| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/29/2004 | DE19921089B4 Verfahren zur Herstellung einer regelmäßigen Gesamtrasterstruktur und Anwendung des Verfahrens A process for producing a regular raster overall structure and use of the method |
| 07/29/2004 | DE19726835B4 Photomaske für einen Prozeßspielraumtest und ein Verfahren zum Durchführen eines Prozeßspielraumtests unter Verwendung dieser Maske Photomask for a process margin test and a method for performing a process margin test using this mask |
| 07/29/2004 | DE10361384A1 Strukturübertragung bei der Bauelementeherstellung Pattern transfer in the device fabrication |
| 07/29/2004 | DE10302765A1 Optical arrangement for a microlithographic projection unit has lenses of single axis double refraction material especially magnesium fluoride |
| 07/29/2004 | DE10302664A1 Facetted mirror and holder and production process for a microlithographic projection unit in extreme ultraviolet determines and corrects deviations in mounting |
| 07/29/2004 | DE10301475A1 Process and projection apparatus to illuminate a substrate with a structure pattern especially for semiconductors uses two or more separate mask steps with differently polarized light |
| 07/29/2004 | DE10140827B4 Vorrichtung zum Debonden von Dünnwafern Apparatus for Debonding of thin wafers |
| 07/28/2004 | EP1441381A2 Cooling of a device for influencing an electron beam |
| 07/28/2004 | EP1441257A2 Illumination apparatus, projection exposure apparatus, and device fabricating method |
| 07/28/2004 | EP1441256A1 Radiation-sensitive resin composition |
| 07/28/2004 | EP1440795A1 Printing method employing planographic printing plate precursor |
| 07/28/2004 | EP1440787A2 Three-dimensional structure forming method |
| 07/28/2004 | EP1440459A2 Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface |
| 07/28/2004 | EP1440457A2 A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor |
| 07/28/2004 | EP1440349A1 Method for the production of a semiconductor device |
| 07/28/2004 | EP1440348A1 Uv curable powder suitable for use as photoresist |
| 07/28/2004 | EP1349969A4 Semiconductor stripping composition containing 1,3-dicarbonyl compounds |
| 07/28/2004 | EP1268660B1 Lithographic printing plate having high chemical resistance |
| 07/28/2004 | EP1246706B1 Anti-reflective coating process and apparatus |
| 07/28/2004 | EP0674778B1 Process and device for generating dosage patterns for the production of structured surfaces |
| 07/28/2004 | CN2629068Y Optical scanning ultrahigh speed laser holographic read writer |
| 07/28/2004 | CN1516819A Objective with pupil obscuration |
| 07/28/2004 | CN1516236A Semiconductor integrated circuit device and mfg. method of multichip module |
| 07/28/2004 | CN1515963A Photoresist demoulding coposition and model forming method by using said composition |
| 07/28/2004 | CN1515962A Sensitive paste-like material, plasma display and mfg. method thereof |
| 07/28/2004 | CN1515961A Chemical amplification corrosion-resistant composition |
| 07/28/2004 | CN1515917A Optical filter |
| 07/28/2004 | CN1159628C An illumination unit and a method for point illumination of a medium |
| 07/28/2004 | CN1159627C Antireflective coating compostions for photoresist compositions and its imaging |
| 07/28/2004 | CN1159626C Light image-forming composition contg. light polymerizable adhesive oligomer |
| 07/28/2004 | CN1159625C Photosensitive thermosetting composition |
| 07/28/2004 | CN1159624C Optical imaging compsns for low polymer |
| 07/28/2004 | CN1159623C Radiation-sensitive compsn. of chemical amplification type containing onium salt type photosensitive acid generating agent |
| 07/28/2004 | CN1159319C Novel monomer and its polymer used for anti-photoetching agent, and their compositions |
| 07/27/2004 | US6768958 Automatic calibration of a masking process simulator |
| 07/27/2004 | US6768600 Temperature compensation apparatus for thermally loaded bodies of low thermal conductivity |
| 07/27/2004 | US6768567 Synchrotron-based EUV lithography illuminator simulator |
| 07/27/2004 | US6768546 Projection exposure apparatus and device manufacturing method using the same |
| 07/27/2004 | US6768539 Lithographic apparatus |
| 07/27/2004 | US6768537 Projection optical system, exposure apparatus, and exposure method |
| 07/27/2004 | US6768505 Method and apparatus for exposing printing forms |
| 07/27/2004 | US6768263 Short arc type mercury lamp |
| 07/27/2004 | US6768127 Device and method for wavelength dependent light outcoupling |
| 07/27/2004 | US6768125 Maskless particle-beam system for exposing a pattern on a substrate |
| 07/27/2004 | US6768118 Electron beam monitoring sensor and electron beam monitoring method |
| 07/27/2004 | US6768117 Immersion lens with magnetic shield for charged particle beam system |
| 07/27/2004 | US6767983 Silicone resin and photosensitive resin composition containing the same |
| 07/27/2004 | US6767771 Formation process of quantum dots or wires |
| 07/27/2004 | US6767694 Process for forming pattern and method for producing liquid crystal apparatus employing process for forming pattern |
| 07/27/2004 | US6767693 Materials and methods for sub-lithographic patterning of contact, via, and trench structures in integrated circuit devices |
| 07/27/2004 | US6767692 Forming photoresist-free and antireflective coating-free peripheral upper surface on substrate bounded by smooth and accurate sidewall on photoresist layer by photolithographic termination of outer perimeter of photoresist layer |
| 07/27/2004 | US6767691 Scattering-reticle assemblies for electron-beam microlithography including a scattering-stencil reticle portion and a scattering-membrane reticle portion |
| 07/27/2004 | US6767690 Methods of forming patterns across photoresist and methods of forming radiation-patterning tools |
| 07/27/2004 | US6767689 Antireflective coating compositions |
| 07/27/2004 | US6767688 A halogenated organic ammonium salt promoter, exposing and developing the photoresist layer to form a relief image, a microelectronic wafer coated with photoresist layer; enhancing lithographic performance |
| 07/27/2004 | US6767687 Polymer for chemically amplified resist and a resist composition using the same |
| 07/27/2004 | US6767686 Chemically amplifying type positive resist composition |
| 07/27/2004 | US6767685 Capable of recording a sharp image on photosensitive plate without being adversely influenced by laser flare and also capable of being applied to a process operation excuted in a light room |
| 07/27/2004 | US6767680 Semiconductor structure and method for determining critical dimensions and overlay error |
| 07/27/2004 | US6767678 Photosolder resist composition |
| 07/27/2004 | US6767676 Optical functional element and method of producing the same |
| 07/27/2004 | US6767674 Forming semiconductors; photoresist patterns; smooth edges |
| 07/27/2004 | US6767170 Wafer handling system and wafer handling method |
| 07/27/2004 | US6766742 Image exposure apparatus |
| 07/27/2004 | US6766740 Apparatus and method using a UV light collimator to expose a photopolymer plate |
| 07/22/2004 | WO2004061919A1 Method and apparatus for bilayer photoresist dry development |
| 07/22/2004 | WO2004061918A1 Pattern forming method, electronic device manufacturing method, electronic device, and photomask |
| 07/22/2004 | WO2004061526A1 Alkali-soluble gap filling material forming composition for lithography |
| 07/22/2004 | WO2004061525A1 Radiation-sensitive resin composition |
| 07/22/2004 | WO2004061019A1 Radiation curable aqueous compositions |
| 07/22/2004 | WO2004061006A1 Photocurable thermosetting conductive composition, conductive circuit formed from the conductive composition, and method of forming the same |
| 07/22/2004 | WO2004060983A1 Method for modifying the surface of a polymeric substrate |
| 07/22/2004 | WO2004049070A3 Photosensitive resin composition comprising a halogen-free colorant |
| 07/22/2004 | WO2004041454A3 Substrate processing apparatus and method |
| 07/22/2004 | WO2004013900A3 System and method for manufacturing embedded conformal electronics |
| 07/22/2004 | WO2003065120A3 Microcontact printing |
| 07/22/2004 | US20040143356 Multi-electron beam exposure method and apparatus |
| 07/22/2004 | US20040143082 Polysiloxane, process for production thereof and radiation-sensitive resin composition |
| 07/22/2004 | US20040142836 Resist and etching by-product removing composition and resist removing method using the same |
| 07/22/2004 | US20040142580 Silylation treatment unit and method |
| 07/22/2004 | US20040142576 Semiconductor fabrication method for making small features |
| 07/22/2004 | US20040142507 Tape stiffener, semiconductor device component assemblies including same, and stereolithographic methods for fabricating same |
| 07/22/2004 | US20040142286 Use of partially fluotinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet |
| 07/22/2004 | US20040142285 reacting substrate having exposed amino groups with linking agent having a carboxy group and protected amino groups, photolithography to expose amino groups, then reacting with carboxylated nanotubes using a coupler; high conductivity layer |
| 07/22/2004 | US20040142284 Method for dicing wafer |
| 07/22/2004 | US20040142283 Fabrication method of semiconductor integrated circuit device |
| 07/22/2004 | US20040142282 Alkyl ester developing solvent for photopolymerizable printing plates |
| 07/22/2004 | US20040142281 layer of hydrogen silsesquioxane on top of carbon layer; electrons passing through the resist layer conducted away through the carbon layer to prevent buildup of electrons which repel electrons from the e-beam resulting in a less focused e-beam |
| 07/22/2004 | US20040142280 unsaturated alkali-soluble resin from a carboxyl acid monomer, a monomer having a phenolic hydroxyl group (a-methyl-p-hydroxystyrene), another unsaturated monomer, and an unsaturated epoxy monomer; photoinitiator; unsaturated compound |
| 07/22/2004 | US20040142279 water-soluble polymer, particularly polyvinylpyrrolidone or a polyacrylamide; an acidic compound; and water; linewidth of positive photoresist patterns reduced, and linewidth of negative photoresist patterns prevented from slimming |
| 07/22/2004 | US20040142276 reaction product of an organohydrogenpolysiloxane, an alkenyl-organopolysiloxane and a diallyl bi- or bisphenol; curable by exposure to radiation having a wide range of wavelength; highly elastic, transparent, minute pattern |
| 07/22/2004 | US20040142275 Photosensitive resin composition, process for forming relief pattern, and electronic component |
| 07/22/2004 | US20040142274 cationically curable component having a linking aliphatic ester group; epoxy group containing component; oxetane group containing component, multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator |
| 07/22/2004 | US20040142272 photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization; control light reaction efficiency to obtain a high resolution pattern |
| 07/22/2004 | US20040142256 Alternate side lithographic substrate imaging |
| 07/22/2004 | US20040142254 high-quality color filter for multi-scene displays' forming a first density area corresponding to transmissive image reproduction and a second density area corresponding to a second density area |
| 07/22/2004 | US20040142251 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 07/22/2004 | US20040142249 making integrated circuits using absorbent transmission masks that can be repaired |
| 07/22/2004 | US20040142058 Apparatus and methods for use in stereolithographic processing of components and assemblies |
| 07/22/2004 | US20040141706 Optical devices incorporating photo reactive polymers |