Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2004
07/15/2004US20040135468 Magnetic actuator under piezoelectric control
07/15/2004US20040135292 Stereolithography resins and methods
07/15/2004US20040135103 Thermionic-cathode for pre-ionization of an extreme ultraviolet (EUV) source supply
07/15/2004US20040135102 Charged-particle-beam exposure apparatus and method of controlling same
07/15/2004US20040135101 Pattern drawing method by scanning beam and pattern drawing apparatus
07/15/2004US20040135100 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography
07/15/2004US20040135099 Lithographic apparatus and device manufacturing method
07/15/2004US20040134883 Patterning method with micro-contact printing and its printed product
07/15/2004US20040134882 Soft lithography; crosslinking using photoinitiators; masking; patterning; curing
07/15/2004US20040134425 Coating film forming apparatus and coating unit
07/15/2004US20040134420 Apparatus and method for bubble-free application of a resin to a substrate
07/15/2004US20040134367 Image recording material conveying device and automatic image recording system
07/15/2004US20040134365 Printing plate material
07/15/2004DE19703969B4 Lufthaubensystem für eine Projektionslinse Air hood system for a projection lens
07/15/2004DE10357430A1 Arrangement for producing print forme has illustrating head on positionable holder with source(s) for generating image points for accepting printing ink on blank forme, temperature control arrangement
07/15/2004DE10261137A1 Projektionsoptik für die Lithographie und Spiegel für eine solche Projection optics for lithography and mirrors for such
07/15/2004DE10260615A1 Technik zum Verringern der Lackvergiftung bei der Herstellung einer Metallisierungsschicht mit einem Dielektrikum mit kleinem ε Technique for reducing the poisoning lacquer in the manufacture of a metallization layer with a dielectric with small ε
07/15/2004DE10259322A1 Making alignment mark in opaque layer on substrate, forms trenches of differing depth, fills selectively, then adds and polishes further layers to leave defined opaque mark
07/15/2004DE10259057A1 Photoresist composition for use in semiconductor lithography, contains a methacrylate copolymer with polycyclic siloxane groups in side chains as carrier polymer, plus photo-acid generator and solvent
07/15/2004DE10258248A1 Interferometric quality checking system for a mirror used in EUV-lithography, whereby a limited surface area is checked for non-rotationally symmetric errors so that rotationally symmetric parent body errors can be located
07/15/2004DE10257766A1 Verfahren zur Einstellung einer gewünschten optischen Eigenschaft eines Projektionsobjektivs sowie mikrolithografische Projektionsbelichtungsanlage Method for setting a desired optical property of a projection lens and microlithographic projection exposure apparatus
07/15/2004DE10256808A1 Projection exposure installation especially for micro-lithographic fabrication of integrated circuits, uses lock-devices to divide housing into two or more mutually fluid-tight sealed housing chambers
07/15/2004CA2550522A1 Photoresist removal
07/14/2004EP1437626A2 Method for replenishing developer of automatic developing apparatus for photosensitive lithographic printing plate
07/14/2004EP1437625A1 Image-forming composition and photosensitive lithographic plate using same
07/14/2004EP1437624A1 Stereolithographic resins containing selected oxetane compounds
07/14/2004EP1437232A2 A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser
07/14/2004EP1436670A2 Determination of center of focus by cross-section analysis
07/14/2004EP1436354A2 Process for making green pigment compositions useful for colour filters and lcd's
07/14/2004EP1436337A1 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization
07/14/2004EP1436297A1 Photoactivable nitrogen bases
07/14/2004EP1093417A4 Processless direct write imaging member containing polymer grafted carbon and methods of imaging and printing
07/14/2004CN1512990A Substituted oxime derivatives and the use thereof as latent acids
07/14/2004CN1512549A Drawing device with charged particle beam and its detecting method and control method for minification and rack phase position
07/14/2004CN1512545A Templet mask for charging-proof and its producing method
07/14/2004CN1512273A Mask box and method for transport light etched mask in box and scanning mask in box
07/14/2004CN1512271A Non-diazo naphthaquinone type positive map PS plate photosensitive composition and positive map thermosensitive CTP plate image forming composition
07/14/2004CN1512270A Method for flat-plate printing image using adic vertical transfer
07/14/2004CN1512269A Radioactive ray sensitive composition, black array, color filter and color liquid crystal display device
07/14/2004CN1512268A Infrared sensitive lithographic printing plate
07/14/2004CN1512266A Automatic processing method for photosensitive lithographic printing plate and its automatic processing device
07/14/2004CN1512265A External coating composition for photoresist agent and method for forming photoresist agent pattern using said composition
07/14/2004CN1512253A Method for producing liquid crystal display device
07/14/2004CN1511712A Original edition of lithographic printing plate
07/14/2004CN1157425C Photoactive polymers
07/14/2004CN1157359C Non-volatile phenylglyoxalic esters
07/13/2004US6763514 Method and apparatus for controlling rippling during optical proximity correction
07/13/2004US6762845 Multiple-pass interferometry
07/13/2004US6762826 Substrate attracting and holding system for use in exposure apparatus
07/13/2004US6762825 Focal point position detecting method in semiconductor exposure apparatus
07/13/2004US6762824 Correction apparatus that corrects optical shift in two optical units, and exposure apparatus having the same
07/13/2004US6762823 Illumination system and scanning exposure apparatus using the same
07/13/2004US6762822 Exposure apparatus and manufacturing method using the same
07/13/2004US6762821 Gas purge method and exposure apparatus
07/13/2004US6762820 Exposure apparatus and device manufacturing method
07/13/2004US6762787 Forming an image on a printing plate using ultrashort laser pulses
07/13/2004US6762786 Device for exposing thermosensitive media
07/13/2004US6762516 Electromagnetic actuator and exposure apparatus having the same
07/13/2004US6762433 Semiconductor product wafer having vertically and horizontally arranged patterned areas including a limited number of test element group regions
07/13/2004US6762432 Electrical field alignment vernier
07/13/2004US6762424 Plasma generation
07/13/2004US6762412 Optical apparatus, exposure apparatus using the same, and gas introduction method
07/13/2004US6762323 Aminobenzophenones and photopolymerizable compositions including the same
07/13/2004US6762268 Radiation transparent, sensitivity, chemical resistance
07/13/2004US6762223 Carbon pigment dispersible in water; polymer comprising at least one ionomeric polymer subunit; and at least one high molecular weight thickening agent which shows pseudoplastic behavior.
07/13/2004US6762133 System and method for control of hardmask etch to prevent pattern collapse of ultra-thin resists
07/13/2004US6762132 Compositions for dissolution of low-K dielectric films, and methods of use
07/13/2004US6762130 Method of photolithographically forming extremely narrow transistor gate elements
07/13/2004US6762113 Method for coating a semiconductor substrate with a mixture containing an adhesion promoter
07/13/2004US6762094 Nanometer-scale semiconductor devices and method of making
07/13/2004US6762012 Generating bubbles by heating ink; coating with negative photoresist
07/13/2004US6762009 Aqueous developable photoimageable thick film compositions with photospeed enhancer
07/13/2004US6762007 A blends comprising a partially etherified polyhydroxystyrene-p and a partially esterified polyhydroxystyrene-p with pivalic acid, an acid generators; photolithography activated by high-energy ultraviolet ray
07/13/2004US6762006 Solid particle dispersions and their use in the preparation of laser thermal media
07/13/2004US6762005 Sensitivity, definition, and stability of latent image before development, can yield a patterned resist thin film with high contrast, invites less scum and has satisfactory thermal resistance
07/13/2004US6762002 30-70% of an epoxide, 5-35% of an aromatic or cycloaliphatic acrylic, 0-40% of a hydroxyl-containing material, cationic and free-radical photoinitiators, exposing to actinic radiation
07/13/2004US6762001 Method of fabricating an exposure mask for semiconductor manufacture
07/13/2004US6762000 Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks
07/13/2004US6761930 Method of coating solution on substrate surface using a slit nozzle
07/13/2004US6761125 Coating film forming system
07/13/2004US6760960 Method of forming electrode pattern of surface acoustic wave device
07/08/2004WO2004057590A1 Method and device for irradiating spots on a layer
07/08/2004WO2004057589A1 Method and device for irradiating spots on a layer
07/08/2004WO2004057425A1 Method for the treatment of a resist system and corresponding device
07/08/2004WO2004057424A2 Illumination system having a more efficient collector optic
07/08/2004WO2004057423A1 Method and system for measuring the reproduction quality of an optical reproduction system
07/08/2004WO2004057422A1 Process for producing photoresist composition, filter, coater and photoresist composition
07/08/2004WO2004057421A2 Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin
07/08/2004WO2004057400A1 Projection optical system for lithography and mirror for said system
07/08/2004WO2004057380A1 Colored photosensitive composition for color filters, color filters, and process for the production thereof
07/08/2004WO2004057378A1 Coated optical element for corrective action obtained by producing layer thickness variations or by refraction factor variations in said coating
07/08/2004WO2004057295A2 Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine
07/08/2004WO2004040376B1 Radiation-sensitive resin composition
07/08/2004WO2004040369A3 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
07/08/2004WO2004038761A3 Self-aligning contacts for stacked electronics
07/08/2004WO2004030038A3 Compositions substrate for removing etching residue and use thereof
07/08/2004WO2003070809B1 Organosiloxanes and their use in dielectric films of semiconductors
07/08/2004US20040133872 Photomask designing method, pattern predicting method and computer program product
07/08/2004US20040133871 Matrix optical process correction
07/08/2004US20040132857 Esterified maleic anhydride-styrene copolymer; using photoinitiator and curing agents; shrinkage inhibition, flexibility; shelf life; for printed circuits