| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/13/2004 | US6721035 Lithographic projection apparatus |
| 04/13/2004 | US6721034 Stage unit, drive table, and scanning exposure apparatus using the same |
| 04/13/2004 | US6721033 Accurately superimposing pattern images |
| 04/13/2004 | US6721032 Exposure apparatus and control method therefor, and device manufacturing method |
| 04/13/2004 | US6721031 Exposure apparatus |
| 04/13/2004 | US6720731 Mercury discharge lamp of the short arc type |
| 04/13/2004 | US6720680 Flat motor device and its driving method, stage device and its driving method, exposure apparatus and exposure method, and device and its manufacturing method |
| 04/13/2004 | US6720667 Semiconductor device having align key for defining active region and method for manufacturing the same |
| 04/13/2004 | US6720565 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography |
| 04/13/2004 | US6720430 Heterocyclic lacton acrylate ester monomers; isobenzofuran acrylate esters; 4,7-methanoisobenzofuran acrylate esters; 4,7-epoxyisobenzofuran acrylate esters |
| 04/13/2004 | US6720251 Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing |
| 04/13/2004 | US6720133 Memory manufacturing process using disposable ARC for wordline formation |
| 04/13/2004 | US6720132 Bi-layer photoresist dry development and reactive ion etch method |
| 04/13/2004 | US6720131 Method and apparatus for applying a film of developer fluid onto a lithographic printing plate in a developing station |
| 04/13/2004 | US6720129 Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same |
| 04/13/2004 | US6720128 Positive resist composition |
| 04/13/2004 | US6720126 Sheet can be transported and fed in a stable state without causing jamming or positioning error to thereby give an image free from any defect in the image caused by the adhesion of foreign materials or mistaken color recording order |
| 04/13/2004 | US6720125 Image recording material |
| 04/13/2004 | US6720124 Recording material |
| 04/13/2004 | US6720117 Exposure mask with appended mask error data |
| 04/13/2004 | US6720115 Exposure method and exposure apparatus using near-field light and exposure mask |
| 04/13/2004 | US6719917 Method of ashing semiconductor device having metal interconnection |
| 04/13/2004 | US6719915 Step and flash imprint lithography |
| 04/13/2004 | US6719844 Deposition method, deposition apparatus, and pressure-reduction drying apparatus |
| 04/08/2004 | WO2004030423A1 X-ray generating device and exposure device |
| 04/08/2004 | WO2004030038A2 Compositions substrate for removing etching residue and use thereof |
| 04/08/2004 | WO2004029723A1 Photoresist remover composition |
| 04/08/2004 | WO2004029722A2 Lithographic method for wiring a side surface of a substrate |
| 04/08/2004 | WO2004029721A2 Method and device for producing exposed structures |
| 04/08/2004 | WO2004029720A1 Radiation-sensitive resin composition, patterned resin film, method for formation of the film, and use thereof |
| 04/08/2004 | WO2004029719A1 193nm resist |
| 04/08/2004 | WO2004029718A1 Highly sensitive and high-resolution photoresist for ion projection lithography |
| 04/08/2004 | WO2004029717A1 Highly sensitive, high-resolution photoresist for electron beam lithography |
| 04/08/2004 | WO2004029716A2 Composition which forms an electrically-conducting protective coat and a method for structuring a photoresist using the protective layer |
| 04/08/2004 | WO2004029037A1 Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape |
| 04/08/2004 | WO2004019077A9 Structures and methods for reducing retardance |
| 04/08/2004 | WO2004006840A3 Three dimensional cell patterned bioploymer scaffolds and method of making the same |
| 04/08/2004 | WO2003107398A3 Techniques to characterize iso-dense effects for microdevice manufacture |
| 04/08/2004 | WO2003107096A3 Method for filtering radiation |
| 04/08/2004 | WO2003087946A3 Imaging method |
| 04/08/2004 | WO2003077007A3 Objective lens consisting of crystal lenses |
| 04/08/2004 | WO2003075049A3 Refractive projection objective |
| 04/08/2004 | WO2003007075A3 Method and apparatus for diffractive transfer of a mask grating |
| 04/08/2004 | US20040068124 Capable of forming a polymer which is effectively acid-decomposable and can control the diffusion of the acid generated upon exposure |
| 04/08/2004 | US20040068110 Novel morpholinoketone derivatives, and preparation process and uses of the same |
| 04/08/2004 | US20040068026 Polymerizable composition |
| 04/08/2004 | US20040068023 manufacture of three dimensional inorganic structures without molding or embossing steps; nanostructure; photoinitiator, reactive curable organic polymer, transparent oxide particles (silica); formed structure can be pyrolyzed to remove organic components and leave an inorganic structure; resolution |
| 04/08/2004 | US20040067860 Cleaning compositions and methods of use thereof |
| 04/08/2004 | US20040067655 Method for forming patterns in a semiconductor device |
| 04/08/2004 | US20040067627 Dry lithograpy method and method of forming gate pattern using the same |
| 04/08/2004 | US20040067615 Method for the preparation of a semiconductor device |
| 04/08/2004 | US20040067521 Sequence specific recognition reagents (oligonucleotide, monoclonal antibodies) attached to a solid substrate; sequencing, fingerprinting and mapping biological polymers |
| 04/08/2004 | US20040067453 System and method for recycling developer solution containing tetra-methyl-ammonia hydroxide (TMAH) |
| 04/08/2004 | US20040067452 Reducing the spacing between adjacent photoresist patterns, by heating to shrink the overcoatings, control pattern dimensions; semiconductors, photolithographic |
| 04/08/2004 | US20040067451 Photon absorption by an absorber in photoinitiator system, having maximum cross section of fluorescein, curing, photopolymerization |
| 04/08/2004 | US20040067450 Planar inorganic device |
| 04/08/2004 | US20040067448 Methods for measuring photoresist dimensions |
| 04/08/2004 | US20040067444 Method for patterning electroconductive tin oxide film |
| 04/08/2004 | US20040067443 Reduce or eliminate ridges at the edges of printing plate, by reducing UV exposure to the edges, spraying masking material, automatic control the spray movement by computer, materials handling |
| 04/08/2004 | US20040067442 Water-developable photosensitive resin for flexography |
| 04/08/2004 | US20040067441 Non-aromatic chromophores for use in polymer anti-reflective coatings |
| 04/08/2004 | US20040067440 Actinic energy ray-curable resin, photocurable and thermosetting resin composition containing the same, and cured products thereof |
| 04/08/2004 | US20040067438 Process for forming a photosensitive element having a layer of particulate material and an apparatus for performing the process |
| 04/08/2004 | US20040067437 Coating compositions for use with an overcoated photoresist |
| 04/08/2004 | US20040067436 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process |
| 04/08/2004 | US20040067434 Method of graft polymerization and variety of materials utilizing the same as well as producing method thereof |
| 04/08/2004 | US20040067433 Photo-inducing chemical reactions, photochemistry, a photoinitiator consisting of semiconductor nanoparticle absorbing photons to activate chemical reaction |
| 04/08/2004 | US20040067432 Comprising a novolac resin coverings, for scuff resistance and protecting from damage during handling; lithographic printing plates |
| 04/08/2004 | US20040067431 Reactive species that undergoes an acid- or radical- initiated chemical reaction, a photoinitiator system of a semicondutor nanoparticle quatum dot that has an electronic excited state |
| 04/08/2004 | US20040067426 Reticle stage based linear dosimeter |
| 04/08/2004 | US20040067424 Protective device for lithographic masks and method of using lithographic masks |
| 04/08/2004 | US20040067423 Non-critical feature on a mask utilizing a low-transmission phase-shift mask pattern and a non-phase shifting mask pattern and a critical feature on a mask utilizing a high transmission phase shift mask pattern |
| 04/08/2004 | US20040067421 Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle |
| 04/08/2004 | US20040067420 Reduced-stress, electrostatically chuckable reticles for use in extreme ultraviolet and soft X-ray microlithography apparatus and methods |
| 04/08/2004 | US20040067323 Photopolymerisable system including silicone monomer, prepolymer, macromonomer or co-monomer, one of which is unsaturated |
| 04/08/2004 | US20040067307 Automatic to minimize manpower required; precise amount of photoresist can be purged when exchanging photoresist bottles prior to coating a new lot of wafers, preventing an unnecessary consumption of photoresist |
| 04/08/2004 | US20040067303 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent |
| 04/08/2004 | US20040066963 Method of inspecting a mask |
| 04/08/2004 | US20040066518 Self referencing mark independent alignment sensor |
| 04/08/2004 | US20040066517 Interferometry-based method and apparatus for overlay metrology |
| 04/08/2004 | US20040066498 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 04/08/2004 | US20040066497 Moving apparatus, exposure apparatus, and device manufacturing method |
| 04/08/2004 | US20040066496 DUV scanner linewidth control by mask error factor compensation |
| 04/08/2004 | US20040065976 Method and a mold to arrange features on a substrate to replicate features having minimal dimensional variability |
| 04/08/2004 | US20040065929 Organic gate insulating film and organic thin film transistor using the same |
| 04/08/2004 | US20040065848 Electron beam lithography system and method therefor |
| 04/08/2004 | US20040065847 Lithographic apparatus and device manufacturing method |
| 04/08/2004 | US20040065825 Pattern width measuring apparatus, pattern width measuring method, and electron beam exposure apparatus |
| 04/08/2004 | US20040065817 Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm |
| 04/08/2004 | US20040065421 Fibrous structure having increased surface area and process for making same |
| 04/08/2004 | US20040065252 Method of forming a layer on a substrate to facilitate fabrication of metrology standards |
| 04/08/2004 | DE20317873U1 Pixel sensitivity correction application method for pixels in charge-coupled device camera, involves changing laser wavelength |
| 04/08/2004 | DE10245128A1 Photosensitive lacquer used in the production of integrated circuits comprises a base polymer, a solvent, a photo-active substance which forms an acid under the influence of light and a fluorescent substance |
| 04/08/2004 | DE10244197A1 Zusammensetzung, die eine elektrisch leitfähige Lackschicht bildet und ein Verfahren zur Strukturierung eines Fotoresists unter Verwendung der Lackschicht Composition which forms an electrically conductive coating layer and a method for patterning a photoresist using the varnish layer |
| 04/07/2004 | EP1406291A2 Electron beam lithography system and method |
| 04/07/2004 | EP1406126A1 Device manufacturing method |
| 04/07/2004 | EP1406125A1 Method for manufacturing photosensitive resin printing plate, and developer treatment device |
| 04/07/2004 | EP1406124A1 Radiation source, lithographic apparatus, and device manufacturing method |
| 04/07/2004 | EP1406123A1 Resist compositions |
| 04/07/2004 | EP1406122A2 Photosensitive composition and acid generator |