| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/04/2004 | US6730916 Electron beam lithography apparatus |
| 05/04/2004 | US6730769 Novolak resin, production process thereof and positive photoresist composition using the novolak resin |
| 05/04/2004 | US6730608 Full image exposure of field with alignment marks |
| 05/04/2004 | US6730599 Supplying treatment solution to substrate mounted on a holding member in states of a gas being supplied into treatment chamber and of atmosphere in treatment chamber being exhausted; measuring temperature of front face of substrate |
| 05/04/2004 | US6730458 Forming arf resist pattern, reducing the size of pattern openings by exposing resist pattern to radiation from an vuv (vacuum ultraviolet) excimer laser or e-beam radiation during thermal treatment |
| 05/04/2004 | US6730457 Digital waterless lithographic printing plate having high resistance to water-washable inks |
| 05/04/2004 | US6730455 Developing a presensitized plate comprising a photo-polymerizable light sensitive layer with a liquid developer to form a negative image; includes an oxygen shielding layer containing polyvinyl alcohol and polyvinyl pyrrolidone |
| 05/04/2004 | US6730454 Antireflective SiO-containing compositions for hardmask layer |
| 05/04/2004 | US6730453 Polysilsesquioxane polymers containing carboxy or hydroxy groups, and a photoacid generator |
| 05/04/2004 | US6730452 To generate resist images on a substrate in the manufacture of integrated circuits |
| 05/04/2004 | US6730451 Fluoroacrylate polymers; transparency; preventing negative working; low absorption of fluorine excimer laser light; high transmittance to vacuum ultraviolet radition |
| 05/04/2004 | US6730447 Manufacturing system in electronic devices |
| 05/04/2004 | US6730444 Needle comb reticle pattern for critical dimension and registration measurements using a registration tool and methods for using same |
| 05/04/2004 | US6730443 Patterning methods and systems using reflected interference patterns |
| 05/04/2004 | US6730409 Promoting adhesion between a polymer and a metallic substrate |
| 05/04/2004 | US6730399 A fibers comprising the particle scattering colorants and optional electronic colorants; particles provide no shrinkage during resin curing; nonfading, plastic can be recycling, stable to sunlight, and nontoxic |
| 05/04/2004 | US6730256 Stereolithographic patterning with interlayer surface modifications |
| 05/04/2004 | US6729546 System for reading two-dimensional images using ambient and/or projected light |
| 05/04/2004 | US6729237 Device for removing image recording material |
| 05/04/2004 | US6729234 Actuation system in an imaging system |
| 04/29/2004 | WO2004036629A1 Spin-coating methods and apparatuses for spin-coating, including pressure sensor |
| 04/29/2004 | WO2004036316A1 Optical arrangement and method of specifying and performing a deformation of an optical surface of an optical element being part of the optical arrangement |
| 04/29/2004 | WO2004036315A1 Photoresist base material, method for purification thereof, and photoresist compositions |
| 04/29/2004 | WO2004036314A2 Acid generating agents and their use in processes for imaging radiation-sensitive elements |
| 04/29/2004 | WO2004036313A1 Flexographic printing plate, flexographic printing device, production method for flexographic printing plate and production method for printing matter |
| 04/29/2004 | WO2004036312A2 Irradiation device for testing objects coated with light-sensitive paint |
| 04/29/2004 | WO2004036311A2 Anti-reflective compositions comprising triazine compounds |
| 04/29/2004 | WO2004036264A2 Polymers, methods of use thereof, and methods of decomposition thereof |
| 04/29/2004 | WO2004035641A1 Process for production of fluoropolymers and photoresist composition |
| 04/29/2004 | WO2004035546A1 Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same |
| 04/29/2004 | WO2004035319A1 Photosensitive resin composition for lithographic printing forme and original forme for lithographic printing |
| 04/29/2004 | WO2004035105A2 Polymer microneedles |
| 04/29/2004 | WO2004010225A3 Machine for exposing printed circuit boards |
| 04/29/2004 | WO2003096123A8 Reversal imprint technique |
| 04/29/2004 | WO2003046628A8 Method for fabricating chirped fiber bragg gratings |
| 04/29/2004 | WO2002036652A9 Photopatternable sorbent and functionalized films |
| 04/29/2004 | US20040083444 Pattern transfer mask related to formation of dual damascene structure and method of forming dual damascene structure |
| 04/29/2004 | US20040083439 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| 04/29/2004 | US20040082315 Mobile terminal managing schedule and mobile communication system using the same |
| 04/29/2004 | US20040082177 Method of forming isolation films in semiconductor devices |
| 04/29/2004 | US20040082173 Micro pattern forming method and semiconductor device manufacturing method |
| 04/29/2004 | US20040082170 Method for forming fine pattern of semiconductor device |
| 04/29/2004 | US20040082163 Film formation method as well as device manufactured by employing the same, and method of manufacturing device |
| 04/29/2004 | US20040082139 Method for manufacturing a semiconductor device and semiconductor device with overlay mark |
| 04/29/2004 | US20040081924 Composition for releasing a resist and method for manufacturing semiconductor device using the same |
| 04/29/2004 | US20040081923 Method of preventing repeated collapse in a reworked photoresist layer |
| 04/29/2004 | US20040081922 Photoresist stripper composition |
| 04/29/2004 | US20040081921 Method for manufacturing conductive pattern substrate |
| 04/29/2004 | US20040081920 Self-aligning contacts for stacked electronics |
| 04/29/2004 | US20040081919 Method for producing recording medium, method for producing stamper of recording medium, apparatus for producing recording medium, and apparatus for producing stamper of recording medium |
| 04/29/2004 | US20040081917 Method of manufacturing an electronic device and a semiconductor integrated circuit device |
| 04/29/2004 | US20040081916 Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion |
| 04/29/2004 | US20040081914 Positive sensitive resin composition and a process for forming a resist pattern therewith |
| 04/29/2004 | US20040081913 Under layer has a thickness of 0.1-5.0 mu m, contains metal oxide particles with a particle size of 1-20 nm in an amount of not less than 30% by weight, and has cracks with a groove width of less than 1 mu m. |
| 04/29/2004 | US20040081912 Particularly polymethylsilazane or polyphenylsilazane, and an optically acid-generating agent. |
| 04/29/2004 | US20040081910 Polymerizable composition, polymer, resist, and process for electron beam lithography |
| 04/29/2004 | US20040081909 Formed by adding benzoquinone to an organic solvent solution of a novolak resin; good storage stability, and no fluctuation in characteristics between production lots. |
| 04/29/2004 | US20040081896 Mask repair using multiple exposures |
| 04/29/2004 | US20040081798 Hardened nano-imprinting stamp |
| 04/29/2004 | US20040081762 Applying to substrate a photosensitive resin composition containing polysilane, photosensitive radical generator, oxidizing agent, alkoxy containing containing silicone compound, exposing to radiation, plating |
| 04/29/2004 | US20040081351 Multi-layer printed circuit board fabrication system and method |
| 04/29/2004 | US20040081328 Hearing aid |
| 04/29/2004 | US20040080738 Method of photolithographic exposure dose control as a function of resist sensitivity |
| 04/29/2004 | US20040080737 Off-axis levelling in lithographic projection apparatus |
| 04/29/2004 | US20040080736 Imaging method for manufacture of microdevices |
| 04/29/2004 | US20040080735 Plain surface stage apparatus |
| 04/29/2004 | US20040080734 Method and apparatus for forming pattern on thin substrate or the like |
| 04/29/2004 | US20040080733 Projection exposure method with luminous flux distribution |
| 04/29/2004 | US20040080732 Near-field photomask, near-field exposure apparatus using the photomask, dot pattern forming method using the exposure apparatus, and device manufactured using the method |
| 04/29/2004 | US20040080730 System and method for clamping a device holder with reduced deformation |
| 04/29/2004 | US20040080727 EUV exposure apparatus with cooling device to prevent overheat of electromagnetic motor in vacuum |
| 04/29/2004 | US20040080009 Fabrication of semiconductor devices using anti-reflective coatings |
| 04/29/2004 | US20040079940 Substrate and organic electroluminescence device using the substrate |
| 04/29/2004 | US20040079902 EUV source box |
| 04/29/2004 | US20040079898 Cooling of voice coil motors in lithographic projection apparatus |
| 04/29/2004 | US20040079883 Electron beam irradiation apparatus, electron beam exposure apparatus, and defect detection method |
| 04/29/2004 | US20040079730 Plastic male mold for fabricating microstructures and nanostructures using imprint lithography |
| 04/29/2004 | US20040079729 Process for etching metal layer |
| 04/29/2004 | US20040079727 Method and compositions for hardening photoresist in etching processes |
| 04/29/2004 | US20040079518 Method and apparatus for cooling a reticle during lithographic exposure |
| 04/29/2004 | DE4426069B4 Laser-Zeicheneinrichtung Laser Tag facility |
| 04/29/2004 | DE19906398B4 Verfahren und Vorrichtung zum Behandeln von Substraten Method and apparatus for treating substrates |
| 04/29/2004 | DE10345895A1 Production of an optical element made from a fluoride crystal for an optical system of an illuminating device comprises determining the crystal orientation on the lateral surface |
| 04/29/2004 | DE10301799A1 Light projection system especially for microlithography and process for homogenizing the optical properties of a component has optical corrector unit |
| 04/29/2004 | DE10295954T5 Belichtungsverfahren unter Verwendung einer komplementär unterteilten Maske, Belichtungsvorrichtung, Halbleiterbauteil und Verfahren zum Herstellen desselben Of the same exposure method using a complementarily divided mask, exposure apparatus, semiconductor device and methods for making |
| 04/29/2004 | DE10248849A1 Vorrichtung zur Aufnahme eines Strahlteilerelements An apparatus for receiving a beam splitter element |
| 04/29/2004 | DE10247954A1 Correction process for a total image error of an imaging group optical component separates symmetrical and asymmetrical components and selects degrees of freedom |
| 04/29/2004 | DE10247011A1 Mehrschichtfolie mit UV-Lackschicht Multilayer film with UV paint coating |
| 04/28/2004 | EP1414076A2 Method of forming planar color filters in an image sensor |
| 04/28/2004 | EP1413963A2 Mobile communication system using mobile terminal to query, download, and manage parts of a schedule |
| 04/28/2004 | EP1413928A2 Apparatus and method for scanning exposure |
| 04/28/2004 | EP1413927A1 Method for forming fine pattern |
| 04/28/2004 | EP1413926A2 Photosensitive resin composition and printed wiring board |
| 04/28/2004 | EP1413925A2 Photosensitive composition and photosensitive lithographic printing plate |
| 04/28/2004 | EP1413924A1 Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern |
| 04/28/2004 | EP1413909A1 Projection optical system and exposure device having the projection optical system |
| 04/28/2004 | EP1413908A2 Projection optical system and exposure apparatus equipped with the projection optical system |
| 04/28/2004 | EP1413870A1 Optical member for optical lithography and evaluation method therefor |
| 04/28/2004 | EP1413432A1 Heat-sensitive imaging element for providing lithographic printing plates |
| 04/28/2004 | EP1412969A2 Method for the production of a self-adjusted structure on a semiconductor wafer |