| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/15/2004 | US6750972 Gas discharge ultraviolet wavemeter with enhanced illumination |
| 06/15/2004 | US6750961 System and method for characterizing macro-grating test patterns in advanced lithography and etch processes |
| 06/15/2004 | US6750952 Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing |
| 06/15/2004 | US6750951 Optical apparatus, exposure apparatus, and exposure method |
| 06/15/2004 | US6750950 Scanning exposure method, scanning exposure apparatus and making method for producing the same, and device and method for manufacturing the same |
| 06/15/2004 | US6750949 Lithographic apparatus and device manufacturing method |
| 06/15/2004 | US6750948 Projection optical system, projection exposure apparatus having the projection optical system, projection method thereof, exposure method thereof and fabricating method for fabricating a device using the projection exposure apparatus |
| 06/15/2004 | US6750947 Driving device and exposure apparatus |
| 06/15/2004 | US6750946 Processing apparatus for processing sample in predetermined atmosphere |
| 06/15/2004 | US6750625 Wafer stage with magnetic bearings |
| 06/15/2004 | US6750571 Magnetically shielded linear motors, and stage apparatus comprising same |
| 06/15/2004 | US6750464 Having pattern elements defined as apertures in stencil reticle, each element split into portions separated by girders formed from membrane of reticle and configured for transfer to substrate using single exposure shot of charged particle beam |
| 06/15/2004 | US6750266 Multiphoton photosensitization system |
| 06/15/2004 | US6750154 Gas assisted method for applying resist stripper and gas-resist stripper combinations |
| 06/15/2004 | US6750150 Method for reducing dimensions between patterns on a photoresist |
| 06/15/2004 | US6750073 Method for forming a mask pattern |
| 06/15/2004 | US6750000 Electron device manufacturing method, a pattern forming method, and a photomask used for those methods |
| 06/15/2004 | US6749998 Reactive double bonds, hydrazines, oximes, hydroquinone, pyrogallol, gallic acid, thiols, aldehydes, butyrophenones, hydroxytoluenes, 3-tert-butyl-4-hydroxy anisole, tocopherol, 6-hydroxy-2,5,7,8-tetramethylchroman-2-carboxylic acid |
| 06/15/2004 | US6749997 Lithographic mask capable of providing regions of graded exposure, such that when combined with anisotropic etching provides three dimensional microstructures of arbitrary size and shape |
| 06/15/2004 | US6749996 Pigment concentrate |
| 06/15/2004 | US6749995 Light sensitive composition, light sensitive planographic printing plate recursor, and image formation method |
| 06/15/2004 | US6749994 Water-soluble cellulose derivative, a photopolymerizable monomer, an acrylic resin having a hydroxyl group, a photoinitiator, and an inorganic powder; high sensitivity for precise patterning even when a thick film |
| 06/15/2004 | US6749991 Negative-working photoresist composition |
| 06/15/2004 | US6749990 Unsaturated halogenated hydrocarbon as photoresist monomer, for example 3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene; etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide |
| 06/15/2004 | US6749989 Resin of 2-alkyl-2-adamantyl (meth)acrylate, 2-oxooxapentyl (meth)acrylate, and 1-hydroxyadamantyl (meth)acrylate monomers, radiation-sensitive acid generator, and organic solvent |
| 06/15/2004 | US6749988 Amine compounds, resist compositions and patterning process |
| 06/15/2004 | US6749987 Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) |
| 06/15/2004 | US6749986 Polymers and photoresist compositions for short wavelength imaging |
| 06/15/2004 | US6749984 Positive-type planographic printing plate precursor that can be written by heat from an infrared laser, a thermal head or the like, and used for so-called direct plate-making |
| 06/15/2004 | US6749983 Polymers and photoresist compositions |
| 06/15/2004 | US6749976 Solid imaging compositions for preparing polypropylene-like articles |
| 06/15/2004 | US6749974 Disposable hard mask for photomask plasma etching |
| 06/15/2004 | US6749972 Producing a photomask for semiconductor photolithography processing |
| 06/15/2004 | US6749765 Aperture fill |
| 06/15/2004 | US6749688 Comprises spin chuck for attracting and holding semiconductor wafer in horizontal state by means of vacuum |
| 06/15/2004 | US6749351 Apparatus for developing substrate |
| 06/15/2004 | US6748865 Imprinting a physically embossed micro pattern or a magnetic micro pattern by tightly pressing a master plate to the substrate surface, |
| 06/10/2004 | WO2004049410A1 Exposure apparatus and exposure method |
| 06/10/2004 | WO2004049409A1 Production method for exposure system, light source unit, exp0srue system, exposure method and adjustment method for exposure system |
| 06/10/2004 | WO2004049408A1 Wafer processing system, coating/developing apparatus, and wafer processing apparatus |
| 06/10/2004 | WO2004049250A1 Layer arrangement provided with a structure producing a diffractive optical effect and a lens-type effect |
| 06/10/2004 | WO2004049073A2 Drying process for low-k dielectric films |
| 06/10/2004 | WO2004049072A2 Method and apparatus for overlay control using multiple targets |
| 06/10/2004 | WO2004049071A1 Radiation-sensitive elements and their storage stability |
| 06/10/2004 | WO2004049070A2 Photosensitive resin composition comprising a halogen-free colorant |
| 06/10/2004 | WO2004049069A1 Photopolymer composition suitable for lithographic printing plates |
| 06/10/2004 | WO2004049068A1 Radiation-sensitive elements |
| 06/10/2004 | WO2004049067A1 Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 06/10/2004 | WO2004049066A1 Applicability improver for photosensitive resin composition and photosensitive resin composition containing the same |
| 06/10/2004 | WO2004049065A2 Curable covercoat compositions, cured products obtained therefrom, and methods of manufacture thereof |
| 06/10/2004 | WO2004049064A2 Method for the removal of organic residues from finely structured surfaces |
| 06/10/2004 | WO2004049062A2 Gas-expanded liquids, methods of use thereof, and systems using gas-expanded liquids for cleaning integrated circuits |
| 06/10/2004 | WO2004048490A1 Uv-cure adhesive composition for optical disk, cured material and goods |
| 06/10/2004 | WO2004048462A1 Photocuring resin composition, medical device using same and method for manufacturing same |
| 06/10/2004 | WO2004048458A1 Organic bottom anti-reflective composition and patterning method using the same |
| 06/10/2004 | WO2004048434A1 Photo- and thermo-setting resin composition and printed wiring boards made by using the same |
| 06/10/2004 | WO2004048307A1 Ketones photoinitiators with reactive side chains and the photocuring system thereof |
| 06/10/2004 | WO2004031860A3 Planar inorganic device |
| 06/10/2004 | WO2004012239A3 Photosensitive bottom anti-reflective coatings |
| 06/10/2004 | WO2004009489A3 Fabrication of 3d photopolymeric devices |
| 06/10/2004 | US20040110857 Photo-curable resin composition containing cyclic acetal compound and cured product |
| 06/10/2004 | US20040110856 Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure |
| 06/10/2004 | US20040110313 Integrated circuit identification |
| 06/10/2004 | US20040110310 Multivariate rbr tool aging detector |
| 06/10/2004 | US20040110133 Using a chemically amplified polymer matrix and a photo carboxylic acid generator; exposing to patterned radiation to expose acid labile groups in reaction areas, coupling a monomer to a biopolymer to said reaction areas |
| 06/10/2004 | US20040110099 Process for forming resist pattern, semiconductor device and fabrication thereof |
| 06/10/2004 | US20040110096 Composition for forming antireflection film for lithography |
| 06/10/2004 | US20040110095 Depositing a positive type photoresist film over a semiconductor substrate;exposing a first mask pattern;exposing a second mask pattern; performing development treatment; etching |
| 06/10/2004 | US20040110093 Use of an energy source to convert precursors into patterned semiconductors |
| 06/10/2004 | US20040110092 Substrate is covered with a photosensitive material and is exposed by a standing wave interference pattern produced by the superposition of two coherent laser beams; rotating; exposure, coverin by a non-critical photomask, development |
| 06/10/2004 | US20040110091 High sensitivity X-ray photoresist |
| 06/10/2004 | US20040110090 Preparation of lithographic printing plates |
| 06/10/2004 | US20040110089 Having high etch rates and good via fill properties |
| 06/10/2004 | US20040110085 Positive resist composition and method of forming resist pattern from the same |
| 06/10/2004 | US20040110084 Resolution, electrical insulating properties, thermal shock resistance and chemical resistance, for use as solder resist and suitable for forming fine wiring |
| 06/10/2004 | US20040110083 Laser addressable thermal transfer imaging element with an interlayer |
| 06/10/2004 | US20040109935 Biosynthesis of polymer array using acid generator; exposure substrate to patterned radiation |
| 06/10/2004 | US20040109601 Method for facilitating automatic analysis of defect printability |
| 06/10/2004 | US20040109237 Projection objective, especially for microlithography, and method for adjusting a projection objective |
| 06/10/2004 | US20040109173 Method and system for measuring patterned structures |
| 06/10/2004 | US20040109165 Automated overlay metrology system |
| 06/10/2004 | US20040109153 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same |
| 06/10/2004 | US20040109152 Reticle Chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposure |
| 06/10/2004 | US20040109151 Lithographic projection apparatus and reflector assembly for use therein |
| 06/10/2004 | US20040109149 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/10/2004 | US20040109148 Exposure apparatus |
| 06/10/2004 | US20040108563 Antireflective coating layer |
| 06/10/2004 | US20040108491 Applying glowing medium between colored layers; printing on paper substrate; curing |
| 06/10/2004 | US20040108473 Extreme ultraviolet light source |
| 06/10/2004 | US20040108467 Lithographic apparatus, device manufacturing method and device manufactured thereby, control system |
| 06/10/2004 | US20040108466 Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured thereby |
| 06/10/2004 | US20040108465 Lithographic projection apparatus and particle barrier for use therein |
| 06/10/2004 | US20040108059 System and method for removal of materials from an article |
| 06/10/2004 | CA2507471A1 Photosensitive resin composition comprising a halogen-free colorant |
| 06/10/2004 | CA2505550A1 Uv-cure adhesive composition for optical disk, cured material and goods |
| 06/09/2004 | EP1427014A2 Integrated circuit identification |
| 06/09/2004 | EP1426832A2 Image recording material conveying device and automatic image recording system |
| 06/09/2004 | EP1426827A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/09/2004 | EP1426826A2 Lithographic apparatus and device manufacturing method |
| 06/09/2004 | EP1426825A2 Catadioptric lithographic projection apparatus with a non-inverting beamsplitter system |