| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/23/2004 | EP0898735B1 Holographic medium and process |
| 06/23/2004 | CN1507649A Holding device, holding method, exposure device, and device manufacturing method |
| 06/23/2004 | CN1507582A Resist remover composition |
| 06/23/2004 | CN1507581A Resist remover composition |
| 06/23/2004 | CN1507580A Positive type radiosensitive composition and method for forming pattern |
| 06/23/2004 | CN1507579A Resist compositions with polymors having 2-cyano acrylic monomer |
| 06/23/2004 | CN1507010A Technology for forming resist pattern, semiconductor device and production thereof |
| 06/23/2004 | CN1506768A Alignment system and method for photoetching system |
| 06/23/2004 | CN1506767A Method for detemining photoetching projection parameter, device producing method and device |
| 06/23/2004 | CN1506766A Method for producing optical etching equipment and devices |
| 06/23/2004 | CN1506765A Composition for forming conjugated polymer pattern and method for forming conjugated polymer pattern using the same composition |
| 06/23/2004 | CN1506764A Method and equipment for heightening adhesive surface of film frame with porous filtering inset |
| 06/23/2004 | CN1506763A Photoetching projector with multi-suppressing silk screen |
| 06/23/2004 | CN1506762A Exposure equipment |
| 06/23/2004 | CN1506761A Mask-free nano pattern making method and equipment |
| 06/23/2004 | CN1506760A Method for producing micro structure |
| 06/23/2004 | CN1506725A Method for producing colour filter base plate for liquid crystal display device |
| 06/23/2004 | CN1155055C Novel detergent and cleaning method using it |
| 06/23/2004 | CN1154869C Optical display device and producing method thereof thermal transfer of a black matrix containing carbon black |
| 06/23/2004 | CN1154708C Chemical-ray sensitive polymer composition |
| 06/23/2004 | CN1154695C Composition for manufacturing circuit element and printed circuit board |
| 06/22/2004 | US6754303 Exposure apparatus and exposing method |
| 06/22/2004 | US6754302 X-ray exposure apparatus |
| 06/22/2004 | US6754161 Manufacturing method for optical recording medium and manufacturing device thereof |
| 06/22/2004 | US6754002 Photolithography methods and systems |
| 06/22/2004 | US6754000 Optical arrangement, and method for the deflection of light beams |
| 06/22/2004 | US6753968 Optical storage system based on scanning interferometric near-field confocal microscopy |
| 06/22/2004 | US6753963 Method of calibration of magnification of optical devices |
| 06/22/2004 | US6753954 Method and apparatus for detecting aberrations in a projection lens utilized for projection optics |
| 06/22/2004 | US6753948 Scanning exposure method and apparatus |
| 06/22/2004 | US6753947 Lithography system and method for device manufacture |
| 06/22/2004 | US6753946 Lithographic apparatus and device manufacturing method |
| 06/22/2004 | US6753945 Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method |
| 06/22/2004 | US6753943 Scanning exposure apparatus and device manufacturing method using the same |
| 06/22/2004 | US6753942 Environmental control chamber |
| 06/22/2004 | US6753941 Lithographic apparatus and device manufacturing method |
| 06/22/2004 | US6753896 Laser drawing apparatus and laser drawing method |
| 06/22/2004 | US6753584 Semiconductor structure comprising substrate with antireflective coating comprising metal silicon nitride compound, metal being selected from scandium and cobalt, configured to minimize reflectivity of deep ultraviolet light |
| 06/22/2004 | US6753540 Lithographic method using variable-area electron-beam lithography machine |
| 06/22/2004 | US6753534 Positioning stage with stationary and movable magnet tracks |
| 06/22/2004 | US6753448 Photoresist monomers, polymers thereof and photoresist compositions using the same |
| 06/22/2004 | US6753240 Semiconductor device production method |
| 06/22/2004 | US6753133 Method and manufacturing a semiconductor device having a ruthenium or a ruthenium oxide |
| 06/22/2004 | US6753132 Pattern formation material and pattern formation method |
| 06/22/2004 | US6753130 Removing mask utilizing thin metal layer as a wet strippable layer or as a plasma etch/ash stop |
| 06/22/2004 | US6753129 Coating and drying a photosensitive formulation onto a substrate, and photosensitive formulation containing a water inoluble acid decomposable transparent polymer and an acid generating compound upon exposure; exposure and development |
| 06/22/2004 | US6753128 Blocking acid generation during photolithography |
| 06/22/2004 | US6753127 Using mixture of norbornene polymer, acid generator and solvent; prebaking, exposure to radiation |
| 06/22/2004 | US6753126 Polymer for chemically amplified resist and chemically amplified resist composition containing the same |
| 06/22/2004 | US6753125 Photosensitive polymer having fused aromatic ring and photoresist composition containing the same |
| 06/22/2004 | US6753124 Radiation-sensitive resin composition |
| 06/22/2004 | US6753120 Alignment measuring method of photolithography process |
| 06/22/2004 | US6753118 Optical grating fabrication process |
| 06/22/2004 | US6753117 Method for reducing line edge roughness of patterned photoresist |
| 06/22/2004 | US6753116 Multiple photolithographic exposures with different non-clear patterns |
| 06/22/2004 | US6752966 Microfabrication methods and devices |
| 06/22/2004 | US6752900 Vacuum loadlock ultraviolet bake for plasma etch |
| 06/22/2004 | US6752872 Coating unit and coating method |
| 06/22/2004 | US6752545 Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment |
| 06/22/2004 | US6752543 Substrate processing apparatus |
| 06/22/2004 | US6752080 Sheet material holding device |
| 06/17/2004 | WO2004051717A1 Illumination optical system, exposure system, and exposure method |
| 06/17/2004 | WO2004051716A1 Exposure system, exposure method, and device fabricating method |
| 06/17/2004 | WO2004051714A2 A polymer solution for nanoprint lithography to reduce imprint temperature and pressure |
| 06/17/2004 | WO2004051709A2 Process for obtaining spatially-organised nanostructures on thin films |
| 06/17/2004 | WO2004051706A2 ANTI-REFLECTIVE COATING COMPOSITIONS FOR USE WITH LOW k DIELECTRIC MATERIALS |
| 06/17/2004 | WO2004051380A1 Method for forming resist pattern and resist pattern |
| 06/17/2004 | WO2004051379A1 Rinse liquid for lithography and method for forming resist pattern using same |
| 06/17/2004 | WO2004051378A1 Pattern transfer method and exposure system |
| 06/17/2004 | WO2004051377A1 Device and method for producing flexographic plates using digital imaging, for newspaper printing |
| 06/17/2004 | WO2004051376A1 Composition for forming antireflection coating |
| 06/17/2004 | WO2004051375A1 Positive resist composition |
| 06/17/2004 | WO2004051374A1 Radiation-sensitive resin composition |
| 06/17/2004 | WO2004051373A2 Developing mixture, and preparation of lithographic printing plates with this developer |
| 06/17/2004 | WO2004051372A2 Method of forming resist pattern, positive resist composition, and layered product |
| 06/17/2004 | WO2004051371A2 Template |
| 06/17/2004 | WO2004051370A1 Transfer mask blank, transfer mask, and transfer method using the transfer mask |
| 06/17/2004 | WO2004051369A1 Photomask blank, and photomask |
| 06/17/2004 | WO2004051330A1 Method of forming polymeric optical device structures |
| 06/17/2004 | WO2004051206A1 Device for the optical mapping of an imaging system |
| 06/17/2004 | WO2004051184A1 Shape measurement method, shape measurement device, tilt measurement method, stage device, exposure device, exposure method, and device manufacturing method |
| 06/17/2004 | WO2004050728A2 Method of producing (meth) acrylic acid derivative polymer for resist |
| 06/17/2004 | WO2004050725A1 Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound |
| 06/17/2004 | WO2004050653A2 Oxime ester photoinitiators with heteroaromatic groups |
| 06/17/2004 | WO2004050266A1 Contaminant removing method and device, and exposure method and apparatus |
| 06/17/2004 | WO2004034132A3 Radiation welding and imaging apparatus and method for using the same |
| 06/17/2004 | WO2004031859A3 Comprehensive integrated lithographic process control system based on product design and yield feedback system |
| 06/17/2004 | WO2004022318A3 Method for making ophthalmic devices |
| 06/17/2004 | WO2004021084A3 Decal transfer microfabrication |
| 06/17/2004 | WO2004012232A3 Forming bilayer resist patterns |
| 06/17/2004 | WO2003107494A3 Gas discharge ultraviolet wavemeter with enhanced illumination |
| 06/17/2004 | WO2003077030A3 Detection of position and estimation of surface shape |
| 06/17/2004 | WO2002099531A3 ANTI-REFLECTIVE COATING COMPOSITIONS FOR USE WITH LOW k DIELECTRIC MATERIALS |
| 06/17/2004 | US20040117757 Method for creating charged-particle-beam exposure data, method for manufacturing semiconductor device, and program |
| 06/17/2004 | US20040117056 Information processing apparatus, information processing method, and exposure apparatus |
| 06/17/2004 | US20040117055 Configuration and method for detecting defects on a substrate in a processing tool |
| 06/17/2004 | US20040116750 Photoresist film |
| 06/17/2004 | US20040116702 Alkoxylated acyl-and bisacylphoshine derivatives |
| 06/17/2004 | US20040116549 Solid mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene oligomers and their use |
| 06/17/2004 | US20040116548 Compositions for dark-field polymerization and method of using the same for imprint lithography processes |