| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 07/15/2004 | US20040135468 Magnetic actuator under piezoelectric control |
| 07/15/2004 | US20040135292 Stereolithography resins and methods |
| 07/15/2004 | US20040135103 Thermionic-cathode for pre-ionization of an extreme ultraviolet (EUV) source supply |
| 07/15/2004 | US20040135102 Charged-particle-beam exposure apparatus and method of controlling same |
| 07/15/2004 | US20040135101 Pattern drawing method by scanning beam and pattern drawing apparatus |
| 07/15/2004 | US20040135100 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography |
| 07/15/2004 | US20040135099 Lithographic apparatus and device manufacturing method |
| 07/15/2004 | US20040134883 Patterning method with micro-contact printing and its printed product |
| 07/15/2004 | US20040134882 Soft lithography; crosslinking using photoinitiators; masking; patterning; curing |
| 07/15/2004 | US20040134425 Coating film forming apparatus and coating unit |
| 07/15/2004 | US20040134420 Apparatus and method for bubble-free application of a resin to a substrate |
| 07/15/2004 | US20040134367 Image recording material conveying device and automatic image recording system |
| 07/15/2004 | US20040134365 Printing plate material |
| 07/15/2004 | DE19703969B4 Lufthaubensystem für eine Projektionslinse Air hood system for a projection lens |
| 07/15/2004 | DE10357430A1 Arrangement for producing print forme has illustrating head on positionable holder with source(s) for generating image points for accepting printing ink on blank forme, temperature control arrangement |
| 07/15/2004 | DE10261137A1 Projektionsoptik für die Lithographie und Spiegel für eine solche Projection optics for lithography and mirrors for such |
| 07/15/2004 | DE10260615A1 Technik zum Verringern der Lackvergiftung bei der Herstellung einer Metallisierungsschicht mit einem Dielektrikum mit kleinem ε Technique for reducing the poisoning lacquer in the manufacture of a metallization layer with a dielectric with small ε |
| 07/15/2004 | DE10259322A1 Making alignment mark in opaque layer on substrate, forms trenches of differing depth, fills selectively, then adds and polishes further layers to leave defined opaque mark |
| 07/15/2004 | DE10259057A1 Photoresist composition for use in semiconductor lithography, contains a methacrylate copolymer with polycyclic siloxane groups in side chains as carrier polymer, plus photo-acid generator and solvent |
| 07/15/2004 | DE10258248A1 Interferometric quality checking system for a mirror used in EUV-lithography, whereby a limited surface area is checked for non-rotationally symmetric errors so that rotationally symmetric parent body errors can be located |
| 07/15/2004 | DE10257766A1 Verfahren zur Einstellung einer gewünschten optischen Eigenschaft eines Projektionsobjektivs sowie mikrolithografische Projektionsbelichtungsanlage Method for setting a desired optical property of a projection lens and microlithographic projection exposure apparatus |
| 07/15/2004 | DE10256808A1 Projection exposure installation especially for micro-lithographic fabrication of integrated circuits, uses lock-devices to divide housing into two or more mutually fluid-tight sealed housing chambers |
| 07/15/2004 | CA2550522A1 Photoresist removal |
| 07/14/2004 | EP1437626A2 Method for replenishing developer of automatic developing apparatus for photosensitive lithographic printing plate |
| 07/14/2004 | EP1437625A1 Image-forming composition and photosensitive lithographic plate using same |
| 07/14/2004 | EP1437624A1 Stereolithographic resins containing selected oxetane compounds |
| 07/14/2004 | EP1437232A2 A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser |
| 07/14/2004 | EP1436670A2 Determination of center of focus by cross-section analysis |
| 07/14/2004 | EP1436354A2 Process for making green pigment compositions useful for colour filters and lcd's |
| 07/14/2004 | EP1436337A1 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |
| 07/14/2004 | EP1436297A1 Photoactivable nitrogen bases |
| 07/14/2004 | EP1093417A4 Processless direct write imaging member containing polymer grafted carbon and methods of imaging and printing |
| 07/14/2004 | CN1512990A Substituted oxime derivatives and the use thereof as latent acids |
| 07/14/2004 | CN1512549A Drawing device with charged particle beam and its detecting method and control method for minification and rack phase position |
| 07/14/2004 | CN1512545A Templet mask for charging-proof and its producing method |
| 07/14/2004 | CN1512273A Mask box and method for transport light etched mask in box and scanning mask in box |
| 07/14/2004 | CN1512271A Non-diazo naphthaquinone type positive map PS plate photosensitive composition and positive map thermosensitive CTP plate image forming composition |
| 07/14/2004 | CN1512270A Method for flat-plate printing image using adic vertical transfer |
| 07/14/2004 | CN1512269A Radioactive ray sensitive composition, black array, color filter and color liquid crystal display device |
| 07/14/2004 | CN1512268A Infrared sensitive lithographic printing plate |
| 07/14/2004 | CN1512266A Automatic processing method for photosensitive lithographic printing plate and its automatic processing device |
| 07/14/2004 | CN1512265A External coating composition for photoresist agent and method for forming photoresist agent pattern using said composition |
| 07/14/2004 | CN1512253A Method for producing liquid crystal display device |
| 07/14/2004 | CN1511712A Original edition of lithographic printing plate |
| 07/14/2004 | CN1157425C Photoactive polymers |
| 07/14/2004 | CN1157359C Non-volatile phenylglyoxalic esters |
| 07/13/2004 | US6763514 Method and apparatus for controlling rippling during optical proximity correction |
| 07/13/2004 | US6762845 Multiple-pass interferometry |
| 07/13/2004 | US6762826 Substrate attracting and holding system for use in exposure apparatus |
| 07/13/2004 | US6762825 Focal point position detecting method in semiconductor exposure apparatus |
| 07/13/2004 | US6762824 Correction apparatus that corrects optical shift in two optical units, and exposure apparatus having the same |
| 07/13/2004 | US6762823 Illumination system and scanning exposure apparatus using the same |
| 07/13/2004 | US6762822 Exposure apparatus and manufacturing method using the same |
| 07/13/2004 | US6762821 Gas purge method and exposure apparatus |
| 07/13/2004 | US6762820 Exposure apparatus and device manufacturing method |
| 07/13/2004 | US6762787 Forming an image on a printing plate using ultrashort laser pulses |
| 07/13/2004 | US6762786 Device for exposing thermosensitive media |
| 07/13/2004 | US6762516 Electromagnetic actuator and exposure apparatus having the same |
| 07/13/2004 | US6762433 Semiconductor product wafer having vertically and horizontally arranged patterned areas including a limited number of test element group regions |
| 07/13/2004 | US6762432 Electrical field alignment vernier |
| 07/13/2004 | US6762424 Plasma generation |
| 07/13/2004 | US6762412 Optical apparatus, exposure apparatus using the same, and gas introduction method |
| 07/13/2004 | US6762323 Aminobenzophenones and photopolymerizable compositions including the same |
| 07/13/2004 | US6762268 Radiation transparent, sensitivity, chemical resistance |
| 07/13/2004 | US6762223 Carbon pigment dispersible in water; polymer comprising at least one ionomeric polymer subunit; and at least one high molecular weight thickening agent which shows pseudoplastic behavior. |
| 07/13/2004 | US6762133 System and method for control of hardmask etch to prevent pattern collapse of ultra-thin resists |
| 07/13/2004 | US6762132 Compositions for dissolution of low-K dielectric films, and methods of use |
| 07/13/2004 | US6762130 Method of photolithographically forming extremely narrow transistor gate elements |
| 07/13/2004 | US6762113 Method for coating a semiconductor substrate with a mixture containing an adhesion promoter |
| 07/13/2004 | US6762094 Nanometer-scale semiconductor devices and method of making |
| 07/13/2004 | US6762012 Generating bubbles by heating ink; coating with negative photoresist |
| 07/13/2004 | US6762009 Aqueous developable photoimageable thick film compositions with photospeed enhancer |
| 07/13/2004 | US6762007 A blends comprising a partially etherified polyhydroxystyrene-p and a partially esterified polyhydroxystyrene-p with pivalic acid, an acid generators; photolithography activated by high-energy ultraviolet ray |
| 07/13/2004 | US6762006 Solid particle dispersions and their use in the preparation of laser thermal media |
| 07/13/2004 | US6762005 Sensitivity, definition, and stability of latent image before development, can yield a patterned resist thin film with high contrast, invites less scum and has satisfactory thermal resistance |
| 07/13/2004 | US6762002 30-70% of an epoxide, 5-35% of an aromatic or cycloaliphatic acrylic, 0-40% of a hydroxyl-containing material, cationic and free-radical photoinitiators, exposing to actinic radiation |
| 07/13/2004 | US6762001 Method of fabricating an exposure mask for semiconductor manufacture |
| 07/13/2004 | US6762000 Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks |
| 07/13/2004 | US6761930 Method of coating solution on substrate surface using a slit nozzle |
| 07/13/2004 | US6761125 Coating film forming system |
| 07/13/2004 | US6760960 Method of forming electrode pattern of surface acoustic wave device |
| 07/08/2004 | WO2004057590A1 Method and device for irradiating spots on a layer |
| 07/08/2004 | WO2004057589A1 Method and device for irradiating spots on a layer |
| 07/08/2004 | WO2004057425A1 Method for the treatment of a resist system and corresponding device |
| 07/08/2004 | WO2004057424A2 Illumination system having a more efficient collector optic |
| 07/08/2004 | WO2004057423A1 Method and system for measuring the reproduction quality of an optical reproduction system |
| 07/08/2004 | WO2004057422A1 Process for producing photoresist composition, filter, coater and photoresist composition |
| 07/08/2004 | WO2004057421A2 Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin |
| 07/08/2004 | WO2004057400A1 Projection optical system for lithography and mirror for said system |
| 07/08/2004 | WO2004057380A1 Colored photosensitive composition for color filters, color filters, and process for the production thereof |
| 07/08/2004 | WO2004057378A1 Coated optical element for corrective action obtained by producing layer thickness variations or by refraction factor variations in said coating |
| 07/08/2004 | WO2004057295A2 Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine |
| 07/08/2004 | WO2004040376B1 Radiation-sensitive resin composition |
| 07/08/2004 | WO2004040369A3 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers |
| 07/08/2004 | WO2004038761A3 Self-aligning contacts for stacked electronics |
| 07/08/2004 | WO2004030038A3 Compositions substrate for removing etching residue and use thereof |
| 07/08/2004 | WO2003070809B1 Organosiloxanes and their use in dielectric films of semiconductors |
| 07/08/2004 | US20040133872 Photomask designing method, pattern predicting method and computer program product |
| 07/08/2004 | US20040133871 Matrix optical process correction |
| 07/08/2004 | US20040132857 Esterified maleic anhydride-styrene copolymer; using photoinitiator and curing agents; shrinkage inhibition, flexibility; shelf life; for printed circuits |