| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/01/2004 | US6743734 Bi-layer resist process |
| 06/01/2004 | US6743730 Plasma processing method |
| 06/01/2004 | US6743572 Method for structuring a photoresist layer |
| 06/01/2004 | US6743571 Making strong, soft, absorbent fibrous webs, such as, for example, paper webs. |
| 06/01/2004 | US6743570 Method of using heat-depolymerizable polycarbonate sacrificial layer to create nano-fluidic devices |
| 06/01/2004 | US6743569 Photosensitive resin laminate and production method thereof |
| 06/01/2004 | US6743566 Cyclic acetal compound, polymer, resist composition and patterning process |
| 06/01/2004 | US6743565 Positive resist composition with (bis-tri fluoromethyl) methyl substituted styrene |
| 06/01/2004 | US6743564 A positive resist formulation consists of nitrile containing tert-amine compound, an organic solvent and a base resin having an acidic functional group which is protected with an acid labile group, a photoacid generator |
| 06/01/2004 | US6743563 Photoresist compositions |
| 06/01/2004 | US6743562 Positive photoresist composition |
| 06/01/2004 | US6743554 Photomask for aberration measurement, aberration measurement method unit for aberration measurement and manufacturing method for device |
| 06/01/2004 | US6743552 Process and composition for rapid mass production of holographic recording article |
| 06/01/2004 | US6743368 Nano-size imprinting stamp using spacer technique |
| 06/01/2004 | US6742944 Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method |
| 06/01/2004 | US6742455 Method for holding sheet material, and image recording apparatus |
| 06/01/2004 | US6742393 Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method |
| 05/27/2004 | WO2004044968A1 Exposure device, exposure method, and semiconductor device manufacturing method |
| 05/27/2004 | WO2004044944A2 Raster frame beam system for electron beam lithography |
| 05/27/2004 | WO2004044660A2 Probability constrained optimization for electrical fabrication control |
| 05/27/2004 | WO2004044656A2 Method for washing an optical lens |
| 05/27/2004 | WO2004044655A1 Method for the bulk machining of fluoropolymer substrates |
| 05/27/2004 | WO2004044654A2 Compositions and processes for nanoimprinting |
| 05/27/2004 | WO2004044653A2 Method and device for rastering source redundancy |
| 05/27/2004 | WO2004044652A2 Positive tone lithography with carbon dioxide development systems |
| 05/27/2004 | WO2004044651A1 A chucking system and method for modulating shapes of substrates |
| 05/27/2004 | WO2004044552A2 Methods and apparatus for ink delivery to nanolithographic probe systems |
| 05/27/2004 | WO2004044025A2 Anti-reflective coatings for photolithography and methods of preparation thereof |
| 05/27/2004 | WO2004044024A1 Photosensitive resin composition and process for the formation of hydrogel |
| 05/27/2004 | WO2004044017A1 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |
| 05/27/2004 | WO2004043935A1 Polymerizable compounds with quadruple hydrogen bond forming groups |
| 05/27/2004 | WO2004029717B1 Highly sensitive, high-resolution photoresist for electron beam lithography |
| 05/27/2004 | WO2004006012B1 A carried for a reticle used in photolithographic semiconductor |
| 05/27/2004 | WO2003083580B1 System for optically treating surfaces |
| 05/27/2004 | WO2003076891A3 Moiré method and measuring system for measuring the distortion of an optical imaging system |
| 05/27/2004 | WO2003036387A3 Method of forming a pattern of sub-micron broad features |
| 05/27/2004 | WO2002069043A8 Low absorbing resists for 157 nm lithography |
| 05/27/2004 | WO2000066969A3 Interferometry system having a dynamic beam-steering assembly for measuring angle and distance |
| 05/27/2004 | US20040103388 First approximation for OPC significant speed-up |
| 05/27/2004 | US20040102934 Automated creation of metrology recipes |
| 05/27/2004 | US20040102912 Automatic calibration of a masking process simulator |
| 05/27/2004 | US20040102863 Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method |
| 05/27/2004 | US20040102548 Comprises alkali soluble resin, phthalocyanine dye, and photosensitive compound; for photopolymerization; for use in liquid crystal displays; heat/light resistance |
| 05/27/2004 | US20040102050 Method of patterning the surface of an article using positive microcontact printing |
| 05/27/2004 | US20040102048 Method for manufacturing semiconductor device |
| 05/27/2004 | US20040102046 Semiconductor processing method using photoresist and an antireflective coating |
| 05/27/2004 | US20040101988 Deposition of permanent polymer structures for OLED fabrication |
| 05/27/2004 | US20040101987 Method of fabrication of electronic devices using microfluidic channels |
| 05/27/2004 | US20040101984 Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer |
| 05/27/2004 | US20040101983 Method and apparatus for overlay control using multiple targets |
| 05/27/2004 | US20040101790 Comprises double exposure of photoresists and double baking; for printing integrated circuit structures |
| 05/27/2004 | US20040101788 Comprises monoethanolamine, N,N-dimethylacetamide, carbito, and gallic acid; for production of semiconductors/integrated circuits |
| 05/27/2004 | US20040101787 Fine pattern forming method |
| 05/27/2004 | US20040101786 Comprises deposition of polyhydroxystyrene; for production of integrated circuits |
| 05/27/2004 | US20040101785 Defocusing of pattern image on photoresist to minimize errors during etching |
| 05/27/2004 | US20040101783 Electrodeposited photoresist and dry film photoresist photolithography process for printed circuit board patterning |
| 05/27/2004 | US20040101782 Coating substrates with mixtures of composite polymers and uncured monomers, then forming patterns, exposing to radiation and evaporating the uncured monomers, to form optics such as mirrors or waveguides |
| 05/27/2004 | US20040101779 Coatings comprising mixtures of polyesters, curing agents and acids or acid generators, used to form semiconductors by photolithographic |
| 05/27/2004 | US20040101778 Water soluble activators bonded to hydrophilic carriers selected from oligomers, polymers, plasticizers or surfactants, for use in light sensitive elements such as photoresists |
| 05/27/2004 | US20040101777 Mixtures of acrylic terpolymer binders, radiation curable polyethers and photoinitiators, used to form electrical and electronic apparatus |
| 05/27/2004 | US20040101769 Method for adjusting the overlay of two mask planes in a photolithographic process for the production of an integrated circuit |
| 05/27/2004 | US20040101710 Oxidation preventitive capping layer for deep ultra-violet and soft x-ray multilayers |
| 05/27/2004 | US20040101634 Method of forming a patterned film of surface-modified carbon nanotubes |
| 05/27/2004 | US20040101385 Semiconductor process apparatus and SMIF pod used therein |
| 05/27/2004 | US20040101018 Suspension system for laser discharge unit |
| 05/27/2004 | US20040100671 Hologram element |
| 05/27/2004 | US20040100625 Method for adjusting a substrate in an appliance for carrying out exposure |
| 05/27/2004 | US20040100624 Holding apparatus, holding method, exposure apparatus and device manufacturing method |
| 05/27/2004 | US20040100623 Lithographic apparatus, device manufacturing method and device manufactured thereby |
| 05/27/2004 | US20040100153 Stage apparatus and method of controlling the same |
| 05/27/2004 | US20040100007 Vibration damping devices and methods |
| 05/27/2004 | US20040099974 Method and apparatus for patterning an optical element |
| 05/27/2004 | US20040099820 Debris mitigation device |
| 05/27/2004 | US20040099819 Position detection apparatus, position detection method, electronic part carrying apparatus, and electronic beam exposure apparatus |
| 05/27/2004 | US20040099816 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
| 05/27/2004 | US20040099633 Method of manufacturing microlens substrate, and microlens exposure optical system |
| 05/27/2004 | US20040099395 Seamless master and method of making same |
| 05/27/2004 | US20040099284 Spraying steam on the surfaces photoresists using nozzles, then peeling |
| 05/27/2004 | US20040099283 Drying process for low-k dielectric films |
| 05/27/2004 | US20040099168 Image exposure apparatus |
| 05/27/2004 | US20040099165 Image exposure apparatus |
| 05/27/2004 | DE10351142A1 Interferometric measurement of thermally induced surface defects in optical components, by use of an interferometer with Fizeau and Twyman-Green arms the signals of which are superimposed to form a measurement signal |
| 05/27/2004 | DE10351027A1 Crystallizing device used in the production of thin film transistors comprises an illuminating system and a mask consisting of a light absorption layer |
| 05/27/2004 | DE10342482B3 Vacuum distribution control method for exposure device for printing plate in electronic image reproduction |
| 05/27/2004 | DE10308436B3 Printing plate exposure device with exposure drum maintained at constant temperature via circulated fluid |
| 05/27/2004 | DE10253874A1 Method for forming optical functional component for adjusting micro lithographic projection illumination installations, using charge coupled device (CCD) camera |
| 05/27/2004 | DE10253162A1 Cleaning system for projection lens for formation of semiconductor and integrated circuit structures on baseplate has supply of gas fed to lens and has gas analysis equipment |
| 05/27/2004 | DE10237901B3 Device for suppressing partial emission of a radiation source based on a hot plasma, especially an EUV radiation source, has a debris filter with plates radially aligned with the optical axis of a radiation source |
| 05/26/2004 | EP1422766A2 Method of fabrication of electronic devices using microfluidic channels |
| 05/26/2004 | EP1422571A2 Stage apparatus and method of controlling the same |
| 05/26/2004 | EP1422570A2 Lithographic projection apparatus with multiple suppression meshes |
| 05/26/2004 | EP1422569A2 Movement control in a lithographic apparatus |
| 05/26/2004 | EP1422568A2 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
| 05/26/2004 | EP1422567A2 A process for forming a photosensitive element having a layer of particulate material and an apparatus for performing the process |
| 05/26/2004 | EP1422566A1 Multilayer photoresist systems |
| 05/26/2004 | EP1422565A2 Multilayer photoresist systems |
| 05/26/2004 | EP1422564A1 Photosensitive thermosetting resin and solder resist ink composition containing the same |
| 05/26/2004 | EP1422563A1 Method of forming a patterned film of surface-modified carbon nanotubes |
| 05/26/2004 | EP1422562A1 Reticle and optical characteristic measuring method |
| 05/26/2004 | EP1422194A1 Process to fabricate a Tool Insert for Injection Moulding a microstructured Piece |