| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/12/2004 | EP0991682B1 Coating method using a one-component aqueous coating system comprising thermally labile hydrophilic groups |
| 05/12/2004 | CN1496497A Resist releasing composition |
| 05/12/2004 | CN1496496A Protecting groups in polymers, photoresists and processes for microlithography |
| 05/12/2004 | CN1496377A Ultraviolet-curable resin composition and photosolder resist ink containing the composition |
| 05/12/2004 | CN1496198A Substrate and organic electroluminescent device using the same |
| 05/12/2004 | CN1496197A Method for producing image element, equipment for producing image element and image element |
| 05/12/2004 | CN1495861A Vapour as treating gas for removing hard shell, corrosion-resisting agent and residue produced by stripping corrosion-resisting agent after ion implantation |
| 05/12/2004 | CN1495856A Orientation dependent on screen by adopting dipole illumination technigue |
| 05/12/2004 | CN1495855A Method for mfg. semiconductor and solid photographic device |
| 05/12/2004 | CN1495854A Image forming method |
| 05/12/2004 | CN1495853A Method and system for mfg. semiconductor device |
| 05/12/2004 | CN1495710A Method for foming single floating block air cushion surface by using forming polymer brush |
| 05/12/2004 | CN1495540A Alignment system of photoetching system utilizing at least two wavelengths and its method |
| 05/12/2004 | CN1495539A Production of automatic optical approximate correcting regulation |
| 05/12/2004 | CN1495538A Alignment method of array optical probe scanning integrated circuit photoetching system and its equipment |
| 05/12/2004 | CN1495537A Digital photoetching system for making smooth diagonal component |
| 05/12/2004 | CN1495535A Etching solution for forming bimetallic mosaic structure craft and base phate treatment method |
| 05/12/2004 | CN1495534A Detergent for removing resist and method for making semiconductor |
| 05/12/2004 | CN1495533A Analogue method and system for designing aperture of exposure device and medium for recording analogue method |
| 05/12/2004 | CN1495532A Photoetching projector and reflector assembly for the same |
| 05/12/2004 | CN1495531A Photoetching projector and particle screen for said device |
| 05/12/2004 | CN1495530A Photoetching equipment and device mfg. method |
| 05/12/2004 | CN1495529A Method for managing photochemical light intensity transient change and its equipment |
| 05/12/2004 | CN1495528A Photoetching projector and reflector assembly for said device |
| 05/12/2004 | CN1495527A Method for mfg. photoetching device |
| 05/12/2004 | CN1495526A Sulfonate and photoresist composition |
| 05/12/2004 | CN1495525A Fine graphic forming material, method and semiconductor device making method |
| 05/12/2004 | CN1495524A Polymeric composition and lithographic printing platemaking forebody |
| 05/12/2004 | CN1495522A Fine pattern forming method and resist surface processing agent |
| 05/12/2004 | CN1495491A Transferring plate for forming orientation film |
| 05/12/2004 | CN1495472A Optical system for compensating spacial dispersion |
| 05/12/2004 | CN1495461A Repeatered lens used in lighting system of photoetching system |
| 05/12/2004 | CN1495444A Method for designing phase raster graphics and method for making photomask system containing it |
| 05/12/2004 | CN1495443A Reflector utilizing microimage to make exposure and its production method |
| 05/12/2004 | CN1495043A Lithographic printing carrier, method for mfg. carrier and pre-sensitized board |
| 05/12/2004 | CN1495017A Screen printing and its making technology |
| 05/12/2004 | CN1494956A Cleaning method for removing particles from surface, cleaning equipment and photo-engraving projection equipment |
| 05/12/2004 | CN1494954A Method and composition for removing residue from microstructure of body |
| 05/12/2004 | CN1149643C Pattern drawing method using charged particle beams and apparatus therefor |
| 05/12/2004 | CN1149637C Electronic beam exposure system |
| 05/12/2004 | CN1149538C Circuit substrate, circuit-formed suspension substrate, and production methods therefor |
| 05/12/2004 | CN1149237C Copolymer resin, Preparation thereof, and photoresist using the same |
| 05/11/2004 | US6735492 Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settings |
| 05/11/2004 | US6735485 Overlay registration correction method for multiple product type microelectronic fabrication foundry facility |
| 05/11/2004 | US6735275 X-ray exposure method, x-ray exposure apparatus, fine structure and semiconductor device |
| 05/11/2004 | US6735236 High power gas discharge laser with line narrowing unit |
| 05/11/2004 | US6735233 Gas discharge laser with means for removing gas impurities |
| 05/11/2004 | US6735232 Laser with versatile output energy |
| 05/11/2004 | US6734971 Method and apparatus for self-referenced wafer stage positional error mapping |
| 05/11/2004 | US6734950 Load-lock chamber and exposure apparatus using the same |
| 05/11/2004 | US6734949 Lithographic apparatus and device manufacturing method |
| 05/11/2004 | US6734947 Quick chamber seals |
| 05/11/2004 | US6734518 Surface treatment of DARC films to reduce defects in subsequent cap layers |
| 05/11/2004 | US6734506 Semiconductor device including a plurality of kinds of MOS transistors having different gate widths and method of manufacturing the same |
| 05/11/2004 | US6734445 Mechanized retractable pellicles and methods of use |
| 05/11/2004 | US6734443 Irradiating reticle using ultraviolet light radiation beam; purification, neutralization |
| 05/11/2004 | US6734442 Mapping method for a microscope slide |
| 05/11/2004 | US6734258 Protective coating composition for dual damascene process |
| 05/11/2004 | US6734248 Containing a 1h-tetrazole or a 5,5'-bis-1h-tetrazole |
| 05/11/2004 | US6734120 Method of photoresist ash residue removal |
| 05/11/2004 | US6734117 Periodic clamping method and apparatus to reduce thermal stress in a wafer |
| 05/11/2004 | US6733957 Having a pit and a groove with different depth formed separately in the inner and outer circumference of the disk substrate |
| 05/11/2004 | US6733953 Semitransparent phase shifting mask has, in the periphery of a pattern element area, a light shielding portion which is formed by a semitransparent phase shifting portion and a transparent portion with the optimal size combination. |
| 05/11/2004 | US6733952 Resist composition |
| 05/11/2004 | US6733951 High resolution in pattern formation by irradiation with acitinic ray; for production of lithographic printing plates and semiconductors/integrated circuits for liquid crystals and thermal heads |
| 05/11/2004 | US6733949 Novolak resin mixtures and photosensitive compositions comprising the same |
| 05/11/2004 | US6733948 Negative image-recording material |
| 05/11/2004 | US6733946 Irradiation photobleaching nanocomposite |
| 05/11/2004 | US6733937 Exposure method for liquid crystal display device |
| 05/11/2004 | US6733936 Method for generating a swing curve and photoresist feature formed using swing curve |
| 05/11/2004 | US6733935 Colored resist material set and color filter |
| 05/11/2004 | US6733934 Color filter array having a red filter layer |
| 05/11/2004 | US6733933 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 05/11/2004 | US6733932 Mask lithography data generation method |
| 05/11/2004 | US6733931 Symmetrical mask system and method for laser irradiation |
| 05/11/2004 | US6733930 Photomask blank, photomask and method of manufacture |
| 05/11/2004 | US6733929 Phase shift masking for complex patterns with proximity adjustments |
| 05/11/2004 | US6733873 Satisfies requirements for transparency, slipperiness, winding properties, resolution and recyclability; residual polycondensation metal catalyst content of less than 150 ppm, and an antimony content of 15 mmol % or less |
| 05/11/2004 | US6733686 Method and device for removing an unnecessary film |
| 05/11/2004 | US6733250 Filter unit, chemical liquid supply system, and chemical liquid supply method |
| 05/11/2004 | US6733165 Optical integrator for an illumination device |
| 05/11/2004 | US6733147 Backlighting system for displays |
| 05/11/2004 | US6732864 Method for measuring strength of image forming surface of planographic printing plate, planographic printing plate and packaging structure for planographic printing plates |
| 05/11/2004 | US6732649 Methods for providing custom rubber stamps |
| 05/11/2004 | US6732610 Slide apparatus and its stage mechanism for use in vacuum |
| 05/06/2004 | WO2004038773A1 Extreme ultraviolet light exposure system and vacuum chamber |
| 05/06/2004 | WO2004038761A2 Self-aligning contacts for stacked electronics |
| 05/06/2004 | WO2004038509A2 Lithography system |
| 05/06/2004 | WO2004038508A1 Electron beam exposure method and electron beam exposure system |
| 05/06/2004 | WO2004038506A1 Chemically amplified positive photosensitive resin composition |
| 05/06/2004 | WO2004038505A1 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance |
| 05/06/2004 | WO2004038504A2 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrication |
| 05/06/2004 | WO2004038503A1 Curable resin composition and flexographic plate material using the curable resin composition |
| 05/06/2004 | WO2004038502A1 Pattern forming materials and pattern formation method using the materials |
| 05/06/2004 | WO2004038481A1 Device for holding a beam splitter element |
| 05/06/2004 | WO2004038467A2 Improvements in or relating to multiple exposures of photosensitive material |
| 05/06/2004 | WO2004038458A2 Apparatus for producing approximately collimated light and method of curing a photopolymerisable layer using the apparatus |
| 05/06/2004 | WO2004037885A1 Capsule type hardener and composition |
| 05/06/2004 | WO2004037877A2 Organosiloxanes |
| 05/06/2004 | WO2004037866A2 Photoresists containing sulfonamide component |