Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2004
05/20/2004US20040096774 Hydrophilic surfaces; applying peroxy compound; exposure to electromagnetic radiation
05/20/2004US20040096773 Soluble polyimide for photosensitive polyimide precursor and photosensitive polyimide precursor composition comprising the soluble polyimide
05/20/2004US20040096772 Amplificated photoresist; addition polymer containing silicon compond and acrylated ester; mixture with solvent and acid generator; exposure to radiation, then heat treatment
05/20/2004US20040096771 Photoresist composition for forming an insulation film, insulation film for organic electroluminescence element and method for itis formation
05/20/2004US20040096760 Accumulating developer fluid; measurement photoresist concentration; calibration; uniform development; reuse
05/20/2004US20040096757 Waterproofing; heat, solvent and chemical resistance; crosslinking; photopolymerization, photosensitive curing
05/20/2004US20040096755 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
05/20/2004US20040096751 Micropattern; masking, holography recording, conveying; printing pattern
05/20/2004US20040096210 Method of developing a resist film and a resist development processor
05/20/2004US20040095662 Adjustment method and apparatus of optical system, and exposure apparatus
05/20/2004US20040095573 Excimer laser inspection system
05/20/2004US20040095567 Projection optical system and exposure apparatus
05/20/2004US20040095565 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby
05/20/2004US20040095564 Exposure device
05/20/2004US20040095518 Method for forming pattern on substrate and method for fabricating liquid crystal display using the same
05/20/2004US20040095457 Can be used, for example, as a color filter black matrix or a thin film transistor black matrix to provide contrast and/or to separate adjacent electrically-conducting components.
05/20/2004US20040095217 Actuator and transducer
05/20/2004US20040095172 Semiconductor device having identification number, manufacturing method thereof and electronic device
05/20/2004US20040095085 Window frame-guided stage mechanism
05/20/2004US20040094847 Multi-layered semiconductor structure
05/20/2004US20040094752 Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same
05/20/2004US20040094726 Electron beam exposure apparatus and deflection amount correction method
05/20/2004US20040094724 Lithographic projection apparatus and reflector assembly for use therein
05/20/2004US20040094722 Gas bearings for use with vacuum chambers and their application in lithographic projection apparatus
05/20/2004US20040094507 Stripping cross-linked photoresists
05/20/2004US20040094089 Film forming unit
05/19/2004EP1420302A1 Lithographic apparatus and device manufacturing method
05/19/2004EP1420301A2 Compensation of lens aberrations by illumination optimization
05/19/2004EP1420300A2 Lithographic apparatus and device manufacturing method
05/19/2004EP1420299A2 Immersion lithographic apparatus and device manufacturing method
05/19/2004EP1420298A2 Immersion lithographic apparatus and device manufacturing method
05/19/2004EP1420297A2 Lithographic apparatus and method to determine beam size and divergence
05/19/2004EP1420295A2 Manufacturing method of semiconductor device
05/19/2004EP1420294A2 Method and apparatus for performing model-based layout conversion for use with dipole illumination
05/19/2004EP1419527A1 Adhesive tape
05/19/2004EP1419362A1 In-situ mirror characterization
05/19/2004EP1419361A1 Dynamic interferometric controlling direction of input beam
05/19/2004EP1292969B1 Patterning method using a removable inorganic antireflection coating
05/19/2004EP1152037B1 Squarylium compounds and optical recording media made by using the same
05/19/2004EP1046082B1 Method for development of photopolymer printing plates
05/19/2004EP0993692A4 Excimer laser with magnetic bearings supporting fan
05/19/2004DE4426109B4 Laser-Zeicheneinrichtung Laser Tag facility
05/19/2004DE10339915A1 Entwicklungsverfahren, Substratbehandlungsverfahren und Substratsbehandlungseinrichtung Development process, substrate processing method and substrate processing apparatus
05/19/2004DE10251087A1 Beleuchtungseinrichtung für eine Mikrolithographie-Projektionsbelichtungsanlage Lighting device for a microlithography projection exposure system
05/19/2004CN1498418A System and method of providing mask defect printablity analysis
05/19/2004CN1498361A Polymers and photoresist compositions
05/19/2004CN1498360A Polymers blends and their use in photoresist compositions for microlithography
05/19/2004CN1498359A Mask pattern correction device and mask pattern correction method, mask manufacturing method and semiconductor device manufacturing method
05/19/2004CN1498236A Resin curable with actinic energy ray, photocurable/thermosetting resin composition containing the same
05/19/2004CN1498229A Surface-active photoinitiators
05/19/2004CN1498056A Radiation source, photoetching equipment and device manufacturing method
05/19/2004CN1497998A Mobile terminal for managing time table and mobile communication system using the mobile terminal
05/19/2004CN1497699A Pattern copy mask, manufacturing method of semiconductor device and program for making mask pattern
05/19/2004CN1497674A Planar stage device
05/19/2004CN1497672A Producing method of graphic and manufacturing method of semiconductor device
05/19/2004CN1497671A Evaluation metod of process residual, setting method and program of determination condition
05/19/2004CN1497670A Photoetching rubber pattern thickening material, photoetching rubber pattern forming technology and semiconductor device manufacturing process
05/19/2004CN1497667A High-Pressure processing method and high-pressure processing device
05/19/2004CN1497662A Substrate processing method, heat processing device and graphic forming method
05/19/2004CN1497659A Nozzle cleaning device and substrate processing device with the nozzle cleaning device
05/19/2004CN1497359A Alkyl aminoalkyl piperazine surfactant and its application in photoresist developer
05/19/2004CN1497358A Lithographic printing projector containing secondary electronic clear cell
05/19/2004CN1497357A Method and device for cooling gratecule when optical stone plate exposure
05/19/2004CN1497356A Electronic projection photoetching device using secondary electronic
05/19/2004CN1497355A Method for determining stray radiation, photoetching projection equipment
05/19/2004CN1497354A Band workpiece transporter
05/19/2004CN1497353A Projection optical system and expoure device with the projection optical system
05/19/2004CN1497352A Manufacturing method of base plate electro-optical device and making method of electro-optical device
05/19/2004CN1497351A Photoetching projector and device manufacturing method
05/19/2004CN1497350A Photoetching device and measuring system
05/19/2004CN1497349A Radiation source, photoetching device and manufacturing method of device
05/19/2004CN1497348A Photoetching device, device manufacturing method and manufactured device by it
05/19/2004CN1497347A Positive type photo erosion resistant agent composition used for making LCD and forming method of erosion resistant picture
05/19/2004CN1497346A Composition of refrared sensitive and forebody of lithographic printing plate
05/19/2004CN1497345A Photosensitive thermosetting pastel composition and fired article pattern used by it
05/19/2004CN1497344A Chemical amplification pasitive corrosion stability compound
05/19/2004CN1497343A Photoresist compound using photoresist
05/19/2004CN1497319A Photoetching device and device manufacturing method
05/19/2004CN1150410C Technique for producing 3-dimensional photon crystals
05/19/2004CN1150219C Light-absorbing polymer and film-forming composition and antireflection film containing said polymer
05/19/2004CN1150079C Anti-welding composition and printed-circuit board
05/18/2004US6738859 Method and apparatus for fast aerial image simulation
05/18/2004US6738410 Line narrowed laser with bidirection beam expansion
05/18/2004US6738201 Combined on-axis and off-axis illumination
05/18/2004US6738195 Optical magnification adjustment system and projection exposure device
05/18/2004US6738188 Forming reflector reflecting radiation in desired wavelength from stack of alternating layers of material having different real refractive indices, with at least one layer of third material in stack and layer thicknesses varying through stack
05/18/2004US6738129 Illumination apparatus, exposure apparatus, and device fabricating method using the same
05/18/2004US6738128 Exposure apparatus
05/18/2004US6737662 Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
05/18/2004US6737660 Electron beam irradiation apparatus and electron beam irradiating method
05/18/2004US6737659 Devices and methods for monitoring respective operating temperatures of components in a microlithography apparatus
05/18/2004US6737658 Pattern observation apparatus and pattern observation method
05/18/2004US6737628 Method for adjusting illumination parameters of a laser imagesetter
05/18/2004US6737549 Photoinitiators for acrylate coatings
05/18/2004US6737492 Comprises chromophore and antireflective coating for use in manufacturing integrated circuits by lithography
05/18/2004US6737338 Pattern forming method for a display device
05/18/2004US6737225 Method of undercutting micro-mechanical device with super-critical carbon dioxide
05/18/2004US6737222 Depositing layered photoresist above a substrate, patterning the first lower layer using the patterned first upper layer as a hard mask; depositing a second layered photoresist above the first layer photoresist, patterning
05/18/2004US6737220 Printing method and printing press
05/18/2004US6737219 Printing plates; photopolymer on glass support