| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/01/2004 | US20040063037 Irradiating far ultraviolet or vacuum ultraviolet exposure light from a second major surface side of a mask substrate; reduction-projecting, by a projection optical system, exposure light which has transmitted through mask substrate |
| 04/01/2004 | US20040063036 Exposing the heat-sensitive pre-sensitized plate to light, and developing the plate using an alkaline developing solution comprising compound selected from cationic surfactants and compound having ethylene oxide-terminal groups |
| 04/01/2004 | US20040063035 For formation of a three-dimensional object |
| 04/01/2004 | US20040063034 Photosensitive composition |
| 04/01/2004 | US20040063033 Presensitized plate |
| 04/01/2004 | US20040063030 Photoresist |
| 04/01/2004 | US20040063029 Usable for the image-forming layer of a positive type lithographic printing plate precursor for the so-called direct platemaking that can be directly achieved with the aid of digital signals from computers and the like |
| 04/01/2004 | US20040063028 Heat-sensitive composition in which removal of the unexposed regions is unnecessary, negative lithographic plate coated with the said composition and method for forming a negative image on the said plate |
| 04/01/2004 | US20040063027 Functional polymer |
| 04/01/2004 | US20040063026 Dry film photoresist |
| 04/01/2004 | US20040063025 Resist pattern, process for producing same, and utilization thereof |
| 04/01/2004 | US20040063024 Capable of high resolution lithographic performance with good exposure dose latitude, reduced sensitivity to fluctuations in post- exposure bake and/or reduced line edge roughness |
| 04/01/2004 | US20040063022 Providing a substrate; applying onto the surface of the substrate a photosensitive formulation comprising mixture of an aromatic diazonium salt containing compounds; treating photosensitive to form a layer that adheres |
| 04/01/2004 | US20040063021 Diazonium salt and thermal recording material using the same |
| 04/01/2004 | US20040063009 Comprehensive integrated lithographic process control system based on product design and yield feedback system |
| 04/01/2004 | US20040063008 Post etch overlay metrology to avoid absorbing layers preventing measurements |
| 04/01/2004 | US20040063007 Precision-of-register measuring mark and measuring method |
| 04/01/2004 | US20040063003 Method of producing a patterned photoresist used to prepare high performance photomasks |
| 04/01/2004 | US20040062999 Method for the manufacture of phase shifting masks for EUV lithography |
| 04/01/2004 | US20040062939 Polymerizable composition and planogaphic printing plate precursor using the same |
| 04/01/2004 | US20040062896 Fractionally-releasable bonding layer for use in photo-sensitive laminate films |
| 04/01/2004 | US20040062876 Liquid phase; reducing precipitation in development process by adjustment pH; process control |
| 04/01/2004 | US20040062867 Method to reduce photoresist poisoning |
| 04/01/2004 | US20040061952 System for coverting optical beams to collimated flat-top beams |
| 04/01/2004 | US20040061930 Narrow-band spectral filter and the use thereof |
| 04/01/2004 | US20040061869 Compensation for errors in off-axis interferometric measurements |
| 04/01/2004 | US20040061868 Figure correction of multilayer coated optics |
| 04/01/2004 | US20040061857 Periodic patterns and technique to control misalignment between two layers |
| 04/01/2004 | US20040061844 Lithographic apparatus and device manufacturing method |
| 04/01/2004 | US20040061673 Imaging forming apparatus |
| 04/01/2004 | US20040061385 Linear motor apparatus |
| 04/01/2004 | US20040061151 Nanometer-scale semiconductor devices and method of making |
| 04/01/2004 | US20040061080 Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method |
| 04/01/2004 | US20040061065 Electron beam exposure apparatus, electron beam exposure apparatus calibration method, and semiconductor element manufacturing method |
| 04/01/2004 | US20040060949 Photoresist applying device and applying method therefor |
| 04/01/2004 | US20040060731 Patterned electrically conductive polymers |
| 04/01/2004 | US20040060466 Printing plate processing apparatus |
| 04/01/2004 | DE20023408U1 Thermally stable layer system used for reflecting extreme UV rays consists of layer pairs made up of a barrier layer of molybdenum carbide between molybdenum layer and a silicon layer |
| 04/01/2004 | DE10340382A1 Print form measurement method for determining difference between projection points on surface of a print form to enable location compensation of patterns projected by different illustrating units |
| 04/01/2004 | DE10332855A1 Verfahren zum Bilden einer Mikrostruktur auf einem Substrat unter Verwendung einer Resiststruktur, und Restistoberflächenbehandlungsmittel A method of forming a microstructure on a substrate using a resist pattern, and Restistoberflächenbehandlungsmittel |
| 03/31/2004 | EP1403928A2 Nanometer-scale semiconductor devices and method of making |
| 03/31/2004 | EP1403717A1 Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device |
| 03/31/2004 | EP1403716A2 Process for developing lithographic printing plate |
| 03/31/2004 | EP1403715A2 Lithographic apparatus and device manufacturing method |
| 03/31/2004 | EP1403714A2 Lithographic apparatus and a measurement system |
| 03/31/2004 | EP1403713A1 Lithographic apparatus and device manufacturing method |
| 03/31/2004 | EP1403712A2 Lithographic apparatus and device manufacturing method |
| 03/31/2004 | EP1403711A1 PATTERN−FORMING MATERIAL AND METHOD OF FORMING PATTERN |
| 03/31/2004 | EP1403710A1 Polymerizable composition |
| 03/31/2004 | EP1403709A2 Photoinitiator |
| 03/31/2004 | EP1403708A2 Photoresist |
| 03/31/2004 | EP1403663A1 Optical member, process for producing the same, and projection aligner |
| 03/31/2004 | EP1403295A2 Ester compounds, polymers, resist compositions and patterning process |
| 03/31/2004 | EP1403042A2 Planographic printing plate precursor |
| 03/31/2004 | EP1403041A2 Infrared-sensitive composition |
| 03/31/2004 | EP1403040A1 Printing plate material and image formation method employing the same |
| 03/31/2004 | EP1403039A1 Infrared sensitive composition and lithographic printing plate precursor |
| 03/31/2004 | EP1402605A1 High repetition rate gas discharge laser with precise pulse timing control |
| 03/31/2004 | EP1402570A2 Control of solid state dimensional features |
| 03/31/2004 | EP1402569A2 Lithography method for forming semiconductor devices on a wafer and apparatus |
| 03/31/2004 | EP1402543A1 Material and method for making an electroconductive pattern |
| 03/31/2004 | EP1402321A1 Resist curable resin composition and cured article thereof |
| 03/31/2004 | EP1402320A1 Method for the production of a printing plate using particle growing acceleration by an additive polymer |
| 03/31/2004 | EP1402319A1 Material having a conductive pattern; and a material and method for making a conductive pattern |
| 03/31/2004 | EP1402318A1 A stamp having an antisticking layer and a method of forming of repairing such a stamp |
| 03/31/2004 | EP1402317A2 Plastic male mold for producing microstructures and nanostructures using imprint lithography |
| 03/31/2004 | EP1401994A1 Aqueous buffered fluoride-containing etch residue removers and cleaners |
| 03/31/2004 | EP1320913B1 High-peak-power laser device and application to the generation of light in the extreme ultraviolet |
| 03/31/2004 | EP0958255A4 Silica with low compaction under high energy irradiation |
| 03/31/2004 | CN1486449A Multilayer elements containing photoresist compositions and their use in microlithography |
| 03/31/2004 | CN1485885A Pattern formation material, water-soluble material and pattern formation method |
| 03/31/2004 | CN1485702A Display panel and the multilayer pole plate made of the same |
| 03/31/2004 | CN1485694A Step-by-step projection photo-etching machine double set shifting exposure ultra-sophisticated positioning silicon chip bench system |
| 03/31/2004 | CN1485693A Photosensitive heat convertible resin and welder-proof ink composition containing the same |
| 03/31/2004 | CN1485662A Protective covers for gas sensor, gas sensor and gas sensor manufacturing method |
| 03/31/2004 | CN1485200A Presensitized lithographic plate comprising microcapsules |
| 03/31/2004 | CN1144267C Electron-beam exposing method |
| 03/31/2004 | CN1144265C Electron beam exposure mask and method for making semiconductor device with the same |
| 03/31/2004 | CN1144264C Mask blank and method of producing mask |
| 03/31/2004 | CN1144263C Exposure device and method for exposure |
| 03/31/2004 | CN1144237C Integral lens for high energy particle flow, method for producing such lenses and use thereof |
| 03/31/2004 | CN1144196C Manufacturing method of master disk for forming optical disk |
| 03/31/2004 | CN1144096C 感光性树脂组成物 The photosensitive resin composition |
| 03/30/2004 | US6714892 Three dimensional reconstruction metrology |
| 03/30/2004 | US6714842 Synchronous position control apparatus and method |
| 03/30/2004 | US6714691 Exposure method and apparatus, and device manufacturing method using the same |
| 03/30/2004 | US6714625 Lithography device for semiconductor circuit pattern generation |
| 03/30/2004 | US6714624 Discharge source with gas curtain for protecting optics from particles |
| 03/30/2004 | US6714577 Energy stabilized gas discharge laser |
| 03/30/2004 | US6714302 Aligning method, aligner, and device manufacturing method |
| 03/30/2004 | US6714282 Position detecting method optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method |
| 03/30/2004 | US6714281 Exposure apparatus and device manufacturing method |
| 03/30/2004 | US6714280 Projection optical system, projection exposure apparatus, and projection exposure method |
| 03/30/2004 | US6714279 Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 03/30/2004 | US6714278 Exposure apparatus |
| 03/30/2004 | US6714277 Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method |
| 03/30/2004 | US6713959 Plasma display panel and method for producing the same |
| 03/30/2004 | US6713903 Motor system for positioning a load |
| 03/30/2004 | US6713900 Linear motors and stages comprising same that produce reduced magnetic fields at an optical axis for charged-particle-beam lithography |
| 03/30/2004 | US6713772 Free-form fabrication using multi-photon excitation |