| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/24/2004 | WO2004053594A2 High sensitivity resist compositions for electron-based lithography |
| 06/24/2004 | WO2004053593A2 Positive imageable thick film compositions |
| 06/24/2004 | WO2004053540A1 Protective coating system for reflective optical elements, reflective optical element and methods for the production thereof |
| 06/24/2004 | WO2004053426A1 Apparatus and methods for detecting overlay errors using scatterometry |
| 06/24/2004 | WO2004053425A1 In-process correction of stage mirror deformations during a photolithography exposure cycle |
| 06/24/2004 | WO2004052947A1 Novel photosensitive resin based on saponified polyvinyl acetate, photosensitive resin composition, method of forming aqueous gel from the same, and compound |
| 06/24/2004 | WO2004041760A3 Fluorinated polymers |
| 06/24/2004 | WO2004012235A3 Atmospheric pressure plasma processing reactor |
| 06/24/2004 | WO2004010226A3 Machine for exposing printed circuit boards |
| 06/24/2004 | WO2003104929A3 Use of overlay diagnostics for enhanced automatic process control |
| 06/24/2004 | WO2002073122A9 Cyclic error reduction in average interferometric position measurements |
| 06/24/2004 | US20040123267 Computer data analyzing method, based on a computer program, with setting values of light exposure and focus positions, forming pattern on substrate to be exposed to light, measure pattern dimensions, calculation |
| 06/24/2004 | US20040123265 Method and system for classifying an integrated circut for optical proximity correction |
| 06/24/2004 | US20040122636 Rapid scattering simulation of objects in imaging using edge domain decomposition |
| 06/24/2004 | US20040122617 Method of determining the distance of projection points on the surface of a printing form |
| 06/24/2004 | US20040122599 Real time analysis of periodic structures on semiconductors |
| 06/24/2004 | US20040122233 Microstructure, nanostructure circuits; overcoating conductor with mask; redox systems ; electrodes, connectors |
| 06/24/2004 | US20040122204 solution polymerization; high performance; improved chemical resistance |
| 06/24/2004 | US20040122124 Stabilized photoinitiators and applications thereof |
| 06/24/2004 | US20040121937 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith |
| 06/24/2004 | US20040121617 Method of processing a substrate, heating apparatus, and method of forming a pattern |
| 06/24/2004 | US20040121615 Method of forming fine patterns |
| 06/24/2004 | US20040121614 Method for forming pattern using printing process |
| 06/24/2004 | US20040121600 Method of wet etching a silicon and nitrogen containing material |
| 06/24/2004 | US20040121594 Process for forming a pattern |
| 06/24/2004 | US20040121588 Method of forming dual damascene pattern in semiconductor device |
| 06/24/2004 | US20040121269 exposing the process surface to a supercritical CO2 containing medium - |
| 06/24/2004 | US20040121267 Method of fabricating lead-free solder bumps |
| 06/24/2004 | US20040121265 a low-density oxide layer is formed on the low-k dielectric layer, for example by converting an upper portion thereof into an oxide so that prior to and during the formation of the cap layer, out-gassing of volatile materials is enhanced |
| 06/24/2004 | US20040121264 during IC fabrication; coated with a photosensitive solution; roughness on the sidewalls of the photosensitive layer is eliminated or reduced by evaporating the solvent without using elevated temperatures. |
| 06/24/2004 | US20040121260 copolymer of optionally substituted anthracen-9-ylalkyl (meth)acrylate and optionally substituted benzophenone-, diphenylsulfone or diphenyl sulfoxide (meth)acrylate; superior film formation characteristics, while maintaining good light absorption |
| 06/24/2004 | US20040121259 a resin; a crosslinking agent; and a nitrogen-containing compound; manufacturing a semiconductor |
| 06/24/2004 | US20040121258 by positioning spacers between the substrate and a presser plate and pressing a flowable photoresist onto the substrate using the presser plate wherein the thickness of the photoresist layer is maintained by the size of the spacers |
| 06/24/2004 | US20040121249 Red-colored photosensitive composition and color filter comprising the same |
| 06/24/2004 | US20040121246 Lithography process to reduce seam lines in an array of microelements produced from a sub-mask and a sub-mask for use thereof |
| 06/24/2004 | US20040121245 Exposure method, exposure mask, and exposure apparatus |
| 06/24/2004 | US20040121134 protective layer comprises iridium; protective barrier layers based on ion beam assisted deposition; longer life span |
| 06/24/2004 | US20040120458 Method of fabricating an optical element, lithographic apparatus and device manufacturing method |
| 06/24/2004 | US20040120051 Refractive projection objective with a waist |
| 06/24/2004 | US20040120044 Optical reduction system with control of illumination polarization |
| 06/24/2004 | US20040119973 Exposure apparatus inspection method and exposure apparatus |
| 06/24/2004 | US20040119970 Test pattern, inspection method, and device manufacturing method |
| 06/24/2004 | US20040119965 Positioning films to allow purge gases to repair damage caused by exposure to radiation, and allow radiation to reach semiconductor wafer for photolithography; separators |
| 06/24/2004 | US20040119964 Double isolation fine stage |
| 06/24/2004 | US20040119963 Exposure apparatus |
| 06/24/2004 | US20040119962 Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus |
| 06/24/2004 | US20040119961 Illumination system with variable adjustment of the illumination |
| 06/24/2004 | US20040119960 Scanning exposure apparatus and method |
| 06/24/2004 | US20040119959 Projection exposure apparatus |
| 06/24/2004 | US20040119958 Lithographic apparatus, computer program, device manufacturing method, and device manufactured thereby |
| 06/24/2004 | US20040119957 Method to diagnose imperfections in illuminator of a lithographic tool |
| 06/24/2004 | US20040119956 Distortion measurement method and exposure apparatus |
| 06/24/2004 | US20040119954 Exposure apparatus and method |
| 06/24/2004 | US20040119935 Method for fabricating liquid crystal display device |
| 06/24/2004 | US20040119490 Parallel, individually addressable probes for nanolithography |
| 06/24/2004 | US20040119436 Method and apparatus for reducing countermass stroke with initial velocity |
| 06/24/2004 | US20040119394 Method and apparatus for debris mitigation for an electrical discharge source |
| 06/24/2004 | US20040119036 System and method for lithography process monitoring and control |
| 06/24/2004 | US20040119029 Exposure apparatus and exposure method |
| 06/24/2004 | US20040119026 Electron beam exposure equipment and electron beam exposure method |
| 06/24/2004 | US20040118809 Microscale patterning and articles formed thereby |
| 06/24/2004 | US20040118184 Liquid flow proximity sensor for use in immersion lithography |
| 06/24/2004 | US20040118183 High-resolution gas gauge proximity sensor |
| 06/24/2004 | DE10356450A1 Exposure device used in photolithographic processes comprises a pressure-reducing chamber containing a mask-supporting arrangement and a pressure plate, a pressure film, and displacement arrangements |
| 06/24/2004 | DE10353869A1 Illustrating print form involves controlling intensity of light acting at one or more image point positions depending on measure of number of image points to be generated in position's surroundings |
| 06/24/2004 | DE10324466A1 Micro-lithographic projection exposure system, splits projection beam using polarization-dependent component, and combines to form output beam with parallel wavefronts |
| 06/24/2004 | DE10258718A1 Projektionsobjektiv, insbesondere für die Mikrolithographie, sowie Verfahren zur Abstimmung eines Projektionsobjektives Projection objective, in particular for microlithography, and processes for the tuning of a projection lens |
| 06/24/2004 | DE10258668A1 Flexographic plate production uses element with protective film that is peeled from photopolymerizable, relief-forming layer of elastomer binder, ethylenically unsaturated monomer and photoinitiator after exposure and before engraving |
| 06/24/2004 | DE10258142A1 Vorrichtung zur optischen Vermessung eines Abbildungssystems Apparatus for the optical measurement of an imaging system |
| 06/24/2004 | DE10255653A1 Reducing illumination device imaging errors involves determining auxiliary structures acting on working structure diffraction spectrum with dimensions less than optical resolution limit by simulation |
| 06/24/2004 | DE10255605A1 Reflektionsmaske zur Projektion einer Struktur auf einen Halbleiterwafer sowie Verfahren zu deren Herstellung Reflection mask for projecting a pattern on a semiconductor wafer, as well as processes for their preparation |
| 06/23/2004 | EP1432009A2 Electron beam exposure equipment and electron beam exposure method |
| 06/23/2004 | EP1431844A1 Assembly for the regulating organ of a watch movement |
| 06/23/2004 | EP1431831A1 Lithographic apparatus, device manufacturing method and substrate holder |
| 06/23/2004 | EP1431830A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/23/2004 | EP1431829A1 Lithographic projection apparatus |
| 06/23/2004 | EP1431828A1 Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system |
| 06/23/2004 | EP1431827A1 Lithographic apparatus, mirror element, device manufacturing method, and beam delivery system |
| 06/23/2004 | EP1431826A2 Projection lens, in particular for microlithography, and me thod for adjusting a projection lens |
| 06/23/2004 | EP1431825A1 Lithographic apparatus, device manufacturing method, and substrate holder |
| 06/23/2004 | EP1431824A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/23/2004 | EP1431823A2 Electronic device manufacture |
| 06/23/2004 | EP1431822A1 Positive photosensitive polyimide resin composition |
| 06/23/2004 | EP1431821A1 Pattern forming method and substance adherence pattern |
| 06/23/2004 | EP1431820A2 Method and system for classifying an integrated circuit for optical proximity correction |
| 06/23/2004 | EP1431710A2 Liquid flow proximity sensor for use in immersion lithography |
| 06/23/2004 | EP1431709A2 High-resolution gas gauge proximity sensor |
| 06/23/2004 | EP1431315A2 Photopolymerization initiator and photopolymerizable composition |
| 06/23/2004 | EP1431032A1 Polymerizable composition and lithographic printing plate precursor |
| 06/23/2004 | EP1431031A2 Printing form and method for modifying its wetting characteristics |
| 06/23/2004 | EP1431018A1 Method of producing resin molded product |
| 06/23/2004 | EP1430573A1 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM |
| 06/23/2004 | EP1430361A2 Carl for bioelectronics: substrate linkage using a conductive layer |
| 06/23/2004 | EP1430360A2 Screen printing process |
| 06/23/2004 | EP1430348A2 Method and apparatus for diffractive transfer of a mask grating |
| 06/23/2004 | EP1430346A1 Catadioptric reduction lens |
| 06/23/2004 | EP1430343A1 Method for fabricating chirped fiber bragg gratings |
| 06/23/2004 | EP1282839B1 Use of rta furnace for photoresist baking |
| 06/23/2004 | EP1201638B1 Photocurable composition containing iodonium salt compound |
| 06/23/2004 | EP0991959B1 Microlens scanner for microlithography and wide-field confocal microscopy |