| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/22/2004 | US20040075894 Catadioptric reduction objective |
| 04/22/2004 | US20040075882 Continuous direct-write optical lithography |
| 04/22/2004 | US20040075822 Exposure apparatus and its making method, substrate carrying method, device manufacturing method and device |
| 04/22/2004 | US20040075396 Plasma processing method and apparatus |
| 04/22/2004 | US20040075201 Shock-absorber units for use in a vacuum chamber for braking runaway moving objects |
| 04/22/2004 | US20040075064 Method for correcting a proximity effect, an exposure method, a manufacturing method of a semiconductor device and a proximity correction module |
| 04/22/2004 | US20040075063 Differential pumping system and exposure apparatus |
| 04/22/2004 | US20040074895 Imaging stabilization apparatus and method for high-performance optical systems |
| 04/22/2004 | US20040074868 Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process |
| 04/22/2004 | US20040074519 Metal safe stabilized stripper for removing cured polymeric layers and negative tone acrylic photoresists |
| 04/22/2004 | DE19508746B4 Belichtungsmaske Exposure mask |
| 04/22/2004 | DE10301626A1 System for rinsing optical unit used in semiconductor lithography to prevent contamination during transport |
| 04/22/2004 | DE10260631A1 Laser illuminating device for a mask of a wafer stepper lithography tool comprises a laser unit for producing a laser beam, a lens for focussing and controlling the laser beam |
| 04/22/2004 | DE10246828A1 Objective, in particular projection objective for microlithography used in the manufacture of semiconductor components has one housing for optical elements provided with mating surfaces |
| 04/22/2004 | DE10245621A1 Method for transferring measurement position of structure element to be formed on mask used in photolithographic structuring of semiconductor wafers employs measurement reference positions provided by end customer |
| 04/21/2004 | EP1411393A2 Determination of stray radiation in a lithographic projection apparatus |
| 04/21/2004 | EP1411392A1 Lithographic projection apparatus |
| 04/21/2004 | EP1411391A2 Method and apparatus for cooling a reticle during lithographic exposure |
| 04/21/2004 | EP1411390A1 Positive type radiosensitive composition and method for forming pattern |
| 04/21/2004 | EP1411389A1 Photoresists with hydroxylated, photoacid-cleavable groups |
| 04/21/2004 | EP1411388A1 A method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus |
| 04/21/2004 | EP1411375A1 Optical element having lanthanum fluoride film |
| 04/21/2004 | EP1411088A1 Polyamic acid resin composition |
| 04/21/2004 | EP1410696A1 Method for converting laser radiation into x-radiation, in particular, into extreme ultraviolet (euv) radiation using a plasma generated by the laser radiation |
| 04/21/2004 | EP1410436A2 Parallel, individually addressable probes for nanolithography |
| 04/21/2004 | EP1410416A2 Slit lens arrangement for particle beams |
| 04/21/2004 | EP1410110A2 Real time analysis of periodic structures on semiconductors |
| 04/21/2004 | EP1410109A1 Photosensitive resin composition |
| 04/21/2004 | EP1410108A2 Photosensitive resin composition |
| 04/21/2004 | EP1410107A1 Process of machining polymers using a beam of energetic ions |
| 04/21/2004 | EP1410106A1 Method of preparing optically imaged high performance photomasks |
| 04/21/2004 | EP1208146B1 Screen coating composition and method for applying same |
| 04/21/2004 | EP1076835B1 Broadband diffractive diffuser and associated methods |
| 04/21/2004 | EP1023638B1 Apparatus for a laser writer for complex microlithographic patterns with a delay circuit |
| 04/21/2004 | EP0993627B1 Device for transferring structures |
| 04/21/2004 | CN2612969Y Forme for collotype printing |
| 04/21/2004 | CN1491528A Method for producing wirings with rough conducting structures and at least one area with fine conducting structures |
| 04/21/2004 | CN1491427A Exposure system, and exposure method, and device production method |
| 04/21/2004 | CN1491374A Semiconductor developing agent |
| 04/21/2004 | CN1490867A 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof |
| 04/21/2004 | CN1490843A Integrated circuit producing method for eliminating sidelobe pattern |
| 04/21/2004 | CN1490675A Hoods with exposure meter for graduated exposion plate method and determining method thereof |
| 04/21/2004 | CN1490674A Hoods for graduated exposion plate method and determining method thereof |
| 04/21/2004 | CN1490673A Exposure system and method thereof |
| 04/21/2004 | CN1490672A Photoetching agent pattern thickening material, photoetching patterns and their forming process, semiconductor device and manufacture thereof |
| 04/21/2004 | CN1490400A Micro-carpillary tube covering method for controlling cell special distribution in shape and size, and use thereof |
| 04/21/2004 | CN1146958C Method for forming thin pattern on semiconductor device |
| 04/21/2004 | CN1146604C Fractionated novolak resin and photoresist composition therefrom |
| 04/21/2004 | CN1146602C Polymer and forming method of micro pattern using the same |
| 04/20/2004 | US6725114 Method and apparatus for automatically generating schedules for wafer processing within a multichamber semiconductor wafer processing tool |
| 04/20/2004 | US6724782 Femtosecond laser-electron x-ray source |
| 04/20/2004 | US6724712 Nanometer scale data storage device and associated positioning system |
| 04/20/2004 | US6724600 Combination current sensor and relay |
| 04/20/2004 | US6724548 Objective, in particular a projection lens for microlithography |
| 04/20/2004 | US6724530 Polarized light illuminator with a polarized light beam splitter |
| 04/20/2004 | US6724486 Helium- Neon laser light source generating two harmonically related, single- frequency wavelengths for use in displacement and dispersion measuring interferometry |
| 04/20/2004 | US6724479 Method for overlay metrology of low contrast features |
| 04/20/2004 | US6724466 Stage assembly including a damping assembly |
| 04/20/2004 | US6724465 Lithography device which uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range |
| 04/20/2004 | US6724464 Position detecting method and unit, optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method |
| 04/20/2004 | US6724463 Projection exposure apparatus and method |
| 04/20/2004 | US6724462 Capping layer for EUV optical elements |
| 04/20/2004 | US6724460 Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects |
| 04/20/2004 | US6724004 Method and apparatus for elimination of high energy ion from EUV radiating device |
| 04/20/2004 | US6724002 Multiple electron beam lithography system with multiple beam modulated laser illumination |
| 04/20/2004 | US6723780 Novolac polymer planarization films with high temperature stability |
| 04/20/2004 | US6723691 Comprising a tetralkylammonium hydroxide, an organic amine such as ethanolamine, gallic acid, a corrosion inhibitor such as ascorbic acid, and water; given alkalinity; cleaning copper containing microelectronics |
| 04/20/2004 | US6723614 Semiconductor device comprising layered positional detection marks and manufacturing method thereof |
| 04/20/2004 | US6723495 Water-developable negative-working ultraviolet and infrared imageable element |
| 04/20/2004 | US6723494 Conductor pattern and electronic component having the same |
| 04/20/2004 | US6723493 4-piperonyl- 2,6-bis(trichloromethyl)-s-triazine as free radical initiator; leucomalachite green as exposure indicating dye; oleophilic polymer and curable monomer |
| 04/20/2004 | US6723492 Lithographic printing plate precursor and method for the preparation of lithographic printing plate employing the same |
| 04/20/2004 | US6723490 Minimization of ablation in thermally imageable elements |
| 04/20/2004 | US6723488 Photoresist composition for deep UV radiation containing an additive |
| 04/20/2004 | US6723487 Method for producing article coated with patterned film and photosensitive composition |
| 04/20/2004 | US6723486 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 04/20/2004 | US6723485 Positive resist composition and process for forming resist pattern using same |
| 04/20/2004 | US6723484 Polyamide capable of forming polyoxazole or polyimide; and photoacid generator |
| 04/20/2004 | US6723483 Sulfonium salt compounds |
| 04/20/2004 | US6723482 Comprises diazo couplers; suppresses discoloration over time without decreasing light resistance of color developed portion; preservability |
| 04/20/2004 | US6723475 Multilayer |
| 04/20/2004 | US6723474 Forming photosensitive layer and transmission reducing layerin determination pattern; exposure to radiation; development |
| 04/20/2004 | US6723388 Method of depositing nanostructured films with embedded nanopores |
| 04/20/2004 | US6723250 Method of producing structured wafers |
| 04/20/2004 | US6723168 Spin-coater with self-cleaning cup and method of using |
| 04/20/2004 | US6722280 Method and system for simultaneous loading and unloading of substrates in platestter |
| 04/20/2004 | CA2255935C Photo-addressable substrates and photo-addressable side-group polymers with highly inducible double refraction |
| 04/15/2004 | WO2004032212A1 Stage device and exposure device |
| 04/15/2004 | WO2004032211A1 X-ray generator and exposure device |
| 04/15/2004 | WO2004032000A1 Methods and systems for process control of corner feature embellishment |
| 04/15/2004 | WO2004031867A2 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography |
| 04/15/2004 | WO2004031866A1 3-d holographic recording method and 3-d holographic recording system |
| 04/15/2004 | WO2004031862A1 Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
| 04/15/2004 | WO2004031861A2 Method for fabrication of diffractive optical elements for maskless lithography |
| 04/15/2004 | WO2004031860A2 Planar inorganic device |
| 04/15/2004 | WO2004031859A2 Comprehensive integrated lithographic process control system based on product design and yield feedback system |
| 04/15/2004 | WO2004031858A2 Resist system, use of a resist system and lithography method for the production of semiconductor elements |
| 04/15/2004 | WO2004031855A2 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same |
| 04/15/2004 | WO2004031854A2 Illumination system for a wavelength = 193 nm, comprising sensors for determining the illumination |
| 04/15/2004 | WO2004031831A1 Methods and systems for improved boundary contrast |