Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2004
07/06/2004US6759670 Method for dynamic manipulation of a position of a module in an optical system
07/06/2004US6759666 Method and apparatus for charged particle beam exposure
07/06/2004US6759655 Inspection method, apparatus and system for circuit pattern
07/06/2004US6759483 Preparation of homo-, co- and terpolymers of substituted styrenes
07/06/2004US6759351 Method for eliminating development related defects in photoresist masks
07/06/2004US6759350 Method for improving contact hole patterning
07/06/2004US6759348 Pattern and its forming method of liquid crystal display device
07/06/2004US6759334 Semiconductor manufacturing apparatus and method
07/06/2004US6759317 Method of manufacturing semiconductor device having passivation film and buffer coating film
07/06/2004US6759185 Method for reuse of loaded developer
07/06/2004US6759184 Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers
07/06/2004US6759181 Protective layer for corrosion prevention during lithography and etch
07/06/2004US6759180 Method of fabricating sub-lithographic sized line and space patterns for nano-imprinting lithography
07/06/2004US6759179 Methods and systems for controlling resist residue defects at gate layer in a semiconductor device manufacturing process
07/06/2004US6759176 Positive-working resist composition
07/06/2004US6759175 Laminating multilayer of peelable support, image recording layer, adhesive and ultraviolet sensitive material; image-wise exposure ; flood exposure and development
07/06/2004US6759172 Color filter for a liquid crystal display and a liquid crystal display using the same
07/06/2004US6759141 Iridium molybdenide and/or iridium silicide
07/06/2004US6759104 Photocurable composition, cured product and process for producing the same
07/06/2004US6758938 Delivery of dissolved ozone
07/06/2004US6758912 Method of inhibiting contaminants using dilute acid rinse
07/06/2004US6758908 Solvent prewet and method and apparatus to dispense the solvent prewet
07/06/2004US6758612 System and method for developer endpoint detection by reflectometry or scatterometry
07/06/2004US6758313 Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systems
07/06/2004US6758063 Photolithography method, photolithography mask blanks, and method of making
07/06/2004CA2118604C Photopolymerizable composition comprising a squarylium compound
07/01/2004WO2004055879A1 Ozone-processing apparatus
07/01/2004WO2004055852A2 Field emission device, and method of manufacturing such a device
07/01/2004WO2004055803A1 Liquid removal in a method and device for irradiating spots on a layer
07/01/2004WO2004055607A2 Apparatus for processing an object with high position accurancy
07/01/2004WO2004055599A1 Resistor structures to electrically measure unidirectional misalignment of stitched masks
07/01/2004WO2004055598A1 Chemical amplification type silicone base positive photoresist composition
07/01/2004WO2004055597A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition
07/01/2004WO2004055596A1 Color filter black matrix resist composition
07/01/2004WO2004055595A2 Method for operating a developing machine and developing machine
07/01/2004WO2004055594A2 Method and system for determining characteristics of substrates employing fluid geometries
07/01/2004WO2004055593A2 Process for producing a heat resistant relief structure
07/01/2004WO2004055592A2 Stable non-photosensitive polyimide precursor compoistions for use in bilayer imaging systems
07/01/2004WO2004055585A1 Liquid crystal displays with post spacers, and their manufacture
07/01/2004WO2004055580A1 Manufacture of shaped structures in lcd cells, and masks therefor
07/01/2004WO2004055472A2 Method for aberration detection and measurement
07/01/2004WO2004054803A1 Method for producing flexoprinting forms by means of laser engraving using photopolymer flexoprinting elements and photopolymerisable flexoprinting element
07/01/2004WO2004054784A1 Magnification corrections employing out-of-plane distortions on a substrate
07/01/2004WO2004042473A3 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
07/01/2004WO2004031858A3 Resist system, use of a resist system and lithography method for the production of semiconductor elements
07/01/2004WO2004001797A3 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing
07/01/2004WO2003102690A3 Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography
07/01/2004WO2003093903A3 Projection method comprising pupillary filtration and a projection lens therefor
07/01/2004US20040128643 Method for communicating a measuring position of a structural element that is to be formed on a mask
07/01/2004US20040128630 Optimization of die yield in a silicon wafer "sweet spot"
07/01/2004US20040127595 Resin compositions, processes for preparing the resin compositions and processes for forming resin films
07/01/2004US20040127374 Composition and method for removing copper-compatible resist
07/01/2004US20040127065 Pattern and its forming method of liquid crystal display device
07/01/2004US20040127041 Substrate with amorphous carbon for removal with silicon oxygen layerwith chemical mechanical polishing
07/01/2004US20040127019 Film forming method and film forming apparatus
07/01/2004US20040126934 Manufacturing methods of semiconductor device and solid state image pickup device
07/01/2004US20040126919 Crystallization apparatus and crystallization method
07/01/2004US20040126917 Method of manufacturing liquid crystal display device
07/01/2004US20040126907 Alignment apparatus and exposure apparatus using the same
07/01/2004US20040126715 Method for employing vertical acid transport for lithographic imaging applications
07/01/2004US20040126714 Method for forming pattern using printing process
07/01/2004US20040126713 Substrate processing method and substrate processing apparatus
07/01/2004US20040126712 Pattern forming method and substance adherence pattern material
07/01/2004US20040126711 Method of depositing patterned films of materials using a positive imaging process
07/01/2004US20040126710 Mask for differential curing and process for making same
07/01/2004US20040126708 Digitally applying a photoreactive material comprising photochemical electron donor exposing to actinic radiation
07/01/2004US20040126705 Coating substrate with photoresist; selectively exposure, development, and removal; coating to smoothen roughness; crosslinking; integrated circuits
07/01/2004US20040126699 Photosensitive polymer containing silicon and a resist composition using the same
07/01/2004US20040126697 Photoimaging; positive-working and/or negative-working; semiconductors
07/01/2004US20040126696 Positively photosensitive insulating resin composition and cured object obtained therefrom
07/01/2004US20040126695 Fluoronorbornene, 7-azabicyclo[2.2.1]hept-5-ene and/or 7-oxobicyclo[2.2.1]hept-5-ene derivative monomers; photoresists, lithography
07/01/2004US20040126694 Microfabrication of organic optical elements
07/01/2004US20040126693 Positive photosensitive composition and method of pattern formation using the same
07/01/2004US20040126682 Elastomeric layer on support having surface containing imagewise printing relief, wherein top surface also contains in a non-image area a print control element comprising relief elements with defined height differences
07/01/2004US20040126681 Photosensitive transfer material comprising thermoplastic resin layer and intermediate layer each having specified surface potential, and method for producing color filter
07/01/2004US20040126680 Method of fabricating color filter substrate for liquid crystal display device
07/01/2004US20040126679 Depositing color filter film on transparent substrate, forming mask pattern which exposes part of film; radiating surface of color filter film; applying developer to remove unexposed color filter film and masked pattern
07/01/2004US20040126677 High resolution laserable assemblages for laser-induced thermal image transfer
07/01/2004US20040126676 Method of manufacturing color filter
07/01/2004US20040126673 Microlithography reticles including high-contrast reticle-identification codes, and apparatus and methods for identifying reticles based on such codes
07/01/2004US20040126671 Structure and process for a pellicle membrane for 157 nanometer lithography
07/01/2004US20040126169 Method and device for imaging a printing form
07/01/2004US20040126004 Evaluation method, position detection method, exposure method and device manufacturing method, and exposure apparatus
07/01/2004US20040125459 Optical integrator, illumination optical apparatus, exposure apparatus, and observation apparatus
07/01/2004US20040125355 Semiconductor manufacturing apparatus
07/01/2004US20040125353 Projection optical system and exposure apparatus equipped with the projection optical system
07/01/2004US20040125351 Immersion lithography
07/01/2004US20040125331 Liquid crystal display substrate fabrication
07/01/2004US20040125201 Card printing system and method
07/01/2004US20040125191 Method for adjusting processing parameters of at least one plate-shaped object in a processing tool
07/01/2004US20040125118 Method and an apparatus for controlling light intensity in connection with the exposure of photosensitive material
07/01/2004US20040124581 Drum for fixing sheet-type member
07/01/2004US20040124563 Multipass multiphoton absorption method and apparatus
07/01/2004US20040124441 Semiconductor wafer assemblies comprising photoresist over silicon nitride materials
07/01/2004US20040124412 Misalignment test structure and method thereof
07/01/2004US20040124373 Electrical discharge gas plasma EUV source insulator components
07/01/2004US20040124372 System and method for maskless lithography using an array of sources and an array of focusing elements
07/01/2004US20040124370 Process and system for curing clearcoats
07/01/2004US20040124369 Methods and apparatus for off-axis lithographic illumination
07/01/2004US20040124363 Method and apparatus for inspecting a pattern formed on a substrate