| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/20/2004 | US6764925 Semiconductor device manufacturing system and electron beam exposure apparatus |
| 07/20/2004 | US6764812 Plasma deposited selective wetting material |
| 07/20/2004 | US6764811 Pattern formation method |
| 07/20/2004 | US6764809 CO2-processes photoresists, polymers, and photoactive compounds for microlithography |
| 07/20/2004 | US6764808 Photolithographic exposing with two different wavelengths, the first wavelength is shorter than the second wavelength, achieve smaller resolution; polymerizing arylalkoxysilane compound to polysiloxanes |
| 07/20/2004 | US6764807 Lithography |
| 07/20/2004 | US6764806 Over-coating composition for photoresist, and processes for forming photoresist patterns using the same |
| 07/20/2004 | US6764805 Coating apparatus having a cascade wall and metering blade, and a cleaning and recirculation arrangement for the coating apparatus |
| 07/20/2004 | US6764803 Adhesion layer on the underside of the backing; laser-sensitive pigment on adhesion layer and/or backing |
| 07/20/2004 | US6764796 Maskless photolithography using plasma displays |
| 07/20/2004 | US6764794 Used for focus monitoring that measures the position of an exposed surface in an optical system in order to adjust focus of optical image on exposed surface |
| 07/20/2004 | US6764749 Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARC |
| 07/20/2004 | US6764619 Solid freeform fabrication of lightweight lithography stage |
| 07/20/2004 | US6764552 Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials |
| 07/20/2004 | US6764232 Developer exit tank for immersion type printing plate processor |
| 07/20/2004 | CA2360594C System for imaging a recording film |
| 07/20/2004 | CA2315740C Discharge lamp sources apparatus and methods |
| 07/20/2004 | CA2239785C Polariser made from brewster plates |
| 07/15/2004 | WO2004059710A1 Aberration measuring method, exposure method and exposure system |
| 07/15/2004 | WO2004059709A1 Coating device and coating film forming method |
| 07/15/2004 | WO2004059705A1 Apparatus and methods for dispensing fluids with rotatable dispense arms |
| 07/15/2004 | WO2004059700A2 Photoresist removal |
| 07/15/2004 | WO2004059699A2 System and method for on-the-fly eccentricity recognition |
| 07/15/2004 | WO2004059395A2 Method of measuring the performance of an illumination system |
| 07/15/2004 | WO2004059394A2 Determining lithographic parameters to optimise a process window |
| 07/15/2004 | WO2004059393A2 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and a resist layer |
| 07/15/2004 | WO2004059392A1 Positive resist composition and method for forming resist pattern |
| 07/15/2004 | WO2004059391A1 Resist composition and method of forming resist pattern using same |
| 07/15/2004 | WO2004059389A2 Sensitizer dyes for photoacid generating systems |
| 07/15/2004 | WO2004059387A1 Photosensitive composition and photosensitive lithography plate |
| 07/15/2004 | WO2004059386A1 Nano-imprint lithography method involving substrate pressing |
| 07/15/2004 | WO2004059247A1 Assessment and optimization for metrology instrument |
| 07/15/2004 | WO2004058699A2 Fluoroarylsulfonium photoacid generators |
| 07/15/2004 | WO2004058675A1 Adamantane derivative and process for producing the same |
| 07/15/2004 | WO2004047166A3 Process for using protective layers in the fabrication of electronic devices |
| 07/15/2004 | WO2004044025A3 Anti-reflective coatings for photolithography and methods of preparation thereof |
| 07/15/2004 | WO2004042472A3 Supercritical carbon dioxide/chemical formulation for removal of photoresists |
| 07/15/2004 | WO2004040371A3 Novel copolymer and photoresist compositions thereof |
| 07/15/2004 | WO2004025369A3 Method for lithographically structuring a substrate, and lacquer system |
| 07/15/2004 | WO2004017366A3 Reticle manipulating device |
| 07/15/2004 | WO2004017143A3 Method for irradiating a resist |
| 07/15/2004 | WO2004013697A3 Micro-contact printing method |
| 07/15/2004 | WO2004012014A3 Diagnosing system for an x-ray source assembly |
| 07/15/2004 | WO2004008246A3 Method and system for context-specific mask writing |
| 07/15/2004 | WO2003062739A3 Method and apparatus for compensation of time-varying optical properties of gas in interferometry |
| 07/15/2004 | US20040139420 Method for improving OPC modeling |
| 07/15/2004 | US20040139418 Automatic optical proximity correction (OPC) rule generation |
| 07/15/2004 | US20040138860 Methods of forming radiation-patterning tools; carrier waves and computer readable media |
| 07/15/2004 | US20040138842 Method for determining rotational error portion of total misalignment error in a stepper |
| 07/15/2004 | US20040138353 Chemical amplification type resist composition |
| 07/15/2004 | US20040138326 Acrylic resin formulations curable to clear, heat-resistant bodies |
| 07/15/2004 | US20040137759 Semiconductor device manufacturing method and semiconductor manufacturing apparatus |
| 07/15/2004 | US20040137677 Device manufacturing method and computer program |
| 07/15/2004 | US20040137651 enhanced cyclic durability without the problematic formation of dendrites; does not exhibit material film aging even when maintained in a low transmission state for extended periods of time; electrochromic window |
| 07/15/2004 | US20040137649 Method of fabricating semiconductor device comprising superposition inspection step |
| 07/15/2004 | US20040137397 Method of heating a substrate in a variable temperature process using a fixed temperature chuck |
| 07/15/2004 | US20040137384 Exposure substrate in vacuum; vibrating absorption supports ; gas springs; metal beellows; accuracy |
| 07/15/2004 | US20040137379 Photoresist stripping agent |
| 07/15/2004 | US20040137378 Agent for forming coating for narrowing patterns and method for forming fine pattern using the same |
| 07/15/2004 | US20040137377 Method for forming fine patterns |
| 07/15/2004 | US20040137376 Method and system for replicating film data to a metal substrate and article of manufacture |
| 07/15/2004 | US20040137375 Method for forming a structure element on a wafer by means of a mask and a trimming mask assigned hereto |
| 07/15/2004 | US20040137374 Method of forming photosensitive film pattern |
| 07/15/2004 | US20040137373 Forming barrier sidewall spacers; overcoating substrate with dielectric; anisotropic etching |
| 07/15/2004 | US20040137371 Protective coating for optic surfaces; microlithography; patterning semiconductor wafer |
| 07/15/2004 | US20040137370 Applying to printing plates; using infrared radiation oven; overcoating substrate; preheating; development |
| 07/15/2004 | US20040137369 Polymerizable composition and lithographic printing plate precursor |
| 07/15/2004 | US20040137368 Liquid radiation curable compound |
| 07/15/2004 | US20040137365 Development; wear resistance; using computers; support , heat sensitive layer |
| 07/15/2004 | US20040137364 Protective layers compatible with thick film pastes |
| 07/15/2004 | US20040137363 maleic anhydride; high resistance to etching and improved adhesion to a substrate; excellent photolithographic performance |
| 07/15/2004 | US20040137362 interpolymers of cyclic siloxane acrylates, e.g., 3-(3,5,7,9,11,13,15-heptaethylpentacyclo [9.5.1.13.9.15.15.17.13]octa-siloxan-1-yl) propyl methacrylate; high resolution photolithography |
| 07/15/2004 | US20040137360 blends of polymer compositions having high UV transparency which are useful as base resins in resists and potentially in many other applications such as photoimaging |
| 07/15/2004 | US20040137359 good in sensitivity and definition and is advantageously used for patterning a resist with less shrink |
| 07/15/2004 | US20040137343 method involves selecting features of a pattern to be imaged, notionally dividing the source into a plurality of source elements, for each source element, calculating the process window for each selected feature |
| 07/15/2004 | US20040137341 Fast and flexible method and system for grating overlay patterns, semiconductors |
| 07/15/2004 | US20040137340 Method for evaluating photo mask and method for manufacturing semiconductor device |
| 07/15/2004 | US20040137339 includes a pellicle assembly with a pellicle frame and a pellicle film coupled to a surface of the pellicle frame; A molecular sieve prevents airborne molecular contaminants (AMCs) generated during lithography from contaminating the photomask |
| 07/15/2004 | US20040137338 includes closely contacting, to a workpiece, a mask having an opening formed with lengthwise directions extending in orthogonal directions, and projecting onto the mask, exposure light being polarized in another direction |
| 07/15/2004 | US20040137336 for use in a photolithographic apparatus includes a blank layer, a layer of patterned opaque material on a surface of the blank layer and a pellicle of perfluoropolyether (PFPE) liquid that covers the surface |
| 07/15/2004 | US20040137335 alternating and attenuating phase shift masks that provide improved resolution of a photolithographic projection apparatus |
| 07/15/2004 | US20040137334 comprises a fluorine-contained photoreactive compound, used to form a recording section of a recording medium |
| 07/15/2004 | US20040137258 Multilayer light emitter has improved of preventing moisture migration and dispersing heat; coverings containing polymeric film layer, transparent inorganic electroconductive metal oxide film, metallic layer, dielectric layer |
| 07/15/2004 | US20040137241 Patternable low dielectric constsnt materials and their use in ULSI interconnection |
| 07/15/2004 | US20040137166 Cationic coating composition and coating film-forming method |
| 07/15/2004 | US20040137148 for gold surfaces; characterized by optical ellipsometry, contact angle goniometry, and polarization modulation infrared reflection absorption spectroscopy |
| 07/15/2004 | US20040136494 Lithographic apparatus and device manufacturing method |
| 07/15/2004 | US20040136102 Apparatus for generating parallel beam with high flux |
| 07/15/2004 | US20040136084 Optical element and manufacturing method therefor |
| 07/15/2004 | US20040136075 Diffuser plate and method of making same |
| 07/15/2004 | US20040136070 Speckle reduction method and system for EUV interferometry |
| 07/15/2004 | US20040136040 Lithography system with beam guidance and method for producing digital holograms in a storage medium |
| 07/15/2004 | US20040136003 Scatterometry for junction metrology |
| 07/15/2004 | US20040135987 Removable reticle window and support frame using magnetic force |
| 07/15/2004 | US20040135986 De-pellicle tool |
| 07/15/2004 | US20040135985 Lithographic projection apparatus with multiple suppression meshes |
| 07/15/2004 | US20040135984 Projection optical system, exposure apparatus, and device manufacturing method |
| 07/15/2004 | US20040135983 Lithography system |
| 07/15/2004 | US20040135981 Exposure apparatus and method |
| 07/15/2004 | US20040135980 In-process correction of stage mirror deformations during a photolithography exposure cycle |