Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2004
08/03/2004US6771353 Exposure apparatus and method, device manufacturing method, and discharge lamp
08/03/2004US6771352 Lithographic apparatus and device manufacturing method
08/03/2004US6771351 Projection exposure method and apparatus
08/03/2004US6771350 Exposure apparatus and exposure method capable of controlling illumination distribution
08/03/2004US6771301 Image setting apparatus having drum simulating supports
08/03/2004US6771299 Multibeam exposure head and multibeam exposure apparatus
08/03/2004US6770987 Brushless electric motors with reduced stray AC magnetic fields
08/03/2004US6770896 Method for generating extreme ultraviolet radiation based on a radiation-emitting plasma
08/03/2004US6770895 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
08/03/2004US6770894 Illumination system with field mirrors for producing uniform scanning energy
08/03/2004US6770866 Direct pattern writer
08/03/2004US6770780 Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin composition
08/03/2004US6770720 A copolymer of styrene and hdyroxyalkyl acrylate or hydroxyalkyl methacrylate
08/03/2004US6770686 2,4,6-triarylpyrylium salt; electron donor mixture of (i) a combination of an aromatic olefin and an aromatic carbonyl compound and/or (ii) a radical forming peroxy or azo compound.
08/03/2004US6770426 Supercritical compositions for removal of organic material and methods of using same
08/03/2004US6770425 Positive photoresists; exposure to actinic radiation; development; bright screens; controlled distribution of light
08/03/2004US6770424 Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms
08/03/2004US6770423 Thin film photoresists; concurrent development, hydrosilation
08/03/2004US6770422 Negative image-recording material and method of image formation
08/03/2004US6770421 Photo- or heat-curable resin composition and multilayer printed wiring board
08/03/2004US6770420 Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity
08/03/2004US6770419 Low silicon-outgassing resist for bilayer lithography
08/03/2004US6770418 Positive resist compositions containing non-polymeric silicon
08/03/2004US6770417 A negative resist composition comprising a constituent component which has a vinyl ether structure protected with an acetal in a molecule is a film forming polymer soluble in basic solution and has an alkali soluble group
08/03/2004US6770415 Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same
08/03/2004US6770414 Additive for photoresist composition for resist flow process
08/03/2004US6770413 Hydroxyphenyl copolymers and photoresists comprising same
08/03/2004US6770409 The simulation is based on calculations of resist development rate; resist is estimated by focusing on the separation of resist molecules that occurs during resist development
08/03/2004US6770408 X-ray transmission film is held by the holding frame with an even step-like structure defined at its peripheral portion.
08/03/2004US6770407 Methods for monitoring photoresists
08/03/2004US6770405 Color filter array having a blue filter layer
08/03/2004US6770404 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
08/03/2004US6770319 Imaging an external appearance of the resin extruded from a resin application device; and automatically adjusting an amount of the resin extruded from the resin application device based on the external appearance
08/03/2004US6770068 Controllable electro-optical patternable mask, system with said mask and method of using the same
07/2004
07/29/2004WO2004064128A1 Exposure system and exposure method
07/29/2004WO2004064127A1 Exposure apparatus and exposure method, device fabricating method, and measurement method and measurement instrument
07/29/2004WO2004064126A1 Charge particle exposure method, complementarily divided mask used for it, and semiconductor device produced by using the method
07/29/2004WO2004064055A1 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method
07/29/2004WO2004063822A1 Clock watch movement regulating member assembly
07/29/2004WO2004063817A1 Microstructure comprising an adhesive coating and method for making same
07/29/2004WO2004063816A1 Method for forming a lithographic printing plate
07/29/2004WO2004063815A2 Method and system for fabricating nanoscale patterns in light curable compositions using an electric field
07/29/2004WO2004063814A2 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels
07/29/2004WO2004063813A1 Apparatus and method of exposing light to a semiconductor device having a curved surface
07/29/2004WO2004063812A1 Apparatus and method of exposing a semiconductor device having a curved surface to light
07/29/2004WO2004063811A2 Method and apparatus for processing of radiation-sensitive patterning compositions
07/29/2004WO2004063695A1 A method to detect a defective pixel
07/29/2004WO2004062936A1 Combination mask
07/29/2004WO2004062899A2 Method for manufacturing of polymer micro needle array with liga process
07/29/2004WO2004047156B1 Position measurement method, position measurement device, exposure method, and exposure device
07/29/2004WO2004044660A3 Probability constrained optimization for electrical fabrication control
07/29/2004WO2004044653A3 Method and device for rastering source redundancy
07/29/2004WO2004033190A3 Film having a patterned fibrillar surface, and method and apparatus for making the film
07/29/2004WO2004027460A3 Replication and transfer of microstructures and nanostructures
07/29/2004WO2004012207A3 Optical device for high energy radiation
07/29/2004WO2004011258A3 Method of forming and repairing a lithographic template having a gap defect
07/29/2004WO2004010224A3 Projection objective for a projection exposure apparatus
07/29/2004WO2004008244A3 Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables
07/29/2004US20040148584 Mask pattern inspecting method, inspection apparatus, inspecting data used therein and inspecting data generating method
07/29/2004US20040147421 For removal of photoresist and flux while minimizing any etching of the substrate
07/29/2004US20040147420 Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal
07/29/2004US20040147129 Methods of masking and etching a semiconductor substrate, and ion implant lithography methods of processing a semiconductor substrate
07/29/2004US20040147121 Method and system for manufacturing a semiconductor device
07/29/2004US20040147066 Functionalizing si wafer or Au substrate with silane or disulfide perfluorophenylazides, applying a polymer such as polystyrene or poly2-ethyl-2-oxazoline on functionalized surface, exposing polymer in preferred pattern to covalently bond substrate with polymer; applying 2nd polymer, forming microwell
07/29/2004US20040146811 filling a monomer solution into interstices of colloidal crystals for photopolymerization inside them; masking; not only more simplified two-dimensional patterns but also complicated two- or three-dimensional patterns can be obtained
07/29/2004US20040146809 superior anti-refractivity and dry-etch resistance in a bi-layer resist process employing a light source having a wavelength of 193 nm or below
07/29/2004US20040146808 an assembly of lithographic sub-masks together forming a fictitious design mask for configuring a device pattern in a layer of a substrate
07/29/2004US20040146807 precise curved surfaces, high numerical apertures (NAs), and low aberration; photolithography; transferring the profile of a photoresist mask
07/29/2004US20040146806 flexographic plates; increased toughness, less tack, reduced cold flow, and higher hardness
07/29/2004US20040146804 Photosensitive lithographic printing plate
07/29/2004US20040146802 Radiation-sensitive resin composition
07/29/2004US20040146801 Positive photosensitive resin compositions and semiconductor device
07/29/2004US20040146800 scratch resistance on the high alkali concentration side while maintaining a high sensitivity in a recording layer
07/29/2004US20040146792 Dimensional variations in the original pattern are produced by bending the mold, defining a varied pattern
07/29/2004US20040146790 coating a photomask substrate with a chemically amplified photoresist containing a modified phenolic polymer, and an onium salt-containing chemical amplifier; coating ; baking such chemically amplified photoresist on said photomask substrate
07/29/2004US20040146789 based on discovery that the flatness of the mask substrate was degraded after chucked depending on the surface shape of the mask substrate, and found that such degraded flatness was a major cause to lower the product yield
07/29/2004US20040146788 Method of manufacturing a photo mask and method of manufacturing a semiconductor device
07/29/2004US20040146648 Overcoating a substrate with photoresist; receiving an image; determination of time; adjustment of fluid flow
07/29/2004US20040146336 Device for holding measurement instruments
07/29/2004US20040146328 Automatic processing method of photosensitive lithographic printing plate and automatic processing apparatus thereof
07/29/2004US20040146263 Process for producing polyimide optical waveguide
07/29/2004US20040146139 X-ray mask and method for making
07/29/2004US20040146082 Laser spectral engineering for lithographic process
07/29/2004US20040145806 Correction of birefringence in cubic crystalline optical systems
07/29/2004US20040145794 Apparatus and method for selectively exposing photosensitive materials using a spatial light modulator
07/29/2004US20040145751 Square wafer chuck with mirror
07/29/2004US20040145716 Purging gas from a photolithography enclosure between a mask protective device and a patterned mask
07/29/2004US20040145714 Tailored reflecting diffractor for EUV lithographic system aberration measurement
07/29/2004US20040145713 Movable stage apparatus
07/29/2004US20040145712 Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured thereby
07/29/2004US20040145646 Device for producing a printing form
07/29/2004US20040145029 A method of forming an arc layer for a semiconductor device
07/29/2004US20040144931 Cooling of a device for influencing an electron beam
07/29/2004US20040144915 Catadioptric projection objective with adaptive mirror and projection exposure method
07/29/2004US20040144753 Photoresist composition for multi-micro nozzle head coater
07/29/2004US20040144752 Resist compositions and patterning process
07/29/2004US20040144736 A Chemical Liquid Supply Apparatus and A Chemical Liquid Supply Method
07/29/2004US20040144488 Semiconductor wafer processing apparatus
07/29/2004US20040144317 Mask used for layer formation and process of making the mask
07/29/2004DE4111060B4 Positiv arbeitende lichtempfindliche Zusammensetzung The positive-working light-sensitive composition