Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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05/20/2004 | US20040096774 Hydrophilic surfaces; applying peroxy compound; exposure to electromagnetic radiation |
05/20/2004 | US20040096773 Soluble polyimide for photosensitive polyimide precursor and photosensitive polyimide precursor composition comprising the soluble polyimide |
05/20/2004 | US20040096772 Amplificated photoresist; addition polymer containing silicon compond and acrylated ester; mixture with solvent and acid generator; exposure to radiation, then heat treatment |
05/20/2004 | US20040096771 Photoresist composition for forming an insulation film, insulation film for organic electroluminescence element and method for itis formation |
05/20/2004 | US20040096760 Accumulating developer fluid; measurement photoresist concentration; calibration; uniform development; reuse |
05/20/2004 | US20040096757 Waterproofing; heat, solvent and chemical resistance; crosslinking; photopolymerization, photosensitive curing |
05/20/2004 | US20040096755 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
05/20/2004 | US20040096751 Micropattern; masking, holography recording, conveying; printing pattern |
05/20/2004 | US20040096210 Method of developing a resist film and a resist development processor |
05/20/2004 | US20040095662 Adjustment method and apparatus of optical system, and exposure apparatus |
05/20/2004 | US20040095573 Excimer laser inspection system |
05/20/2004 | US20040095567 Projection optical system and exposure apparatus |
05/20/2004 | US20040095565 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby |
05/20/2004 | US20040095564 Exposure device |
05/20/2004 | US20040095518 Method for forming pattern on substrate and method for fabricating liquid crystal display using the same |
05/20/2004 | US20040095457 Can be used, for example, as a color filter black matrix or a thin film transistor black matrix to provide contrast and/or to separate adjacent electrically-conducting components. |
05/20/2004 | US20040095217 Actuator and transducer |
05/20/2004 | US20040095172 Semiconductor device having identification number, manufacturing method thereof and electronic device |
05/20/2004 | US20040095085 Window frame-guided stage mechanism |
05/20/2004 | US20040094847 Multi-layered semiconductor structure |
05/20/2004 | US20040094752 Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same |
05/20/2004 | US20040094726 Electron beam exposure apparatus and deflection amount correction method |
05/20/2004 | US20040094724 Lithographic projection apparatus and reflector assembly for use therein |
05/20/2004 | US20040094722 Gas bearings for use with vacuum chambers and their application in lithographic projection apparatus |
05/20/2004 | US20040094507 Stripping cross-linked photoresists |
05/20/2004 | US20040094089 Film forming unit |
05/19/2004 | EP1420302A1 Lithographic apparatus and device manufacturing method |
05/19/2004 | EP1420301A2 Compensation of lens aberrations by illumination optimization |
05/19/2004 | EP1420300A2 Lithographic apparatus and device manufacturing method |
05/19/2004 | EP1420299A2 Immersion lithographic apparatus and device manufacturing method |
05/19/2004 | EP1420298A2 Immersion lithographic apparatus and device manufacturing method |
05/19/2004 | EP1420297A2 Lithographic apparatus and method to determine beam size and divergence |
05/19/2004 | EP1420295A2 Manufacturing method of semiconductor device |
05/19/2004 | EP1420294A2 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
05/19/2004 | EP1419527A1 Adhesive tape |
05/19/2004 | EP1419362A1 In-situ mirror characterization |
05/19/2004 | EP1419361A1 Dynamic interferometric controlling direction of input beam |
05/19/2004 | EP1292969B1 Patterning method using a removable inorganic antireflection coating |
05/19/2004 | EP1152037B1 Squarylium compounds and optical recording media made by using the same |
05/19/2004 | EP1046082B1 Method for development of photopolymer printing plates |
05/19/2004 | EP0993692A4 Excimer laser with magnetic bearings supporting fan |
05/19/2004 | DE4426109B4 Laser-Zeicheneinrichtung Laser Tag facility |
05/19/2004 | DE10339915A1 Entwicklungsverfahren, Substratbehandlungsverfahren und Substratsbehandlungseinrichtung Development process, substrate processing method and substrate processing apparatus |
05/19/2004 | DE10251087A1 Beleuchtungseinrichtung für eine Mikrolithographie-Projektionsbelichtungsanlage Lighting device for a microlithography projection exposure system |
05/19/2004 | CN1498418A System and method of providing mask defect printablity analysis |
05/19/2004 | CN1498361A Polymers and photoresist compositions |
05/19/2004 | CN1498360A Polymers blends and their use in photoresist compositions for microlithography |
05/19/2004 | CN1498359A Mask pattern correction device and mask pattern correction method, mask manufacturing method and semiconductor device manufacturing method |
05/19/2004 | CN1498236A Resin curable with actinic energy ray, photocurable/thermosetting resin composition containing the same |
05/19/2004 | CN1498229A Surface-active photoinitiators |
05/19/2004 | CN1498056A Radiation source, photoetching equipment and device manufacturing method |
05/19/2004 | CN1497998A Mobile terminal for managing time table and mobile communication system using the mobile terminal |
05/19/2004 | CN1497699A Pattern copy mask, manufacturing method of semiconductor device and program for making mask pattern |
05/19/2004 | CN1497674A Planar stage device |
05/19/2004 | CN1497672A Producing method of graphic and manufacturing method of semiconductor device |
05/19/2004 | CN1497671A Evaluation metod of process residual, setting method and program of determination condition |
05/19/2004 | CN1497670A Photoetching rubber pattern thickening material, photoetching rubber pattern forming technology and semiconductor device manufacturing process |
05/19/2004 | CN1497667A High-Pressure processing method and high-pressure processing device |
05/19/2004 | CN1497662A Substrate processing method, heat processing device and graphic forming method |
05/19/2004 | CN1497659A Nozzle cleaning device and substrate processing device with the nozzle cleaning device |
05/19/2004 | CN1497359A Alkyl aminoalkyl piperazine surfactant and its application in photoresist developer |
05/19/2004 | CN1497358A Lithographic printing projector containing secondary electronic clear cell |
05/19/2004 | CN1497357A Method and device for cooling gratecule when optical stone plate exposure |
05/19/2004 | CN1497356A Electronic projection photoetching device using secondary electronic |
05/19/2004 | CN1497355A Method for determining stray radiation, photoetching projection equipment |
05/19/2004 | CN1497354A Band workpiece transporter |
05/19/2004 | CN1497353A Projection optical system and expoure device with the projection optical system |
05/19/2004 | CN1497352A Manufacturing method of base plate electro-optical device and making method of electro-optical device |
05/19/2004 | CN1497351A Photoetching projector and device manufacturing method |
05/19/2004 | CN1497350A Photoetching device and measuring system |
05/19/2004 | CN1497349A Radiation source, photoetching device and manufacturing method of device |
05/19/2004 | CN1497348A Photoetching device, device manufacturing method and manufactured device by it |
05/19/2004 | CN1497347A Positive type photo erosion resistant agent composition used for making LCD and forming method of erosion resistant picture |
05/19/2004 | CN1497346A Composition of refrared sensitive and forebody of lithographic printing plate |
05/19/2004 | CN1497345A Photosensitive thermosetting pastel composition and fired article pattern used by it |
05/19/2004 | CN1497344A Chemical amplification pasitive corrosion stability compound |
05/19/2004 | CN1497343A Photoresist compound using photoresist |
05/19/2004 | CN1497319A Photoetching device and device manufacturing method |
05/19/2004 | CN1150410C Technique for producing 3-dimensional photon crystals |
05/19/2004 | CN1150219C Light-absorbing polymer and film-forming composition and antireflection film containing said polymer |
05/19/2004 | CN1150079C Anti-welding composition and printed-circuit board |
05/18/2004 | US6738859 Method and apparatus for fast aerial image simulation |
05/18/2004 | US6738410 Line narrowed laser with bidirection beam expansion |
05/18/2004 | US6738201 Combined on-axis and off-axis illumination |
05/18/2004 | US6738195 Optical magnification adjustment system and projection exposure device |
05/18/2004 | US6738188 Forming reflector reflecting radiation in desired wavelength from stack of alternating layers of material having different real refractive indices, with at least one layer of third material in stack and layer thicknesses varying through stack |
05/18/2004 | US6738129 Illumination apparatus, exposure apparatus, and device fabricating method using the same |
05/18/2004 | US6738128 Exposure apparatus |
05/18/2004 | US6737662 Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product |
05/18/2004 | US6737660 Electron beam irradiation apparatus and electron beam irradiating method |
05/18/2004 | US6737659 Devices and methods for monitoring respective operating temperatures of components in a microlithography apparatus |
05/18/2004 | US6737658 Pattern observation apparatus and pattern observation method |
05/18/2004 | US6737628 Method for adjusting illumination parameters of a laser imagesetter |
05/18/2004 | US6737549 Photoinitiators for acrylate coatings |
05/18/2004 | US6737492 Comprises chromophore and antireflective coating for use in manufacturing integrated circuits by lithography |
05/18/2004 | US6737338 Pattern forming method for a display device |
05/18/2004 | US6737225 Method of undercutting micro-mechanical device with super-critical carbon dioxide |
05/18/2004 | US6737222 Depositing layered photoresist above a substrate, patterning the first lower layer using the patterned first upper layer as a hard mask; depositing a second layered photoresist above the first layer photoresist, patterning |
05/18/2004 | US6737220 Printing method and printing press |
05/18/2004 | US6737219 Printing plates; photopolymer on glass support |