| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/06/2004 | WO2004037799A1 Improvement in the storage stability of photoinitiators |
| 05/06/2004 | WO2004008249A3 Compositions and method for removing photoresist and/or resist residue |
| 05/06/2004 | WO2004004025A3 Method for the economical structuring of conducting polymers by means of defining hydrophilic and hydrophobic regions |
| 05/06/2004 | WO2003100826A3 Lithography laser with beam delivery and beam pointing control |
| 05/06/2004 | WO2003053845A3 Chemical functionalization nanolithography |
| 05/06/2004 | WO2002073699A9 Nanofabrication |
| 05/06/2004 | WO2002069039A9 Photoacid generator systems for short wavelength imaging |
| 05/06/2004 | US20040088675 Method of and computer program product for designing patterns, and method of manufacturing semiconductor device |
| 05/06/2004 | US20040088149 Method and apparatus for performing OPC using model curvature |
| 05/06/2004 | US20040088071 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device |
| 05/06/2004 | US20040087694 Positive type resist composition |
| 05/06/2004 | US20040087690 Acid generators used as photoinitiators, acid catalysts for photoresists in microlithography and/or photopolymerization |
| 05/06/2004 | US20040087687 Photocurable compositions with phosphite viscosity stabilizers |
| 05/06/2004 | US20040087676 Film formation method |
| 05/06/2004 | US20040087457 Including alcohol; solubilizing inorganic salts and polar organic compounds; damage-free, residue-free cleaning |
| 05/06/2004 | US20040087183 Selectively growing a polymeric material on a semiconductor substrate |
| 05/06/2004 | US20040087181 Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof |
| 05/06/2004 | US20040087177 Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same |
| 05/06/2004 | US20040087176 Forming a self-aligned pattern on an existing pattern on a substrate by coating a masking material to the substrate and allowing a portion of the masking material to preferentially attach to portions of the existing pattern; including metal elements and dielectrics; microelectronics; simplifification |
| 05/06/2004 | US20040086809 Controlling resist profiles through substrate modification |
| 05/06/2004 | US20040086806 Applying photosensitive resin containing polysilane to substrate; exposing a region of photosensitive layer to a radiation and performing development to form channel portion that corresponds to metal pattern; contacting with liquid |
| 05/06/2004 | US20040086805 For use in deep-etch x-ray lithography, electroforming and molding |
| 05/06/2004 | US20040086804 Forming a resist pattern on a microelectronic substrate; forming a coating layer comprising a water-soluble resin on resist pattern, hardening intermixed layer; and removing the non-intermixed coating layer from hardened intermixed layer |
| 05/06/2004 | US20040086803 Non-resonant two-photon absorbing material, non-resonant two-photon emitting material, and method for inducing absorption or generating emission of non-resonant two photons by using the material |
| 05/06/2004 | US20040086800 Photoactive adhesion promoter |
| 05/06/2004 | US20040086793 High resolution overlay alignment systems for imprint lithography |
| 05/06/2004 | US20040086792 Lithographic mask for semiconductor devices with a polygonal-section etch window, in particular having a section of at least six sides |
| 05/06/2004 | US20040086791 Reference data is created from corrected photomask design data that is corrected on the basis of an exposure transfer pattern, and sensor data is created by measuring shape of the photomask based on the corrected photomask design data |
| 05/06/2004 | US20040086789 Manufacturing method of photomask and photomask |
| 05/06/2004 | US20040086787 Alternating aperture phase shift photomask having plasma etched isotropic quartz features |
| 05/06/2004 | US20040086786 Radiation correction method for electron beam lithography |
| 05/06/2004 | US20040086709 For transferring a patterned polyelectrolyte multilayer from a first surface to second surface |
| 05/06/2004 | US20040086287 Coating film layer moisture adjusting device and planographic printing plate producing method |
| 05/06/2004 | US20040086080 Erosion reduction for EUV laser produced plasma target sources |
| 05/06/2004 | US20040085862 Near-field optical probe and optical near-field generator |
| 05/06/2004 | US20040085645 Illumination system and exposure apparatus and method |
| 05/06/2004 | US20040085641 Achromatic fresnel optics based lithography for short wavelength electromagnetic radiations |
| 05/06/2004 | US20040085548 Interference system and semiconductor exposure apparatus having the same |
| 05/06/2004 | US20040085545 Cyclic error compensation in interferometry systems |
| 05/06/2004 | US20040085524 Device manufacturing apparatus |
| 05/06/2004 | US20040085436 Image amplification for laser systems |
| 05/06/2004 | US20040085024 Method and device for rastering source redundancy |
| 05/06/2004 | US20040084637 Electron projection lithography apparatus using secondary electrons |
| 05/06/2004 | US20040084632 Illumination system and exposure apparatus and method |
| 05/06/2004 | US20040084412 Plasma ashing process |
| 05/06/2004 | US20040084397 Color wheel fabrication method |
| 05/06/2004 | US20040083966 Support device and manufacturing method thereof, stage device, and exposure apparatus |
| 05/06/2004 | US20040083953 Spin-coating methods and apparatus for spin-coating, including pressure sensor |
| 05/06/2004 | EP1416548A2 Organic gate insulating film and organic thin film transistor using the same |
| 05/06/2004 | EP1416330A2 Control of critical dimension (CD) |
| 05/06/2004 | EP1416329A1 Lithographic apparatus and device manufacturing method |
| 05/06/2004 | EP1416328A2 Inspection method and device manufacturing method |
| 05/06/2004 | EP1416327A1 Inspection method and device manufacturing method |
| 05/06/2004 | EP1416326A1 Method, inspection system, computer program and reference substrate for detecting mask defects |
| 05/06/2004 | EP1416325A1 A master and method of manufacturing a master for molds used to produce microstructured devices |
| 05/06/2004 | EP1416003A1 RESIN COMPOSITION, COMPOSITION FOR SOLDER RESIST, AND CURED ARTICLE OBTAINED THEREFROM |
| 05/06/2004 | EP1415974A1 Process for production of fluorine-containing norbornene derivatives |
| 05/06/2004 | EP1415968A1 Process for producing ether compound |
| 05/06/2004 | EP1415825A2 Printing plate material |
| 05/06/2004 | EP1415803A1 Conveying device |
| 05/06/2004 | EP1415200A1 Method for printing a near-field photoinduced stable structure and optical fibre tip therefor |
| 05/06/2004 | EP1415199A2 Collector with fastening devices for fastening mirror shells |
| 05/06/2004 | EP1415198A2 Lithographic template |
| 05/06/2004 | EP1415197A2 Optical proximity correction for phase shifting photolithographic masks |
| 05/06/2004 | EP1414878A1 Process and composition for rapid mass production of holographic recording article |
| 05/06/2004 | EP1414722A1 Reticle protection and transport |
| 05/06/2004 | EP1263606B1 Dual-layer self-contained recording paper incorporating hollow microspheres |
| 05/06/2004 | EP0944482B1 Apparatus and method for recovering photoresist developers and strippers |
| 05/06/2004 | DE10246788A1 Schutzvorrichtung für lithographische Masken und Verfahren zu ihrer Verwendung Protection device for lithographic masks and methods for their use |
| 05/06/2004 | DE10147880B4 Verfahren zur Messung einer charakteristischen Dimension wenigstens einer Struktur auf einem scheibenförmigen Objekt in einem Meßgerät A method for measuring a characteristic dimension of at least one structure on a disc-shaped object in a measuring instrument |
| 05/06/2004 | CA2501438A1 Improvement in the storage stability of photoinitiators |
| 05/05/2004 | CN1494819A Extreme ultraviolet generating device, exposure device using the same and semiconductor mfg. method |
| 05/05/2004 | CN1494733A High-pressure treatment method |
| 05/05/2004 | CN1494732A Process for making sub-lithographic photoresist features |
| 05/05/2004 | CN1494665A Method and apparatus for spatial light modulation |
| 05/05/2004 | CN1494663A Refractive index grating mfg. process |
| 05/05/2004 | CN1494171A 膜形成方法 Film forming method |
| 05/05/2004 | CN1494112A Semiconductor device mfg. method |
| 05/05/2004 | CN1494090A Photosensitive conductive paste and conductive body pattern formed thereby |
| 05/05/2004 | CN1493925A Exposure device and method for transfering photomask and workpiece |
| 05/05/2004 | CN1493924A Projection optical system, exposure device and its assembly mfg. method |
| 05/05/2004 | CN1493923A Inspecting method and photomask |
| 05/05/2004 | CN1493922A Reflection refraction photoetching system having light lid table vertical to crystal wafer desk and method |
| 05/05/2004 | CN1493921A Photoetching equipment having vacuum mask plate store connected with vacuum chamber |
| 05/05/2004 | CN1148609C Antireflective coatings for photosensitive resin compositions |
| 05/05/2004 | CN1148400C Polyimides and polyamide acids |
| 05/05/2004 | CN1148396C Photoeresist composition comprising polycyclic polymers with acid labile pendant groups |
| 05/04/2004 | US6732351 Method of forming mask for charged particle beam exposure and processing program of pattern data for forming mask for charged particle beam exposure |
| 05/04/2004 | US6731431 Unit including optical element having protrusion and optical element having recess; relative alignment between elements is accomplished by engagement of protrusion and recess; elements are opposed to each other with predetermined spacing |
| 05/04/2004 | US6731377 Laser output control method, laser apparatus and exposure apparatus |
| 05/04/2004 | US6731376 Illuminating single column of microdevice cells on mask with pulses of radiation, moving workpiece perpendicular to long axis of column, coordinating movement of workpiece with timing of pulses of radiation to pattern with images of cells |
| 05/04/2004 | US6731375 Projection aligner, exposing method and semiconductor device |
| 05/04/2004 | US6731374 Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system |
| 05/04/2004 | US6731373 Method for imprinting a wafer with identifying information, and exposing method and apparatus for imprinting a wafer with identifying information |
| 05/04/2004 | US6731372 Multiple chamber fluid mount |
| 05/04/2004 | US6731371 Controlling decrease of transmittance on optical path to obtain high exposure light intensity, even when using vacuum ultraviolet light as exposure light |
| 05/04/2004 | US6731358 Color liquid crystal panel and color liquid crystal display apparatus |
| 05/04/2004 | US6731320 Laser pattern generator |
| 05/04/2004 | US6730925 Method and apparatus for projection exposure and device manufacturing method |
| 05/04/2004 | US6730920 Abbe arm calibration system for use in lithographic apparatus |