| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/15/2004 | WO2004031686A1 Laser interferometer for repeatable mounting on the wall of a vacuum chamber |
| 04/15/2004 | WO2004030924A1 Method of making a lithographic printing plate precursor |
| 04/15/2004 | WO2004030916A2 Card printing system and method |
| 04/15/2004 | WO2004030830A1 Nanostructured and nanoporous film compositions, structures, and methods for making the same |
| 04/15/2004 | WO2004017139A3 Negative-working photosensitive composition and negative-working photosensitive planographic printing plate |
| 04/15/2004 | WO2003070809A3 Organosiloxanes and their use in dielectric films of semiconductors |
| 04/15/2004 | WO2003014831A8 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates |
| 04/15/2004 | US20040073885 Mask pattern correction apparatus, mask pattern correction method, mask manufacturing method, and semiconductor device manufacturing method |
| 04/15/2004 | US20040073398 Methods and systems for determining a critical dimension and a thin film characteristic of a specimen |
| 04/15/2004 | US20040072969 Epoxy acrylates |
| 04/15/2004 | US20040072706 Placing an object onto a support within a pressure chamber, pressurizing the chamber, cleaning, decompressing and venting |
| 04/15/2004 | US20040072450 Spin-coating methods and apparatuses for spin-coating, including pressure sensor |
| 04/15/2004 | US20040072434 Device manufacturing apparatus |
| 04/15/2004 | US20040072420 Anti-reflective compositions comprising triazine compounds |
| 04/15/2004 | US20040072108 Prevents collapse; photolithography |
| 04/15/2004 | US20040072106 Screen printing process for light emitting base layer |
| 04/15/2004 | US20040072105 Formed via irradiation polymerization; improved biocompatibility; photoresists |
| 04/15/2004 | US20040072104 Comprises kryton fluoride photoresist pattern |
| 04/15/2004 | US20040072103 Positive-working photoresist composition |
| 04/15/2004 | US20040072102 Method of processing light sensitive planographic printing plate precursor and pre-washing solution used in the method |
| 04/15/2004 | US20040072099 High resolution; improved development and etch resistance; microelectronics |
| 04/15/2004 | US20040072098 Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device |
| 04/15/2004 | US20040072097 Photosensitive composition and acid generator |
| 04/15/2004 | US20040072096 Photoresists; thin films; irradiation polymerization/ photopolymerization; surface/heat treatment |
| 04/15/2004 | US20040072095 Comprises 4-(1-butoxyphenyl)diphenylsulfonium mesylate; photosensitivity; high resolution, photospeed and depth of focus; semiconductors; relief imaging |
| 04/15/2004 | US20040072094 Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits |
| 04/15/2004 | US20040072086 Exposure method and exposure apparatus using complementary division mask, and semiconductor device and method for making the same |
| 04/15/2004 | US20040072083 For use in photolithography |
| 04/15/2004 | US20040072082 Photomask, method of manufacturing a photomask, and method of manufacturing an electronic product |
| 04/15/2004 | US20040071872 Dividing a coating region of substrate into at least two regions; and setting a jet amount of the liquid to any one of at least two regions to a greater value than the jet amount to another of at least two regions |
| 04/15/2004 | US20040071336 Exposure method and device manufacturing method using this exposure method |
| 04/15/2004 | US20040071260 X-ray projection exposure apparatus and a device manufacturing method |
| 04/15/2004 | US20040071177 Discharge laser with porous layer covering anode discharge surface |
| 04/15/2004 | US20040070852 Projection eposure apparatus and method |
| 04/15/2004 | US20040070772 Parametric profiling using optical spectroscopic systems |
| 04/15/2004 | US20040070771 Focus control system |
| 04/15/2004 | US20040070744 Method for Evaluating Image Formation Performance |
| 04/15/2004 | US20040070743 Projection system for EUV lithography |
| 04/15/2004 | US20040070742 Relay image optical system, and illuminating optical device and exposure system provided with the optical system |
| 04/15/2004 | US20040070741 Alignment system and projection exposure apparatus |
| 04/15/2004 | US20040070740 Exposure method and exposure apparatus |
| 04/15/2004 | US20040070643 Method of manufacturing microstructure, method of manufacturing liquid discharge head, and liquid discharge head |
| 04/15/2004 | US20040070039 Reduce the in-plane photoelectric conversion portion characteristic distribution that is created in forming color filters by a common photolithography; good uniformity between exposure regions in image |
| 04/15/2004 | US20040069957 System and method for maskless lithography using an array of improved diffractive focusing elements |
| 04/15/2004 | US20040069757 Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same |
| 04/15/2004 | US20040069745 Method for preventing the etch transfer of sidelobes in contact hole patterns |
| 04/15/2004 | DE10342741A1 Laser array operating method for imaging printing former for printing machine, by selecting pumping power for individual laser in array based on e.g. on or off state of adjacent laser |
| 04/15/2004 | DE10296416T5 Verfahren und Vorrichtung zur Registrierungssteuerung in der Produktion durch Belichten Method and apparatus for registration control in production by exposure |
| 04/15/2004 | DE10296415T5 Verfahren und Vorrichtung zum Drucken von Mustern und Substraten Method and apparatus for printing patterns and substrates |
| 04/15/2004 | DE10296370T5 Bildverstärkung für Lasersysteme Image enhancement for laser systems |
| 04/15/2004 | DE10246546A1 Resistsystem, Verwendung eines Resistsystems und Lithographieverfahren zur Herstellung von Halbleiterbauelementen Resist system, using a resist lithography system and method for the production of semiconductor devices |
| 04/15/2004 | DE10243755A1 Process for forming a matrix arrangement of exposure fields on an idealized semiconductor wafer in integrated circuit production compares peripheral parameters with a quality reference |
| 04/15/2004 | DE10243745A1 Hochempfindlicher und hochauflösender Fotoresist für die Ionenprojektions-Lithographie High-sensitivity and high-resolution photoresist for ion projection lithography |
| 04/15/2004 | DE10243742A1 Hochempfindlicher und hochauflösender Fotoresist für die Elektronenstrahl-Lithographie High-sensitivity, high-resolution photo resist for electron beam lithography |
| 04/15/2004 | CA2500075A1 Planar inorganic device |
| 04/15/2004 | CA2499868A1 Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
| 04/14/2004 | EP1408680A2 Media clamping apparatus and method for an external drum imaging system. |
| 04/14/2004 | EP1408366A2 Non-resonant two-photon absorbing material, non-resonant two photon emitting material, and method for inducing absorption or generating emission of non-resonant two photons by using the material |
| 04/14/2004 | EP1407897A1 Multilayer foil with a UV-cured lacquer film |
| 04/14/2004 | EP1407894A2 Photosensitive lithographic printing plate precursor |
| 04/14/2004 | EP1407808A1 Method for producing a biomimetic membrane, biomimetic membrane and uses thereof |
| 04/14/2004 | EP1407521A1 Line narrowing unit with flexural grating mount |
| 04/14/2004 | EP1407475A2 Tunable radiation source providing a planar irradiation pattern for processing semiconductor wafers |
| 04/14/2004 | EP1407326A1 Sulfoxide pyrrolid(in)one alkanolamine stripping and cleaning composition |
| 04/14/2004 | EP1407325A1 Compensation of birefringence in a lens composed of crystal lenses |
| 04/14/2004 | EP1407324A1 Photoimageable composition |
| 04/14/2004 | EP1407299A1 Delay element made from a cubic crystal and corresponding optical system |
| 04/14/2004 | EP1407220A1 Interferometer system |
| 04/14/2004 | EP1208014B1 Positive acting photoresist composition and imageable element |
| 04/14/2004 | EP1060206B1 Modified polycyclic polymers |
| 04/14/2004 | EP1002264B1 Method for providing a bioinformatics database |
| 04/14/2004 | CN1489719A Liquid crystal shutter for exposure system |
| 04/14/2004 | CN1489184A Dry photoetching method and method for forming grating pattern |
| 04/14/2004 | CN1489183A Pattern-formation method of semiconductor device |
| 04/14/2004 | CN1489000A Developing method, substrate treating method and substrate treating device |
| 04/14/2004 | CN1488999A Exposure device detecting method and exposure device |
| 04/14/2004 | CN1488998A Optical etching device and manufacturing method |
| 04/14/2004 | CN1488997A Concave spherical photoetching rose engine |
| 04/14/2004 | CN1488996A Chemical-reinforced photoresist composition |
| 04/14/2004 | CN1488995A Method for making microelectronic structure using mixed layers of forming water soluble resin and anti-corrosion agent |
| 04/14/2004 | CN1488987A Color wheel fabrication method |
| 04/14/2004 | CN1488975A Resin insulating layer manufacturing method, base board for electrooptical device, electrooptical device manufacturing method and electrooptical device |
| 04/14/2004 | CN1488740A 清洁组合物 Cleaning compositions |
| 04/14/2004 | CN1488631A Cyclic-aliphatic epoxy compound containing pheneylethylene cinnamyl or maleimide functional group |
| 04/14/2004 | CN1146019C Phase-shift mask and manufacture thereof |
| 04/14/2004 | CN1145846C Process for manufacturing microstructured bodies |
| 04/14/2004 | CN1145800C Semiconductor device and sensor |
| 04/14/2004 | CN1145651C Water soluble negative-working photoresist composition |
| 04/13/2004 | US6721940 Exposure processing method and exposure system for the same |
| 04/13/2004 | US6721938 Optical proximity correction for phase shifting photolithographic masks |
| 04/13/2004 | US6721390 Soft X-ray reduction projection exposure system, soft X-ray reduction projection exposure method and pattern formation method |
| 04/13/2004 | US6721389 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 04/13/2004 | US6721340 Bandwidth control technique for a laser |
| 04/13/2004 | US6721104 System and method for focusing an elastically deformable lens |
| 04/13/2004 | US6721041 Stage device and exposure apparatus |
| 04/13/2004 | US6721040 Exposure method and apparatus using near field light |
| 04/13/2004 | US6721039 Exposure method, exposure apparatus and device producing method |
| 04/13/2004 | US6721038 Device for step-and-repeat exposure of a substrate |
| 04/13/2004 | US6721037 Device for exposure of a peripheral area of a wafer |
| 04/13/2004 | US6721036 Lithographic apparatus, device manufacturing method, and device manufactured thereby |