| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/01/2004 | US20040123484 High pressure processing method and apparatus |
| 07/01/2004 | DE4428661B4 Lithographische Druckplatte A lithographic printing plate |
| 07/01/2004 | DE19611726B4 Blindstruktur zur Außeraxial-Belichtung Blind structure for off-axis illumination |
| 07/01/2004 | DE10356600A1 Printing plate with a silicon surface, useful for offset printing, comprises hydrophobic regions in which the silicon atoms are bonded to organic terminal groups other than single methyl or methoxy groups |
| 07/01/2004 | DE10261875A1 Cleaning system for removing contamination from surface of component in lithographic projection apparatus that is used in manufacture of integrated circuits, comprises cleaning particle provider with electric field generator |
| 07/01/2004 | DE10261775A1 Vorrichtung zur optischen Vermessung eines Abbildungssystems Apparatus for the optical measurement of an imaging system |
| 07/01/2004 | DE10260819A1 Method for producing micro-structured optical elements involves provision of an auxiliary layer with a surface structure, and transfer of this structure unaltered to a substrate |
| 07/01/2004 | DE10259599A1 Securing optical element holders together using screws, for projection lenses in microlithography, by measuring region of holder surface using interferometric measuring device, and varying torque to achieve uniform interference pattern |
| 07/01/2004 | DE10258709A1 Schutzsystem für reflektive optische Elemente, reflektives optisches Element und Verfahren zu deren Herstellung Protection system for reflective optical elements, reflective optical element, and processes for their preparation |
| 06/30/2004 | EP1434335A2 Alignment apparatus and exposure apparatus using the same |
| 06/30/2004 | EP1434292A1 Fuel cell and electronic device using fuel cell |
| 06/30/2004 | EP1434240A1 Illumination system, particularly for deep ultraviolet lithography |
| 06/30/2004 | EP1434102A1 Developer composition for lithographic printing plate |
| 06/30/2004 | EP1434101A2 Automatic processing method of photosensitive lithographic printing plate and automatic processing apparatus thereof |
| 06/30/2004 | EP1434100A2 Lithographic apparatus |
| 06/30/2004 | EP1434099A1 Device manufacturing method |
| 06/30/2004 | EP1434098A2 Contamination barrier with expandable lamellas |
| 06/30/2004 | EP1434097A2 Lithographic apparatus and device manufacturing method |
| 06/30/2004 | EP1434096A2 Lithographic apparatus and device manufacturing method |
| 06/30/2004 | EP1434095A1 Lithographic apparatus and device manufacturing method |
| 06/30/2004 | EP1434094A1 Container for a mask |
| 06/30/2004 | EP1434093A2 Catoptric projection system, exposure apparatus and device fabrication method |
| 06/30/2004 | EP1434092A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/30/2004 | EP1434091A1 Chemical-amplification-type positive radiation-sensitive resin composition |
| 06/30/2004 | EP1434090A1 Photosensitive resin composition |
| 06/30/2004 | EP1434089A1 Photo-polymerisable paste compositions |
| 06/30/2004 | EP1434068A2 Methods of forming waveguides that are rounded in cross section and waveguides formed therefrom |
| 06/30/2004 | EP1433595A2 Infrared-sensitive lithographic printing plate |
| 06/30/2004 | EP1433028A1 Negative-acting aqueous photoresist composition |
| 06/30/2004 | EP1433027A2 High-resolution photoresist structuring of multi-layer structures deposited onto substrates |
| 06/30/2004 | EP1252079A4 Wafer transport system |
| 06/30/2004 | CN1509424A Radiation-sensitive resin composition |
| 06/30/2004 | CN1509423A Resist material and microfabrication method |
| 06/30/2004 | CN1509404A Line Profile asymmetry measurement using sattero-metry |
| 06/30/2004 | CN1509233A Chemical imaging of lithographic printing plate |
| 06/30/2004 | CN1509199A Chemical Supply device and method thereof |
| 06/30/2004 | CN1508845A Photoresist supply system and method |
| 06/30/2004 | CN1508730A Automatic generation of measuring formule |
| 06/30/2004 | CN1508633A Developer solution composition and use method thereof |
| 06/30/2004 | CN1508631A Device producing method and device obtained therefrom, and computer programe and photoetching device |
| 06/30/2004 | CN1508629A Photoetching device, mirror element, device producing method and beam transfering system |
| 06/30/2004 | CN1508628A 图形发生器 Graphics Generator |
| 06/30/2004 | CN1508627A Silver halide emulsion with high image contrast, and preparing method and use thereof |
| 06/30/2004 | CN1508626A Development activating solution and use of it for preparing offset plate with high image contrast |
| 06/30/2004 | CN1508625A Negative photoresist resin coating liquid and preparing method thereof |
| 06/30/2004 | CN1508624A Polymerizable composition and plated printed plate fore-body |
| 06/30/2004 | CN1508623A Method for making sub-wavelength structure |
| 06/30/2004 | CN1508598A Method for producing liquid crystal display |
| 06/30/2004 | CN1508574A Radioactive-ray sensitive composition for colour optical filter, colouring-layer for mation method and use |
| 06/30/2004 | CN1508567A Method for making large relief deep micro lens array |
| 06/30/2004 | CN1508010A Printing plate and method for changing its moisture characteristic |
| 06/30/2004 | CN1507957A Rotary wet preparing process and apparatus for crystal circle washing |
| 06/30/2004 | CN1155665C Photosensitive resin composition of aqueous emulsion type |
| 06/29/2004 | US6757875 Method and apparatus of evaluating layer matching deviation based on CAD information |
| 06/29/2004 | US6757645 Visual inspection and verification system |
| 06/29/2004 | US6757316 Four KHz gas discharge laser |
| 06/29/2004 | US6757315 Corona preionization assembly for a gas laser |
| 06/29/2004 | US6757110 Catadioptric lithography system and method with reticle stage orthogonal to wafer stage |
| 06/29/2004 | US6757066 Multiple degree of freedom interferometer |
| 06/29/2004 | US6757053 Stage assembly including a reaction mass assembly |
| 06/29/2004 | US6757052 Single aperture optical system for photolithography systems |
| 06/29/2004 | US6757051 Projection optical system, manufacturing method thereof, and projection exposure apparatus |
| 06/29/2004 | US6757049 Apparatus and method for exposure |
| 06/29/2004 | US6757048 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method using the apparatus, and semiconductor manufacturing factory |
| 06/29/2004 | US6756980 Imaging simulation method and imaging simulation system using the same and recording medium programmed with the simulation method |
| 06/29/2004 | US6756751 Multiple degree of freedom substrate manipulator |
| 06/29/2004 | US6756706 Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines |
| 06/29/2004 | US6756599 Particle-optical apparatus, illumination apparatus and projection system as well as a method employing the same |
| 06/29/2004 | US6756420 Coating composition and a process to form a coating film with use thereof |
| 06/29/2004 | US6756418 Photosensitive resin compositions for color filter applications |
| 06/29/2004 | US6756319 Silica microstructure and fabrication method thereof |
| 06/29/2004 | US6756187 Method for removing patterned layer from lower layer through reflow |
| 06/29/2004 | US6756183 Imagewise exposing presensitized plate comprising grained and anodized substrate with photopolymerizable light-sensitive layer containing acrylic acid-itaconic acid copolymer and titanocene photoinitiator, then developing |
| 06/29/2004 | US6756180 Cyclic olefin-based resist compositions having improved image stability |
| 06/29/2004 | US6756179 A positive resist comprising: a resin capable of decomposing by the action of an acid to increase solubility in an alkali developer, and a compound capable of generating aromatic sulfonic acid substituted with a fluorine containing group |
| 06/29/2004 | US6756178 Novolak resin containing at least 20% by mole of a m-cresol repeating unit and having a 1- ethoxyethyl group substituting for part of hydrogen atoms of phenolic hydroxyl groups, (b) a quinonediazide ester of, and (c) 1,1-bis(4-hydroxyphenyl) |
| 06/29/2004 | US6756177 Multicolor recording |
| 06/29/2004 | US6756168 Determining exposure time of wafer photolithography process |
| 06/29/2004 | US6756167 Overlay target design method to minimize impact of lens aberrations |
| 06/29/2004 | US6756166 Active energy ray-curable resin having at least two unsaturated bonds; acid salt of n-substituted melamine or guanamine compound; photoinitiator; diluent; and thermosetting compound. |
| 06/29/2004 | US6756165 Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element |
| 06/29/2004 | US6756159 Method of preparing exposure data and method of preparing aperture mask data |
| 06/29/2004 | US6756120 Colored articles and compositions and methods for their fabrication |
| 06/29/2004 | US6755989 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 06/29/2004 | US6755579 Developer having substrate oscillating system and method of developing process |
| 06/24/2004 | WO2004054050A1 Ultraviolet light source, phototherapy apparatus using ultraviolet light source, and exposure system using ultraviolet light source |
| 06/24/2004 | WO2004053970A1 Stripping composition for removing a photoresist and method of manufacturing tft substrate for a liquid crystal display device using the same |
| 06/24/2004 | WO2004053959A1 Optical device and projection exposure apparatus using such optical device |
| 06/24/2004 | WO2004053958A1 Exposure apparatus and method for manufacturing device |
| 06/24/2004 | WO2004053957A1 Surface position detection apparatus, exposure method, and device porducing method |
| 06/24/2004 | WO2004053956A1 Exposure apparatus, exposure method and method for manufacturing device |
| 06/24/2004 | WO2004053955A1 Exposure system and device producing method |
| 06/24/2004 | WO2004053954A1 Exposure apparatus and method for manufacturing device |
| 06/24/2004 | WO2004053953A1 Exposure apparatus and method for manufacturing device |
| 06/24/2004 | WO2004053952A1 Exposure apparatus and method for manufacturing device |
| 06/24/2004 | WO2004053951A1 Exposure method, exposure apparatus and method for manufacturing device |
| 06/24/2004 | WO2004053950A1 Exposure apparatus and method for manufacturing device |
| 06/24/2004 | WO2004053938A2 Programmable photolithographic mask based on nano-sized semiconductor particles |
| 06/24/2004 | WO2004053596A2 Method for adjusting a desired optical property of a positioning lens and microlithographic projection exposure system |
| 06/24/2004 | WO2004053595A1 Positive type photoresist composition for lcd production and method of forming resist pattern |