| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/09/2004 | EP1426824A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/09/2004 | EP1426823A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/09/2004 | EP1426822A1 Composition for forming antireflective film for use in lithography |
| 06/09/2004 | EP1426821A1 Method of fabricating an optical element, lithographic apparatus and device manufacturing method |
| 06/09/2004 | EP1426793A1 Photodefinable composition including a silsesquioxane polymer and an optical waveguide formed therefrom |
| 06/09/2004 | EP1425783A1 Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece |
| 06/09/2004 | EP1425623A1 Graphics engine for high precision lithography |
| 06/09/2004 | EP1328846B1 Edge bead remover for thick film photoresists |
| 06/09/2004 | EP1326906B1 Fractionation of resins using a static mixer and a liquid-liquid centrifuge |
| 06/09/2004 | EP1159649B1 Electron beam resist |
| 06/09/2004 | EP1040003B1 Engraving system and method comprising different engraving devices |
| 06/09/2004 | EP0931103B1 Monomers, oligomers and polymers with terminal oxirane groups, method of preparation and polymerisation under radiation exposure |
| 06/09/2004 | DE4105887B4 Vorsensibilisierte Platte zur Verwendung in der Herstellung lithographischer Druckplatten A presensitized plate for use in making lithographic printing plates |
| 06/09/2004 | DE10255735A1 Device to support a reflector bar in an optical projection system for lithography has carrying elements providing two line supports |
| 06/09/2004 | DE102004002764A1 Verfahren zur Herstellung von Multilayern und Multilayer A process for the production of multilayers and multilayer |
| 06/09/2004 | DE10005850B4 Verfahren zur Herstellung von Mikrostrukturen A process for the fabrication of microstructures |
| 06/09/2004 | CN1503930A Two-layer film and method of forming pattern with same |
| 06/09/2004 | CN1503929A Method of uniformly coating substrate |
| 06/09/2004 | CN1503928A Method for uniformly coating substrate |
| 06/09/2004 | CN1503927A Resin composition, process for producing resin composition, and method of forming resin film |
| 06/09/2004 | CN1503615A Material-saving type atomic beam generator |
| 06/09/2004 | CN1503342A Method and device for checking mask pattern |
| 06/09/2004 | CN1503325A Multiple alignment mark and method |
| 06/09/2004 | CN1503093A Method, system, and computer program product for improved trajector planning and execution |
| 06/09/2004 | CN1503064A Photoresist developer compositions |
| 06/09/2004 | CN1503063A Method and apparatus for large area photoetching by constant light source step scanning |
| 06/09/2004 | CN1503062A Method for making lithographic apparatus and device |
| 06/09/2004 | CN1503061A Method for making optical projection apparatus and device |
| 06/09/2004 | CN1503060A Method foe making optical elements, lithographic device and apparatus making method |
| 06/09/2004 | CN1503059A Lithographic apparatus and device manufacturing method |
| 06/09/2004 | CN1503058A Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
| 06/09/2004 | CN1503057A Foam eliminating dispersing agent for developer solution of photosensitive resists |
| 06/09/2004 | CN1503055A Master mask, exposure monitor method, exposure method and semiconductordevice mfg method |
| 06/09/2004 | CN1503039A Method for making substrate of microlens and exposure optical system of microlens |
| 06/09/2004 | CN1502555A Method for forming pattern film of surface modified carbon nano tube |
| 06/09/2004 | CN1153261C Method for stripping metal |
| 06/09/2004 | CN1153260C Method for forming net-structure photoresist layer |
| 06/09/2004 | CN1153076C Method of making multimode interference type optical coupler on insulating silicon material layer |
| 06/09/2004 | CN1152903C Solvent-free, radiation-curable, optical glass fiber coating compsn. and mfg process |
| 06/09/2004 | CN1152859C Novel N-vinyllactam derivatives and polymer thereof |
| 06/09/2004 | CN1152784C Anti-fake seal engraving process |
| 06/09/2004 | CA2448193A1 Method and device for imaging a printing form |
| 06/08/2004 | US6748578 Streamlined IC mask layout optical and process correction through correction reuse |
| 06/08/2004 | US6747783 Pattern generator |
| 06/08/2004 | US6747744 Interferometric servo control system for stage metrology |
| 06/08/2004 | US6747732 Method of making exposure apparatus with dynamically isolated reaction frame |
| 06/08/2004 | US6747731 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/08/2004 | US6747730 Lithographic apparatus, device manufacturing method, and method of manufacturing an optical element |
| 06/08/2004 | US6747729 Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition |
| 06/08/2004 | US6747282 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/08/2004 | US6747222 Feature formation in a nonphotoimagable material and switch incorporating same |
| 06/08/2004 | US6747143 Methods for polymer synthesis |
| 06/08/2004 | US6747101 Epoxy acrylates |
| 06/08/2004 | US6746973 Effect of substrate surface treatment on 193 NM resist processing |
| 06/08/2004 | US6746972 Apparatus for and method of heat-treating a wafer |
| 06/08/2004 | US6746965 Manufacturing method of semiconductor device |
| 06/08/2004 | US6746964 Method of manufacturing semiconductor laser element |
| 06/08/2004 | US6746938 Manufacturing method for semiconductor device using photo sensitive polyimide etching mask to form viaholes |
| 06/08/2004 | US6746899 Tape stiffener, semiconductor device component assemblies including same, and stereolithographic methods for fabricating same |
| 06/08/2004 | US6746882 Method of correcting non-linearity of metrology tools, and system for performing same |
| 06/08/2004 | US6746879 Guard filter methodology and automation system to avoid scrap due to reticle errors |
| 06/08/2004 | US6746828 Process for structuring a photoresist layer |
| 06/08/2004 | US6746827 Process for structuring a photoresist layer |
| 06/08/2004 | US6746826 Method for an improved developing process in wafer photolithography |
| 06/08/2004 | US6746825 Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates |
| 06/08/2004 | US6746823 Coating on substrate high molecular buffer layer and photomask layer, forming pattern by lithography, heating above glass transition temperature to form microstructure array, cooling, coating with metal conductive layer and electro-casting layer |
| 06/08/2004 | US6746822 Use of surface coupling agent to improve adhesion |
| 06/08/2004 | US6746821 Polymer with molecular groups convertible into alkali soluble groups at a given temperature by acid-catalyzed cleavage reactions; allowing base to diffuse into the photoresist layer and heating; greater steepness and less roughness |
| 06/08/2004 | US6746820 Capable of forming an image by scanning exposure such as laser; resist for forming a printed wiring board, a color filter or a phosphor pattern |
| 06/08/2004 | US6746819 Article comprising photostructurable polyimide or polyimide mixture for adhesive layer with thickness of <1 mu m between photostructurable epoxy resin and metal or silicon |
| 06/08/2004 | US6746818 (Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process |
| 06/08/2004 | US6746817 Acid labile groups increase alkali solubility; having increased alkali dissolution rate before and after radiation exposure, high sensitivity, high resolution, and etching resistance |
| 06/08/2004 | US6746816 Photosensitive resin composition and circuit board |
| 06/08/2004 | US6746813 Negative resist composition |
| 06/08/2004 | US6746812 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life |
| 06/08/2004 | US6746722 Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition |
| 06/08/2004 | US6746128 Ultra-high resolution imaging devices |
| 06/08/2004 | US6746010 Apparatus for conveying sheet-like recording material |
| 06/08/2004 | US6745693 Variable data lithographic printing device and method |
| 06/08/2004 | US6745484 Reticle, and pattern positional accuracy measurement device and method |
| 06/03/2004 | WO2004047166A2 Process for using protective layers in the fabrication of electronic devices |
| 06/03/2004 | WO2004047156A1 Position measurement method, position measurement device, exposure method, and exposure device |
| 06/03/2004 | WO2004047155A1 Euv exposure method, euv exposure system and euv exposure substrate |
| 06/03/2004 | WO2004047096A1 Method for producing stamper used for producing optical disc and optical disc producing method |
| 06/03/2004 | WO2004046828A1 Antireflective compositions for photoresists |
| 06/03/2004 | WO2004046826A2 Positive tone lithography in carbon dioxide solvents |
| 06/03/2004 | WO2004046771A1 Projection lens with non- round diaphragm for microlithography |
| 06/03/2004 | WO2004046056A1 Synthetic quartz glass member and ultraviolet exposure apparatus using same |
| 06/03/2004 | WO2004036315B1 Photoresist base material, method for purification thereof, and photoresist compositions |
| 06/03/2004 | WO2004031855A3 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same |
| 06/03/2004 | WO2004029716A3 Composition which forms an electrically-conducting protective coat and a method for structuring a photoresist using the protective layer |
| 06/03/2004 | WO2004012013A3 Optical imaging using a pupil filter and coordinated illumination polarisation |
| 06/03/2004 | WO2004010228A3 Maskless lithography using an array of diffractive focusing elements |
| 06/03/2004 | WO2004010164A3 Catadioptric projection objective |
| 06/03/2004 | WO2003069264A3 Characterization and compensation of non-cyclic errors in interferometry systems |
| 06/03/2004 | WO2003052514A9 Patterning of solid state features by direct write nanolithographic printing |
| 06/03/2004 | WO2003012367A9 Passive zero shear interferometers |
| 06/03/2004 | WO2002077484A9 Method and device for vibration control |
| 06/03/2004 | US20040107412 Method and system for context-specific mask writing |
| 06/03/2004 | US20040106755 Fluorine containing compounds with unsaturated ether or ester groups |