| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 05/26/2004 | EP1421653A1 Laser lithography light source with beam delivery |
| 05/26/2004 | EP1421447A1 Imageable composition containing infrared absorber with counter anion derived from a non-volatile acid |
| 05/26/2004 | EP1421446A1 Method of actinically imaging |
| 05/26/2004 | EP1278644B1 Thermal transfer of crosslinked materials |
| 05/26/2004 | EP1276011B1 Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with the same |
| 05/26/2004 | EP1163550A4 Hydroxy-amino thermally cured undercoat for 193 nm lithography |
| 05/26/2004 | EP1141444A4 Novel composition for selective etching of oxides over metals |
| 05/26/2004 | EP0879113B1 Damage-free laser surface treatment method |
| 05/26/2004 | CN1500369A Metod and device for generation of far ultraviolet or soft X-ray radiation |
| 05/26/2004 | CN1500233A Lithographer comprising mobile lens and method for producing digital holograms in storage medium |
| 05/26/2004 | CN1500231A Photosensitive film for circuit formation and process for producing printed wiring board |
| 05/26/2004 | CN1500227A Method for forming pattern on substrate and method for fabricating liquid crystal display using same |
| 05/26/2004 | CN1500130A Aqueous cleaning compsn. contg. copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 05/26/2004 | CN1500119A Positive photodefinable compsn. of polycarboxylic acid, phenolic and thermocurable resins |
| 05/26/2004 | CN1500099A Polycyclic fluorine-contg. polymers and photoresists for microlithography |
| 05/26/2004 | CN1499573A Non-planography through selective reaction for producing mask, its products and compsns. for such method |
| 05/26/2004 | CN1499299A Substrate calibrating appts, its processing device and delivery appts. |
| 05/26/2004 | CN1499298A Lightscribing device and mfg. method of such device |
| 05/26/2004 | CN1499297A Lightscribing device and mfg. method of such device |
| 05/26/2004 | CN1499296A Chemical amplifying positive resist compsn. |
| 05/26/2004 | CN1499295A Positive light-sensitive compsn. |
| 05/26/2004 | CN1499293A Checking method and element mfg. method |
| 05/26/2004 | CN1499292A Checking method and element mfg. method |
| 05/26/2004 | CN1499290A Non-lithographic printing method for producing self-alignment mask, produced products and compsns, for such products |
| 05/26/2004 | CN1499288A Mask protective layer for photoetching and its mfg. method |
| 05/26/2004 | CN1499287A Printed board material |
| 05/26/2004 | CN1498989A 结晶装置和结晶方法 Crystallization apparatus and the crystallization method |
| 05/26/2004 | CN1498776A Rigidified nano stamp die plate |
| 05/26/2004 | CN1151408C Method for fabricating light exposure mask |
| 05/26/2004 | CN1151358C Methods and apparatus for measuring thickness of a film, particularly of photoresist film on semiconductor sbustrate |
| 05/26/2004 | CN1151192C Prepn. of polycarboxylic acid resin containing unsaturated double bond |
| 05/25/2004 | US6741732 Exposure method and device manufacturing method using this exposure method |
| 05/25/2004 | US6741627 Photolithographic molecular fluorine laser system |
| 05/25/2004 | US6741394 Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus |
| 05/25/2004 | US6741377 Reducing contribution of reflected ambient light from inactive areas of microoptical electromechanical apparatus |
| 05/25/2004 | US6741358 Exposure apparatus and device production method in which position of reference plate provided on substrate stage is measured |
| 05/25/2004 | US6741349 Optical microspectrometer |
| 05/25/2004 | US6741338 In-situ source metrology instrument and method of use |
| 05/25/2004 | US6741334 Exposure method, exposure system and recording medium |
| 05/25/2004 | US6741333 Multiple image photolithography system and method |
| 05/25/2004 | US6741332 Stage system, exposure apparatus, and device manufacturing method |
| 05/25/2004 | US6741331 Lithographic apparatus with improved exposure area focus, device manufacturing method, and device manufactured thereby |
| 05/25/2004 | US6741330 Exposure device |
| 05/25/2004 | US6741329 Lithographic apparatus and device manufacturing method |
| 05/25/2004 | US6741328 Exposure apparatus and its control method, stage apparatus, and device manufacturing method |
| 05/25/2004 | US6741327 Eliminating residual pattern aberration |
| 05/25/2004 | US6740962 Tape stiffener, semiconductor device component assemblies including same, and stereolithographic methods for fabricating same |
| 05/25/2004 | US6740896 Sensitivity adjusting method for pattern inspection apparatus |
| 05/25/2004 | US6740895 Method and apparatus for emission lithography using patterned emitter |
| 05/25/2004 | US6740893 Optical instrument, and device manufacturing method |
| 05/25/2004 | US6740892 Air-cooled lamp, and article treatment system and method utilizing an air-cooled lamp |
| 05/25/2004 | US6740891 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 05/25/2004 | US6740856 Preformed heating element and method of making |
| 05/25/2004 | US6740596 Manufacturing method of active matrix substrate |
| 05/25/2004 | US6740542 Method for producing micromachined devices and devices obtained thereof |
| 05/25/2004 | US6740476 Surface smoothing of stereolithographically formed 3-D objects |
| 05/25/2004 | US6740475 Method for structuring a photoresist layer |
| 05/25/2004 | US6740474 Technique for making deep microstructures in photoresist |
| 05/25/2004 | US6740473 Method for shrinking critical dimension of semiconductor devices |
| 05/25/2004 | US6740471 Improving adhesion between an inorganic anti-reflective coatinglayer and photoresist; roughening |
| 05/25/2004 | US6740470 Lithographic printing plate precursor |
| 05/25/2004 | US6740469 Developer-soluble metal alkoxide coatings for microelectronic applications |
| 05/25/2004 | US6740468 The recording layer containing a polymerizable compound, and an infrared absorber, and polymerization caused by action of light or heat decreases solubility of the recording layer n an alkali developer |
| 05/25/2004 | US6740467 Photoresist compositions comprising blends of ionic and non-ionic photoacid generators |
| 05/25/2004 | US6740466 High sensitivity to uv, visible, andinfrared; fogging of the background is reduced; clarity and high contrast; addition polymerizable compound, an indole-pyrimidinetrione methine dye, an anionic organoboron compound |
| 05/25/2004 | US6740465 Imaging media containing heat developable photosensitive microcapsules |
| 05/25/2004 | US6740459 Method of designing photosensitive composition and lithography process |
| 05/25/2004 | US6740368 Beam shaped film pattern formation method |
| 05/25/2004 | US6740163 Photoresist recirculation and viscosity control for dip coating applications |
| 05/25/2004 | US6739588 Method and device for separating printing plates |
| 05/25/2004 | US6739261 Device for selecting and conveying printing plates |
| 05/25/2004 | US6739255 Stamp, method, and apparatus |
| 05/25/2004 | US6739039 Manufacturing method of printed circuit board using dry film resist |
| 05/21/2004 | WO2004042477A1 Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same |
| 05/21/2004 | WO2004042476A1 Chemically amplified polymer having pendant group with camphoryl and resist composition comprising the same |
| 05/21/2004 | WO2004042475A1 Resist composition |
| 05/21/2004 | WO2004042474A1 Negative type photosensitive resin composition |
| 05/21/2004 | WO2004042473A2 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions |
| 05/21/2004 | WO2004042472A2 Supercritical carbon dioxide/chemical formulation for removal of photoresists |
| 05/21/2004 | WO2004042319A2 Compensation of refractivity perturbations in an intererometer path |
| 05/21/2004 | WO2004041881A1 Polymeric compound for photoresist and resin composition for photoresist |
| 05/21/2004 | WO2004041879A1 Acrylic copolymer and radiation-sensitive resin composition |
| 05/21/2004 | WO2004041770A1 Chemically amplified polymer having pendant group with cyclododecyl and resist composition comprising the same |
| 05/21/2004 | WO2004041762A1 Fluorine-containing vinyl ethers, their polymers, and resist compositions using such polymers |
| 05/21/2004 | WO2004041760A2 Fluorinated polymers |
| 05/21/2004 | WO2004041454A2 Substrate processing apparatus and method |
| 05/21/2004 | WO2004001506A3 Antireflective coatings for high-resolution photolithographic synthesis of dna array |
| 05/21/2004 | WO2003085455A3 Photoresist compositions comprising acetals and ketals as solvents |
| 05/21/2004 | WO2002075793B1 System and method of providing mask defect printability analysis |
| 05/20/2004 | US20040098160 Method, system, and computer program product for improved trajectory planning and execution |
| 05/20/2004 | US20040097689 Photosensitive thermosetting resin and solder resist ink composition containing the same |
| 05/20/2004 | US20040097097 Method for coating a semiconductor substrate with a mixture containing an adhesion promoter |
| 05/20/2004 | US20040097072 Method of forming metallized pattern |
| 05/20/2004 | US20040096783 Exposing the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer, and then contacting the polymer resist layer with CO2 solvent system to remove light field region |
| 05/20/2004 | US20040096782 Weatherproofing photoresists; mixture of adhesive and reflective material |
| 05/20/2004 | US20040096781 Method for producing an electrically conductive structure on a non-planar surface and the use of said method |
| 05/20/2004 | US20040096780 Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same |
| 05/20/2004 | US20040096779 Positive tone lithography with carbon dioxide development systems |
| 05/20/2004 | US20040096777 Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate |
| 05/20/2004 | US20040096776 Radiation transparent; diffraction efficiency; light interference patterns; recording intensity distribution of light; variations in refractive index |