| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/03/2004 | US6771353 Exposure apparatus and method, device manufacturing method, and discharge lamp |
| 08/03/2004 | US6771352 Lithographic apparatus and device manufacturing method |
| 08/03/2004 | US6771351 Projection exposure method and apparatus |
| 08/03/2004 | US6771350 Exposure apparatus and exposure method capable of controlling illumination distribution |
| 08/03/2004 | US6771301 Image setting apparatus having drum simulating supports |
| 08/03/2004 | US6771299 Multibeam exposure head and multibeam exposure apparatus |
| 08/03/2004 | US6770987 Brushless electric motors with reduced stray AC magnetic fields |
| 08/03/2004 | US6770896 Method for generating extreme ultraviolet radiation based on a radiation-emitting plasma |
| 08/03/2004 | US6770895 Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
| 08/03/2004 | US6770894 Illumination system with field mirrors for producing uniform scanning energy |
| 08/03/2004 | US6770866 Direct pattern writer |
| 08/03/2004 | US6770780 Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin composition |
| 08/03/2004 | US6770720 A copolymer of styrene and hdyroxyalkyl acrylate or hydroxyalkyl methacrylate |
| 08/03/2004 | US6770686 2,4,6-triarylpyrylium salt; electron donor mixture of (i) a combination of an aromatic olefin and an aromatic carbonyl compound and/or (ii) a radical forming peroxy or azo compound. |
| 08/03/2004 | US6770426 Supercritical compositions for removal of organic material and methods of using same |
| 08/03/2004 | US6770425 Positive photoresists; exposure to actinic radiation; development; bright screens; controlled distribution of light |
| 08/03/2004 | US6770424 Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms |
| 08/03/2004 | US6770423 Thin film photoresists; concurrent development, hydrosilation |
| 08/03/2004 | US6770422 Negative image-recording material and method of image formation |
| 08/03/2004 | US6770421 Photo- or heat-curable resin composition and multilayer printed wiring board |
| 08/03/2004 | US6770420 Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity |
| 08/03/2004 | US6770419 Low silicon-outgassing resist for bilayer lithography |
| 08/03/2004 | US6770418 Positive resist compositions containing non-polymeric silicon |
| 08/03/2004 | US6770417 A negative resist composition comprising a constituent component which has a vinyl ether structure protected with an acetal in a molecule is a film forming polymer soluble in basic solution and has an alkali soluble group |
| 08/03/2004 | US6770415 Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same |
| 08/03/2004 | US6770414 Additive for photoresist composition for resist flow process |
| 08/03/2004 | US6770413 Hydroxyphenyl copolymers and photoresists comprising same |
| 08/03/2004 | US6770409 The simulation is based on calculations of resist development rate; resist is estimated by focusing on the separation of resist molecules that occurs during resist development |
| 08/03/2004 | US6770408 X-ray transmission film is held by the holding frame with an even step-like structure defined at its peripheral portion. |
| 08/03/2004 | US6770407 Methods for monitoring photoresists |
| 08/03/2004 | US6770405 Color filter array having a blue filter layer |
| 08/03/2004 | US6770404 Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| 08/03/2004 | US6770319 Imaging an external appearance of the resin extruded from a resin application device; and automatically adjusting an amount of the resin extruded from the resin application device based on the external appearance |
| 08/03/2004 | US6770068 Controllable electro-optical patternable mask, system with said mask and method of using the same |
| 07/29/2004 | WO2004064128A1 Exposure system and exposure method |
| 07/29/2004 | WO2004064127A1 Exposure apparatus and exposure method, device fabricating method, and measurement method and measurement instrument |
| 07/29/2004 | WO2004064126A1 Charge particle exposure method, complementarily divided mask used for it, and semiconductor device produced by using the method |
| 07/29/2004 | WO2004064055A1 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method |
| 07/29/2004 | WO2004063822A1 Clock watch movement regulating member assembly |
| 07/29/2004 | WO2004063817A1 Microstructure comprising an adhesive coating and method for making same |
| 07/29/2004 | WO2004063816A1 Method for forming a lithographic printing plate |
| 07/29/2004 | WO2004063815A2 Method and system for fabricating nanoscale patterns in light curable compositions using an electric field |
| 07/29/2004 | WO2004063814A2 Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels |
| 07/29/2004 | WO2004063813A1 Apparatus and method of exposing light to a semiconductor device having a curved surface |
| 07/29/2004 | WO2004063812A1 Apparatus and method of exposing a semiconductor device having a curved surface to light |
| 07/29/2004 | WO2004063811A2 Method and apparatus for processing of radiation-sensitive patterning compositions |
| 07/29/2004 | WO2004063695A1 A method to detect a defective pixel |
| 07/29/2004 | WO2004062936A1 Combination mask |
| 07/29/2004 | WO2004062899A2 Method for manufacturing of polymer micro needle array with liga process |
| 07/29/2004 | WO2004047156B1 Position measurement method, position measurement device, exposure method, and exposure device |
| 07/29/2004 | WO2004044660A3 Probability constrained optimization for electrical fabrication control |
| 07/29/2004 | WO2004044653A3 Method and device for rastering source redundancy |
| 07/29/2004 | WO2004033190A3 Film having a patterned fibrillar surface, and method and apparatus for making the film |
| 07/29/2004 | WO2004027460A3 Replication and transfer of microstructures and nanostructures |
| 07/29/2004 | WO2004012207A3 Optical device for high energy radiation |
| 07/29/2004 | WO2004011258A3 Method of forming and repairing a lithographic template having a gap defect |
| 07/29/2004 | WO2004010224A3 Projection objective for a projection exposure apparatus |
| 07/29/2004 | WO2004008244A3 Defect inspection methods that include acquiring aerial images of a reticle for different lithographic process variables |
| 07/29/2004 | US20040148584 Mask pattern inspecting method, inspection apparatus, inspecting data used therein and inspecting data generating method |
| 07/29/2004 | US20040147421 For removal of photoresist and flux while minimizing any etching of the substrate |
| 07/29/2004 | US20040147420 Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal |
| 07/29/2004 | US20040147129 Methods of masking and etching a semiconductor substrate, and ion implant lithography methods of processing a semiconductor substrate |
| 07/29/2004 | US20040147121 Method and system for manufacturing a semiconductor device |
| 07/29/2004 | US20040147066 Functionalizing si wafer or Au substrate with silane or disulfide perfluorophenylazides, applying a polymer such as polystyrene or poly2-ethyl-2-oxazoline on functionalized surface, exposing polymer in preferred pattern to covalently bond substrate with polymer; applying 2nd polymer, forming microwell |
| 07/29/2004 | US20040146811 filling a monomer solution into interstices of colloidal crystals for photopolymerization inside them; masking; not only more simplified two-dimensional patterns but also complicated two- or three-dimensional patterns can be obtained |
| 07/29/2004 | US20040146809 superior anti-refractivity and dry-etch resistance in a bi-layer resist process employing a light source having a wavelength of 193 nm or below |
| 07/29/2004 | US20040146808 an assembly of lithographic sub-masks together forming a fictitious design mask for configuring a device pattern in a layer of a substrate |
| 07/29/2004 | US20040146807 precise curved surfaces, high numerical apertures (NAs), and low aberration; photolithography; transferring the profile of a photoresist mask |
| 07/29/2004 | US20040146806 flexographic plates; increased toughness, less tack, reduced cold flow, and higher hardness |
| 07/29/2004 | US20040146804 Photosensitive lithographic printing plate |
| 07/29/2004 | US20040146802 Radiation-sensitive resin composition |
| 07/29/2004 | US20040146801 Positive photosensitive resin compositions and semiconductor device |
| 07/29/2004 | US20040146800 scratch resistance on the high alkali concentration side while maintaining a high sensitivity in a recording layer |
| 07/29/2004 | US20040146792 Dimensional variations in the original pattern are produced by bending the mold, defining a varied pattern |
| 07/29/2004 | US20040146790 coating a photomask substrate with a chemically amplified photoresist containing a modified phenolic polymer, and an onium salt-containing chemical amplifier; coating ; baking such chemically amplified photoresist on said photomask substrate |
| 07/29/2004 | US20040146789 based on discovery that the flatness of the mask substrate was degraded after chucked depending on the surface shape of the mask substrate, and found that such degraded flatness was a major cause to lower the product yield |
| 07/29/2004 | US20040146788 Method of manufacturing a photo mask and method of manufacturing a semiconductor device |
| 07/29/2004 | US20040146648 Overcoating a substrate with photoresist; receiving an image; determination of time; adjustment of fluid flow |
| 07/29/2004 | US20040146336 Device for holding measurement instruments |
| 07/29/2004 | US20040146328 Automatic processing method of photosensitive lithographic printing plate and automatic processing apparatus thereof |
| 07/29/2004 | US20040146263 Process for producing polyimide optical waveguide |
| 07/29/2004 | US20040146139 X-ray mask and method for making |
| 07/29/2004 | US20040146082 Laser spectral engineering for lithographic process |
| 07/29/2004 | US20040145806 Correction of birefringence in cubic crystalline optical systems |
| 07/29/2004 | US20040145794 Apparatus and method for selectively exposing photosensitive materials using a spatial light modulator |
| 07/29/2004 | US20040145751 Square wafer chuck with mirror |
| 07/29/2004 | US20040145716 Purging gas from a photolithography enclosure between a mask protective device and a patterned mask |
| 07/29/2004 | US20040145714 Tailored reflecting diffractor for EUV lithographic system aberration measurement |
| 07/29/2004 | US20040145713 Movable stage apparatus |
| 07/29/2004 | US20040145712 Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured thereby |
| 07/29/2004 | US20040145646 Device for producing a printing form |
| 07/29/2004 | US20040145029 A method of forming an arc layer for a semiconductor device |
| 07/29/2004 | US20040144931 Cooling of a device for influencing an electron beam |
| 07/29/2004 | US20040144915 Catadioptric projection objective with adaptive mirror and projection exposure method |
| 07/29/2004 | US20040144753 Photoresist composition for multi-micro nozzle head coater |
| 07/29/2004 | US20040144752 Resist compositions and patterning process |
| 07/29/2004 | US20040144736 A Chemical Liquid Supply Apparatus and A Chemical Liquid Supply Method |
| 07/29/2004 | US20040144488 Semiconductor wafer processing apparatus |
| 07/29/2004 | US20040144317 Mask used for layer formation and process of making the mask |
| 07/29/2004 | DE4111060B4 Positiv arbeitende lichtempfindliche Zusammensetzung The positive-working light-sensitive composition |