| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/22/2004 | US20040141185 Compensation of refractivity perturbations in an interferometer path |
| 07/22/2004 | US20040141168 Imprint lithography template comprising alignment marks |
| 07/22/2004 | US20040141167 Optimization method of aperture type of projection aligner |
| 07/22/2004 | US20040141166 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/22/2004 | US20040141165 Radiation source, lithographic apparatus, and device manufacturing method |
| 07/22/2004 | US20040141164 Exposure method and exposure apparatus |
| 07/22/2004 | US20040141163 Device for holding a template for use in imprint lithography |
| 07/22/2004 | US20040140440 Illumination system, particularly for EUV lithography |
| 07/22/2004 | US20040140439 Electrode insulator materials for use in extreme ultraviolet electric discharge sources |
| 07/22/2004 | US20040140436 Transfer method and apparatus, exposure method and apparatus, method of manufacturing exposure apparatus, and device manufacturing method |
| 07/22/2004 | US20040140418 System and method for lithography process monitoring and control |
| 07/22/2004 | US20040139874 Conveying device |
| 07/22/2004 | DE10361649A1 Verfahren zum Herstellen einer Flüssigkristallanzeigevorrichtung A method of manufacturing a liquid crystal display device |
| 07/22/2004 | DE10361273A1 Vorrichtung und Verfahren zum Verbessern der Resistlinienrauhheit bei der Bearbeitung von Halbleiterscheiben Apparatus and method for improving the resist line roughness in the machining of semiconductor wafers |
| 07/22/2004 | DE10356663A1 Übertragung von Strukturen bei der Herstellung von Bauelementen Transfer of structures in the manufacture of components |
| 07/22/2004 | DE10334434A1 Verfahren und Gerät zum Reinigen eines Halbleitersubstrats Method and apparatus for cleaning a semiconductor substrate |
| 07/22/2004 | DE10261845A1 Verfahren zur Behandlung eines Resistsystems und Vorrichtung dafür A method for treating a resist system and apparatus therefor |
| 07/22/2004 | DE10260755A1 Verfahren zur Bildung eines Strukturelementes auf einem Wafer mittels einer Maske und einer ihr zugeordneten Trim-Maske A method for forming a structural element on a wafer with a mask and a trim mask assigned |
| 07/22/2004 | DE10260235A1 Verfahren zum Aufbringen einer Resistschicht, Verwendungen von Klebematerialien sowie Klebematerialien und Resistschicht A method of applying a resist layer, uses of adhesive materials and adhesive materials and resist layer, |
| 07/22/2004 | DE10259025A1 Verfahren zum Betreiben einer Entwicklermaschine und Entwicklermaschine Method for operating a developer machine and developing machine |
| 07/22/2004 | DE10254990A1 Verfahren zum Entfernen von organischen Rückständen von feinstrukturierten Oberflächen A method for removing organic residues finely structured surfaces |
| 07/22/2004 | CA2511790A1 Radiation curable aqueous compositions |
| 07/22/2004 | CA2505474A1 Method for modifying the surface of a polymeric substrate |
| 07/21/2004 | EP1439578A2 Method for dicing wafer |
| 07/21/2004 | EP1439428A2 Level sensor for lithographic apparatus |
| 07/21/2004 | EP1439427A2 Shearing interferometer for euv wavefront measurement |
| 07/21/2004 | EP1439426A2 Diffuser plate and method of making same |
| 07/21/2004 | EP1439425A1 Lithographic projection apparatus and device manufacturing method |
| 07/21/2004 | EP1439424A2 Detection assembly and lithographic projection apparatus provided with such a detection assembly |
| 07/21/2004 | EP1439423A2 Photosensitive lithographic printing plate |
| 07/21/2004 | EP1439422A1 Method of forming fine pattern |
| 07/21/2004 | EP1439421A2 Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid |
| 07/21/2004 | EP1439420A1 Simulation based method of optical proximity correction design for contact hole mask |
| 07/21/2004 | EP1439419A2 Method and apparatus for providing optical proximity correction features to a reticle pattern for optical lithography |
| 07/21/2004 | EP1439418A2 Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects |
| 07/21/2004 | EP1439058A2 Planographic printing plate precursor |
| 07/21/2004 | EP1439057A1 Image forming method |
| 07/21/2004 | EP1438774A2 Very narrow band, two chamber, high rep rate gas discharge laser system |
| 07/21/2004 | EP1438772A2 Line selected f 2? two chamber laser system |
| 07/21/2004 | EP1438738A2 Methods and apparatus for patterning a surface |
| 07/21/2004 | EP1438725A1 Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device |
| 07/21/2004 | EP1438637A2 Lithographic apparatus and device manufacturing method |
| 07/21/2004 | EP1438636A2 Real-time prediction of and correction of proyimity resist heating in raster scan particle beam lithography |
| 07/21/2004 | EP1438635A1 Fluorinated polymers having ester groups and photoresists for microlithography |
| 07/21/2004 | EP1438634A1 Holographic recording material and method for creating a light-resistant hologram |
| 07/21/2004 | EP1438633A2 Method for forming elliptical and rounded mask features using beam shaping |
| 07/21/2004 | EP1438628A2 Method and device for reducing speckle in an optical system |
| 07/21/2004 | EP1438347A1 Deodorizing agent for sulfur- or nitrogen-containing initiators |
| 07/21/2004 | EP1438128A2 Methods of patterning a monolayer |
| 07/21/2004 | EP1376242A9 Over-coating agent for forming fine patterns and a method of forming fine patterns using it |
| 07/21/2004 | EP1360881B1 Method for producing wirings with rough conducting structures and at least one area with fine conducting structures |
| 07/21/2004 | EP1269261B1 Solid imaging compositions for preparing polypropylene-like articles |
| 07/21/2004 | EP0900674A4 Method for forming a micro-relief on a metallic article and variants |
| 07/21/2004 | CN2627537Y Thin film semiconductor device, electrolight device and intermediate mask |
| 07/21/2004 | CN1514956A Thick film photoresists and methods for use thereof |
| 07/21/2004 | CN1514955A Lithographic template |
| 07/21/2004 | CN1514954A Semiconductor package and method of preparing same |
| 07/21/2004 | CN1514953A Exposure control for phase shifting photolithographic masks |
| 07/21/2004 | CN1514943A Preferred crystal orientation optical elements from cubic materials |
| 07/21/2004 | CN1514845A Oxime ester photoinitiatros having combined structure |
| 07/21/2004 | CN1514675A Mask and its mfg. method, electroluminescent apparatus and its mfg. method, and electronic apparatus |
| 07/21/2004 | CN1514307A Photoetching projection device |
| 07/21/2004 | CN1514306A Manufacturing method of photoetching equipment and device, and device obtained therefrom |
| 07/21/2004 | CN1514305A Manufacturing method of photoctching equipment having residue inhibiting device and device |
| 07/21/2004 | CN1514303A Graph of liquid crystal display device and its forming method |
| 07/21/2004 | CN1514302A Improved photo anticorrosion agent |
| 07/21/2004 | CN1514301A 改进的光引发剂 Improved photoinitiators |
| 07/21/2004 | CN1514280A Colour filter of liquid crystal display and liquid crystal display using said colour filter |
| 07/21/2004 | CN1513884A Photopolymerization initiator and composition capable of photopolymerization |
| 07/21/2004 | CN1158570C Phase shifting mask etching process of producing T-shaped grid through one photo-etching step |
| 07/21/2004 | CN1158569C Positive photo-resist composition |
| 07/21/2004 | CN1158161C Laser processing power output stabilization method |
| 07/20/2004 | US6766507 Mask/wafer control structure and algorithm for placement |
| 07/20/2004 | US6766339 Method and system for efficient and accurate filtering and interpolation |
| 07/20/2004 | US6766212 Identifying relationships among constituent parts of a wafer fabrication system |
| 07/20/2004 | US6766211 Mmeasuring and controlling single nanometer alignment; using unique mark combined with mathematical analysis |
| 07/20/2004 | US6765946 Fan for gas discharge laser |
| 07/20/2004 | US6765945 Injection seeded F2 laser with pre-injection filter |
| 07/20/2004 | US6765934 Laser repetition rate multiplier |
| 07/20/2004 | US6765729 Catadioptric reduction lens |
| 07/20/2004 | US6765724 Diffraction grating-based wavelength selection unit having improved polarization dependent performance |
| 07/20/2004 | US6765717 Preferred crystal orientation optical elements from cubic materials |
| 07/20/2004 | US6765712 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/20/2004 | US6765683 Interferometer system and method of manufacturing projection optical system using same |
| 07/20/2004 | US6765673 Pattern forming method and light exposure apparatus |
| 07/20/2004 | US6765651 Fast image simulation for photolithography |
| 07/20/2004 | US6765650 Vacuum compatible air bearing stage |
| 07/20/2004 | US6765649 Exposure apparatus and method |
| 07/20/2004 | US6765647 Exposure method and device |
| 07/20/2004 | US6765645 De-pellicle tool |
| 07/20/2004 | US6765604 Banding-reduced imaging of a printing form |
| 07/20/2004 | US6765282 Semiconductor structure and method for determining critical dimensions and overlay error |
| 07/20/2004 | US6765279 Membrane 3D IC fabrication |
| 07/20/2004 | US6765267 Pixel structure |
| 07/20/2004 | US6765218 Lithographic projection apparatus with positioning system for use with reflectors |
| 07/20/2004 | US6765204 Microstructured pattern inspection method |
| 07/20/2004 | US6765061 Holography; polyurethane coating; waterproofing |
| 07/20/2004 | US6764964 Method for forming patterns of a semiconductor device |
| 07/20/2004 | US6764946 Method of controlling line edge roughness in resist films |
| 07/20/2004 | US6764944 Low viscosity antireflectivity pattern |