Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2014
01/08/2014CN103499895A Display panel, display device and manufacturing method of display panel
01/08/2014CN103499877A Large numerical aperture projection optical system
01/08/2014CN103499876A Large numerical aperture pure refraction type projection optical system
01/08/2014CN103499851A Glaring concave grating manufacture method
01/08/2014CN103497543A Modified nano silicon dioxide, preparation method thereof, pigment dispersoid, and photosensitive resin composition
01/08/2014CN103497325A Polyester compounds, preparation method thereof and photoresist composition
01/08/2014CN102566303B Method for automatically embedding plotting parameters into Barco plotter
01/08/2014CN102540729B Hard mask composition, method of forming pattern, and semiconductor integrated circuit device including pattern
01/08/2014CN102516458B Molecularly imprinted polymer specially combined with specified glycoprotein and preparation method and application of molecularly imprinted polymer
01/08/2014CN102509704B Method for manufacturing T-shaped gate by adopting single electron beam exposure
01/08/2014CN102472985B Resist stripping solution composition, and method for stripping resist by using same
01/08/2014CN102365314B Photosensitive polyimide and photosensitive resin composition comprising same
01/08/2014CN102239450B Multi-beam exposure scanning method and apparatus, and method for manufacturing printing plate
01/08/2014CN102043349B Exposure device and exposure method
01/08/2014CN101876790B Photocurable resin composition for transparent electrode formation and method for producing transparent electrode
01/08/2014CN101851434B 染料组合物 Dye composition
01/08/2014CN101809502B Thick film resists
01/08/2014CN101778818B Aromatic sulfonium salt compound
01/07/2014US8624252 Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and el television
01/07/2014US8624205 Charged particle beam writing apparatus and device production method
01/07/2014US8623590 Pattern forming process
01/07/2014US8623589 Bottom antireflective coating compositions and processes thereof
01/07/2014US8623587 Residue removing liquid composition and method for cleaning semiconductor element using same
01/07/2014US8623586 Method for on-press developable lithographic plate utilizing light-blocking material
01/07/2014US8623585 Positive-type photoresist composition
01/07/2014US8623584 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
01/03/2014WO2014004828A1 Developable bottom antireflective coating composition and pattern forming method using thereof
01/03/2014WO2014003207A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, and semiconductor device
01/03/2014WO2014003206A1 Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the method
01/03/2014WO2014003134A1 Developing solution composition for lithographic printing plate precursor and method for manufacturing lithographic printing plate
01/03/2014WO2014003111A1 Photosensitive resin composition, cured product, method for producing cured product, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, and touch panel display device
01/03/2014WO2014003023A1 Composition for pattern formation and pattern forming method
01/03/2014WO2014002861A1 Photosensitive resin composition, method for producing cured film, cured film, organic el display device, and liquid crystal display device
01/03/2014WO2014002835A1 Method for concentrating processing waste liquid and method for recycling processing waste liquid
01/03/2014WO2014002810A1 Polymer compound, resin composition for photoresists, and method for producing semiconductor
01/03/2014WO2014002808A1 Resist mask processing method
01/03/2014WO2014002690A1 Curable composition, cured film and display element
01/03/2014WO2014002679A1 Pattern formation method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
01/03/2014WO2014002312A1 Pattern drawing device, pattern drawing method
01/03/2014WO2014002294A1 Alkaline-developable photosensitive resin composition, dry film, cured article, and printed wiring board
01/03/2014WO2014002151A1 Resist stripping agent
01/03/2014WO2014001071A2 Lithographic apparatus
01/03/2014WO2014000998A1 Photon source, metrology apparatus, lithographic system and device manufacturing method
01/03/2014WO2014000970A1 Projection exposure apparatus for projection lithography
01/03/2014WO2014000763A1 Method for designing an illumination optics and illumination optics
01/03/2014WO2014000380A1 Mask plate
01/03/2014WO2014000316A1 Photomask for curing frame adhesive and method for manufacturing liquid crystal display panel
01/02/2014US20140004712 Developable bottom antireflective coating composition and pattern forming method using thereof
01/02/2014US20140004468 Multiple-grid exposure method
01/02/2014US20140004467 Method of forming resist pattern and negative tone-development resist composition
01/02/2014US20140004466 Photosensitive Resin Laminate and Thermal Processing of the Same
01/02/2014US20140004465 Resist underlayer film forming composition and method for forming resist pattern using the same
01/02/2014US20140004463 Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound
01/02/2014US20140004320 Photopatterning
01/02/2014US20140001475 Manufacturing method of array substrate, array substrate and lcd device
01/02/2014DE102013007913A1 Photosäureerzeuger, Photolack, der den Photosäureerzeuger umfasst, und beschichteter Gegenstand, der diesen umfasst Photoacid generators, photo-resist comprising the photoacid generator, and coated article comprising these
01/02/2014DE102012211256A1 Projektionsbelichtungsanlage für die Projektionslithographie Projection exposure apparatus for projection lithography
01/01/2014EP2680074A1 Process of producing lithographic printing plate
01/01/2014EP2680073A1 Organic light-emitting diode display panel and manufacturing method thereof
01/01/2014EP2680072A1 Method and system for creation of binary spatial filters
01/01/2014EP2679962A1 Position measuring device
01/01/2014EP2678743A1 Grazing incidence reflector, lithographic apparatus, method for manufacturing grazing incidence reflector and method for manufacturing a device
01/01/2014CN203376558U Device carrying out uniformity compensation in scanning direction
01/01/2014CN203376557U Film thinning processing device for corrosion resistant layer
01/01/2014CN103492952A Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method
01/01/2014CN103492951A Enhanced multi-photon imaging resolution method
01/01/2014CN103492950A Photocurable/thermosetting resin composition
01/01/2014CN103492949A Novel photosensitive resin composition and use thereof
01/01/2014CN103492948A Photoactive compound and a light-sensitive resin composition comprising same
01/01/2014CN103492947A Selectively etching of a polymer matrix on pet
01/01/2014CN103492928A Dispensing method and device for dispensing
01/01/2014CN103492915A Color curable composition for color filters, color cured film, method for producing color filter, color filter, and display device
01/01/2014CN103489789A Ceramic substrate dual surface photolithography technique and structure
01/01/2014CN103489767A Method for manufacturing high-evenness grid lines
01/01/2014CN103488064A Back side alignment apparatus and back side alignment substrate pasting method
01/01/2014CN103488062A Wedge-shaped prism focusing device capable of bidirectionally sliding
01/01/2014CN103488061A Adjustment and design method for lighting system matching multiple objective lens in extreme ultraviolet lithography machine
01/01/2014CN103488060A Method for determining photoetching exposure defocusing amount
01/01/2014CN103488059A Surface plasma functional structure device and nanolithography method for low-energy electrons
01/01/2014CN103488058A Method for manufacturing grid line with high uniformity through double exposure
01/01/2014CN103488057A Self-counterpoint exposure orientation equipment and process method for manufacturing phase difference plate
01/01/2014CN103488056A Manufacturing method, illumination method and exposure method of illumination optical device and device manufacturing method
01/01/2014CN103488055A Exposure apparatus and exposure method
01/01/2014CN103488054A 曝光装置及曝光方法 Exposure apparatus and exposure method
01/01/2014CN103488053A 曝光设备和装置制造方法 Exposure apparatus and device manufacturing method
01/01/2014CN103488052A 曝光装置 Exposure device
01/01/2014CN103488051A Preparation method of composite structure of photoresist film and substrate for LIGA (Lithographie, Galvanoformung and Abformung) technology
01/01/2014CN103488050A Colored photosensitive resin composition
01/01/2014CN103488049A Nanometer sliver photoresist composite material and method for preparing sliver conducting wire or inductor from the same
01/01/2014CN103488048A 光致抗蚀剂组合物 The photoresist composition
01/01/2014CN103488047A Coloring composition, color filter and display device
01/01/2014CN103488046A Nano imprint lithography device and method thereof
01/01/2014CN103488045A Ion implanted barrier layer making method
01/01/2014CN103488043A Pattern generation method
01/01/2014CN103488042A Method for high volume e-beam lithography
01/01/2014CN103488035A Holographic directional scatter screen and method and device for manufacturing holographic directional scatter screen
01/01/2014CN103487971A Color film substrate, touch display device and method for manufacturing color film substrate
01/01/2014CN103483325A Synthetic method of novel diazonaphthoquinone sulfonate derivative
01/01/2014CN103483241A Diazonaphthoquinone sulfonate derivative
01/01/2014CN102576192B 感光性树脂组合物 The photosensitive resin composition
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