Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2004
06/17/2004US20040116312 Method for the removal of an imaging layer from a semiconductor substrate stack
06/17/2004US20040115960 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography
06/17/2004US20040115957 Apparatus and method for enhancing wet stripping of photoresist
06/17/2004US20040115936 Remote ICP torch for semiconductor processing
06/17/2004US20040115926 Method of wet etching an inorganic antireflection layer
06/17/2004US20040115843 Methods and systems for determining a presence of macro defects and overlay of a specimen
06/17/2004US20040115654 Preparing nucleotide sequence array platforms; genomics; genotyping
06/17/2004US20040115568 Fabrication of sub-wavelength structures
06/17/2004US20040115567 Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms
06/17/2004US20040115566 Patterned structures of high refractive index materials
06/17/2004US20040115565 Method for patterning a layer of a low dielectric constant material
06/17/2004US20040115564 Photolithographic methods of using a single reticle to form overlapping patterns
06/17/2004US20040115563 Photosensitive coating material for a substrate and process for exposing the coated substrate
06/17/2004US20040115558 Multilayer; containing photoinitiator, hardener; controlling thickness; pattern stability; color filter
06/17/2004US20040115538 X-rays; exposure a self-supporting film of radiation sensitivity material to electrons beams scanning pattern ; generating film with reduced metal concentration
06/17/2004US20040115485 Fluoride crystalline optical lithography lens element blank
06/17/2004US20040115437 Dual cure reaction products of self-photoinitiating multifunction acrylates with cycloaliphatic epoxy compounds
06/17/2004US20040114720 Droplet and filament target stabilizer for EUV source nozzles
06/17/2004US20040114217 Objective with pupil obscuration
06/17/2004US20040114152 Interferometry systems involving a dynamic beam-steering assembly
06/17/2004US20040114150 Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser
06/17/2004US20040114143 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus
06/17/2004US20040114142 Birefringence measurement at deep-ultraviolet wavelengths
06/17/2004US20040114132 Test pattern, inspection method, and device manufacturing method
06/17/2004US20040114124 Chuck, lithographic apparatus and device manufacturing method
06/17/2004US20040114123 Lithographic apparatus and device manufacturing method
06/17/2004US20040114122 Lithographic apparatus and method to determine beam characteristics
06/17/2004US20040114121 Exposure apparatus, exposure method using the same, and method of manufacture of circuit device
06/17/2004US20040114120 Lithographic apparatus, device manufacturing method, and device manufactured thereby
06/17/2004US20040114119 Lithographic apparatus and a measurement system
06/17/2004US20040114118 Reflective liquid crystal display lithography system
06/17/2004US20040114117 Lithographic apparatus and device manufacturing method
06/17/2004US20040114116 Moving member mechanism and control method therefor
06/17/2004US20040113101 Charged-particle-beam microlithography systems that detect and offset beam-perturbing displacements of optical-column components
06/17/2004US20040113098 Structured organic materials and devices using low-energy particle beams
06/17/2004US20040112862 Planarization composition and method of patterning a substrate using the same
06/17/2004US20040112861 Method for modulating shapes of substrates
06/17/2004US20040112859 Photosensitive film for circuit formation and process for producing printed wiring board
06/17/2004US20040112405 Method and apparatus for cleaning a semiconductor substrate
06/17/2004US20040112164 Alignment apparatus, exposure apparatus, and device manufacturing method
06/17/2004US20040112153 Method and system for determining characteristics of substrates employing fluid geometries
06/17/2004US20040112104 Method and apparatus for texturing a metal sheet or strip
06/17/2004US20040111823 Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks
06/17/2004DE10314253A1 Process for scanning illumination of a reticule and a microlithographic projection unit has static illuminations at start and end and a scanning illumination
06/17/2004DE10258732A1 Optical system for microlithographic projection units for wafers has compensating plate angled to optical path to equalize two linearly polarized components
06/17/2004DE10256672A1 Process and device to separate stereolithographic hardened material layers from a contact surface successively photopolymerizes fluid layers and performs controlled separation
06/17/2004DE10256614A1 Vorrichtung und Verfahren zur Herstellung von Flexodruckplatten für den Zeitungsdruck mittels digitaler Bebilderung Apparatus and method for producing flexographic printing plates for newspaper printing using digital imaging
06/17/2004DE10254499A1 Schichtanordnung mit einer einen linsenartigen Effekt erzeugenden beugungsoptisch wirksamen Struktur Layer arrangement with a lens-like effect generating optically diffractive structure
06/17/2004DE10036183B4 Verfahren und Gerät zum Erhitzen eines Wafers und Verfahren und Gerät zum Ausheizen eines Photoresistfilms auf einem Wafer Method and apparatus for heating a wafer, and method and apparatus for baking a photoresist film on a wafer
06/17/2004CA2507521A1 Template
06/17/2004CA2505893A1 Oxime ester photoinitiators with heteroaromatic groups
06/16/2004EP1429191A1 Method for determining parameters for lithographic projection
06/16/2004EP1429190A2 Exposure apparatus and method
06/16/2004EP1429189A1 Lithographic apparatus and device manufacturing method
06/16/2004EP1429188A2 Lithographic apparatus and device manufacturing method
06/16/2004EP1429187A2 Droplet and filament target stabilizer for EUV source nozzles
06/16/2004EP1429186A2 Pellicle frame with porous inserts or heightened bonding surfaces
06/16/2004EP1429185A1 Etching method and composition for forming etching protective layer
06/16/2004EP1429184A1 Functionalized copolymer for photopolymerizable composition
06/16/2004EP1428676A2 Printing plate material
06/16/2004EP1428416A1 Discharge source with gas curtain for protecting optics from particles
06/16/2004EP1428245A1 Monolithic three-dimensional structures
06/16/2004EP1428076A2 Device and method for optically scanning a substrate disk
06/16/2004EP1428075A1 Method for high resolution patterning using low-energy electron beam, process for preparing nano device using the method
06/16/2004EP1428074A1 Method for high resolution patterning using soft x-ray, process for preparing nano device using the method
06/16/2004EP1244548B1 Heat-sensitive imaging element for providing lithographic printing plates
06/16/2004EP1016092B1 Method and apparatus for producing extreme ultra-violet light for use in photolithography
06/16/2004EP0930540B1 Photosensitive composition and use thereof
06/16/2004EP0888578B1 Solutions and processes for removal of sidewall residue after dry-etching
06/16/2004CN1505857A High-peak-power laser device and application to the generation of light in the extreme ultraviolet
06/16/2004CN1505831A Method of etching organic antireflection coating (ARC) layers
06/16/2004CN1505820A Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same
06/16/2004CN1505773A Solvents and photoresist compositions for short wavelength imaging
06/16/2004CN1505651A Polysiloxane, process for production thereof and radiation-sensitive resin composition
06/16/2004CN1505127A Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography
06/16/2004CN1505102A Manufacturing method of photo mask and semiconductor device
06/16/2004CN1505101A Method for shrinking critical dimension of semiconductor devices
06/16/2004CN1505100A Position design of alignment marks
06/16/2004CN1505067A Magnetic actuator under piezoelectric control
06/16/2004CN1505061A Process for producing metallic high-energy X-ray focusing combination lens
06/16/2004CN1504842A 全息元件 Holographic elements
06/16/2004CN1504833A Method to enhance resolution of a chemically amplified photoresist
06/16/2004CN1504832A Lithographic apparatus and device manufacturing method
06/16/2004CN1504831A Lithographic apparatus, device manufacturing method, and device manufactured thereby
06/16/2004CN1504830A Lithographic apparatus and device manufacturing method
06/16/2004CN1504829A Catadioptric lithographic projection apparatus with a non-inverting beamsplitter system
06/16/2004CN1504828A Photopolymer holographic memory materials comprising high refractive index epoxy and low refractive index olefine monomer and manufacturing method thereof
06/16/2004CN1504827A Method of forming planar color filters in an image sensor
06/16/2004CN1504780A Process for producing polyimide optical waveguide
06/16/2004CN1504777A Coloration-photosensitive resin composition
06/16/2004CN1504448A Ketone photo initiator compound having active side chain, preparing process and application thereof
06/16/2004CN1154193C Prodn. of organic electrical lighting device
06/16/2004CN1154159C Process for ashing organic materials from substrates
06/16/2004CN1154018C Improved contact and deep groove composition
06/16/2004CN1153679C Thermosensitive polymeric image recording material and method for use
06/16/2004CN1153666C Positive-working photosensitive lithographic printing plate and method for producing same
06/15/2004US6751514 Service method, service system and manufacturing/inspection apparatus
06/15/2004US6751003 Apparatus and method for selectively exposing photosensitive materials using a reflective light modulator
06/15/2004US6751000 Reflective diffraction of radiation beams for image registration
06/15/2004US6750976 Device for manufacturing semiconductor device and method of manufacturing the same