| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/22/2014 | CN103529650A Height measurement device and height measurement method |
| 01/22/2014 | CN103529649A Negative fluorine-containing photoresist composition and application thereof in preparation of polymer optical waveguide device |
| 01/22/2014 | CN103529648A Negative type photosensitive material |
| 01/22/2014 | CN103529647A Photoresist composition, colorful film base plate and display device |
| 01/22/2014 | CN103529646A Green colored composition for color filter, and color filter |
| 01/22/2014 | CN103529645A Preparation method for nano-seal |
| 01/22/2014 | CN103529644A Nano embossing press |
| 01/22/2014 | CN103529643A Nano graphical system and light response characteristic detection device thereof |
| 01/22/2014 | CN103529641A Extreme ultraviolet lithography process and mask |
| 01/22/2014 | CN103529591A Color film substrate and preparation method thereof, display panel and preparation method thereof and display device |
| 01/22/2014 | CN103525434A Polymerizable compounds and use thereof in liquid crystal displays |
| 01/22/2014 | CN103525120A Metal azo pigments and pigment preparations produced from same, and production method and use thereof |
| 01/22/2014 | CN103524735A 感光型聚酰亚胺 Photosensitive polyimide |
| 01/22/2014 | CN103524711A Novel epoxy carboxylate compound, derivative thereof, active energy ray curable resin composition containing them, and cured product thereof |
| 01/22/2014 | CN103524680A Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist |
| 01/22/2014 | CN103524355A 1,3,5-tri(4-N,N'-dialkyl aniline) benzene organic compound and synthesis method thereof |
| 01/22/2014 | CN103521479A Cleaning device and linear coater |
| 01/22/2014 | CN102617375B Photo-initiation/halogen-free flame retardant and preparation method and application thereof |
| 01/22/2014 | CN102566286B Method for improving precision of rotating stage |
| 01/22/2014 | CN102540745B Exposure system based on control of principal component of space image |
| 01/22/2014 | CN102540739B Active driving cable table |
| 01/22/2014 | CN102540419B Large-view-field projection lithography objective lens |
| 01/22/2014 | CN102402127B Silicon chip prealignment device and silicon chip prealignment method |
| 01/22/2014 | CN102360169B Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method |
| 01/22/2014 | CN102257435B Silicon-containing resist underlayer film formation composition having anion group |
| 01/22/2014 | CN102209633B Method and device for preparing precursor of printing plate |
| 01/22/2014 | CN102197340B Exposure apparatus and photomask |
| 01/22/2014 | CN102165372B Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter |
| 01/22/2014 | CN102124412B Projection system, lithographic apparatus, method of projecting a beam of radiation onto a target and device manufacturing method |
| 01/22/2014 | CN102077143B Telecentricity corrector for microlithographic projection system |
| 01/22/2014 | CN102037312B Method and apparatus for overlay compensation between subsequently patterned layers on workpiece |
| 01/22/2014 | CN101946209B Silicon-containing resist underlayer film-forming composition containing cyclic amino group |
| 01/21/2014 | US8634063 Wafer with design printed outside active region and spaced by design tolerance of reticle blind |
| 01/21/2014 | US8634061 Exposure apparatus and device manufacturing method |
| 01/21/2014 | US8634060 Method for a multiple exposure, microlithography projection exposure installation and a projection system |
| 01/21/2014 | US8634059 Lithographic apparatus and device manufacturing method |
| 01/21/2014 | US8634058 Lithographic apparatus and device manufacturing method |
| 01/21/2014 | US8634057 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 01/21/2014 | US8634056 Lithographic apparatus and device manufacturing method |
| 01/21/2014 | US8633460 Reflective optical element, optical system EUV and lithography device |
| 01/21/2014 | US8632961 Flexographic processing solution and use |
| 01/21/2014 | US8632960 Method of forming resist pattern and negative tone-development resist composition |
| 01/21/2014 | US8632959 Flexographic printing plate assembly |
| 01/21/2014 | US8632958 Method of controlling surface roughness of a flexographic printing plate |
| 01/21/2014 | US8632957 Thermally crosslinkable resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, and relief printing plate and process for making same |
| 01/21/2014 | US8632956 Process for producing photosensitive resin plate and relief printing plate having recessed and projected pattern, and plate surface treating liquid used in the process |
| 01/21/2014 | US8632955 Conditioning a surface of an aluminium strip |
| 01/21/2014 | US8632954 Method for making a lithographic printer plate precursor |
| 01/21/2014 | US8632953 Process for making lithographic printing plate |
| 01/21/2014 | US8632951 Positive-working lithographic printing plate precursor for infrared laser and process for making lithographic printing plate |
| 01/21/2014 | US8632950 Cyanine dyes and lithographic printing plate precursors comprising such dyes |
| 01/21/2014 | US8632949 Lithographic printing plate support and presensitized plate |
| 01/21/2014 | US8632948 Positive-working photoimageable bottom antireflective coating |
| 01/21/2014 | US8632947 Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate |
| 01/21/2014 | US8632946 Positive-type photoresist composition |
| 01/21/2014 | US8632945 Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition |
| 01/21/2014 | US8632943 Near-infrared sensitive, positive-working, image forming composition and photographic element containing a 1,1-di[(alkylphenoxy)ethoxy]cyclohexane |
| 01/21/2014 | US8632942 Method of forming patterns |
| 01/21/2014 | US8632941 Negative-working lithographic printing plate precursors with IR dyes |
| 01/21/2014 | US8632940 Aluminum substrates and lithographic printing plate precursors |
| 01/21/2014 | US8632939 Polymer, chemically amplified positive resist composition and pattern forming process |
| 01/21/2014 | US8632938 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 01/21/2014 | US8632937 UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer |
| 01/21/2014 | US8632692 Compositions for use in semiconductor devices |
| 01/16/2014 | WO2014011609A1 Inverted nanocone structures for multifunctional surface and its fabrication process |
| 01/16/2014 | WO2014010592A1 Mark formation method and device manufacturing method |
| 01/16/2014 | WO2014010552A1 Illumination optical system, exposure device, and device manufacturing method |
| 01/16/2014 | WO2014010473A1 Photosensitive resin composition, photosensitive dry film, pattern formation method, printed circuit board, and method for producing same |
| 01/16/2014 | WO2014010392A1 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask |
| 01/16/2014 | WO2014010345A1 Photosensitive resin composition, conductive wire protection film, and touch panel member |
| 01/16/2014 | WO2014010274A1 Substrate treatment device and device manufacturing method |
| 01/16/2014 | WO2014010204A1 Alkali development type resin, and photosensitive resin composition using same |
| 01/16/2014 | WO2014009847A1 Compositions for anti pattern collapse treatment comprising gemini additives |
| 01/16/2014 | WO2014009120A1 Lithography apparatus with segmented mirror |
| 01/16/2014 | WO2014009100A1 Lithographic cluster system, method for calibrating a positioning device of a lithographic apparatus |
| 01/16/2014 | WO2014009042A1 Support for a movable element and lithography apparatus |
| 01/16/2014 | WO2014008994A1 Microlithographic projection exposure apparatus and method for varying an optical wavefront in a catoptric lens of such an apparatus |
| 01/16/2014 | WO2013143777A3 Substrate table system, lithographic apparatus and substrate table swapping method |
| 01/16/2014 | WO2013135494A3 Lithographic apparatus |
| 01/16/2014 | US20140017902 Nonaqueous cleaning liquid and method for etching processing of silicon substrate |
| 01/16/2014 | US20140017617 Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern |
| 01/16/2014 | US20140017616 Apparatus and method for developing process |
| 01/16/2014 | US20140017615 Apparatus and method for resist coating and developing |
| 01/16/2014 | US20140017614 Method of forming large-area masters for replication of transfer lithography templates |
| 01/16/2014 | US20140017611 Photoresist composition |
| 01/16/2014 | US20140017610 Lithography process and structures |
| 01/16/2014 | US20140017604 Lithography process |
| 01/16/2014 | US20140017603 Optical element, illumination device, measurement apparatus, photomask, exposure method, and device manufacturing method |
| 01/16/2014 | US20140016111 Exposure apparatus, calibration method, and method of manufacturing article |
| 01/16/2014 | US20140016110 Shear-Layer Chuck for Lithographic Apparatus |
| 01/16/2014 | US20140016109 Arrangement for actuating an element in a projection exposure apparatus |
| 01/16/2014 | US20140016108 Optical imaging device with image defect determination |
| 01/16/2014 | US20140016072 Metal azo pigments and pigment preparations produced therefrom |
| 01/16/2014 | US20140015900 Method of making superoleophobic re-entrant resist structures |
| 01/16/2014 | US20140014620 Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method |
| 01/16/2014 | DE102013101608A1 Vorrichtung und Verfahren für einen Entwicklungsprozess Apparatus and method for a development process |
| 01/16/2014 | DE102013001962A1 Lithographieprozess Lithography process |
| 01/16/2014 | DE102012212064A1 Lithographianlage mit segmentiertem Spiegel Lithographianlage with segmented mirror |
| 01/15/2014 | EP2683516A1 Laser fabrication system and method |
| 01/15/2014 | EP2315205B1 Apparatus for producing optical disk-use original and for producing optical disk |