| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/05/2004 | WO2004037866A3 Photoresists containing sulfonamide component |
| 08/05/2004 | WO2004034146A3 Lighting system comprising a device for adjusting the light intensity |
| 08/05/2004 | WO2004001508A3 Method and apparatus for maskless photolithography |
| 08/05/2004 | US20040153989 Pattern writing method capable of preventing or reducing an error between design dimensions and finished dimensions of a pattern |
| 08/05/2004 | US20040153293 Transducer-based sensor system |
| 08/05/2004 | US20040152860 Positive resist composition and base material carrying layer of the positive resist composition |
| 08/05/2004 | US20040152798 Photo-initiator compositions |
| 08/05/2004 | US20040152608 Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| 08/05/2004 | US20040152329 Method for manufacturing semiconductor electronic devices |
| 08/05/2004 | US20040152323 Liquid film layer is provided between the photosensitive resist layer and a photomask containing a light shielding film with an opening portion, the resist layer is exposed with near field light through opening and liquid film layer |
| 08/05/2004 | US20040152024 Flood exposure of photoresist to eliminate pullback; shrinkage inhibition |
| 08/05/2004 | US20040152022 Resist remover composition |
| 08/05/2004 | US20040152021 Three-dimensional structure forming method |
| 08/05/2004 | US20040152019 Diisopropylbenzene containing solvent and method of developing flexographic printing plates |
| 08/05/2004 | US20040152011 Reversible contrast enhancement layer (R-CEL) in optical lithography, lithography mask inspection and writing and optical storage |
| 08/05/2004 | US20040152009 Benzenesulfonic acid with cycloalkyleneoxycarbonyl- substituent and sulfonium or halogenonium counterion; amplification positive resists; excimer laser lithography; line edge roughness, resolution, sensitivity |
| 08/05/2004 | US20040151993 Patterning light-shielding film; mounting pellicle on mask substrate; inspection; repairing defects |
| 08/05/2004 | US20040151992 Photomask, and method and apparatus for producing the same |
| 08/05/2004 | US20040151989 Photo mask, method of manufacturing electronic device, and method of manufacturing photo mask |
| 08/05/2004 | US20040151400 Method and apparatus for recording jag-free image |
| 08/05/2004 | US20040150878 Projection exposure apparatus |
| 08/05/2004 | US20040150877 Optical arrangement having a lens of single-axis, double-refracting material |
| 08/05/2004 | US20040150865 Programmable photolithographic mask based on semiconductor nano-particle optical modulators |
| 08/05/2004 | US20040150838 Model optimization for structures with additional materials |
| 08/05/2004 | US20040150833 Interferometric plural-dimensional displacement measuring system |
| 08/05/2004 | US20040150808 Master transport apparatus |
| 08/05/2004 | US20040150807 Lithographic apparatus, mirror element, device manufacturing method, and beam delivery system |
| 08/05/2004 | US20040150806 Projection lens and microlithographic projection exposure apparatus |
| 08/05/2004 | US20040150805 Projection exposure apparatus |
| 08/05/2004 | US20040150804 Projection exposure mask, projection exposure apparatus, and projection exposure method |
| 08/05/2004 | US20040150802 Lithograph apparatus comprising a mobile lens for producing digital holograms |
| 08/05/2004 | US20040150778 Active matrix substrate, display device, and image sensing device |
| 08/05/2004 | US20040150707 Apparatus for measuring the physical properties of a surface and a pattern generating apparatus for writing a pattern on a surface |
| 08/05/2004 | US20040150074 Matrix; nanocrystalline particles which absorbs light |
| 08/05/2004 | US20040150068 Membrane 3D IC fabrication |
| 08/05/2004 | US20040150028 Semiconductor device and method for manufacturing the same |
| 08/05/2004 | US20040149937 Extreme UV light source and semiconductor exposure device |
| 08/05/2004 | US20040149935 High throughput, low cost; exposing arbitrary pattern with constant and periodical arrangement of wirings and standard cells of semiconductor |
| 08/05/2004 | US20040149933 Method and devices for adjusting an electron-beam used in an electron beam proximity exposure apparatus |
| 08/05/2004 | US20040149925 Slit lens arrangement for particles beams |
| 08/05/2004 | US20040149688 Method for producing a biomimetic membrane, biomimetic membrane and its applications |
| 08/05/2004 | US20040149687 Method of manufacturing a vacuum chuck used in imprint lithography |
| 08/05/2004 | US20040149683 Method for forming pattern using printing process |
| 08/05/2004 | US20040149678 Method for the fabrication of an optical disk master |
| 08/05/2004 | US20040149367 Devices and methods for aligning a stamp and a substrate |
| 08/05/2004 | US20040149309 Microelectronic cleaning compositions containing ammonia-free fluoride salts |
| 08/05/2004 | US20040148790 Time alarm system in detecting scanner/step module tilt |
| 08/05/2004 | DE10349187A1 Halbleiterwafer-Bearbeitungsvorrichtung A semiconductor wafer processing apparatus |
| 08/05/2004 | DE10297154T5 Phasenverschiebungs-Moiré-Fokusmonitor Phase shift Moiré FokusMonitor |
| 08/05/2004 | DE10297123T5 Bebilderte Elemente und Verfahren zu ihrer Herstellung Illustrated elements and methods for their preparation |
| 08/05/2004 | DE10259769A1 Production of negative working radiation-sensitive element for use as printing plate precursor, by applying radiation-sensitive composition comprising solvent mixture |
| 08/05/2004 | DE10258715A1 Manufacturing optical imaging system, especially microlithography protection objective, involves computing wavefront error correction surface topography/refractive index distribution |
| 08/05/2004 | DE10134755B4 Verfahren zur Messung einer charakteristischen Abmessung wenigstens einer Struktur auf Halbleiterwafern A method for measuring a characteristic dimension of at least one structure on semiconductor wafers |
| 08/04/2004 | EP1443364A2 Projection exposure apparatus |
| 08/04/2004 | EP1443363A2 Compounds for photoresist and resin composition for photoresist |
| 08/04/2004 | EP1443362A2 Resist composition |
| 08/04/2004 | EP1443361A2 Projection exposure mask, projection exposure apparatus, and projection exposure method |
| 08/04/2004 | EP1443304A2 Interferometric plural-dimensional displacement measuring system |
| 08/04/2004 | EP1443042A1 Hybrid onium salt |
| 08/04/2004 | EP1442894A1 Support for lithographic printing plate and presensitized plate and method of treating presensitized plate |
| 08/04/2004 | EP1442330A1 Tilting mirror |
| 08/04/2004 | EP1442329A2 Optical element with an optical axis |
| 08/04/2004 | EP1442088A1 Intaglio printing process using radically curable printing inks |
| 08/04/2004 | EP1442005A2 Novel difunctional photoinitiators |
| 08/04/2004 | EP1441994A1 Fused silica having high internal transmission and low birefringence |
| 08/04/2004 | EP1441868A2 Patterned structure reproduction using nonsticking mold |
| 08/04/2004 | EP1337897A4 Photopatternable sorbent and functionalized films |
| 08/04/2004 | EP1091998B1 Photo-curable polymer composition and flexographic printing plates containing the same |
| 08/04/2004 | EP1084165B1 Water soluble negative-working photoresist composition |
| 08/04/2004 | EP0948757B1 Method of contact printing on gold coated films |
| 08/04/2004 | EP0888389B1 Photoactivatable chain transfer agents |
| 08/04/2004 | CN1518745A Material and method for making electroconductive pattern |
| 08/04/2004 | CN1518685A Method for forming thick resist pattern |
| 08/04/2004 | CN1518684A Thiopene-containing photo acid generators for photolithography |
| 08/04/2004 | CN1518072A Method for cutting chip |
| 08/04/2004 | CN1518064A Patterning method for integrated circuit |
| 08/04/2004 | CN1518063A Processing device of semiconductor chip |
| 08/04/2004 | CN1517803A Dephotoresist agent |
| 08/04/2004 | CN1517802A Stripping agent composition for phtoresist |
| 08/04/2004 | CN1517801A Method for adding developer to automatic developing device for photosensitive lithographic printing plate |
| 08/04/2004 | CN1517800A Method of making metal pattern |
| 08/04/2004 | CN1517799A Perfluoropolyether liquid film and method for cleaning mask using perfluoropolyether liquid |
| 08/04/2004 | CN1517798A Horizon sensor for photoetching device |
| 08/04/2004 | CN1517797A Detecting assembly and photoetching projector with the detecting assembly |
| 08/04/2004 | CN1517796A 曝光装置 Exposure device |
| 08/04/2004 | CN1517795A 光敏性树脂组合物 The photosensitive resin composition of the |
| 08/04/2004 | CN1517794A Anti-corrosion composition |
| 08/04/2004 | CN1517792A Device for removing protective film of optical mask |
| 08/04/2004 | CN1517728A 曝光装置 Exposure device |
| 08/04/2004 | CN1517726A Dyeing photoresist composition for color filter |
| 08/04/2004 | CN1517723A Method for manufacturing microlens array |
| 08/04/2004 | CN1517206A Lithographic printing plate forebody |
| 08/04/2004 | CN1160763C Improved critical dimension control |
| 08/04/2004 | CN1160762C Electronic beam exposure mask, exposure method and equipment and method for making semiconductor device |
| 08/04/2004 | CN1160599C Light absorbing polymers |
| 08/04/2004 | CN1160598C Photoresist composition containing condensation polymer |
| 08/04/2004 | CN1160597C Mixed solvent system for positive photoresists |
| 08/03/2004 | US6772084 Overlay measurements using periodic gratings |
| 08/03/2004 | US6771372 Rotational stage with vertical axis adjustment |
| 08/03/2004 | US6771354 Vibration damping apparatus, control method therefor, exposure apparatus having the vibration damping apparatus, maintenance method therefor, semiconductor device fabrication method, and semiconductor fabrication factory |