| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/08/2004 | US20040132855 Polymers, methods of use thereof, and methods of decomposition thereof |
| 07/08/2004 | US20040132303 Membrane 3D IC fabrication |
| 07/08/2004 | US20040132290 Method for the manufacture of micro structures |
| 07/08/2004 | US20040132225 Method for reducing dimensions between patterns on a photoresist |
| 07/08/2004 | US20040131980 Method for forming a pattern and substrate-processing apparatus |
| 07/08/2004 | US20040131979 Apparatus and method to improve resist line roughness in semiconductor wafer processing |
| 07/08/2004 | US20040131977 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 07/08/2004 | US20040131975 Photosensitive lithographic printing plate and method for making a printing plate |
| 07/08/2004 | US20040131974 Preventing peppering in nonimage portions; reducing sludge and cleaning load of developer tank; prewashing, exposing, washing with recycled post-exposure water then fresh water |
| 07/08/2004 | US20040131973 Imaging and developing layer containing binder, acid activated crosslinking agent and acid generator; simplification; infrared sensitive; arsenic and antimony free; easy handling and disposal |
| 07/08/2004 | US20040131972 Shelf stable image recording materials; water soluble or swellable polymer containing monomer having hydrogen bonding group, ring structure and terminal ethylenic unsaturated side chain and free radical generating compound |
| 07/08/2004 | US20040131971 Computer data direct recordable by infrared laser; high quality images; press life; support with layer containing carboxlyic acid functionalized acrylate or acrylamide binder, initiator, polyacrylated compound and infrared absorber |
| 07/08/2004 | US20040131970 Mechanical strength, chemical resistance; blending with adhesion surface treated nanoparticle filler |
| 07/08/2004 | US20040131968 Containing 2-hydroxyethyl-5-norbornene-2-carboxylate units; etch and heat resistance; substrate adhesiveness; tetramethylammonium hydroxide solution development; polymer and monomer synthesis |
| 07/08/2004 | US20040131967 Image forming composition and photosensitive lithographic plate using same |
| 07/08/2004 | US20040131965 Tetraisoprophyl methylene diphosphonate; ultra-UV light absorbance depressant |
| 07/08/2004 | US20040131964 Thick film containing partially naphthoquinonediazidosulfonyl ester substituted novalak resin and methyl vinyl ether-monoalkyl maleate polymer; high sensitivity and resolution, perpendicular geometry and crack resistance during and after plating |
| 07/08/2004 | US20040131963 Burr free lift off |
| 07/08/2004 | US20040131957 Low cost, precise, reliable ink jet printing; rapid refill; optimizing fluid flow, suppressing meniscus vibration; utilizing dehydration crosslinked terpolymer of methyl methacrylate-methacrylic acid-sensitivity region widening factor monomer |
| 07/08/2004 | US20040131956 Colored photosensitive resin composition and color filter comprising the same |
| 07/08/2004 | US20040131952 Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation |
| 07/08/2004 | US20040131951 Mask, manufacturing method for mask, and manufacturing method for semiconductor device |
| 07/08/2004 | US20040131949 Single ultraviolet radiation exposure |
| 07/08/2004 | US20040131948 Having antireflective coating on absorber layer |
| 07/08/2004 | US20040131946 System and method for fabrication and replication of diffractive optical elements for maskless lithography |
| 07/08/2004 | US20040131843 Nanolithography methods and products therefor and produced thereby |
| 07/08/2004 | US20040131352 Plate registering system and method of operation |
| 07/08/2004 | US20040130809 Focusing-device for the radiation from a light source |
| 07/08/2004 | US20040130806 Catadioptric system and exposure device having this system |
| 07/08/2004 | US20040130785 Fabrication methods for micro compound optics |
| 07/08/2004 | US20040130772 Compact imaging head and high speed multi-head laser imaging assembly and method |
| 07/08/2004 | US20040130711 Method of detecting mask defects, a computer program and reference substrate |
| 07/08/2004 | US20040130698 Managing method of exposure apparatus, managing method of mask, exposure method, and manufacturing method of semiconductor device |
| 07/08/2004 | US20040130697 Reflection preventing film modifying apparatus and reflection preventing film modifying method |
| 07/08/2004 | US20040130696 Method and apparatus for reducing focal-plane deviation in lithography |
| 07/08/2004 | US20040130695 Kit for converting a photolithography machine for treating semiconductor wafers of certain diameter to a machine for treating semiconductor wafers of larger diameter |
| 07/08/2004 | US20040130694 Reduced illumination radiation contamination |
| 07/08/2004 | US20040130693 Lithographic apparatus, optical element and device manufacturing method |
| 07/08/2004 | US20040130692 Substrate processing apparatus |
| 07/08/2004 | US20040130690 Alignment system and methods for lithographic systems using at least two wavelengths |
| 07/08/2004 | US20040130689 Defect compensation of lithography on non-planar surface |
| 07/08/2004 | US20040130688 Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method |
| 07/08/2004 | US20040130613 Method and and apparatus for imaging with multiple exposure heads |
| 07/08/2004 | US20040130561 Maskless lithography with multiplexed spatial light modulators |
| 07/08/2004 | US20040130220 Tube carrier reaction apparatus |
| 07/08/2004 | US20040129900 Device inspection |
| 07/08/2004 | US20040129898 Electron beam writing equipment and electron beam writing method |
| 07/08/2004 | US20040129896 Method and device for generating extreme ultravilolet radiation in particular for lithography |
| 07/08/2004 | US20040129895 Source multiplexing in lithography |
| 07/08/2004 | US20040129159 Plate material for printing and printing machine |
| 07/08/2004 | US20040128918 Control system and method for improving tracking accuracy of a stage through processing of information from previous operations |
| 07/08/2004 | DE4328838B4 Verfahren zur Herstellung von cyclischen N-Azidosulfonylarylimiden A process for producing cyclic N-Azidosulfonylarylimiden |
| 07/08/2004 | DE4116519B4 Licht-empfindliche Zusammensetzung Light-sensitive composition |
| 07/08/2004 | DE19502827B4 Projektions-Belichtungsgerät A projection exposure apparatus |
| 07/08/2004 | DE10259186A1 Receptacle for measuring instruments, such as interferometers has structural parts attached so that thermal expansion of structural side parts and connects has no effect in measuring direction |
| 07/08/2004 | DE10255667A1 Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit Radiation-sensitive elements with excellent storage stability |
| 07/08/2004 | DE10255664A1 Für lithographische Druckplatten geeignete Photopolymerzusammensetzung For lithographic printing plates suitable photopolymer composition |
| 07/08/2004 | DE10255663A1 Strahlungsempfindliche Elemente A radiation-sensitive elements |
| 07/08/2004 | DE10253919A1 Verfahren zur Justage eines Substrates in einem Gerät zur Durchführung einer Belichtung A method for adjusting a substrate in an apparatus for performing an exposure |
| 07/07/2004 | EP1435640A2 Electron beam writing equipment and method |
| 07/07/2004 | EP1435544A1 Method for forming image through reaction development |
| 07/07/2004 | EP1435289A1 Plate registering system and method of operation |
| 07/07/2004 | EP1435022A1 Aqueous developable photoimageable thick film compositions with photospeed enhancer |
| 07/07/2004 | EP1435021A1 Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes |
| 07/07/2004 | EP1435020A2 Aqueous developable photoimageable thick film compositions |
| 07/07/2004 | EP1435012A1 Method for apodizing a planar waveguide grating |
| 07/07/2004 | EP1435010A1 Photolithographic uv transmitting mixed fluoride crystal |
| 07/07/2004 | EP1292361A4 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 07/07/2004 | EP1274581B1 A method and an apparatus for controlling light intensity in connection with the exposure of photosensitive material |
| 07/07/2004 | EP1089871A4 Directed energy assisted in vacuo micro embossing |
| 07/07/2004 | CN1511166A Photo initiator compositions |
| 07/07/2004 | CN1510719A Mask and producing method, producing method for semiconductor device with this mask |
| 07/07/2004 | CN1510525A Dividing scale focus measuring system and method by multiple interferometric beams |
| 07/07/2004 | CN1510524A 微晶芯片像素位移方法 Microcrystalline chip pixel displacement method |
| 07/07/2004 | CN1510523A Impurity shielding with extendable slice |
| 07/07/2004 | CN1510522A Device manufacturing method |
| 07/07/2004 | CN1510521A Manufacturing method for photoetching device and component, substrate fixer |
| 07/07/2004 | CN1510520A Method and apparatus for providing lens aberration compensation by lighting source optimization |
| 07/07/2004 | CN1510519A Photoetching device with aligning subsystem, manufacturng method for device with alignment and aligning structure |
| 07/07/2004 | CN1510518A Photoetching device, manufacturing method for the component, and component therefrom |
| 07/07/2004 | CN1510517A Photoetching device and component producing meethod |
| 07/07/2004 | CN1510516A Photoetching device, manufacturing method for the component and component therefrom |
| 07/07/2004 | CN1510515A Photoetching device and method for manufacturing the apparatus |
| 07/07/2004 | CN1510394A High seeparation sharpness gasometer-type approach sensor |
| 07/07/2004 | CN1509869A Lithographic printing plate forebody |
| 07/07/2004 | CN1509838A Method for manufacturing non-lead solder lug |
| 07/07/2004 | CN1156900C Method and apparatus for quantifying proximity effect by measuring device performance |
| 07/07/2004 | CN1156389C Mechanism and method for transferring workpieces carriers between distributing box and receiving container |
| 07/07/2004 | CA2449619A1 Apparatus for producing a printing form |
| 07/06/2004 | US6760901 Trough adjusted optical proximity correction for dual damascene vias which takes into account the topography on a wafer created by prior wafer processing operations |
| 07/06/2004 | US6760892 Apparatus for evaluating lithography process margin simulating layout pattern of semiconductor device |
| 07/06/2004 | US6760641 Discrete time trajectory planner for lithography system |
| 07/06/2004 | US6760406 Method and apparatus for generating X-ray or EUV radiation |
| 07/06/2004 | US6760400 Exposing method and semiconductor device fabricated by the exposing method |
| 07/06/2004 | US6760167 Apparatus, system, and method for precision positioning and alignment of a lens in an optical system |
| 07/06/2004 | US6760101 Method for inspecting exposure apparatus |
| 07/06/2004 | US6760095 EUV condenser with non-imaging optics |
| 07/06/2004 | US6760094 Aligner |
| 07/06/2004 | US6760093 Image forming method and image forming apparatus |
| 07/06/2004 | US6760054 Imaging apparatus utilizing laser beams |