| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/18/2004 | US6737218 Printing plate precursor comprising a substrate and provided thereon, a layer containing a light heat conversion material, wherein the light heat conversion material does not substantially change in nature when allowed to stand in heat |
| 05/18/2004 | US6737217 Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same |
| 05/18/2004 | US6737216 Laser engravable flexographic printing element and a method for forming a printing plate from the element |
| 05/18/2004 | US6737215 Photoresist composition for deep ultraviolet lithography |
| 05/18/2004 | US6737214 Comprising a blend of a divinyl ether of a (cyclo)alkanediol-crosslinked polyhydroxystyrene having acid labile hydroxyl blocking groups and a crosslinked acrylate-hydroxystyrene copolymer; dry etching resistance, high resolution |
| 05/18/2004 | US6737213 Pattern formation material and method |
| 05/18/2004 | US6737212 Photosensitive composition |
| 05/18/2004 | US6737208 Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information |
| 05/18/2004 | US6737207 Method for evaluating lithography system and method for adjusting substrate-processing apparatus |
| 05/18/2004 | US6737206 Pre-alignment system of exposure apparatus having wafer cooling means and exposure method using the same |
| 05/18/2004 | US6737203 Photosensitive resin compositions for color filter applications |
| 05/18/2004 | US6737200 Method for aligning a contact or a line to adjacent phase-shifter on a mask |
| 05/18/2004 | US6737169 Can form a smooth film; storage stability, hardness and wear resistance |
| 05/18/2004 | US6736985 High-resolution method for patterning a substrate with micro-printing |
| 05/18/2004 | US6736984 Non-mechanical fabrication of carbon-containing work pieces |
| 05/18/2004 | US6736983 Method for producing microcomponents |
| 05/18/2004 | US6736928 Exposure apparatus and semiconductor device manufacturing method |
| 05/18/2004 | US6736927 Apparatus for increased workpiece throughput |
| 05/18/2004 | US6736806 Controllable liquid crystal matrix mask particularly suited for performing ophthamological surgery, a laser system with said mask and a method of using the same |
| 05/18/2004 | US6736556 Resist coating unit includes a cup surrounding a wafer held by a spin chuck; air blower |
| 05/18/2004 | US6736386 Covered photomask holder and method of using the same |
| 05/18/2004 | US6735867 Method of making a static pressure air bearing |
| 05/13/2004 | WO2004040626A1 Mask, mask producing method and exposure method |
| 05/13/2004 | WO2004040625A1 Exposure apparatus control method and device |
| 05/13/2004 | WO2004040378A2 Illumination device for a microlithographic projection-exposure system |
| 05/13/2004 | WO2004040377A1 Chemical-amplification positive-working photoresist composition |
| 05/13/2004 | WO2004040376A1 Radiation-sensitive resin composition |
| 05/13/2004 | WO2004040375A1 Photocurable compositions with phosphite viscosity stabilizers |
| 05/13/2004 | WO2004040374A2 Photomask assembly and method for protecting the same from contaminants generated during a lithography process |
| 05/13/2004 | WO2004040373A1 Multi-image reticles |
| 05/13/2004 | WO2004040372A1 Multi-image reticles |
| 05/13/2004 | WO2004040371A2 Novel copolymer and photoresist compositions thereof |
| 05/13/2004 | WO2004040369A2 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers |
| 05/13/2004 | WO2004039554A2 Lithographic method for forming mold inserts and molds |
| 05/13/2004 | WO2004011984A3 Retainer, exposure apparatus, and semiconductor device fabrication method |
| 05/13/2004 | WO2004001480A3 Catadioptric reduction objective |
| 05/13/2004 | WO2003065428B1 Image formation state adjustment system, exposure method, exposure apparatus, program, and information recording medium |
| 05/13/2004 | WO2002093253A9 Backside alignment system and method |
| 05/13/2004 | WO2002091422A3 Raster shaped beam, electron beam exposure strategy using a two dimensional multiplexel flash field |
| 05/13/2004 | US20040093111 Overlay registration correction method for multiple product type microelectronic fabrication foundry facility |
| 05/13/2004 | US20040093107 Probability constrained optimization for electrical fabrication control |
| 05/13/2004 | US20040092126 Method for preventing reworked photoresist from collapsing |
| 05/13/2004 | US20040092045 Methods and systems for determining a presence of macro and micro defects on a specimen |
| 05/13/2004 | US20040091824 Recycling polymer contaminated solvent used in photopolymeri-zation crosslinked relief plate developing; centrifugation |
| 05/13/2004 | US20040091820 Cleaning after doping or etching without leaving residue; decomposing photosensitizer with light exposure prior to nonaqueous solvent treatment |
| 05/13/2004 | US20040091817 Electron beam lithography method |
| 05/13/2004 | US20040091816 Photosensitive composition and photosensitive lithographic printing plate |
| 05/13/2004 | US20040091813 Norbornene based monomers; transparent at 157 nm; generating positive tone resist image |
| 05/13/2004 | US20040091812 Lithographic printing plate precursors imageable elements; form dry films at ambient temperature |
| 05/13/2004 | US20040091799 Photopolymerized and epoxy crosslinked acrylic monomers; tensile modulus, elongation, yield stress |
| 05/13/2004 | US20040091796 Pellicle for lithography, and a method for producing it |
| 05/13/2004 | US20040091793 Faster wafer fabrication without wasting exposure area; simultaneous evaluation |
| 05/13/2004 | US20040091790 Reducing corner rounding and image shortening |
| 05/13/2004 | US20040091623 Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof |
| 05/13/2004 | US20040091618 For forming a photoresist film having a uniform thickness without damaging substrate and without a need for a without need for a large amount of photoresist and without need for removing an unnecessary photoresist from an edge of substrate |
| 05/13/2004 | US20040091607 Method for forming a liquid film on a substrate |
| 05/13/2004 | US20040091606 Dropping a liquid adjusted to be spread into a give amount on a substrate to be processed from a dropping nozzle or dropping nozzles of a dropping unit onto the substrate, and then moving the dropping unit and substrate |
| 05/13/2004 | US20040091341 Reticle manipulating device |
| 05/13/2004 | US20040091142 Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns |
| 05/13/2004 | US20040090675 Printer and a method for recording a multi-level image |
| 05/13/2004 | US20040090657 Multibeam exposure head and multibeam recording method using the same |
| 05/13/2004 | US20040090629 Diffraction order selection for optical metrology simulation |
| 05/13/2004 | US20040090617 Method for optimising the image properties of at least two optical elements as well as methods for optimising the image properties of at least three optical elements |
| 05/13/2004 | US20040090611 Chucking system for modulating shapes of substrates |
| 05/13/2004 | US20040090610 Microfabrication of pattern imprinting |
| 05/13/2004 | US20040090609 Illumination system and exposure apparatus and method |
| 05/13/2004 | US20040090608 Illumination optical apparatus and exposure apparatus |
| 05/13/2004 | US20040090606 Exposure apparatus, exposure method, and device manufacturing method |
| 05/13/2004 | US20040090587 Liquid crystal shutter for exposure device |
| 05/13/2004 | US20040090129 Positioning apparatus and charged-particle-beam exposure apparatus |
| 05/13/2004 | US20040089979 Method of reducing pattern distortions during imprint lithography processes |
| 05/13/2004 | US20040089900 Method of pattering thin film and tft array substrate using it and production method therefor |
| 05/13/2004 | US20040089822 Charged-particle beam writer |
| 05/13/2004 | US20040089819 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/13/2004 | US20040089818 Multi-foil optic |
| 05/13/2004 | US20040089651 Heating device, method for evaluating heating device and pattern forming method |
| 05/13/2004 | US20040089406 Method for producing an etching mask |
| 05/13/2004 | US20040089229 Deposition method, deposition apparatus, and pressure-reduction drying apparatus |
| 05/13/2004 | DE10330599A1 Verfahren zur Herstellung von Mikroelektronik-Strukturelementen durch Ausbilden von Durchmischungsschichten aus wasserlöslichen Harzen und Resistmaterialien A process for the production of microelectronic structure elements by forming mixing layers of water-soluble resins and resist materials |
| 05/13/2004 | DE10260985A1 Shearing interferometry system for measurement of a wave front for use in measuring an optical imaging system in order to quantify its quality, said system having filters to suppress unwanted higher diffraction orders |
| 05/13/2004 | DE10025522B4 Verfahren zur strukturierten Abscheidung leitfähiger Polymerer A method for structured deposition conductive polymers |
| 05/13/2004 | CA2502239A1 Lithographic method for forming mold inserts and molds |
| 05/12/2004 | EP1418796A2 Erosion reduction for EUV laser produced plasma target sources |
| 05/12/2004 | EP1418576A2 Electron beam lithography method |
| 05/12/2004 | EP1418468A2 Projection optical system and exposure apparatus |
| 05/12/2004 | EP1418467A2 Projection optical system, exposure apparatus, and device manufacturing method |
| 05/12/2004 | EP1418447A1 Fluoride crystal lens element with minimized birefringence for VUV microlithography and optical blank therefor |
| 05/12/2004 | EP1418059A1 Multicolor image forming material and multicolor image forming method using the same |
| 05/12/2004 | EP1418017A2 Positioning apparatus, charged particle beam exposure apparatus, and semiconductor device manufacturing method |
| 05/12/2004 | EP1417543A1 Stable energy detector for extreme ultraviolet radiation detection |
| 05/12/2004 | EP1417542A2 A method of substrate processing and photoresist exposure |
| 05/12/2004 | EP1417541A2 Diaphragm for an integrator unit |
| 05/12/2004 | EP1417540A2 Critical dimension monitoring from latent image |
| 05/12/2004 | EP1417539A1 Methods and apparatus for use in photopolymer plate manufacture |
| 05/12/2004 | EP1417538A2 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates |
| 05/12/2004 | EP1417530A1 Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
| 05/12/2004 | EP1417525A2 Objective with pupil obscuration |
| 05/12/2004 | EP1417198A2 Sulfonium salts as photoinitiators for radiation curable systems |
| 05/12/2004 | EP1086145B1 Photoinitiators and their applications |
| 05/12/2004 | EP1029258B1 Holographic medium and process |