 | US6709790 Method and apparatus for generating periodic structures in substrates by synthetic wavelength holograph exposure |
| 03/23/2004 | US6709523 Silylation treatment unit and method |
| 03/23/2004 | US6709174 Apparatus and method for development |
| 03/23/2004 | CA2088023C New plastic materials made from heterogenuous copolymers of vinylidine fluoride and chlortrifluorethylene, and their uses and process for their preparation |
| 03/18/2004 | WO2004023534A1 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method |
| 03/18/2004 | WO2004023214A1 Interferometry-based method and apparatus for overlay metrology |
| 03/18/2004 | WO2004023213A1 Radiation-sensitive negative-type resist composition for pattern formation and pattern formation method |
| 03/18/2004 | WO2004023212A1 Photopolymerizable resin composition for sandblast resist |
| 03/18/2004 | WO2004023211A2 Exposure method, exposure mask, and exposure apparatus |
| 03/18/2004 | WO2004023210A1 Method for producing a pattern formation mold |
| 03/18/2004 | WO2004023184A1 Objective with birefringent lenses |
| 03/18/2004 | WO2004023172A1 Optimization method for an objective with fluoride crystal lenses and objective with fluoride crystal lenses |
| 03/18/2004 | WO2004022612A1 Photoresists, fluoropolymers and processes for 157 nm microlithography |
| 03/18/2004 | WO2004022513A1 Resist and method of forming resist pattern |
| 03/18/2004 | WO2004022337A1 Stabilized infrared-sensitive elements |
| 03/18/2004 | WO2004022318A2 Method for making ophthalmic devices |