| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/15/2014 | CN203397081U Novel positioning mechanism |
| 01/15/2014 | CN203397080U Exposure structure for removing metal residues from periphery of metal bridge of capacitive touch screen |
| 01/15/2014 | CN1916111B Organic composition, liquid crystal display including the same and method of manufacturing liquid crystal display |
| 01/15/2014 | CN103515492A Method for photoetching of LED wafer without mask plate |
| 01/15/2014 | CN103515267A Device for and method of generating wiring data, and imaging system |
| 01/15/2014 | CN103515198A Process method for continuously forming two holes or grooves with different depths |
| 01/15/2014 | CN103515197A Self-aligned multi-patterning mask layer and formation method thereof |
| 01/15/2014 | CN103515174A Drawing apparatus, data processing method, and method of manufacturing article |
| 01/15/2014 | CN103513524A Semiconductor remover |
| 01/15/2014 | CN103513523A 光刻胶清洗剂 Photoresist Cleaner |
| 01/15/2014 | CN103513522A 半导体清洗组合物 Semiconductor cleaning compositions |
| 01/15/2014 | CN103513521A Negative photoresist stripper composition |
| 01/15/2014 | CN103513520A Antiseptic mixture and photoresist stripper composition |
| 01/15/2014 | CN103513519A Monitoring system for liquid drop target space positions in light sources of extreme ultraviolet photoetching machine |
| 01/15/2014 | CN103513518A Ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine |
| 01/15/2014 | CN103513517A 曝光装置及曝光方法 Exposure apparatus and exposure method |
| 01/15/2014 | CN103513516A Exposure method, exposure apparatus, and photomask |
| 01/15/2014 | CN103513515A Alkali developing-type photosensitive resin composition and dry film as well as cured material and printed circuit board |
| 01/15/2014 | CN103513514A Photoresists comprising amide component |
| 01/15/2014 | CN103513513A A green colored composition for a color filter |
| 01/15/2014 | CN103513512A Photosensitive resin composition and application of same |
| 01/15/2014 | CN103513511A Nano impressing method |
| 01/15/2014 | CN103513510A Water-soluble resin composition for forming fine patterns including polymer containing amine salt and amine, and method of forming fine patterns by using the same |
| 01/15/2014 | CN103513509A Mask plate and substrate as well as manufacturing method of substrate |
| 01/15/2014 | CN103513505A Photo mask, photo mask manufacturing method, pattern transfer method and flat panel display manufacturing method |
| 01/15/2014 | CN103509151A Alkali soluble resin and photosensitive resin composition containing the same |
| 01/15/2014 | CN103508994A Photoacid generator, photoresist comprising the photoacid generator, and coated article comprising same |
| 01/15/2014 | CN102819186B 3T1R four-degrees-of-freedom precise location workbench |
| 01/15/2014 | CN102636959B Decomposition and marking of semiconductor device design layout in double patterning lithography |
| 01/15/2014 | CN102593718B Preparation method for intermediate infrared laser |
| 01/15/2014 | CN102540762B Digital ultraviolet exposure controller |
| 01/15/2014 | CN102466974B Photo mask lifting and fetching device |
| 01/15/2014 | CN102456619B Array substrate, manufacturing method thereof and liquid crystal display |
| 01/15/2014 | CN102323727B Lithographic apparatus and device manufacturing method |
| 01/15/2014 | CN102272885B Photolithographic reticles with electrostatic discharge protection structures |
| 01/15/2014 | CN102243327B Holographic grating manufactured by HfO2/SiO2 sol-gel glass |
| 01/15/2014 | CN102156387B Radiation-sensitive composition and cured film |
| 01/15/2014 | CN102033345B Manufacture method of liquid crystal display and array baseplate |
| 01/15/2014 | CN102023496B Imprint lithography method and apparatus |
| 01/15/2014 | CN101784959B A double exposure semiconductor process for improved process margin |
| 01/15/2014 | CN101735825B Liquid crystal aligning agent, polyorganosiloxane, liquid crystal aligning film, forming method thereof and liquid crystal display element |
| 01/14/2014 | US8629973 Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation |
| 01/14/2014 | US8629971 Lithographic apparatus and device manufacturing method |
| 01/14/2014 | US8628911 Polymers, photoresist compositions and methods of forming photolithographic patterns |
| 01/14/2014 | US8628910 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
| 01/14/2014 | US8628909 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
| 01/14/2014 | US8628908 Chemically amplified resist composition and patterning process |
| 01/14/2014 | US8628907 Positive photosensitive resin composition, method for forming cured film, cured film, organic el display device and liquid crystal display device |
| 01/14/2014 | US8628896 Member for masking film, process for producing masking film using the same, and process for producing photosensitive resin printing plate |
| 01/09/2014 | WO2014007361A1 Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the method |
| 01/09/2014 | WO2014007267A1 Microlens fabrication method |
| 01/09/2014 | WO2014007231A1 Positive photosensitive composition, thin film transistor, and compound |
| 01/09/2014 | WO2014007079A1 Method for manufacturing semiconductor device using organic underlayer film-forming composition for solvent development lithography processes |
| 01/09/2014 | WO2014007040A1 Photosensitive transfer material, cured film, method for producing cured film, organic el display device, liquid crystal display device, and capacitive input device |
| 01/09/2014 | WO2014006944A1 Photo-alignment exposure device and photo-alignment exposure method |
| 01/09/2014 | WO2014006942A1 Exposure apparatus |
| 01/09/2014 | WO2014006935A1 Position measurement device, stage apparatus, exposure equipment, and device manufacturing method |
| 01/09/2014 | WO2014006821A1 Conductive polymer composition, coated article which is provided with antistatic film obtained from conductive polymer composition, and pattern forming method using conductive polymer composition |
| 01/09/2014 | WO2014005828A1 Metrology for lithography |
| 01/09/2014 | WO2014005780A1 A lithographic apparatus |
| 01/09/2014 | WO2014005362A1 Apparatus and process for baking treatment of glass substrate |
| 01/09/2014 | WO2014005358A1 Nano-patterned system and photoresponsive characteristic detection device thereof |
| 01/09/2014 | WO2013035247A3 High aspect ratio structure and method for manufacturing the same |
| 01/09/2014 | US20140011359 Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices |
| 01/09/2014 | US20140011139 Surface-modified middle layers |
| 01/09/2014 | US20140011137 High resolution, solvent resistant, thin elastomeric printing plates |
| 01/09/2014 | US20140011136 Patterning process and resist composition |
| 01/09/2014 | US20140011135 Polymer compound comprising dye and curable resin composition comprising same |
| 01/09/2014 | US20140011134 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film |
| 01/09/2014 | US20140011133 Materials and methods for improved photoresist performance |
| 01/09/2014 | US20140011126 Silphenylene-containing photocurable composition, pattern formation method using same, and optical semiconductor element obtained using the method |
| 01/09/2014 | US20140011122 Reflective mask blank and method of manufacturing a reflective mask |
| 01/09/2014 | US20140011121 Mask and method for forming the same |
| 01/09/2014 | US20140011120 Extreme ultraviolet lithography process and mask |
| 01/09/2014 | US20140009764 Method for measuring an angularly resolved intensity distribution and projection exposure apparatus |
| 01/09/2014 | US20140009746 Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method |
| 01/09/2014 | US20140008552 Target supply apparatus, chamber, and extreme ultraviolet light generation apparatus |
| 01/09/2014 | DE202009018857U1 Lichtempfindliche Harzzusammensetzung von Positivtyp A photosensitive resin composition of positive type |
| 01/09/2014 | DE102012013420A1 Method for performing dose control for electron beam exposure systems, involves creating set of patterns for elementary figures in electron beam exposure system, and determining dose levels based on created patterns |
| 01/09/2014 | DE102007047186B4 Aufnahmevorrichtung zur Aufnahme einer Photolithographiemaske Receiving means for receiving a photolithography mask |
| 01/09/2014 | DE102007044633B4 Fotolithografie-Immersionsscanner und Verfahren zum Betreiben desselben The same photo lithographic immersion scanner and method of operating |
| 01/08/2014 | EP2682815A1 Lithographic printing master plate and method for manufacturing lithographic printing plate |
| 01/08/2014 | EP2681626A1 Parallel acquisition of spectra for diffraction based overlay |
| 01/08/2014 | EP2681625A1 Lithograpic apparatus, spectral purity filter and device manufacturing method |
| 01/08/2014 | EP2681624A1 Lithography system and method of processing substrates in such a lithography system |
| 01/08/2014 | EP2681623A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film |
| 01/08/2014 | EP2681164A1 Systems and methods for optics cleaning in an euv light source |
| 01/08/2014 | CN203385993U Four-exposure-head optical exposure machine with automatic aligning system |
| 01/08/2014 | CN103502892A Method for offset imaging |
| 01/08/2014 | CN103502891A Arrangement for actuating an element in a projection exposure apparatus |
| 01/08/2014 | CN103502890A Photopatternable structure containing substrate with two-side photoresist coatings |
| 01/08/2014 | CN103502889A Photosensitive resin composition, method for forming pattern-cured film using photosensitive resin composition, and electronic component |
| 01/08/2014 | CN103502888A Negative photosensitive resin composition, cured film, partition wall, black matrix, method for producing partition wall, method for producing black matrix, color filter, and organic EL element |
| 01/08/2014 | CN103502723A Led light source module for light exposure, led light source apparatus for light exposure, and system for managing led light source apparatus for light exposure |
| 01/08/2014 | CN103502363A Dye dispersion, photosensitive resin composition for color filter, color filter, liquid crystal display device, and organic light-emitting display device |
| 01/08/2014 | CN103502313A Novel polyamic acid, photosensitive resin composition, dry film and circuit board |
| 01/08/2014 | CN103500705A Method for manufacturing high-uniformity grid line |
| 01/08/2014 | CN103499913A Surface plasmon imaging photoetching structure |
| 01/08/2014 | CN103499912A Method and system for testing exposure energy by gray level |
| 01/08/2014 | CN103499911A Radiation-sensitive composition for the formation of colored layers, color filters, and color liquid crystal displays |