| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/03/2004 | US20040106737 Heat shrinkage photoresist pattern; using mixture of polyvinyl alcohol and another water soluble polymer |
| 06/03/2004 | US20040106718 Ultraviolet curable silver composition and related method |
| 06/03/2004 | US20040106692 Resin composition and three dimensional object |
| 06/03/2004 | US20040106532 Cleaning liquid used in photolithography and a method for treating substrate therewith |
| 06/03/2004 | US20040106531 Using mixture of hydrogen fluoride salt ,base and acid |
| 06/03/2004 | US20040106530 Using mixture containing hydroxylamine compound |
| 06/03/2004 | US20040106298 Development apparatus for manufacturing semiconductor device |
| 06/03/2004 | US20040106278 Method of eliminating photoresist poisoning in damascene applications |
| 06/03/2004 | US20040106073 Forming method of resist pattern for improving accuracy of dimension of pattern, manufacturing method of semiconductor apparatus using the same and heat treatment apparatus for the same |
| 06/03/2004 | US20040106072 Pretreatment; determination, calibration of photoresist dissolving concentration of developer, speed; for semiconductors |
| 06/03/2004 | US20040106071 Uniformity of pattern |
| 06/03/2004 | US20040106070 Method to enhance resolution of a chemically amplified photoresist |
| 06/03/2004 | US20040106068 Lithographic apparatus and device manufacturing method |
| 06/03/2004 | US20040106067 Miniaturization of electrical and electronic apparatus by forming patterns on photoresists containing acid generators, then exposing, developing and heating, to diffuse acids formed and to equalize glass transition temperature |
| 06/03/2004 | US20040106066 Pattern-forming process using photosensitive resin composition |
| 06/03/2004 | US20040106064 Silicon-containing polymer, negative type resist composition comprising the same, and patterning method for semiconductor device using the same |
| 06/03/2004 | US20040106063 Photoresist solutions comprising mixtures of polymers, acid generators, bases, dissolution inhibitors, curing agents and solvents used in microlithography |
| 06/03/2004 | US20040106062 Photoacid generators in photoresist compositions for microlithography |
| 06/03/2004 | US20040106061 temporary supports having thermoplastic resins layers, intermediate layers, and light sensitive recording layers, used to form color filters used in liquid crystal displays or printed circuits |
| 06/03/2004 | US20040106051 Projectors comprising quartz substrates having light diversion and absorption stacks, and electroconductive layers, that can be chucked to substrate holders to which an electrostatic potential is applied |
| 06/03/2004 | US20040106050 coating radiation transparent substrates with photoresists, then scanning with lasers light in controlled patterns, development and etching to form optical fibers; communication |
| 06/03/2004 | US20040106048 Modular containment cell arrangements |
| 06/03/2004 | US20040105652 Polysilsesquioxane; exposure to actinic radiation; development |
| 06/03/2004 | US20040105577 Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography |
| 06/03/2004 | US20040105177 Method of supporting and adjusting optical element in exposure apparatus |
| 06/03/2004 | US20040105170 Objective with fluoride crystal lenses |
| 06/03/2004 | US20040105085 Image formation characteristics adjustment method for projection optical system |
| 06/03/2004 | US20040105084 Projection system configured to project patterned beam onto target portion of substrate, wherein a space in comprises perhaloalkane and nitrogen compound; damage prevention to optical surfaces |
| 06/03/2004 | US20040105083 Lithographic apparatus and device manufacturing method |
| 06/03/2004 | US20040105082 Radiation source, lithographic apparatus and device manufacturing method |
| 06/03/2004 | US20040105081 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/03/2004 | US20040105080 Lithographic apparatus and device manufacturing method |
| 06/03/2004 | US20040104641 Method of separating a template from a substrate during imprint lithography |
| 06/03/2004 | US20040104359 Illumination apparatus, exposure method, exposure apparatus, and device manufacturing method |
| 06/03/2004 | US20040104326 Device for fixing thin and flexible substrates |
| 06/03/2004 | US20040104206 Methods for preparing ball grid array substrates via use of a laser |
| 06/03/2004 | US20040104196 Method of forming fine patterns |
| 06/03/2004 | US20040103950 Liquid quantity determination unit, photolithography apparatus, and liquid quantity determination method |
| 06/03/2004 | US20040103924 Gas-expanded liquids, methods of use thereof, and systems using gas-expanded liquids for cleaning integrated circuits |
| 06/03/2004 | US20040103922 Method of high pressure treatment |
| 06/03/2004 | US20040103917 Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus |
| 06/03/2004 | US20040103805 Printing plate material |
| 06/03/2004 | DE10352740A1 Hilfsstrukturmerkmale mit einer unter der Auflösung liegenden Grösse Auxiliary structural features with a sub-resolution size |
| 06/03/2004 | DE10307381B3 Printing plate recording device with pivoted sensor finger for detecting edge of printing plate incorporated in surface of printing plate exposure drum |
| 06/03/2004 | DE10253679A1 Optical arrangement used in the production of semiconductor components comprises a lens system arranged behind a mask, and a medium having a specified refractive index lying between the mask and the lens system |
| 06/02/2004 | EP1424767A2 Magnetic actuator under piezoelectric control |
| 06/02/2004 | EP1424599A1 Lithographic apparatus and device manufacturing method |
| 06/02/2004 | EP1424598A1 Lithographic projection apparstus and device manufacturing method |
| 06/02/2004 | EP1424597A2 Lithographic apparatus and device manufacturing method |
| 06/02/2004 | EP1424596A2 First approximation for OPC significant speed-up |
| 06/02/2004 | EP1424595A2 Automatic calibration of a masking process simulator |
| 06/02/2004 | EP1424577A2 Process for producing polyimide optical waveguide |
| 06/02/2004 | EP1424537A1 DISPLACEMENT DETECTING METHOD, DISPLACEMENT DETECTING DEVICE AND CALIBRATING METHOD THEREOF, AND RECORDING DEVICE OF INFORMATION RECORDING MEDIUM ORIGINAL DISK |
| 06/02/2004 | EP1424309A2 Hardened nano-imprinting stamp |
| 06/02/2004 | EP1424210A1 Photosensitive resin composition for printing plate precursor capable of laser engraving |
| 06/02/2004 | EP1423759A2 Method and device for control of the data flow on application of reticles in a semiconductor component production |
| 06/02/2004 | EP1423758A1 A zoom system, in particular, a zoom system for an illumination device of a microlithographic projection system |
| 06/02/2004 | EP1423757A1 Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators |
| 06/02/2004 | EP1423756A2 Method of lift-off microstructuring deposition material on a substrate, substrates obtainable by the method, and use thereof |
| 06/02/2004 | EP1194815B1 Ceramic blank with a photostructurable functional layer containing platinum and method for production thereof |
| 06/02/2004 | EP1165704B1 Utilization of phenylglyoxilic acid esters as photoinitiators |
| 06/02/2004 | EP1085971B1 Application of textured or patterned surfaces to a prototype |
| 06/02/2004 | CN1502122A Method to restore hydrophobicity in dielectric films and materials |
| 06/02/2004 | CN1502064A Lithograph with one-dimensional trigger mask and method for production of digital holograms in a storage medium |
| 06/02/2004 | CN1502063A Process for producing acid sensitive liquid composition containing a carbonate |
| 06/02/2004 | CN1502062A Composition for forming antireflection film for lithography |
| 06/02/2004 | CN1501443A Method and apparatus for coating anti-corrosion liquid |
| 06/02/2004 | CN1501442A Photoresist deposition apparatus and method for forming photoresist film with the same |
| 06/02/2004 | CN1501179A Cleaning liquid used in photolithography and a method for treating substrate therewith |
| 06/02/2004 | CN1501177A Developing method and apparatus |
| 06/02/2004 | CN1501175A Lithographic apparatus and device manufacturing method |
| 06/02/2004 | CN1501174A Method, inspection system, computer program and reference substrate for detecting mask defects |
| 06/02/2004 | CN1501173A Lithographic apparatus and device manufacturing method |
| 06/02/2004 | CN1501172A Lithographic apparatus and device manufacturing method |
| 06/02/2004 | CN1501171A 曝光装置 Exposure device |
| 06/02/2004 | CN1501170A Lithographic apparatus and device manufacturing method |
| 06/02/2004 | CN1501169A Solid state image pickup element and method of manufacturing a solid state pickup element |
| 06/02/2004 | CN1501168A Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/02/2004 | CN1501167A Radiation-sensitive resin composition |
| 06/02/2004 | CN1501166A Radiation-sensitive resin composition |
| 06/02/2004 | CN1501165A Device manufacturing method with reversed alignment markers |
| 06/02/2004 | CN1501151A Method for improving contact hole patterning |
| 06/02/2004 | CN1500911A Lithographic apparatus and method to determine beam size and divergence |
| 06/02/2004 | CN1500715A Lamination and picture composition method utilizing chemical self-assembly process |
| 06/02/2004 | CN1152074C Composition for radiation absorption film formation and the antireflection film formed from the same |
| 06/01/2004 | US6744851 Linear filament array sheet for EUV production |
| 06/01/2004 | US6744802 Laser oscillating apparatus with slotted waveguide |
| 06/01/2004 | US6744511 Stage device having drive mechanism for driving a movable stage, and exposure apparatus and method of detecting position of the stage |
| 06/01/2004 | US6744494 Continuously adjustable neutral density area filter |
| 06/01/2004 | US6744493 In-vacuum exposure shutter |
| 06/01/2004 | US6744492 Exposure apparatus |
| 06/01/2004 | US6744491 Method of and apparatus for recording image by exposure to light beams |
| 06/01/2004 | US6744490 Device for processing of a strip-shaped workpiece |
| 06/01/2004 | US6744489 Semiconductor exposure apparatus and method of driving the same |
| 06/01/2004 | US6744143 Semiconductor device having test mark |
| 06/01/2004 | US6744060 Pulse power system for extreme ultraviolet and x-ray sources |
| 06/01/2004 | US6744054 Evacuation use sample chamber and circuit pattern forming apparatus using the same |
| 06/01/2004 | US6743881 High resolution microlithography; post exposure delay stability; heat resistance; terpolymer containing styrenic, p-vinylphenol and vinylbenzene containing branched ester substitution |
| 06/01/2004 | US6743851 Polyimide film |
| 06/01/2004 | US6743735 Photoresist removal from alignment marks through wafer edge exposure |