| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/28/2004 | EP1412962A2 Pattern generation method and apparatus using cached cells of hierarchical data |
| 04/28/2004 | EP1412818A1 Method for developing lithographic printing plate precursors using a coating attack-suppressing agent |
| 04/28/2004 | EP1412816A2 Alternating phase-shift mask inspection method and apparatus |
| 04/28/2004 | EP1412262A1 Smif container including an electrostatic dissipative reticle support structure |
| 04/28/2004 | EP1412182A2 Laser spectral engineering for lithographic process |
| 04/28/2004 | EP1057079B1 Apparatus used for extreme ultraviolet lithography comprising a filter for suppressing undesired atomic and microscopic particles from a radiation source and filter used in such an apparatus |
| 04/28/2004 | EP1000385B1 Method and system for producing activating light absorbing lenses |
| 04/28/2004 | CN1493020A 保护膜组合物 Protective film composition |
| 04/28/2004 | CN1492479A Method for producing integrated circuit |
| 04/28/2004 | CN1492478A Method for producing semiconductor element |
| 04/28/2004 | CN1492477A Crystallizing device, crystallizing method and phase exchanging mechanism |
| 04/28/2004 | CN1492285A Optical mask with alignment measurnig mark and its detecting method |
| 04/28/2004 | CN1492284A Method for producing photoetching projector and device with optical element and its device |
| 04/28/2004 | CN1492283A Light sensitive colouring composition and filter |
| 04/28/2004 | CN1492265A Colour filter plate and its producing method and liquid crystal display device including colour filter plate |
| 04/28/2004 | CN1492241A Reflector for exposure device, reflective mask for exposure device, exposure device and pattern forming method |
| 04/28/2004 | CN1147925C Organic removal process |
| 04/28/2004 | CN1147758C Photosensitive quinolone compounds and process of preparation |
| 04/28/2004 | CN1147621C Figure forming method |
| 04/27/2004 | US6728337 Star pinch plasma source of photons or neutrons |
| 04/27/2004 | US6728043 Microlithographic illumination method and a projection lens for carrying out the method |
| 04/27/2004 | US6728037 Multilayer-coated reflective mirrors for X-ray optical systems, and methods for producing same |
| 04/27/2004 | US6728021 Optical component and method of inducing a desired alteration of an optical property therein |
| 04/27/2004 | US6727992 Method and apparatus to reduce effects of sheared wavefronts on interferometric phase measurements |
| 04/27/2004 | US6727989 Accuracy |
| 04/27/2004 | US6727982 Illumination system with plural light sources, and exposure apparatus having the same |
| 04/27/2004 | US6727981 Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method |
| 04/27/2004 | US6727980 Apparatus and method for pattern exposure and method for adjusting the apparatus |
| 04/27/2004 | US6727978 Projection exposure apparatus and projection exposure method |
| 04/27/2004 | US6727977 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 04/27/2004 | US6727976 Adjusting projection optical system according to detection of interference fringe |
| 04/27/2004 | US6727975 Device and method of correcting exposure defects in photolithography |
| 04/27/2004 | US6727964 Color liquid crystal panel and color liquid crystal display apparatus |
| 04/27/2004 | US6727731 Energy control for an excimer or molecular fluorine laser |
| 04/27/2004 | US6727658 Electron beam generating apparatus and electron beam exposure apparatus |
| 04/27/2004 | US6727565 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 04/27/2004 | US6727507 Electron beam proximity exposure apparatus and method |
| 04/27/2004 | US6727179 Method for creating an integrated circuit stage wherein fine and large patterns coexist |
| 04/27/2004 | US6727173 Semiconductor processing methods of forming an utilizing antireflective material layers, and methods of forming transistor gate stacks |
| 04/27/2004 | US6727126 Masking member for forming fine electrode and manufacturing method therefor, method for forming electrode, and field effect transistor |
| 04/27/2004 | US6727049 Radiation sensitive compositions and methods |
| 04/27/2004 | US6727048 Selectively removing a lacquer layer so that so that the remaining lacquer is disposed in the sub-pixel areas of a display device, resulting in a smooth, highly reflective aluminum layer that is electrically and mechanically robust |
| 04/27/2004 | US6727047 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist |
| 04/27/2004 | US6727046 Process for making a periodic profile |
| 04/27/2004 | US6727045 Spraying an aqueous developing liquid at a temperature of not lower than 40 degrees c. under liquid at a temperature of not lower than 40 degrees c. under a high pressure to a photosensitive resin letterpress printing plate after exposure |
| 04/27/2004 | US6727044 Method for producing lithographic printing plate, lithographic printing original plate for laser scan exposure, and photopolymerizable composition |
| 04/27/2004 | US6727043 Solid imaging compositions for preparing polyethylene-like articles |
| 04/27/2004 | US6727042 Photosensitive resin composition |
| 04/27/2004 | US6727040 Positive resist composition to be irradiated with one of an electron beam and X-ray |
| 04/27/2004 | US6727039 Positive photoresist composition |
| 04/27/2004 | US6727038 Useful as thin film dielectrics in electronic applications such as multichip modules, integrated circuits and printed circuit boards |
| 04/27/2004 | US6727037 Image-formation material and infrared absorber |
| 04/27/2004 | US6727036 Positive-working radiation-sensitive composition |
| 04/27/2004 | US6727035 Photocurable liquid resin composition |
| 04/27/2004 | US6727034 High sensitivity and high resolution; black matrix and phosphor screen for a color picture tube |
| 04/27/2004 | US6727033 Positive resist composition |
| 04/27/2004 | US6727032 Useful in micro-processing using various radiations, e.g., far-ultraviolet radiation such as krf excimer laser or arf excimer laser, x rays such as synchrotron radiation, charged particle radiation such as electron beam, etc. |
| 04/27/2004 | US6727031 Support and a recording layer whose solubility is altered by irradiation with infrared laser; used for printing plates, color filters, photoresists |
| 04/27/2004 | US6727028 Separating masking pattern into zones; overcoating semiconductor wafer |
| 04/27/2004 | US6727027 Seed layer is formed of a chromium material containing atleast one of oxygen, nitrogen and carbon, disposed between the transparent substrate and the light-shielding film or the antireflective film |
| 04/27/2004 | US6727025 Photomask and exposure method |
| 04/27/2004 | US6727024 Polyalkylene oxide polymer composition for solid polymer electrolytes |
| 04/27/2004 | US6726829 Joining tube edges in flat pattern; coating with photosensitive resin; rotation; cardiovascular disorders |
| 04/27/2004 | US6726814 Process for producing optical article |
| 04/27/2004 | US6726800 Ashing apparatus, ashing methods, and methods for manufacturing semiconductor devices |
| 04/27/2004 | US6726433 Apparatus for loading and unloading a supply of plates in an automated plate handler |
| 04/27/2004 | US6726077 Ticket dispensing modules and method |
| 04/22/2004 | WO2004034448A1 Exposure device, exposure system, recipe generation system, and device manufacturing method |
| 04/22/2004 | WO2004034447A1 Ultra-short ultraviolet optical system-use reflection mirror, ultra-short ultraviolet optical system, application method for ultra-short ultraviolet optical system, production method for ultra-short ultraviolet optical system, ultra-short ultraviolet exposure system, and application method for ultra-short ultraviolet exposu |
| 04/22/2004 | WO2004034435A2 Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties |
| 04/22/2004 | WO2004034424A2 A method and a mold to arrange features on a substrate to replicate features having minimal dimensional variability |
| 04/22/2004 | WO2004034391A1 Method of producing optical disk-use original and method of producing optical disk |
| 04/22/2004 | WO2004034149A1 Casing for a projection lens used for microphotography provided with adjusting surface for mounting and adjusting said casing |
| 04/22/2004 | WO2004034148A1 Composition for forming antireflection film for lithography |
| 04/22/2004 | WO2004034147A1 Photosensitive resin composition, and, photosensitive element, method for forming resist pattern and printed wiring board using the composition |
| 04/22/2004 | WO2004034146A2 Lighting system comprising a device for adjusting the light intensity |
| 04/22/2004 | WO2004034132A2 Radiation welding and imaging apparatus and method for using the same |
| 04/22/2004 | WO2004033206A1 Thermally sensitive multilayer imageable element |
| 04/22/2004 | WO2004033190A2 Film having a patterned fibrillar surface, and method and apparatus for making the film |
| 04/22/2004 | WO2004027521A3 A multi-axis projection imaging system |
| 04/22/2004 | WO2003090985A8 Device and method for transferring a pattern to a substrate |
| 04/22/2004 | WO2003072614A3 Thiol compound, photopolymerization initiator composition and photosensitive composition |
| 04/22/2004 | WO2003071355A3 Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same |
| 04/22/2004 | US20040077898 Contacting a alkyladamantyl halide with an alkali compound in the presence of a dissolving organic solvent and distilling |
| 04/22/2004 | US20040077173 Using water soluble bottom anti-reflective coating |
| 04/22/2004 | US20040076912 Method and apparatus for removing organic films |
| 04/22/2004 | US20040076911 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance |
| 04/22/2004 | US20040076910 Stripping method |
| 04/22/2004 | US20040076909 Layer of a liquid photocurable composition of microcapsules containing a photocolorable material is cured by light and selected areas are irradiated with light of a different dose to form the desired image |
| 04/22/2004 | US20040076906 Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| 04/22/2004 | US20040076905 Triarylsulfonium salts in which at least one ring is t-alkoxy substituted as acid generators for high energy radiation-responsive materials containing t-butoxycarbonyl-protected polyvinylphenols |
| 04/22/2004 | US20040076904 Planographic printing plate precursor |
| 04/22/2004 | US20040076903 Cyclic olefin-based resist compositions having improved image stability |
| 04/22/2004 | US20040076902 Resin soluble in acidified aqueous solution (e.g., 1-ethoxy-ethyl-protected polyvinylphenol or novolak); quaternary ammonium salt stabilizer; 2-(hydrocarbylsulfonyloxyimino)-5-(alpha-cyano-o -methylbenzylidene)dihydrothiophene |
| 04/22/2004 | US20040076892 Having some of the cuts on the complementary mask 180-degrees out of phase with one another helps cuts that are close to one another to print better and prevents undesirable deterioration of the features printed using the phase mask |
| 04/22/2004 | US20040076891 Identifying selected segments that do not abut any feature to be printed; first OPC on selected segments; second OPC to correct segments that do abut features; third OPC on an associated phase shifting mask |
| 04/22/2004 | US20040076889 Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production |
| 04/22/2004 | US20040076757 Templated monolayer polymerization and replication |
| 04/22/2004 | US20040076749 Method for coating low viscosity materials |
| 04/22/2004 | US20040075895 Apparatus for method for immersion lithography |