| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/07/2004 | EP1406121A1 Reduced-stress, electrostatically chuckable reticles for use in extreme ultraviolet and soft X-ray microlithography apparatus and methods |
| 04/07/2004 | EP1406107A2 Apparatus and method for retaining mirror, and mirror exchange method |
| 04/07/2004 | EP1405666A2 Substrate for methods to determine analytes and methods to manufacture such substrates |
| 04/07/2004 | EP1405338A2 Semiconductor processing module with integrated feedback/feed forward metrology |
| 04/07/2004 | EP1405144A1 Sensor for determining radiated energy and use thereof |
| 04/07/2004 | EP1405143A1 Imaging system utilizing light emitting diodes for preparation of print screens |
| 04/07/2004 | EP1405142A1 Methods using topcoat for photoresist |
| 04/07/2004 | EP1405141A1 Thermally sensitive coating compositions containing mixed diazo novolaks useful for lithographic elements |
| 04/07/2004 | EP1405140A1 Resist compositions with polymers having 2-cyano acrylic monomer |
| 04/07/2004 | EP1405139A1 Photosensitive polyimide precursor compositions |
| 04/07/2004 | EP1405120A1 Compact imaging head and high speed multi-head laser imaging assembly and method |
| 04/07/2004 | EP1405110A2 Preferred crystal orientation optical elements from cubic materials |
| 04/07/2004 | EP1404797A1 Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| 04/07/2004 | EP1404796A1 Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| 04/07/2004 | EP1404795A1 Microelectronic cleaning compositions containing ammonia-free fluoride salts |
| 04/07/2004 | CN1487915A Process for preparing alkyladamantyl esters and compositions |
| 04/07/2004 | CN1487884A Method for obtaining a lithographic printing surface |
| 04/07/2004 | CN1487883A Thermally convertible lithographic printing precursor |
| 04/07/2004 | CN1487781A Underlying pattern forming material for electrode and wiring material absorption and application thereof |
| 04/07/2004 | CN1487368A Aligning apparatus and method, offset press, components producing method and produced device |
| 04/07/2004 | CN1487367A Frequency domain phase collimator |
| 04/07/2004 | CN1487366A Method for producing photoetching apparatus and parts |
| 04/07/2004 | CN1487365A Base fixing parts and device producing method |
| 04/07/2004 | CN1487364A System and method for making laser beam expend without expanding space coherence |
| 04/07/2004 | CN1487363A Method for designing phase grating pattern, and methodfor producing photomask system |
| 04/07/2004 | CN1487361A Photoresist for high-resolution imager |
| 04/07/2004 | CN1487360A Chuck, photoetching apparatus and components producing method |
| 04/07/2004 | CN1487312A Optical fibre beam, light source apparatus using optical fibre beam and method for producing light source apparatus |
| 04/07/2004 | CN1145199C Method for producing semiconductor device |
| 04/07/2004 | CN1145194C Method for forming photoresist pattern |
| 04/07/2004 | CN1145078C Polymer and corrosion resistant material |
| 04/07/2004 | CN1145077C Photopolymer holographic recording material sensitive to green light and its producing process |
| 04/07/2004 | CN1144944C Orifice for fuel spray nozzle |
| 04/07/2004 | CN1144943C Oritice plate, especially for oil injection nozzle |
| 04/07/2004 | CA2407381A1 Edge treatment of flexographic printing elements |
| 04/06/2004 | US6718532 Charged particle beam exposure system using aperture mask in semiconductor manufacture |
| 04/06/2004 | US6718088 Multiplex laser light source and exposure apparatus |
| 04/06/2004 | US6717973 Wavelength and bandwidth monitor for excimer or molecular fluorine laser |
| 04/06/2004 | US6717896 Controlling a gap length in a near-field area in an exposure apparatus |
| 04/06/2004 | US6717778 Spin-valve giant magnetoresistive head and method of manufacturing the same |
| 04/06/2004 | US6717746 Catadioptric reduction lens |
| 04/06/2004 | US6717722 Catadioptric optical system and exposure apparatus having the same |
| 04/06/2004 | US6717653 Moving mechanism in exposure apparatus, and exposure apparatus having the same |
| 04/06/2004 | US6717652 Exposure apparatus, exposure method and semiconductor device fabricated with the exposure method |
| 04/06/2004 | US6717651 Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice |
| 04/06/2004 | US6717650 Maskless lithography with sub-pixel resolution |
| 04/06/2004 | US6717296 Lithographic apparatus and motor for use in the apparatus |
| 04/06/2004 | US6717159 Low distortion kinematic reticle support |
| 04/06/2004 | US6717106 Laser sintering apparatus |
| 04/06/2004 | US6717097 Data path for high performance pattern generator |
| 04/06/2004 | US6716992 Free radical curable; adhesives |
| 04/06/2004 | US6716892 Urethane oligomer, resin compositions thereof, and cured article thereof |
| 04/06/2004 | US6716761 Method of forming fine patterns |
| 04/06/2004 | US6716754 Methods of forming patterns and molds for semiconductor constructions |
| 04/06/2004 | US6716730 Pattern formation method |
| 04/06/2004 | US6716653 Mask alignment structure for IC layers |
| 04/06/2004 | US6716649 Method for improving substrate alignment |
| 04/06/2004 | US6716648 Method of manufacturing and testing semiconductor integrated circuit device |
| 04/06/2004 | US6716573 Fine pattern polymer; rectangular shapes; silylated surface resolution, development |
| 04/06/2004 | US6716570 Low temperature ( less-than 20 degrees c.), high density oxygen and argon plasma and intense uv radiation is used to simultaneously trim and harden a photoresist linewidth in an icp chamber |
| 04/06/2004 | US6716568 Epoxy photoresist composition with improved cracking resistance |
| 04/06/2004 | US6716566 Negative planographic printing plate |
| 04/06/2004 | US6716565 Applicable to image-forming materials such as three-dimensional modelling by light, holography, lithographic printing plates, color proofs, photoresists and color filters, and inks, paints and adhesives |
| 04/06/2004 | US6716564 Alkali-soluble resin,such as a phenolic resin, that has been modified with aniline or an aniline derivative |
| 04/06/2004 | US6716563 Azo dyes and azo-metal complexes for atomic force microscope lithography |
| 04/06/2004 | US6716559 Method and system for determining overlay tolerance |
| 04/06/2004 | US6716515 Castellation technique for improved lift-off of photoresist in thin-film device processing and a thin-film device made thereby |
| 04/06/2004 | US6716285 Spin coating of substrate with chemical |
| 04/06/2004 | US6715944 Apparatus for removing photoresist film |
| 04/06/2004 | US6715943 Solution treatment method and solution treatment unit |
| 04/06/2004 | US6715422 Plate producing apparatus having controller for controlling cassette selection assembly |
| 04/06/2004 | US6715419 Method and device for producing a printing image carrier on prefabricated carrier material |
| 04/01/2004 | WO2004027889A1 Material with pattern surface for use as template and process for producing the same |
| 04/01/2004 | WO2004027856A1 Method for supporting substrate, substrate supporting apparatus and exposure apparatus |
| 04/01/2004 | WO2004027843A1 Surface processing method |
| 04/01/2004 | WO2004027842A1 X-ray generator, e-ray exposure apparatus, and x-ray filter |
| 04/01/2004 | WO2004027810A2 System and method for removal of materials from an article |
| 04/01/2004 | WO2004027521A2 A multi-axis projection imaging system |
| 04/01/2004 | WO2004027520A1 Electron beam irradiation device, electron beam irradiation method, disc-like body manufacturing apparatus, and disc-like body manufacturing method |
| 04/01/2004 | WO2004027518A2 A method for the removal of an imaging layer from a semiconductor substrate stack |
| 04/01/2004 | WO2004027460A2 Replication and transfer of microstructures and nanostructures |
| 04/01/2004 | WO2004026356A1 Method for immobilizing hydrogel-bonding polymers on polymer substrate surfaces |
| 04/01/2004 | WO2004012234A3 Superlattice nanopatterning of wires and complex patterns |
| 04/01/2004 | WO2003107093A3 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds |
| 04/01/2004 | WO2003087944A3 Device for the low-deformation mounting of a rotationally asymmetric optical element |
| 04/01/2004 | WO2003087935A3 Nanoimprint resist |
| 04/01/2004 | WO2003069015A3 Aperture masks for circuit fabrication |
| 04/01/2004 | US20040063882 (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns |
| 04/01/2004 | US20040063849 Photosolder resist composition |
| 04/01/2004 | US20040063827 Positive resist composition and pattern formation method using the same |
| 04/01/2004 | US20040063813 A powder coating composition comprising reactive nanoparticles and a thermocurable or radiation curable resin. The nanoparticles impart a wide range of enhanced properties to the compositions such as hardness and abrasion resistance. |
| 04/01/2004 | US20040063596 Photochromic photo resist composition |
| 04/01/2004 | US20040063595 For removing a photoresist pattern from an underlying layer; for manufacturing a semiconductor device |
| 04/01/2004 | US20040063563 To be used in near ultraviolet region |
| 04/01/2004 | US20040063334 Method for forming a mask pattern |
| 04/01/2004 | US20040063319 Substrate processing apparatus and substrate processing method |
| 04/01/2004 | US20040063282 Nanometer-scale semiconductor devices and method of making |
| 04/01/2004 | US20040063051 For use in fabrication of microelectronic, micro-optical and micromechanical devices |
| 04/01/2004 | US20040063042 For selectively removing photoresist residues from a microstructure |
| 04/01/2004 | US20040063038 Two masking layers are created, first masking layer comprising a main pattern, an isolated pattern and a dummy pattern, second masking layer exposing dummy pattern; compensating for optical proximity effects and micro-loading are applied |