| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 03/30/2004 | US6713747 Light exposure apparatus |
| 03/30/2004 | US6713612 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process |
| 03/30/2004 | US6713523 Photopolymerizable composition and photosensitive thermal recording material |
| 03/30/2004 | US6713440 Resist and etching by-product removing composition and resist removing method using the same |
| 03/30/2004 | US6713404 Methods of forming semiconductor constructions |
| 03/30/2004 | US6713396 Method of fabricating high density sub-lithographic features on a substrate |
| 03/30/2004 | US6713327 Stress controlled dielectric integrated circuit fabrication |
| 03/30/2004 | US6713239 Photosensitive solution is applied onto a resist film and entire surface is exposed all at once enabling uniform developing and an improvement in line width uniformity (cd value uniformity) |
| 03/30/2004 | US6713238 Microscale patterning and articles formed thereby |
| 03/30/2004 | US6713236 Lithography method for preventing lithographic exposure of peripheral region of semiconductor wafer |
| 03/30/2004 | US6713234 Fabrication of semiconductor devices using anti-reflective coatings |
| 03/30/2004 | US6713233 Forming clear fields on a reticle and to reticles formed by electron-beam processing. |
| 03/30/2004 | US6713232 Using acidic aqueous solution |
| 03/30/2004 | US6713231 Method of manufacturing semiconductor integrated circuit devices |
| 03/30/2004 | US6713230 Includes an acrylated, epoxidized novolak prepolymer, photocurable monomers and an epoxy compound that also has a vinyl group, and clay nanocomposite |
| 03/30/2004 | US6713229 May be exposed to light using arf lasers, may have strong resistances to dry etching processes, may possess excellent adhesion to film materials, and may be developed using conventional developers |
| 03/30/2004 | US6713228 Unsaturated ether containing polymer |
| 03/30/2004 | US6713225 1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition |
| 03/30/2004 | US6713219 Line light source and a control system that converts the pattern into a timing signal to control light and dark status of each point light source |
| 03/30/2004 | US6713134 Apparatus for spin-coating semiconductor substrate and method of doing the same |
| 03/30/2004 | US6713120 Substrate processing system and substrate processing method |
| 03/30/2004 | US6713000 Ultraviolet curable silver composition and related method |
| 03/30/2004 | US6712956 Apparatus for monitoring discharge of photoresist |
| 03/30/2004 | US6712596 System for producing ultraviolet blocking lenses |
| 03/30/2004 | CA2443190A1 Method of determining the distance of projection points on the surface of a printing form |
| 03/30/2004 | CA2288480C A method for fabrication of multi-step structures using embedded etch stop layers |
| 03/30/2004 | CA2276138C Wet lithographic printing constructions incorporating metallic inorganic layers |
| 03/25/2004 | WO2004025710A2 Method of heating a substrate in a variable temperature process using a fixed temperature chuck |
| 03/25/2004 | WO2004025370A1 Optical reproduction system, in particular catadioptric reduction lens |
| 03/25/2004 | WO2004025369A2 Method for lithographically structuring a substrate, and lacquer system |
| 03/25/2004 | WO2004025368A2 Device for sealing a projection illumination system |
| 03/25/2004 | WO2004025367A2 Method for manufacturing and controlling structures and patterns of soluble and colloidal substances by printing on the micrometer and nanometer scale and with reduction of the dimensions of the stamp's features |
| 03/25/2004 | WO2004025364A2 Four color digital printing process and color image element using color-sensitive photopolymers |
| 03/25/2004 | WO2004025350A1 Surface-plasmon-generated light source and its use |
| 03/25/2004 | WO2004025349A1 Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type |
| 03/25/2004 | WO2004025335A1 Binary blazed diffractive optical element |
| 03/25/2004 | WO2004024619A1 Method for processing substrate |
| 03/25/2004 | WO2004013699A3 Infrared-sensitive composition containing a metallocene derivative |
| 03/25/2004 | WO2004013674A9 Method and system for correction of intrinsic birefringence in uv microlithography |
| 03/25/2004 | WO2004006012A3 A carried for a reticle used in photolithographic semiconductor |
| 03/25/2004 | WO2003083577A3 Solvent resistant copolymers |
| 03/25/2004 | WO2003079115A3 Device for exposing substrate materials |
| 03/25/2004 | WO2003077034A3 Fluorine-containing compounds with high transparency in the vacuum ultraviolet |
| 03/25/2004 | WO2003066326A3 Method and composition for making ceramic parts by stereolithophotography and use in dentistry |
| 03/25/2004 | WO2002095497A3 Method of lift-off microstructuring deposition material on a substrate, substrates obtainable by the method, and use thereof |
| 03/25/2004 | US20040059541 Position detecting method and apparatus |
| 03/25/2004 | US20040059540 Position detecting device and position detecting method |
| 03/25/2004 | US20040059453 Automobile gauge faces made of stainless steel and other metals |
| 03/25/2004 | US20040059444 Image forming characteristics measuring method, image forming characteristics adjusting method, exposure method and apparatus, program and storage medium, and device manufacturing method |
| 03/25/2004 | US20040059033 Mixture of fluoropolymer and solvent; photopolymerization; coating for semiconductor |
| 03/25/2004 | US20040058814 Heat exchanging image receiver sheet; irradiation with laser; transferring images |
| 03/25/2004 | US20040058813 Image-forming material and image formation method |
| 03/25/2004 | US20040058551 Fluorous cleaning solution for lithographic processing |
| 03/25/2004 | US20040058536 Electron beam lithography method |
| 03/25/2004 | US20040058533 Method for fabricating a pattern and method for manufacturing a semiconductor device |
| 03/25/2004 | US20040058516 Manufacturing method of semiconductor device |
| 03/25/2004 | US20040058484 Crystallization apparatus, crystallization method, and phase shifter |
| 03/25/2004 | US20040058460 Scatterometry test structures stacked over same footprint area |
| 03/25/2004 | US20040058280 Forming a first insulation film including a conductive pattern on a semiconductor substrate; forming etch stop film and insulation film on insulation film; forming a via hole; forming a filling film; forming photoresist film; patterning |
| 03/25/2004 | US20040058279 For use in electron beam lithography |
| 03/25/2004 | US20040058276 Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto |
| 03/25/2004 | US20040058273 Support for lithographic printing plate, method of preparing the support and presensitized plate |
| 03/25/2004 | US20040058272 Resist composition |
| 03/25/2004 | US20040058271 Pattern formation material, water-soluble material and pattern formation method |
| 03/25/2004 | US20040058270 Sensitivity and resolution |
| 03/25/2004 | US20040058269 Resolution |
| 03/25/2004 | US20040058256 Illuminating a mask with illumination light, which is disposed in projection exposure apparatus and in which a dose monitor pattern is formed, passing only a 0th-order diffracted light through a pupil surface of projection exposure apparatus |
| 03/25/2004 | US20040058255 Substrate topography compensation at mask design: 3D OPC topography anchored |
| 03/25/2004 | US20040058254 Phase shift mask blank, photo mask blank, and manufacturing apparatus and method of blanks |
| 03/25/2004 | US20040058253 For use in fabricating semiconductor devices |
| 03/25/2004 | US20040058087 Surface-active photoinitiators |
| 03/25/2004 | US20040057817 Switchable damping mechanism for use in a stage apparatus |
| 03/25/2004 | US20040057474 Bandwidth control technique for a laser |
| 03/25/2004 | US20040057158 Method of depicting a pattern with electron beam and method of producing disc-like substrate carrying thereon a pattern depicted with electron beam |
| 03/25/2004 | US20040057134 Microlithography reduction objective and projection exposure apparatus |
| 03/25/2004 | US20040057120 Multi-axis projection imaging system |
| 03/25/2004 | US20040057118 Systems and methods for correction of spatial cross-talk and pattern frame effects in imaging systems |
| 03/25/2004 | US20040057107 Reflective lithography mask inspection tool based on achromatic fresnel optics |
| 03/25/2004 | US20040057055 Laser interferometer displacement measuring system, exposure apparatus, and electron beam lithography apparatus |
| 03/25/2004 | US20040057036 Exposure method |
| 03/25/2004 | US20040057035 Light energy detecting apparatus for exposure condition control in semiconductor manufacturing apparatus |
| 03/25/2004 | US20040057034 Exposure apparatus including micro mirror array and exposure method using the same |
| 03/25/2004 | US20040057033 Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system |
| 03/25/2004 | US20040057032 Exposure apparatus |
| 03/25/2004 | US20040057031 Exposure apparatus and method of manufacturing a semiconductor device using the same |
| 03/25/2004 | US20040057030 Reticle-holding pods and methods for holding thin, circular reticles, and reticle-handling systems utilizing same |
| 03/25/2004 | US20040056665 Power monitoring unit, control method therefor, and exposure apparatus |
| 03/25/2004 | US20040056578 Multibeam generating apparatus and electron beam drawing apparatus |
| 03/25/2004 | US20040056215 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
| 03/25/2004 | US20040056193 Applications operating with beams of charged particles |
| 03/25/2004 | US20040055872 Stamper forming method |
| 03/25/2004 | US20040055490 Printing plate precursor and printing method |
| 03/25/2004 | US20040055336 Optical apparatus |
| 03/25/2004 | US20040055177 Exposure Apparatus |
| 03/25/2004 | DE19857094B4 Verfahren zum Verringern/zum lokalen Verringern eines Resistmusters in einer Hableitervorrichtung A method for reducing / to local decrease a resist pattern in a Hableitervorrichtung |
| 03/25/2004 | DE19703752B4 Black-Matrix in Farbbildröhren und Verfahren zur Herstellung der Black-Matrix Black matrix in color picture tubes and method for manufacturing the black matrix |
| 03/25/2004 | DE10333248A1 Optical lithography process for semiconductor chip fabrication, involves exposing photo-resist layer through trim mask to assist in exposing space between features that is defined by phase shifters of phase-shifting mask |
| 03/25/2004 | DE10324866A1 Verfahren zum Herstellen einer resistiven Halbleiterspeichervorrichtung A method of manufacturing a resistive semiconductor memory device |
| 03/25/2004 | DE10243827A1 Direct-write lithography method for forming sub-micrometer structure, e.g. photonic crystals, by interpolating layout data in-situ and selecting dose modulation to give exposure of circular areas by proximity effect |
| 03/25/2004 | DE10242142A1 Manufacture of exposed structures using exposure apparatus, by reading macro line data sets for lines being exposed from memory while further macro lines are written to memory |